Preparation and characterization of semiconductor GNR-CNT nanocomposite and its application in FET

So far, little is known about the experimental potential of graphene nanoribbon-carbon nanotube (GNR-CNT) heterostructure as a semiconductor nanocomposite. The present work examined the structural features, topography and electronic properties of GNR-CNT nanocomposite by using Raman spectroscopy, transmission electron microscopy, scanning tunneling microscopy and spectroscopy (STS). The homogenous semiconductor GNR-CNT nanocomposites were produced under optimized synthesis conditions. The narrow band gap was exhibited by optimization of the reduction step. The STS of the micro-scale surface of the nanocomposite shows local density of state in selected areas that represent the 0.08 eV band gap of a homogenous nanocomposite. The potential of the semiconductor nanocomposite was considered for application in stacked graphene nanoribbon-field effect transistors (SGNR-FETs). A simple method of device fabrication is proposed based on a semiconductor stacked GNR nanocomposite. The high hole mobility and rectifying effect of the p–n junction of the SGNR nanocomposite on TiO₂ are demonstrated. The optimal thickness for the back gate TiO₂ dielectric for the tested devices was 40 nm. This thickness decreased leakage current at the p–n junction of the SGNR/TiO₂ interface, which is promising heterojunction for optoelectronics. The thickness of gate dielectric and quantum capacitance of the gate was investigated at the low 40 nm thickness by calculating the mobility. In the proposed SGNR-FET, holes dominate electrical transport with a high mobility of about 1030 cm²/V s.     

Novel molybdenum disulfide nanosheets–decorated polyaniline: Preparation,characterization and enhanced electrocatalytic activity for hydrogen evolution reaction

Novel molybdenum disulfide nanosheets–decorated polyaniline (MoS₂/PANI) was synthesized and investigated as an efficient catalyst for hydrogen evolution reaction (HER). Compared with MoS₂, MoS₂/PANI nanocomposites exhibited higher catalytic activity and lower Tafel slope for HER in H₂SO₄ solution. The amount of 19 wt% PANI for coupling with MoS₂ resulted in a high current density of 80 mA cm⁻² at 400 mV (vs. RHE). In addition, the optimal MoS₂/PANI nanocomposite showed impressive long-term stability even after 500 cycles. The enhanced catalytic activity of MoS₂/PANI nanocomposites was primarily ascribed to the effective electron transport channels of PANI and the increase of electrochemically accessible surface area in composite materials, which was advantageous to facilitate the charge transfer at catalyst/electrolyte interface.     

A novel optical property induced by MO,S vacancy and V-doped in monolayer MoS2

The electronic structure and optical properties of Mo, S vacancy and V doping in MoS₂ monolayer will be investigated through first-principles calculations based on the density functional theory. The results indicate that the MoS₂ with Mo, S vacancy and V doping (Mo₁₄VS₃₂, Mo₁₅VS₃₁ and Mo₁₄VS₃₁) will gain the property of magnetic semiconductor with the magnetic moment of 1 μB, 1 μB and 0.95 μB, respectively. The optical properties of these V-doped and vacancy defect structures all reflect the phenomenon of red shift. The absorption edge of pure monolayer molybdenum disulfide is 0.8 eV, whereas the absorption edges of Mo₁₄VS₃₂, Mo₁₅VS₃₁ and Mo₁₄VS₃₁ become 0 eV, 0.2 eV and 0.16 eV, respectively. As a potential material, MoS₂ is widely used in many fields such as the production of optoelectronic devices, military devices and civil devices.     

Fabricating high performance n-channel lateral double diffused metal–oxide–semiconductor transistors utilizing the shallow trench isolation as a salicide blocking mask of the drift region

In this paper, the improved characteristics of 10 V tolerant high-voltage n-channel lateral double diffused metal–oxide–semiconductor (LDMOS) devices, using a pure 0.25 μm standard low-voltage complementary metal–oxide–semiconductor (CMOS) logic process with dual gate oxide, are described. The fabricated transistors showed about 30% better current driving characteristics and about 40% higher drain operating voltage than previous reports of these kinds of devices. The transistors maintained a breakdown voltage, BV_DSS, over 14 V. These devices also showed good sub-threshold characteristics. This paper describes the cost-effective and high performance n-channel high-voltage LDMOS using a pure low-voltage standard CMOS logic process.     

Device linearity improvement and current enhancement utilizing high-to-low doping-channel FETs

We report device linearity improvement and current enhancement in both a heterostructure FET (HFET) and a camel-gate FET (CAMFET) using InGaAs/GaAs high-low and GaAs high-medium-low doped channels, respectively. In an HFET, a low doped GaAs layer was employed to build an excellent Schottky contact. In a GaAs CAMFET, a low doped layer together withn⁺andp⁺layers formed a high-performance majority camel-diode gate. Both exhibit high effective potential barriers of >1.0 V and gate-to-drain breakdown voltages of >20.0 V (atI_g=1.0 mA mm⁻¹). A thin, high doped channel was used to enhance current drivability and to improve the transconductance linearity. A 2×100 μm²HFET had a peak transconductance of 230 mS mm⁻¹and a current density greater than 800 mA mm⁻¹. The device had a transconductance of more than 80 percent of the peak value over a wide drain current range of 200 to 800 mA mm⁻¹. A 1.5×100 μm²CAMFET had a peak transconductance of 220 mS mm⁻¹and a current density greater than 800 mA mm⁻¹. Similarly, the device had a transconductance of more than 80 percent of the peak value over a wide drain current range of 160 to 800 mA mm⁻¹. The improvement of device linearity and the enhancement of current density suggest that high-to-low doped-channel devices for both an HFET and a CAMFET are suitable for high-power large signal circuit applications.     

Excess currents larger than the point contact limit in normal-metal/superconducting junctions

In a point contact NS junction, perfect Andreev reflection occurs over a range of voltages equal to the superconducting energy gap, producing an excess current of I_exc =  (4 / 3)(2 eΔ / h). If the superconductor has a finite width, rather than the infinite width of the point contact, one cannot neglect superfluid flow inside the superconducting contact. The energy range available for perfect Andreev reflections then becomes larger than the superconducting gap, since superfluid flow alters the dispersion relation inside the finite width superconductor. We find a maximum excess current of approximately (7 / 3)(2 eΔ / h) when the width of the superconductor is approximately 7 / 3 times the width of the normal metal.     

Ohmic contact and space-charge-limited current in molybdenum oxide modified devices

The effect of indium-tin oxide (ITO) surface treatment on hole injection of devices with molybdenum oxide (MoO₃) as a buffer layer on ITO was studied. The Ohmic contact is formed at the metal/organic interface due to high work function of MoO₃. Hence, the current is due to space charge limited when ITO is positively biased. The hole mobility of N, N′-bis-(1-napthyl)-N, N′-diphenyl-1, 1′biphenyl-4, 4′-diamine (NPB) at various thicknesses (100–400 nm) has been estimated by using space-charge-limited current measurements. The hole mobility of NPB, 1.09×10⁻⁵ cm²/V s at 100 nm is smaller than the value of 1.52×10⁻⁴ cm²/V s at 400 nm at 0.8 MV/cm, which is caused by the interfacial trap states restricted by the surface interaction. The mobility is hardly changed with NPB thickness for the effect of interfacial trap states on mobility which can be negligible when the thickness is more than 300 nm.     

Electron-energy-loss spectroscopy of C60 monolayer films on active and inactive surfaces

The characteristics of interaction between C₆₀ molecules and Si(1 1 1)-7×7, Ag/Si(1 1 1)-√3×√3 R30° and layered material MoS₂ surfaces have been investigated using electron-energy-loss spectroscopy (EELS). The EEL spectrum of C₆₀/Si(1 1 1)-7×7 shows a new peak at loss energy of 2.7 eV. This indicates the existence of charge transfer from the substrate to C₆₀ molecules. The EEL spectrum of a C₆₀ monolayer film grown on a cleaved surface of MoS₂ is almost the same as that of bulk C₆₀. The EEL spectrum of a C₆₀ monolayer film on an Ag/Si(1 1 1) surface is quite different from that on a clean Si(1 1 1)-7×7 surface, although the films on those substrates have the same epitaxial arrangement. Furthermore, intensities of energy-loss peaks of C₆₀/Ag/Si(1 1 1) are slightly smaller than those of C₆₀/MoS₂ in spite of having the same loss-energy. This suggests that the interaction between C₆₀ molecules and the Ag/Si(1 1 1) surface is stronger than that between C₆₀ molecules and the MoS₂ surface.     

Shrinking limits of silicon MOSFETs: numerical study of 10 nm scale devices

We have performed numerical modeling of dual-gate ballistic n-MOSFETs with channel length of the order of 10 nm, including the effects of quantum tunneling along the channel and through the gate oxide. Our analysis includes a self-consistent solution of the full (two-dimensional) electrostatic problem, with account of electric field penetration into the heavily doped electrodes. The results show that transistors with channel length as small as 8 nm can exhibit either a transconductance up to 4000 mS mm ^− 1or gate modulation of current by more than 8 orders of magnitude, depending on the gate oxide thickness. These characteristics make the devices satisfactory for logic and memory applications, respectively, although their gate threshold voltage is rather sensitive to nanometer-scale variations in the channel length.     

Terahertz pulse driven Josephson junctions

The voltage response of a Josephson junction to a pulsed terahertz current is evaluated in the limit of a negligible junction capacitance (overdamped limit). The time-dependent superconductor phase difference across the junction is calculated in the framework of the standard resistive shunted junction model by using a perturbative method. The pulsed current bias affects the time average value of the voltage across the junction and current steps are induced in the current–voltage characteristics for voltage values depending on the pulse repetition rate. The current step height is proportional to the square of the pulse time width (τ) to the period (T) ratio. A fast response detector for pulsed Terahertz radiation is proposed, with an expected responsivity of the order of 0.1 V/W and an equivalent noise power of about 3 × 10^?10 W/Hz^1/2.     

Electrical properties of carbon-nanotube-network transistors in air after gamma irradiation

We experimentally evaluate the electrical properties of carbon nanotube (CNT)-network transistors before and after ⁶⁰Co gamma-ray irradiation up to 50 kGy in an air environment. When the total dose is increased, the degree of the threshold voltage (V_th) shift towards positive gate voltages in the drain current–gate voltage (I_D–V_GS) characteristics decreases for total irradiation doses above 30 kGy, although it is constant below 30 kGy. From our analysis of the I_D–V_GS characteristics along with micro-Raman spectroscopy, the gamma-ray irradiation does not change the structure of the CNT network channel for total doses up to 50 kGy; it instead generates charge traps near the CNT/SiO₂ gate insulator interfaces. These traps are located within the SiO₂ layer and/or the adsorbate on the device surface. The positively charged traps near the CNT/SiO₂ interface contribute less to the V_th shift than the interface dipoles at the CNT/metal electrode interfaces and the segment of the CNT network channel below doses of 30 kGy, while the contribution of the charge traps increases for total doses above 30 kGy. Our findings indicate the possibility of the application of CNT-network transistors as radiation detectors suitable for use in air for radiation doses above 30 kGy.     

Investigation of complex channel capacitance in C60 field effect transistor and evaluation of the effect of grain boundaries

Frequency and gate voltage dependences of capacitance in a C₆₀ field effect transistor (FET) showed an intriguing power law (C ∝ f^−p, p ∼ 0.3–0.35) irrespective of the gate voltage. In order to interpret this phenomenon, we formulated a complex impedance of the bottom contact FET based on a distributed constant circuit model in cases of both a single grain channel and a multi-grain channel. The power law could be well explained in terms of the complex impedance formula using only a small number of fitting parameters, the results of which indicate the validity of the model. This kind of analysis could usefully characterize the organic FETs consisting of grain boundaries, providing information on the resistance ratio of the grain interior to the grain boundary.     

Off-state breakdown characteristics of InGaP-based high-barrier gate heterostructure field-effect transistors

In this work, the off-state breakdown characteristics of two different types InGaP-based high-barrier gate heterostructure field-effect transistors are studied and demonstrated. These devices have different high-barrier gate structures, e.g. the i-InGaP layer for device A and n  ⁺ - GaAs/p ⁺  -InGaP/n-GaAs camel-like structure for device B. The wide-gap InGaP layer is used to improve the breakdown characteristics. Experimentally, the studied devices show high off-state breakdown characteristics even at high temperature operation regime. This indicates that the studied devices are suitable for high-power and high-temperature applications. In addition, the off-state breakdown mechanisms are different for device A and B. For device A, off-state breakdown characteristics is only gate dominated at the temperature regime from 30 to 180  ^∘ C. For device B, off-state breakdown characteristics are gate and channel dominated at 30  ^∘ C and only gate dominated within 150 to 210  ^∘ C.     

Effect of film thickness on the transport properties of MgB2 synthesized by spray pyrolysis

Polycrystalline MgB₂ films of different thickness have been prepared by employing spray pyrolysis technique on MgO (1 0 0) substrate. The MgB₂ and other phases have been confirmed using X-ray diffraction technique and no trace of impurities phases have been found. The resistivity behavior shows that the superconducting transition temperature lies in the range of 37–39 K with narrow transition width. The transport critical current density vary with films thickness and achieved highest value ～1.2 × 10⁶ A/cm² at 20 K for 2.0 μm thick film and its values increase as thickness increases.     

Step feature observed in the angular dependence of magnetization switching fields in GaMnAs micro-device

The magnetization switching phenomena of GaMnAs Hall devices have been investigated by using the planar Hall effect (PHE) measurement. Though two different sizes of Hall bar devices, width of 300 and of 10 μm, show very similar Curie temperature, their magnetization switching fields behave significantly different. While the angle dependence of magnetization switching field of the 300 μm device showed typical rectangular shape behavior with an applied magnetic field angle in the polar plot, that of the 10 μm device exhibited large step at 〈1 1 0〉 crystallographic directions, breaking the continuity of the switching field in angle dependence. Such unusual phenomenon observed in the 10 μm device was discussed in terms of the change in magnetic anisotropy by the fabrication of micro-device.     

Low temperature hole mobility in strained p-Si/Si1 − xGex/p-Si selectively doped double heterojunctions

We present a systematic theoretical study of the low-temperature (T =  0 K) quasi-two-dimensional-hole gas mobility in strained p-Si/Si_0.8Ge_0.2/p-Si selectively doped double heterojunctions. Ionized-impurity (remote and background), interface-roughness and alloy-scattering mechanisms are taken into account. In our calculations we use self-consistently calculated wavefunctions and a multi-subband transport model. We investigate the mobility dependence on the structural parameters, such as the spacer thickness and the well width. We comment on the significance of every scattering mechanism looking for the maximum hole mobility in these systems. Alloy scattering seems to be the main mobility-limiting mechanism resulting in a hole mobility which increases with the spacer thickness and the well width. Our theoretical results are consistent with experiment.     

Si-delta doping and spacer thickness effects on the electronic properties in Si-delta-doped AlGaAs/GaAs HEMT structures

In this work, we investigate the effect of the δ-Si doping on the barrier and the spacer thickness on the electronic properties of AlGaAs/GaAs HEMTs structures grown by molecular beam epitaxy on (1 0 0) oriented GaAs substrates. Photoluminescence measurements as function of the temperature are used to determine the relaxation processes of the electron and the hole in the channel. The photoluminescence characterizations of Si-delta-doped AlGaAs/GaAs HEMTs structures have been studied in the 10–300 K temperature range. Low temperature PL spectra show the optical transition (E_e–h) that occurs between the fundamental states of electrons to holes in the GaAs channel. Increase of the Si-δ-doping density and decrease of the spacer width improve the two-dimensional electron gas confinement and decrease defects densities in the canal. The band structure of Si-delta-doped AlGaAs/GaAs HEMTs structures at T = 10 K has been studied theoretically using the finite differences method to self-consistently and simultaneously solve Schrödinger and Poisson equations written within the Hartree approximation.     

Two-dimensional numerical simulation on galloping detonation in a narrow channel

The numerical simulations of the two-dimensional galloping detonation performed by using two-dimensional full Navier–Stokes simulations with a detailed chemistry model are presented. The detonation in a narrow channel with d = 5 mm, which is approximately twice the half-reaction length of hydrogen, shows a feature of galloping detonation with two initiations during its propagation under the laminar flow assumption. The distance between these two initiations is approximately 1300 mm, which causes the induction time behind the leading shock wave. As the channel width increases, the galloping feature diminishes. The detonation propagates approximately 4% lower than D_CJ for d = 10 and 15 mm. By increasing the channel width, the strength of the detonation increases, as shown in the maximum pressure histories. The effects of turbulence behind the detonation show that the galloping feature disappears, although its propagation velocity becomes 0.9 D_CJ. The strength of the detonation becomes significantly weak compared with the detonation propagating in the wide channel widths, and this feature is similar to the laminar assumption. The trend of the velocity deficits in the NS simulations agrees fairly well with the trend of the modified ZND calculations with η = 0.25.     

Conductance of quantum interference transistors in parallel and in series

We theoretically study the electronic conductance G and the current–voltage characteristics of two quantum interference transistors in parallel and in series. We use two different definitions of conductance,G ∼ T and G ∼ T / R. Neither can reproduce the classical additivity law in the case of coherent transport due to quantum interference for the elements in series and quasibound states when elements are in parallel. In the case of two transistors in series, we find that the quantityT / R only qualitatively better represents the additivity law, which is probably expected because this model avoids counting the contact resistance twice. However, for the parallel configuration of transistors, the conductance is almost additive for the majority of energies when G ∼ T, except for the single-mode regime. Possible use of these configurations in digital electronics for basic logic functions is discussed.