共查询到19条相似文献,搜索用时 281 毫秒
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在CO2激光功率为50—300W、扫描速度为20mm/s、激光散光斑为20mm照射条件下 ,诱导非 晶Fe735Cu1Nb3Si135B9带中发生结构重组,产生定量纳米α-F e(Si)晶相形成双相组织结构材料. 利用穆斯堡尔谱研究了非晶Fe735C u1Nb3Si135B9合金激光纳米化的 超精细结构. 实验结果表明,激光诱导非晶 Fe735Cu1Nb3Si135B 9纳米化后,其超精细磁场的分布随 着激光功率变 化由单峰向双峰变化,在高功率辐照时, 出现了双峰分布,并且峰位向高场移动. 高激光 功率辐照非晶Fe735Cu1Nb3Si135 sub>B9合金纳米晶化相有四种超精细结 构,即2个超精细磁场较小的初晶相和2个超精细磁场较大的纳米晶化相. 其中超精细磁场较 大(17—25MA/m)的α-Fe(Si)相为DO3结构.
关键词:
激光
纳米晶α-Fe(Si)
735Cu1Nb< sub>3Si135B9')" href="#">非晶Fe735Cu1Nb< sub>3Si135B9
超精细结构
超精细磁场 相似文献
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本工作用X射线散射技术研究了金属一类金属玻璃合金Pd77Si16.5Ag6.59,Co42.9Ni27.3Fe7.8Si8B14和Co50.7Ni19.5Fe7.8Si6B16的结构。求出了它们的干涉函数I(s)和原子径向分布函数RDF(r),并由此获得了有关结构信息的原子平均距离、最近邻配位数和短程有序畴半径。此外,对这些合金的RDF(r)第一峰作了高斯分布拟合,求得了比较好的拟合方程,并用近似方法估算了其中金属-金属原子间的配位数。
关键词: 相似文献
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G. Schumacher S. Klaumünzer S. Rentzsch G. Vogl 《Zeitschrift für Physik B Condensed Matter》1980,40(1-2):19-21
Irradiation of the metallic glass Pd80Si20 with high energy Ar-ions at low temperatures resulted in electrical resistance increases of about 5% at a measuring temperature of 10 K after fluences of 3·1015 Ar/cm2 indicating that defects were created by radiation damage. Annealing experiments were performed up to 150°C showing a smooth recovery throughout the whole temperature range. 相似文献
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In search for structural contributions to the low temperature anomaly we report high resolution resistance and magnetoresistance measurements () of amorphous splats of Gd67Co33 and Pd80Si20. For both alloys, the resistivity ?(H = 0, T) has a minimum at T ~ 10 K and increases with decreasing T. The ferromagnetic Gd67Co33 shows a strong negative field dependence of , saturating at H ~ 2T for T = 4.2 K but no measurable change in below 10 K is observed.The diamagnetic Pd80Si20 exhibits a positive field dependent magnetoresistance at low temperatures. Additionally, a field dependent part in is found which is probably due to paramagnetic impurities (~ 1 ppm Fe). However, there is also a field independent contribution in the amorphous state of Pd80Si20, which vanishes after crystallization. We attribute this to non-magnetic scattering induced by the disordered structure. 相似文献
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In this work we analyzed the mechanical damping behavior of amorphous Pd77.5Cu6.0Si16.5 below the glass transition temperature (T
g) with creep/recovery measurements. Here a correlation between temperature stimulation and external stress is found in an
exponential, multiplicative way. This demonstrates that not only is the yield stress of the material influenced by temperature
variation (mechanical melting) but also the secondary relaxation is modified under stress and temperature. 相似文献
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J. Bieger H. Adrian P. Müller G. Saemann-Ischenko E.L. Haase 《Solid State Communications》1980,36(11):979-982
Low temperature irradiation of thin films of Nb75Ge25 (Tc = 3.2 K) and Nb80Si20 (Tc = 4.7 K) with 20 MeV sulfur ions leads to an increase of Tc of about 0.5 K and a decrease of ? of about 1.5 to 3.5%. Annealing up to room temperature partly restores the initial values. Qualitatively the results can be explained by irradiation induced smearing of the structure factor, which is partially recovered by annealing. 相似文献
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B.M. Geerken I.A.M. Corbière R. Griessen 《Journal of Physics and Chemistry of Solids》1983,44(8):793-799
By simultaneously measuring the length change of a palladium electrode and the current through the electrolytical cell when a triangular voltage is applied across the cell, it is possible to distinguish between surface and bulk processes during hydrogen uptake in Pd. From a comparison of corresponding dilatograms and voltammograms of polycrystalline Pd with those of crystalline Pd and amorphous Pd80Si20, one concludes that the diffusion of hydrogen into the bulk of the samples takes place to a large extent along dislocation lines. Dilatometric and voltammetric measurements in magnetic fields up to 10T show that the absorption of well annealed Pd electrodes is increasing up to 1T and saturates at higher fields. 相似文献
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Measurements of electrical resistivity after low temperature fast neutron irradiation are made for amorphous Pd80Si20 and Pd80Ni2Sl18 and then Pd80Si20 annealed at 230°C and 360°C, and the isochronal annealing curves are obtained. The resistivity increase of Pd80Si20 annealed at 360°C is about 10 times larger than that of amorphous alloys and no defined annealing stage is observed in amorphous alloys and Pd80Si20 annealed at 360°C. For amorphous Pd80Si20, about 60% of the resistivity increase by irradiation remains after annealing up to room temperature and these are discussed by the structural relaxation. 相似文献
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F.G. Aliev N.B. Brandt V.V. Moshchalkov S.M. Chudinov 《Solid State Communications》1983,45(3):215-218
Resistivity measurements of CeCu2Si2 are carried out under pressures p up to 12 kbars. Unlike polycrystalline samples, no traces of superconductivity have been observed in CeCu2Si2 at ambient pressure. When pressure is applied, CeCu2Si2 monocrystals become superconducting with anomalously large ratio Hc2(0)/Tc (0) = 34 K0e/K and with the derivative dHc2/dT(T=Tc) = 140 K0e/K 相似文献
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The crystal structure of HoPt2Si2 was determined using powder neutron diffraction data. It is tetragonal, CaBe2Ge2 type (space group P4/n mm). Neutron diffraction and magnetometric measurements indicate that HoPt2Si2 remains paramagnetic at the temperature of 2.0 K. 相似文献