P型掺杂金刚石厚膜的电火花加工

CVD金刚石具有和天然金刚石相近的一系列独特的力学、热学、声学、电学、光学和化学性能,在航空、航天、国防等高科技领域具有广阔的应用前景.但是,普通CVD金刚石膜是绝缘体,无法直接进行电加工.本文在分析了电火花加工半导体材料去除速率的基础上,通过掺硼对CVD金刚石厚膜进行半导体改性,继而实现了其电火花加工.通过研究,建立了掺硼金刚石厚膜电火花加工去除速率的经验公式.最后,通过Raman和SEM分析对CVD金刚石厚膜的电火花加工机理进行了初步探讨.     

CVD人造金刚石核辐射探测器研究进展

金刚石探测器具有体积小、抗辐照能力强、时间响应快等优点,在核辐射领域应用优势显著。早期金刚石核辐射探测器均采用天然金刚石材料,化学气相沉积(chemical vapor deposition, CVD)金刚石人工合成技术的进步,极大地促进了金刚石核辐射探测器的发展与应用。本文从CVD人造金刚石材料入手,分析了制约金刚石探测器性能的杂质与缺陷、CVD金刚石的合成工艺、探测器级金刚石中杂质与缺陷的表征方法,并基于载流子迁移率与寿命乘积、探测器的电荷收集效率等性能指标,总结了CVD金刚石中的杂质与缺陷对探测器性能的影响规律,介绍了国外金刚石核辐射探测器的应用现状并展望了国内金刚石核辐射探测器的发展前景。     

高质量CVD金刚石膜的氧化损伤

高质量CVD金刚石膜的高温损伤的研究是其高温应用的基础。抛光的金刚石膜经780℃保温3min后,红外透过和可见光的透过率开始下降;780℃保温15min后,其红外透过和可见光的透过率严重受损。扫描电镜、原子力学显微镜及台阶仪的结果表明：CVD金刚石膜氧化的开始阶段主要集中在晶界、表面孔洞等缺陷处,随后导致金刚石膜的晶面也开始刻蚀,表面粗糙度增大,最终使得金刚石膜丧失红外和可见光的透过。     

纳米金刚石膜——一种新的具有广阔应用前景的CVD金刚石

以氢气为主要反应气体生长的CVD金刚石膜的晶粒尺寸过大限制了它在某些领域的进一步应用.当晶粒组成降到纳米级时,金刚石膜会表现出许多优异的性能,具有广阔的应用前景.与通常的CVD法生长金刚石的工艺不同,氩气在纳米金刚石的生长过程中发挥着重要作用.纳米金刚石的鉴定和评价是纳米金刚石研究中的重要部分.     

MPCVD金刚石单晶的制备及其应用前景

金刚石具有优异的物理化学性能,在很多领域的应用前景十分诱人.用化学气相沉积(CVD)法实现高沉积速率、高质量、大面积金刚石单晶的制备成为了当今研究的一个热点.本文综述了影响微波等离子体化学气相沉积法制备单晶金刚石的工艺参数,并简单介绍了国内外在单晶金刚石制备上的进展,最后对CVD金刚石单晶的应用前景进行了展望.     

金刚石单晶的化学气相沉积制备及其在粒子探测器件中的应用

自2002年世界上第一颗采用化学气相沉积(CVD)方法制备的大尺寸金刚石单晶被报道之后,碳材料领域在世界范围内再一次掀起了CVD金刚石的研究热潮,单晶CVD金刚石也成为与石墨烯研究热度相当的又一种碳材料。几乎同时,将这种优异的材料在各个可能的相关领域进行应用的研究也随之被广泛地开展起来,这些研究工作逐渐表明:在新世纪单晶CVD金刚石将在能源、太空、信息等领域得到广泛的应用,其对社会生活、国家安全和科技进步将产生巨大的影响。本文在结合我们自己的工作基础上,综述了国内、外在单晶CVD金刚石制备领域的进展及其在粒子探测器件领域的应用。     

我国化学气相沉积(CVD)金刚石膜研究三十年

从1980年代化学气相沉积(CVD)金刚石膜问世,我国研究人员迅速跟进,在短时间内从国家层面进行布局,“863计划”从1987年启动到2016年落幕。在我国科学技术需要急起直追的年代,“863计划”的实施有力推动了我国CVD金刚石膜技术的进步,直至今天国家重点研发计划仍然在接力支持CVD金刚石在各个领域的应用研究。回顾CVD金刚石三十年的发展历程,对我国科技战略的设计、科技政策的制定、科研计划的落实、科技成果的实施等有重要的借鉴意义。     

基底温度控制方式对直流弧光放电PCVD金刚石膜的影响

如何精确、高效地实现对基底温度的测控,并获得优化的温度参数,对于CVD金刚石制备技术至关重要.本文采用自主研制的具有新型基底温度自动控制系统的直流弧光放电PCVD设备,分别进行了基底温度开环、闭环及开闭环复合控制下的金刚石薄膜制备研究,并采用SEM,激光Raman光谱仪对所制备薄膜的形貌品质进行了分析.研究结果表明:基底温控方式的不同会明显影响CVD金刚石膜的晶体、生长特征及品质,尤其造成了薄膜生长中二次形核密度以及非金刚石成分的显著变化;在保证系统稳定运行的前提下,当其它沉积参数恒定时,受控下的基底温度控制精度及控制品质的实时变化是影响CVD金刚石膜生长性能的主要因素,其中控制精度介于±5℃～±15℃间变化,而控制品质受控制方式的影响较大;相对于控制精度而言,控制品质的变化对常规金刚石薄膜生长性能的影响更为明显.对于此系统,只有采用开-闭环复合控制,且开环流量维持在其单独工作流量的20;时,才能保证基底温度控制精度、控制品质及所制备的CVD金刚石薄膜的质量最佳.     

硬质合金表面去钴和脱碳对金刚石薄膜粘结性能的影响

金刚石涂层的粘结性能是影响CVD金刚石薄膜涂层刀具使用寿命的关键因素.本文分别对硬质合金(YG6)表面进行酸蚀去钴和原位脱碳两种不同的预处理后,在热丝CVD系统中沉积金刚石薄膜,运用压痕试验评价金刚石薄膜与硬质合金基体的粘结性能.结果表明,经过原位脱碳预处理的硬质合金表面上金刚石涂层的粘结性能比酸蚀去钴法提高了近一倍;同时分析了硬质合金表面酸蚀去钴对金刚石薄膜粘结性能的影响及其剥离机制,并讨论了硬质合金表面原位脱碳的化学机制.     

计算机控制CVD金刚石生长系统的研究

在CVD金刚石生长系统的基础上设计开发了计算机控制系统,对金刚石生长过程中各物理信号进行监测与控制,实现了无人值守下金刚石的生长.详细介绍了计算机控制的结构和软件实现方法.最后介绍了在计算机控制之下金刚石厚膜,纳米金刚石薄膜以及复合膜的生长.结果表明该系统运行稳定、可靠,控制效果明显优于人工控制,具有非常广泛的应用价值.     

Synthetic Diamond — Basic Research and Applications

Non-equilibrium growth of synthetic diamond layers by chemical vapour deposition (CVD) techniques on heterosubstrates has largely been improved over the past decade. On silicon substrates highly textured and oriented diamond films can be grown with optical transparencies and thermal conductivities suitable for broad-band optical windows and heat spreaders. Boron pulse-doping of homoepitaxial diamond layers leads to high p-conductivity at room temperature allowing the fabrication of Schottky diodes and field effect transistors operating at temperatures up to 1000 K. Other devices such as sensors and detectors are being successfully fabricated. At the same time many basic questions remain to be solved including efficient n-type doping.     

Characterization of homoepitaxial diamond for ionizing radiation detectors

Synthetic diamond has been proven as an important material for advanced electronic applications, such as those encountered in high energy physics and astrophysics. In fact, diamond transparency to visible light, its high carrier mobility, high breakdown field and strong resistance to chemical attack and radiation damage have suggested the potential application of this material for ‘solar-blind’ UV detectors which have to operate in extreme environments. To avoid the possible problems connected with the presence of grain boundaries in polycrystalline diamond films, a great effort has been devoted to the optimization of the growth process leading to high-quality single-crystal diamond on diamond substrates (homoepitaxy). In this view, characterization studies play a crucial role, because they provide the feedback for the optimization of the deposition process, in order to obtain the best quality material. In this work, a characterization study of homoepitaxial diamond grown by chemical vapor deposition (CVD) on synthetic diamond substrates is presented. The samples have been deposited in a CVD tubular reactor using a CH₄–H₂ gas mixture (1–7%) at approximately 560 °C substrate temperature. The growth rate ranged between 0.9 μm/h and 2.2 μm/h, microwave powers between 520 W and 720 W. The crystalline quality of the diamond layer has been studied by means of Raman spectroscopy. Photoluminescence has been used to study the nature and the distribution of impurities, having energy levels in the diamond band gap, which influence negatively the electronic quality of the material. The results have been compared with electro-optical characterization of UV detectors for astrophysics based on the analyzed diamond samples. The growth parameters which guarantees both high material quality and optimal device response have been determined.     

热丝化学气相法生长单晶金刚石颗粒的衬底温度场仿真及实验研究

本文使用金刚石磨料作为晶种颗粒,通过热丝化学气相法生长出单晶金刚石颗粒,并且建立三维的有限元模型,利用有限元仿真分析了生长过程中影响金刚石磨料生长速率以及沉积质量的各种因素,如热丝的排列方式,衬底的温度场,以及晶种的分布方式.通过固定在热丝CVD反应腔里的热电偶测量了实际的衬底温度分布,从而验证了仿真结果的正确性.另外,通过改变仿真模型优化了沉积单晶金刚石颗粒的工艺参数,获得适应于合成单晶金刚石颗粒的新技术,为化学气相沉积合成单晶金刚石颗粒奠定了基础,也为高温高压金刚石磨料品级的改进与提高提供了新途径.     

Analysis of synthetic diamond single crystals by X-ray topography and double-crystal diffractometry

Structural features of diamond single crystals synthesized under high pressure and homoepitaxial films grown by chemical vapor deposition (CVD) have been analyzed by double-crystal X-ray diffractometry and topography. The conditions of a diffraction analysis of diamond crystals using Ge monochromators have been optimized. The main structural defects (dislocations, stacking faults, growth striations, second-phase inclusions, etc.) formed during crystal growth have been revealed. The nitrogen concentration in high-pressure/high-temperature (HPHT) diamond substrates is estimated based on X-ray diffraction data. The formation of dislocation bundles at the film-substrate interface in the epitaxial structures has been revealed by plane-wave topography; these dislocations are likely due to the relaxation of elastic macroscopic stresses caused by the lattice mismatch between the substrate and film. The critical thicknesses of plastic relaxation onset in CVD diamond films are calculated. The experimental techniques for studying the real diamond structure in optimizing crystal-growth technology are proven to be highly efficient.     

金刚石辐射伏特效应同位素电池器件研究进展

微机电系统、深空、深海探测任务等对于长效、便携电源提出了更高的要求。同位素电池由于其能量密度高、功率输出稳定,可以在高低温、无太阳光照等极端环境下持续不断地为月球车、海底探测器等提供能量。作为同位素电池中的主要类型,辐射伏特效应同位素电池由于其理论能量转换效率高、易于微型化被广泛研究,并已经成功应用于心脏起搏器。宽禁带的半导体换能结器件制作的同位素电池能够获得更高的能量转换效率。宽禁带半导体中的代表金刚石具有5.5 eV的禁带宽度与耐辐射的特性,使其成为制作辐射伏特效应同位素电池换能结器件的最佳选择。随着化学气相沉积技术的发展,金刚石晶体的外延技术突飞猛进,为金刚石半导体器件的发展打下了材料基础。本文对比了常见的同位素电池换能结用半导体材料和辐射源材料的特性,介绍了辐射伏特效应的基本原理,接着对辐射伏特效应同位素电池的关键参数进行了分析,并汇总了有关金刚石辐射伏特效应同位素电池研究的文献,通过各个参数,如开路电压、转换效率等的对比,指出了目前金刚石同位素电池发展的状态与存在的问题。通过分析金刚石与其他n型半导体材料组成的异质pn结目前的性能与应用情况,给出了基于金刚石异质pn结的高性能同位素电池的结构设计,并进行了总结与展望。     

Diamond epitaxy: Basics and applications

Diamond has been used as cutting tools, and also has recently attracted extensive attention as a semiconductor. In the review, its properties and prospects of its electronic devices are shown. Then, principles of crystal growth methods, such as high-pressure, high-temperature (HPHT) and chemical vapor deposition (CVD) methods, are described. Next, current understanding of defects such as dislocations and stacking faults is described. Further, for the future electronic applications, the present status of wafer technology and impurity doping are described. Finally, the electronic devices made of diamond semiconductors are shown.     

CVD法制备高质量金刚石单晶研究进展

本文介绍了制备单晶金刚石的主要方法并对其进行了对比,从籽晶选择、预处理和生长工艺几个方面综述了微波等离子体化学气相沉积法制备金刚石单晶的研究进展,并简单介绍了目前国内外在单晶金刚石制备上的进展,最后对CVD金刚石单晶在电子领域的应用进行了展望.