N掺杂MgxZn1-xO薄膜结构和光学性质研究

采用溶胶-凝胶法在玻璃衬底上制备了N掺杂MgxZn1-xO薄膜.通过X射线衍射(XRD)、扫描电子显微镜(SEM)、透射光谱、光致发光(PL)谱对N掺杂MgxZn1-xO薄膜样品的晶体结构、表面形貌和光学性能进行了研究.XRD结果表明所有样品均形成了MgZnO合金薄膜,没有观察到其它氧化物的衍射峰.样品的结晶质量越差,样品的表面形貌越不规则,但样品在可见光的透射率越强,甚至达到了95;.样品的禁带宽度随Mg含量的增加而增加,随N含量的增加而减小.所有样品的光致发光谱均观察到强的400 nm发光和弱的可见发光.400 nm的发光强度随Mg含量的增加而减弱,随N含量的增加而增强,认为薄膜在400 nm的发光来源ZnO的激子复合.     

退火对电弧离子镀制备的ZnO薄膜的影响

采用阴极电弧离子镀在Si、Al2O3以及玻璃衬底上制备出具有择优取向的ZnO薄膜,并对其进行退火处理.利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、光致发光光谱(PL)、紫外-可见光光谱仪对ZnO薄膜的结构、表面形貌和光学性能进行分析.XRD结果表明,所制备的ZnO薄膜具有很好的ZnO(002)择优取向,退火使ZnO(002)衍射峰向高角度方向偏移.SEM结果表明,随着退火温度升高,表面晶粒由隆起的山脉或塔状变为平面状,晶粒002面呈六边状.PL谱结果表明,随着退火温度的升高,紫外发光峰强度逐渐增强,可见光发光峰强度逐渐相对减弱.紫外可见光透过谱结果表明,退火使可见光透过率增高,光学带隙发生红移.     

掺Cd对ZnO薄膜光学性能的影响

采用溶胶-凝胶法在石英玻璃上制备了不同掺Cd浓度的ZnO薄膜.X射线衍射(XRD)结果表明,所制备的薄膜具有c抽择优取向,随着Cd掺杂浓度的升高,(002)峰向低角度方向移动.UV透射曲线表明,薄膜具有明显的紫外吸收边,通过改变Cd的掺入浓度,可以使吸收边向长波方向移动并被控制在一定范围内,从而使薄膜的禁带宽度连续可调;薄膜的光致发光(PL)谱显示,ZnO薄膜的PL谱是由紫外激子发光峰和蓝光发光带组成,通过掺入Cd可使紫外带边发射的峰位向低能端方向红移,这与透射谱中吸收带边的红移相吻合,由紫外发光峰得到的光禁带宽度和由透射谱拟合得到的光禁带基本一致.对不同掺杂浓度的薄膜进行了比较,发现Cd掺入量为8;摩尔分数时ZnO薄膜具有最佳的结构性能和发光性能.     

退火气氛和镧掺杂浓度对ZnO薄膜结构和光学性能的影响

采用溶胶-凝胶浸渍提拉法在玻璃衬底上制备Zn1-xLaxO(x=0～0.04)(LZO)薄膜,分别在空气、氮气和氩气条件下进行退火,探讨了不同退火气氛和不同镧掺杂浓度对其结构和光学性能的影响.XRD和SEM结果表明:氩气退火条件下ZnO的晶粒尺寸比空气退火条件下和氮气退火条件下的晶粒尺寸略小,且ZnO晶粒的尺寸随着镧掺杂浓度的增加而减小.薄膜光致发光(PL)测量表明:紫光发光带中心在氩气下退火相对于空气下退火存在略微的蓝移,而在氮气下退火则相反;ZnO紫光发光带的位置随着镧掺杂浓度的增加先红移而后蓝移.禁带宽度在镧掺杂量为2;时达到最小值,说明镧可以有效地调节ZnO的禁带宽度.     

Zn1-x MgxS薄膜的磁控溅射制备及其性能研究

利用双靶磁控溅射法,在普通石英玻璃基底上成功制备出II-VI族化合物固溶体半导体Zn1-xMgxS多晶薄膜,并用X射线能量色散谱仪(EDS)、原子力显微镜(AFM)、X射线衍射仪(XRD)、紫外-可见(UV-V is)分光光度计、荧光分光光度计(PL)等测试手段表征了多晶薄膜的成份、表面形貌、晶体结构和光学性质。结果表明:磁控溅射法制备的Zn1-xMgxS多晶薄膜具有立方和六方相混晶相结构,晶粒生长均匀,薄膜在波长小于280nm的紫外区有强烈的吸收,在可见光区紫光范围有一个强的发光峰,而且随着Mg含量的增加,强度增加,吸收边和发光峰的蓝移也增加。蓝移说明了带隙的展宽,其禁带宽度大约从3.6 eV增至4.4 eV。较高的结晶质量和发光特性显示了它是一种制作短波光电器件和紫外探测器的理想材料。     

ITO玻璃衬底上生长的Zn0.9Mg0.1S多晶薄膜特性研究

以ZnS和Mg粉末为原料,采用真空蒸镀技术在ITO玻璃上成功地制备了宽禁带三元化合物Zn0.9Mg0.1S多晶薄膜.原子力显微镜和X射线衍射研究表明:薄膜生长形貌和结晶性能良好,为择优取向的立方闪锌矿结构,晶粒直径约20nm,薄膜的X射线衍射峰较之ZnS的衍射峰向大角度方向移动了0.46°;室温下的拉曼谱峰相对于ZnS的拉曼谱峰出现蓝移,且347.67cm-1谱峰比较强;光致发光谱显示,Zn0.9Mg0.1S薄膜在410nm处有一个较强的发光峰.良好的结晶质量和发光特性为开发多功能材料和器件提供了可能性.     

Mg掺杂浓度对MgxZn1-xO薄膜结构和光学性能的影响

通过超声喷雾热解工艺在P型<100>Si衬底上制备了不同Mg掺杂浓度的纳米MgxZN1-xO薄膜.通过扫描电镜(SEM)、X射线光电子能谱(XPS)、X射线衍射(XRD)和光致发光(PL)谱的测试对不同Mg掺杂浓度下薄膜的表面形貌、成分、品体结构和光学性能进行了研究.SEM测试结果表明,低Mg掺杂浓度时,MgxZn1-xO表面平整致密,但随Mg浓度的增加,薄膜表而平整度降低.XRD测试结果表明在低浓度下MgxZn1-xO薄膜足ZnO的纤锌矿结构,而没有出现MgO的分相,ZnO的衍射峰峰强随Mg浓度的增加逐渐减弱.不同Mg掺杂浓度下的光致发光谱图均出现了近带边紫外发射峰和可见光发射峰,其中近带边紫外发射峰随掺杂浓度的增大出现了明显的蓝移.     

CdS量子点敏化ZnO薄膜的制备及其性能研究

本文以Zn(CH3COO)2·2H2O、CdCl2和硫脲的水溶液分别为前驱体,采用超声喷雾热解法在ITO导电玻璃上成功的制备了CdS量子点敏化ZnO薄膜(ZnO∶ CdS).通过扫描电镜(SEM),X射线衍射(XRD),光致发光(PL)谱和吸收光谱对CdS量子点敏化ZnO薄膜形貌,结构和光学性能进行了研究.SEM图表明CdS量子点已成功沉积到ZnO薄膜上,量子点呈颗粒状,直径约71 nm.XRD结果显示,除观察到原有的ZnO特征峰外,在2θ=30.3°处有一明显的特征峰,对应着CdS的(111)晶面.PL谱图表明在325 nm的光激发下,CdS量子点敏化ZnO薄膜在400 nm处有一较强的紫外发射峰,在500～700 nm处有一个较宽的黄绿发射带.吸收光谱表明,CdS量子点敏化后ZnO薄膜在可见光区的吸收边为586 nm.     

溶胶-凝胶法合成Eu3+掺杂YBO3薄膜及其结构与光致发光性能的研究（英文）

以稀土硝酸盐和硼酸作为原料,采用溶胶-凝胶法在硅底片上通过浸涂合成了YBO3∶Eu3+薄膜。应用X-射线衍射(XRD)、能量色散X射线衍射(EDX)、原子力显微镜(AFM)和荧光分光光谱仪分别研究了其晶体结构、形貌、化学成份和光致发光(PL)性能。结果表明,成功合成了YBO3∶Eu3+薄膜,由平均粒径为100 nm、均方根(RMS)粗糙度为10 nm的YBO+3∶Eu3纳米晶组成,在PL光谱中于588 nm和616 nm处分别呈现出橙色发光峰和红色发光峰,归因于Eu3+掺杂的(5D0→7F1)和(5D0→7F2)能级跃迁。     

以乙醇为氧源生长ZnO薄膜中温度对光谱影响的研究

本文探索了以乙醇为氧源通过MOCVD方法生长ZnO薄膜的方法,着重研究了该实验中生长温度对薄膜发光光谱的影响.我们分别在350℃、370℃、380℃、400℃和420℃温度下生长了ZnO薄膜,并对其发光光谱进行了研究.结果表明适当地提高生长温度可以使近带边发光峰蓝移,但温度过高,使得峰位红移并展宽.在380℃的生长条件下得到了较好的光谱.370℃条件下还出现了474nm的发光峰,经退火后此峰消失.     

溶胶-凝胶法制备高Mg含量Zn1-x MgxO薄膜

采用溶胶-凝胶法在石英玻璃基板上制备了ZB1-xMgxO薄膜,研究退火温度对高Mg含量Zn0.5Mg0.5O薄膜的相组成、相偏析及紫外-可见透过光谱中吸收边移动的影响,当退火温度≤500℃时,Zn0.5Mg0.5O薄膜未发生相偏析现象,且400℃退火处理制备的Zn0.5Mg0.5O薄膜的紫外-可见透过光谱中吸收边蓝移最大.因此,对于高Mg含量Zn0.5Mg0.5O薄膜,退火温度是影响Mg2+在ZnO中固溶度的关键因素,且400℃是其理想的退火温度.在此条件下研究了不同Mg含量对Zn1-xMgO(x=0～0.8)薄膜带隙调节的影响,随着Mg含量的增加,其紫外-可见透过光谱中紫外光区吸收边呈现规律性蓝移,光学带隙值Eg从纯ZnO的3.3 eV调节至4.2 eV.     

Structural and optical properties of single-crystal ZnMgO thin films grown on sapphire and ZnO substrates by RF magnetron sputtering

High-quality ZnMgO films were grown by the radio frequency (RF) magnetron sputtering technique in pure oxygen ambient. Single-crystal films were obtained, when the Mg concentration was Zn_0.87Mg_0.13O or lower in the case of ZnMgO/Al₂O₃ and when it was Zn_0.65Mg_0.35O or lower in the case of ZnMgO/ZnO. Polycrystalline films were obtained when the growth temperature was lower than 500 °C, regardless of the Mg concentration. Position of the photoluminescence (PL) ultraviolet (UV) peak of the ZnMgO film shifted with the addition of Mg, from 3.33 eV (ZnO) to 3.51 eV (Zn_0.87Mg_0.13O) and 3.70 eV (Zn_0.65Mg_0.35O). It was also observed that growth of the ZnMgO films at higher temperature resulted in higher band-gap energy. It was proposed that this phenomenon is because concentration of the substitutional Mg atoms occupying Zn site is increased as the growth temperature increases.     

Photoluminescence characteristics of Mg- and Si-doped GaN thin films grown by MOCVD technique

We have studied the optical, structural and surface morphology of doped and undoped GaN thin films. The p- and n-type thin films have been successfully prepared by low-pressure MOCVD technique by doping with Mg and Si, respectively. The different carrier concentrations were obtained in the GaN thin films by varying dopant concentrations. Photoluminescence (PL) studies were carried to find the defect levels in the doped and undoped GaN thin films at low temperature. In the undoped GaN thin films, a low intensity and broad yellow band peak was observed. The donor–acceptor pair (DAP) emission and its phonon replicas were observed in both the Si or Mg lightly doped GaN thin films. The dominance of the blue and the yellow emissions increased in the PL spectra, as the carrier concentration was increased. The XRD and SEM analyses were employed to study the structural and surface morphology of the films, respectively. Both the doped and the undoped films exhibited hexagonal structure and polycrystalline nature. Mg-doped GaN thin films showed columnar structure whereas Si-doped films exhibited spherical shape grains.     

Structural and optical properties of Mg‐doped ZnO thin films prepared by a modified Pechini method

ZnO thin films with different Mg doping contents (0%, 3%, 5%, 8%, 10%, respectively) were prepared on quartz glass substrates by a modified Pechini method. XRD patterns reveal that all the thin films possess a polycrystalline hexagonal wurtzite structure. The peak position of (002) plane for Mg‐doped ZnO thin films shifts toward higher angle due to the Mg doping. The crystallite size calculated by Debey‐Scherrer formula is in the range of 32.95–48.92 nm. The SEM images show that Mg‐doped ZnO thin films are composed of dense nanoparticles, and the thickness of Mg‐doped ZnO thin films with Mg doped at 8% is around 140 nm. The transmittance spectra indicate that Mg doping can increase the optical bandgap of ZnO thin films. The band gap is tailored from 3.36 eV to 3.66 eV by changing Mg doping concentration between 3% and 10%. The photoluminescence spectra show that the ultraviolet emission peak of Mg‐doped ZnO thin films shifts toward lower wavelength as Mg doping content increases from 3% to 8%. The green emission peak of Mg‐doped ZnO thin films with Mg doping contents were 3%, 8%, and 10% is attributed to the oxygen vacancies or donor‐acceptor pair. These results prove that Mg‐doped ZnO thin films based on a modified Pechini method have the potential applications in the optoelectronic devices.     

反应磁控溅射制备AZO薄膜相结构的演化及机理研究

在室温下,利用直流反应磁控溅射技术在不同的氧气流量下沉积ZnO∶ Al (AZO)薄膜.采用XRD、SEM和TEM技术分析薄膜相成分、表面截面形貌及微观结构.结果表明:氧气流量为2.5 sccm时,沉积形成的薄膜为不透明具有金属导电性能的AZO/Zn( AZO)双层复合膜结构;氧气流量为3.5 sccm时,沉积形成了透明导电的AZO薄膜;氧气流量为5.0 sccm时,形成了透明不导电且含有纳米Al2O3颗粒的AZO薄膜;此外,AZO薄膜在400℃退火后,薄膜晶粒长大和(002)晶面方向择优生长更加明显以及高氧气流量沉积的AZO薄膜中的纳米Al2O3颗粒消失.     

氩气退火时间对Fe(Se,Te)薄膜的性能影响研究

作为一种铁基超导薄膜,Fe(Se,Te)薄膜具有晶体结构简单、所包含的元素较少、易于合成的特点,不仅有利于超导机理研究而且有着潜在的技术应用价值。本文通过磁控溅射在温度为320 ℃的CaF₂单晶衬底上制备了Fe(Se,Te)薄膜,并在氩气氛围下进行了退火处理。研究了退火时间对Fe(Se,Te)薄膜的晶体结构、微观形貌、成分组成以及电输运特性的影响。结果表明:Fe(Se,Te)薄膜的结晶性较好,退火有助于消除薄膜样品中的FeSe相,薄膜的晶格常数c对退火不敏感,退火后薄膜晶粒尺寸变大;Fe(Se,Te)薄膜成分与靶材的名义组分存在一定的偏差,退火时间越长,Fe(Se,Te)薄膜表面的颗粒越密集;Fe(Se,Te)薄膜的电阻随温度升高而减小,呈现出半导体特性,退火3 h后电阻明显增大。     

溅射制备不同厚度Pb(Zr0.52Ti0.48)O3薄膜结晶态的研究

研究了射频磁控溅射的Pb(Zr0.52Ti0.48)O3(PZT52/48)薄膜在退火晶化时,厚度对其结晶态及表面形貌的影响.首先利用Materials Studio软件对PZT分子进行了模拟,并模拟了X射线衍射(XRD)得到PZT的特征峰图;实验上,采用退火炉对不同厚度的PZT(52/48)薄膜进行了不同温度及时间的退火;接着采用XRD对各样片薄膜进行了结晶物相分析;采用FIB对部分样片薄膜表面形貌进行了观察.实验结果显示,薄膜的厚度及退火条件在一定程度上对其结晶态的影响是一致的;对于一定厚度的薄膜,合适且相同的退火(650 ℃)条件都可以使其形成单一的PZT(52/48)物相;二次退火对较厚薄膜结晶化有一定的作用,但随着溅射薄膜厚度的增加而累加了内应力,退火后形成有PZT(52/48)物相的较厚薄膜表面出现裂纹越明显.     

Dopant concentration dependence of structure,optical, and magnetic properties of ZnO:Fe thin films

The effects of Fe-dopant concentration on the structure, optical, and magnetic properties of ZnO thin films were investigated by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), optical transmittance, absorption, photoluminescence (PL), and magnetic measurements. XRD spectra indicated that the doping of Fe atoms could not only change the lattice constant of ZnO but also improve the crystalline quality of ZnO thin films. And the Zn (0 0 2) diffraction peak at round 36.34°(2θ) was detected with increasing Fe content for the substitution of the Zn in the ZnO film. The band gap edge shifted toward longer wavelength with increase in Fe doping. Moreover, near band edge emission gradually increased with increase in Fe content (up to about 0.82 wt%), and then abruptly decreased due to the concentration quenching effect. Magnetic measurements confirmed that the ferromagnetic behavior of Fe-doped ZnO was correlated with the dopant concentration.     

The effect of different oriented sapphire substrates on the growth of polar and non-polar ZnMgO by MOCVD

Polar and non-polar ZnMgO were synthesized on different crystallographic planes (C-, R- and M-planes) of sapphire (Al₂O₃) substrates by metal organic chemical vapor deposition, respectively. Under the same experimental condition, polar ZnMgO nanorods were obtained on C-Al₂O₃ substrate whereas non-polar ZnMgO thin films were obtained on R- and M-Al₂O₃ substrates. The surface morphology was significantly influenced by the competition of the preferable growth directions on different sapphire substrates. On C-Al₂O₃ substrate, ZnMgO nanorods were vertically well-aligned with typical lengths in the range 330–360 nm. On R- and M-Al₂O₃ substrates, however, ZnMgO thin films with flat surfaces were obtained, whose thickness were 150 and 20 nm, respectively. Under the same condition, the C-ZnMgO deposited on C-Al₂O₃ substrate has the maximum growth velocity (11 nm/nim), followed by A-ZnMgO deposited on R-Al₂O₃ substrate (5 nm/min), and the M-ZnMgO deposited on M-Al₂O₃ substrate has the minimum one (0.67 nm/min). The Near-Band-Edge (NBE) emission in Photoluminescence (PL) spectra shows a clear blueshift and a slight broadening compared with that of pure ZnO samples, which suggest that the Mg content has successfully incorporated into ZnO. The different energy blueshifts (67 meV and 98 meV) of the NBE emission demonstrate that A-ZnMgO deposited on R-Al₂O₃ substrate has higher Mg incorporation efficiency than C-ZnMgO on C-Al₂O₃ substrate.