Synthesis of TiN/a-Si3N4 thin film by using a Mather type dense plasma focus system

A 2.3 kJ Mather type pulsed plasma focus device was used for the synthesis of a TiN/a-Si3N4 thin film at room temperature. The film was characterized using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and atomic force microscopy (AFM). The XRD pattern confirms the growth of polycrystalline TiN thin film. The XPS results indicate that the synthesized film is non-stoichiometric and contains titanium nitride, silicon nitride, and a phase of silicon oxy-nitride. The SEM and AFM results reveal that the surface of the synthesized film is quite smooth with 0.59 nm roughness (root-mean-square).     

The effect of TiN nanoparticles deposition with different number of shots on SS316L by plasma focus device

In this paper, we present the result of TiN nanocrystalline deposition on SS316L, using a 4 kJ plasma focus (PF) device for 10, 20, and 30 focus shots. The effect of different number of focus shots on micro-structural changes of thin film is characterized by field emission scanning electron microscope. Existence of grains in different size confirms the formation of TiN nanocrystals on the surface of SS316L substrate. X-ray diffraction (XRD) reveals the formation of a nanocrystalline titanium nitride coating on the surface of SS316L samples. The crystalline size of TiN obtained from XRD data is strongly dependent on the number of focus shots. Thickness of the elements found on the surface of the treated sample that obtain by Rutherford backscattering spectroscopy (RBS) analysis is in the range of 150×10¹⁵?200×10¹⁵ atoms/cm². All the existence elements in the coated samples are identified by Particle Induced X-ray Emission (PIXE) spectra. Investigation on the corrosion resistance of TiN coatings was performed using an electrochemical potentiodynamic polarization. Our results suggest that TiN nanocrystalline implantation with proper ion fluences using PF can significantly improve the corrosion resistance of SS316L.     

Deposition of tungsten nitride thin films by plasma focus device at different axial and angular positions

Tungsten nitride thin films were deposited on stainless steel-304 substrates by using a low energy (2 kJ) Mather type plasma focus device. X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM) and microhardness are used to study the surface of treated samples. The XRD analysis shows that the degree of crystallinity of deposited thin films strongly depends on axial and angular positions of samples. The SEM micrographs of the deposited films at different angular positions (0°, 10° and 30°) and axial position of 8 cm show that the content of WN sub-micro crystalline structures on the surface of deposited films decreased with increasing the angle with respect to anode axis. From AFM results we observe that for the sample deposited at 8 cm and 0° axial and angular positions, respectively, the most uniform surface and the most homogenous distribution of grains are obtained. Also the hardness results show that the highest mechanical hardness is obtained when the film is deposited at 8 cm and 0° axial and angular positions, respectively.     

稠密等离子体焦点装置研制

研制了一台用作脉冲中子源的稠密等离子体焦点装置(DPF),其放电室为Mather型结构。介绍了整个装置的工作原理及系统组成,详细论述了放电室的设计方法。实验结果表明,在550~600 Pa充氘压力范围下,当储能电容充电电压大于19 kV时,装置的平均中子产额大于5.0×10⁸(D-D)中子/脉冲,中子脉冲宽度(FWHM)为(40±5) ns。该装置能用于中子、伽马辐射诊断中探测系统灵敏度实验研究,也可用于开展快中子照相、中子活化分析以及单粒子效应等方面的研究工作。     

Nitrogen doping in pulsed laser deposited ZnO thin films using dense plasma focus

Pulsed laser deposition synthesized ZnO thin films, grown at 400 °C substrate temperature in different oxygen gas pressures, were irradiated with 6 shots of pulsed nitrogen ions obtained from 2.94 kJ dense plasma focus to achieve the nitrogen doping in ZnO. Structural, compositional and optical properties of as-deposited and nitrogen ion irradiated ZnO thin films were investigated to confirm the successful doping of nitrogen in irradiated samples. Spectral changes have been seen in the nitrogen irradiated ZnO thin film samples from the low temperature PL measurements. Free electron to acceptor emissions can be observed from the irradiated samples, which hints towards the successful nitrogen doping in films. Compositional analysis by X-ray photoelectron spectroscopy and corresponding shifts in binding energy core peaks of oxygen and nitrogen confirmed the successful use of plasma focus device as a novel source for nitrogen ion doping in ZnO thin films.     

用于等离子体焦点装置的强流装置

研制了用于稠密等离子体焦点的强流装置,该装置采用八台低电感低内阻脉冲电容器和八个低感大电流、可控触发高压开关并联组成初级储能模块,高压开关同步击穿后产生μs级强电流经平行板传输线加载到负载。脉冲电容器和高压开关采用一体化设计,结构紧凑,使脉冲电容器与高压开关间的连接电感尽可能小;平板传输线为扇形结构,一个扇形平板传输线连接一个高压开关,平行板传输线可以将电感做得较小,有利于大电流回路的传输。在脉冲电容器充电20 kV时,假负载上可以得到500 kA的电流,电流上升时间约为3.7 μs。     

Synthesis of nano-structure tungsten nitride thin films on silicon using Mather-type plasma focus

Nano-structure thin film of tungsten nitride was deposited onto Si-substrate at room temperature using Mather-type plasma focus (3.3?kJ) machine. Substrate was exposed against 10, 20, 30, and 40 deposition shots and its corresponding effect on structure, morphology, conductivity and nano-hardness has been systematically studied. The X-ray diffractormeter spectra of the exposed samples show the presence of various phases of WN and WN₂ that depends on number of deposition shots. Surface morphological study revealed the uniform distribution of nano-sized grains on deposited film surface. Hardness and conductivity of exposed substrate improved with higher deposition shots. X-ray photo-electron spectroscopy survey scan of 40 deposition shots confirmed the elemental presence of W and N on Si-substrate.     

稠密等离子体聚焦装置的中子产额及其稳定性研究

叙述了稠密等离子体聚焦装置(DPF)作为中子发生器的工作原理,讨论了影响DPF中子产额及其稳定性的一些因素和改进措施。利用不同电极形状、不同绝缘气体的场崎变开关可以很好地提高聚焦装置的运行性能,使装置输出中子的起伏由过去的约两个量级降到目前的3倍左右。通过对腔内电极的清洁,在不更换气体的条件下。中子产额无明显下降。     

Optimization of neon soft X-rays emission from 200 J fast miniature dense plasma focus device: A potential source for soft X-ray lithography

The neon soft X-ray (SXR) emission characteristics of a Fast Miniature Plasma Focus (FMPF-3) device have been investigated. The FMPF-3 device used for our experiment is of sub-kilojoule energy capacity, which is an order of magnitude lesser than the other well established plasma focus devices. The influence of different geometrical parameters of the anode and the pressure of the filling gas on the SXR emission was investigated to optimize the neon SXR yield and thereby make it a potential source for X-ray lithography. The SXR signal, solely from the desired, characteristic spectral range (900–1600) eV was selectively extracted and acquired using appropriate X-ray absorption filters on diode X-ray spectrometer. It was found that the neon SXR emission from 17 mm long cylindrical anode, which produced best neutron yields, was rather poor, in a very narrow pressure range and that too at low operating pressure. With decrease in the length of cylindrical anode, the optimum operating pressure shifts to higher pressure side, the working pressure range widens and the SXR yield also increases until the anode length is reduced to 12 mm, after which, the SXR yield and working pressure range start to degrade. The highest neon SXR yield of 1.1 J/shot, corresponding to a wall plug efficiency of 0.57%, was obtained for 12 mm long cylindrical anode. The tapered anodes with different length were also designed and tested, but they did not show any significant improvement in neon SXR yield.     

Mechanical properties of Al/a-C nanocomposite thin films synthesized using a plasma focus device

The Al/a-C nanocomposite thin films are synthesized on Si substrates using a dense plasma focus device with alu- minum fitted anode and operating with CH4/Ar admixture. X-ray diffractometer results confirm the formation of metallic crystalline Al phases using different numbers of focus shots. Raman analyses show the formation of D and G peaks for all thin film samples, confirming the presence of a-C in the nanocomposite thin films. The formation of Al/a-C nanocomposite thin films is further confirmed using X-ray photoelectron spectroscopy analysis. The scanning electron microscope results show that the deposited thin films consist of nanoparticles and their agglomerates. The sizes of th agglomerates increase with increasing numbers of focus deposition shots. The nanoindentation results show the variations in hardness and elastic modulus values of nanocomposite thin film with increasing the number of focus shots. Maximum values of hardness and elastic modulus of the composite thin film prepared using 20 focus shots are found to be about 10.7 GPa and 189.2 GPa, respectively.     

Relativistic electron beams detection in a dense plasma focus

Fast electron beams into a hollow anode of a small plasma focus machine (2 kJ, 4 μF) were measured. The diagnostic method designed for this purpose is founded in a small Rogowski coil introduced into a cavity performed in the anode. By means of this, electron beam pulses of about 10 ns width generated in the plasma focus are detected. Simultaneously, hard X-ray signals obtained from a scintillator-photomultiplier system are registered. The electron beam energy was measured through the time-of-flight of the electrons between probe and anode top. The beams are found to be relativistic and its energy is into the range of hard X-rays energy. An analysis of signal intensities and relative delays for three hundred shots are here presented. Received 28 February 2002 / Received in final form 7 May 2002 Published online 24 September 2002     

Synthesis of composite TiN/Ni3N/a-Si3N4 thin films using the plasma focus device

Composite films of TiN/Ni₃N/a-Si₃N₄ were synthesized using the Mather-type plasma focus device with varying numbers of focus deposition shots (5, 15, and 25) at 0° and 10° angular positions. The composition and structural analysis of these films were analyzed by using Rutherford backscattering (RBS) and X-ray diffraction (XRD). Scanning electron microscope and atomic force microscope were used to study the surface morphology of films. XRD patterns confirm the formation of composite TiN/Ni₃N/a-Si₃N₄ films. The crystallite size of TiN (200) plane is 11 and 22 nm, respectively, at 0° and 10° angular positions for same 25 focus deposition shots. Impurity levels and thickness were measured using RBS. Scanning electron microscopy results show the formation of net-like structures for multiple focus shots (5, 15, and 25) at angular positions of 0° and 10°. The average surface roughness of the deposited films increases with increasing focus shots. The roughness of the film decreases at higher angle 10° and the films obtained are smoother as compared with the films deposited at 0° angular positions.     

Influence of Kr doping on neon soft X-rays emission in fast miniature plasma focus device

An investigation on the possibility of enhancement of soft X-ray (SXR) (900–1600 eV) emission from a fast miniature plasma focus (FMPF) device of 235 J (at 14 kV) storage energy through doping of operating gas was performed. Neon (Ne), the operating gaseous medium, was doped with krypton (Kr) in different volumetric ratios at various operating pressures ranging from 2 to 14 mbar. The 1% Kr doping increased the average optimum SXR emission efficiency from 0.47% to 0.6% without enhancing the hard X-ray (HXR) (>1600 eV) emission. The Kr doping influenced the major pinching characteristics such as focusing efficiency and time to pinch with consequential effect on X-ray emissions. Synchronous operation of the 4 pseudo-spark gap (PSG) switches was mandatory for efficient discharge current delivery to the electrodes. A drastic improvement in the pinching efficiency was obtained with replacement of old and worn out PSG switches with the new ones. Optical imaging of current sheath dynamics was performed using gated ICCD camera to verify the normal operation of the device after the PSGs replacement. A numerical simulation analysis on the 2 cm long stainless steel tapered anode, used in this study, was done to predict the maximum SXR emission efficiency and the peak operating gas pressure. An analysis on the amount of SXR fluence generated at the source position and the proportion of it reaching the target position is also reported.     

Experimental study of the neutron emission mechanisms in a Filippov-type plasma focus device

The results of an experimental investigation of neutron emission characteristics in the Filippov-type plasma focus facility Dena (90 kJ, 25 kV, 288 µF) with D₂ + %1 Kr as working gas are presented. From the experimental results, one can conclude that both thermonuclear and nonthermonuclear mechanisms are always present in neutron production, but their contributions to the total neutron yield are strongly dependent on the initial pressure and discharge voltage. It has been found that at constant discharge voltages and low pressures the beam—target interaction mechanism plays an important role in the neutron production and with increasing the pressure, its role decreases and the importance of thermonuclear mechanism increases. Also at constant pressures, the contribution of beam—target interaction mechanism in neutron production decreases with increasing the discharge energy. The value of the index in the empirical neutron yield scaling law Y_n I E^/2 was found to be about 3.82.     

基于等离子体紫外辐射的强激光自动寻焦系统

精准定位激光束焦点位置是提高激光雕刻、切割、焊接等加工精度的重要基础,而传统测量方法不适用于自动寻找强激光焦点。基于激光烧蚀金属后等离子发光含大量紫外谱线的原理,以日盲的氮化镓肖特基光电二极管为传感器,设计了以304不锈钢靶材为耗材的红外强激光束自动寻焦方法及其装置。该方法与共聚焦显微镜检测平均烧蚀坑深的方法相比,当以脉冲宽度100 ns、重复工作频率20 kHz、平均功率10 W的1064 nm光纤激光雕刻机为实验对象时,二者定焦位置相差24 μm。     

Very low pressure plasma sprayed alumina and yttria-stabilized zirconia thin dense coatings using a modified transferred arc plasma torch

As a novel thermal spray process, very low pressure plasma spray (VLPPS) process has been significantly used to deposit thin, dense and homogenous ceramic coating materials for special application needs in recent years. In this study, in order to enhance low-energy plasma jet under very low pressure ambience, a home-made transferred arc nozzle was made and mounted on a low-power F100 plasma torch to fully melt or evaporate powder feedstock. As a result, thin and dense alumina (Al₂O₃) and yttria-stabilized zirconia (YSZ) ceramic coatings with an average thickness of 30-40 μm were successfully elaborated by the VLPPS process below 1 mbar. An optical emission spectroscopy (OES) was used to analyze the plasma jet properties. The microstructures of the coatings were observed by means of a scanning electron microscopy (SEM). It was found that the YSZ coatings displayed a bimodal microstructure which was composed of splats formed by melted particles and a little amount of vapor condensation from evaporated particles. However, vapor condensation could not be observed in the Al₂O₃ coatings, and only lamellar splats were found. The mechanical properties of both coatings were also evaluated.     

Enhancement of X-ray emission in the side on direction in a Mather-type plasma focus

A 1.8 kJ Mather-type plasma focus (PF) for argon and hydrogen filling is examined. Two anode configurations are used. One is tapered towards the anode face, and the other is cylindrical but the face is cut at different angles. At optimum conditions, the system is found to emit Cu–Kα X-rays of about 1.6±0.1 J/sr in the side-on direction for argon filling, which is about 32% of the total X-ray emission. In 4π-geometry, maximum total X-ray yield and wall plug efficiency found are 26.4±1.3 J and 1.5± 0.1% respectively. The modified geometry may help to use the PF as a radiation source for X-ray diffraction.     

Synthesis of ZrSiN composite films using a plasma focus device

ZrSiN thin films are synthesized by using plasma focus through various numbers of focus shots （10, 20, and 30）, with samples placed at 9 cm away from the tip of the anode. Crystal structures, surface morphologies, and elemental compositions of ZrSiN films are characterized by an X-ray diffractometer （XRD） and scanning electron microscope （SEM） attached with energy dispersive X-ray spectroscopy （EDS）. XRD patterns confirm the formations of polycrystalline ZrSiN films. Crystallinity of nitride increases with the increase of focus shot number. The average crystallite size of zirconium nitride increases from 27 ± 3 nm to 73±8 nm and microstrain decreases from 2.28 to 1.0 with the increase of the focus shot number. SEM results exhibit the formations of granular and oval-shaped microstructures, depending on the number of focus shots. EDS results confirm the presences of silicon, zirconium, nitrogen, and oxygen in the composite films. The content values of Zr and N in the composite films increase with the increase of the focus shot number.     

Stability assessment and operating parameter optimization on experimental results in very small plasma focus,using sensitivity analysis

Regarding the importance of stability in small-scale plasma focus devices for producing the repeatable and strength pinching, a sensitivity analysis approach has been used for applicability in design parameters optimization of an actually very low energy device (84 nF, 48 nH, 8–9.5 kV, ～2.7–3.7 J). To optimize the devices functional specification, four different coaxial electrode configurations have been studied, scanning an argon gas pressure range from 0.6 to 1.5 mbar via the charging voltage variation study from 8.3 to 9.3 kV. The strength and efficient pinching was observed for the tapered anode configuration, over an expanded operating pressure range of 0.6 to 1.5 mbar. The analysis results showed that the most sensitive of the pinch voltage was associated with $0.88\pm 0.8\text{mbar}$ argon gas pressure and 8.3–8.5 kV charging voltage, respectively, as the optimum operating parameters. From the viewpoint of stability assessment of the device, it was observed that the least variation in stable operation of the device was for a charging voltage range of 8.3 to 8.7 kV in an operating pressure range from 0.6 to 1.1 mbar.     

Neutron production with mixture of deuterium and krypton in Sahand Filippov type plasma focus facility

This Letter reports the order of magnitude enhancement in neutron yield from Sahand plasma focus device with krypton seeded deuterium operation. The highest average neutron yield of 2.2×¹⁰⁹ neutrons per shot was achieved at 1.00 Torr deuterium with 3% krypton which is higher than the best average neutron yield of 3.18×¹⁰⁸ neutrons per shot for pure deuterium operation. Estimation of average neutron energy showed that the maximum and minimum average energies are 2.98±0.6 MeV at 16 kV in 0.25 Torr deuterium with 3% Kr and 2.07±0.2 MeV at 18 kV operation in 0.5 Torr deuterium with 3% Kr, respectively. The anisotropy of neutron emission from Sahand DPF showed that the neutrons are produced mainly by beam-target mechanisms.