Resistive switching behaviors of Cu/TaOx/TiN device with combined oxygen vacancy/copper conductive filaments

Forming-free and self-compliant bipolar resistive switching is observed in Cu/TaO_x/TiN conductive bridge random access memory. Generally, Pt has been investigated as an inert electrode. However, Pt is not desirable material in current semiconductor industry for mass production. In this study, all electrodes are adapted to complementary metal-oxide-semiconductor compatible materials. The self-compliant resistive switching is achieved via usage of TiN bottom electrode. Also, dissolved Cu ions in TaO_x lead to forming-free resistive switching behavior. The resistive switching mechanism is formation and rupture of combined oxygen vacancy/metallic copper conductive filament. We propose that Cu/TaO_x/TiN is a promising candidate for a conductive bridge random access memory structure.     

Composition dependence of unipolar resistance switching in TaOx thin films

Amorphous TaO_x thin films were deposited at different temperatures, and the resistance switching properties of the Pt/TaO_x/Pt structure were investigated. X‐ray photoelectron spectroscopy showed that the amount of Ta₂O₅ in the film decreased and the content of Ta suboxides increased substantially when the growth temperature was increased. Unipolar resistance switching near the anode was stable only for TaO_x film grown at room temperature. The experimental results revealed the critical effect of the film composition on the resistance switching behavior of TaO_x films. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Improvement of high-frequency characteristics of FeCoHfO/AlOx multilayered films

High-permeability magnetic films can enhance the inductance of thin-film inductors in dc-dc converters. The FeCoHfO/AlO_x multilayered films were fabricated by dc reactive magnetron co-sputtering. Inserting the AlO_x layers can decrease the anisotropic field of the FeCoHfO magnetic films, which was beneficial to raise the permeability of the FeCoHfO/AlO_x multilayered films. With this optimum configuration of a nine-layer structure [FeCoHfO (133 nm)/AlO_x (10 nm)]₉, low anisotropic field (H_K = 65 Oe) and high permeability (permeability over 170 at 30-50 MHz) were obtained. The permeability increased nearly six times from 30 (M1) to 175 (M9). The permeability was evidently improved by the employment multilayered coating.     

Solution-processed high-k thin films as a resistive switching for ReRAM applications

Resistive switching characteristics of solution-processed high-k thin films (HfO_x and TaO_x) were investigated for ReRAM applications. The thickness of solution-processed high-k thin films can be easily controlled by simple spin coating. We optimized the critical thickness of solution-processed HfO_x and TaO_x thin films, for reliable ReRAM operations. A similar bipolar resistive switching behavior was observed from both solution-processed and sputter-processed HfO_x films. Furthermore, it was found that the solution-processed HfO_x and TaO_x films have a uniform resistive switching characteristic. The dominant conduction of these solution-processed films is described by Ohmic conduction in the low-resistance state. On the other hand, Ohmic conduction at low voltage and Poole–Frenkel emission at high voltage dominate in the high-resistance state. It was verified that the solution-processed HfO_x and TaO_x films have superior endurance and retention characteristics. Therefore, ReRAM devices based on solution-processed high-k materials are expected to be a promising candidate, for usage of resistive memory in glass substrate or flexible substrate based electronic devices.     

Magnetoresistance in Co/AlOx/Co tunnel junction arrays

Lateral arrays of Co/AlO_x/Co junctions with dimensions down to 60 nm and inter-junction separations ∼60–100 nm have been fabricated and analyzed for possible coherent tunneling effects. Extra attention is paid to avoid uncertainties due to inconsistencies in switching and/or resistance of successive barriers. We observe ∼10% magnetoresistance enhancement at moderate bias in double junctions that cannot be accounted for by a simple model of two resistsors in series.     

约瑟夫森结AlOx-Al隧道势垒的实验研究

通过Ｘ光电子能谱（ＸＰＳ）、阳极氧化电压谱（ＡＶＳ）和Ｆｉｓｋｅ台阶电压的测量，研究了约瑟夫森结中ＡｌＯ_x-Ａｌ隧道势垒．发现结的隧道势垒最佳沉积Ａｌ层厚度为７ｎｍ，Ａｌ上形成ＡｌＯ_x厚度只取决于氧化条件，与沉积Ａｌ厚无关，势垒Ａｌ氧化物可能含有一个像ＡｌＯＯＨ态的ＯＨ基团．同时，估算了剩余Ａｌ厚度，证实了结中Ａｌ／Ｎｂ间在４.２Ｋ时，由常态Ａｌ而产生临近效应的存在 关键词：     

Properties of superconducting Nb/Al/Nb/Al?AlOx?Al?AlOx?Al/Nb/Al/Nb tunnel junctions

Modified geometry (MG) devices, Nb/Al/Nb/Al−AlO_x−Al−AlO_x−Al/Nb/Al/Nb, have been fabricated and investigated in comparison with the basic geometry (BG) double-barrier Nb/Al−AlO_x−Al−AlO_x−Al/Nb devices. The enhancement of the critical temperature in the Al film is found to be weaker for the MG devices as compared with the BG devices at temperatures nearT=4.2 K but stronger at lowT. Indication of an enhancement of dc Josephson critical current density,j _c , at bias voltageV≠0 as compared withj _c (V=0) has been observed in the MG devices for the first time.     

Contact passivation in silicon solar cells using atomic‐layer‐deposited aluminum oxide layers

Atomic‐layer‐deposited aluminum oxide (AlO_x) layers are implemented between the phosphorous‐diffused n⁺‐emitter and the Al contact of passivated emitter and rear silicon solar cells. The increase in open‐circuit voltage V_oc of 12 mV for solar cells with the Al/AlO_x/n⁺‐Si tunnel contact compared to contacts without AlO_x layer indicates contact passivation by the implemented AlO_x. For the optimal AlO_x layer thickness of 0.24 nm we achieve an independently confirmed energy conversion efficiency of 21.7% and a V_oc of 673 mV. For AlO_x thicknesses larger than 0.24 nm the tunnel probability decreases, resulting in a larger series resistance. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Resistive switching behaviour of a tantalum oxide nanolayer fabricated by plasma oxidation

We investigate the resistive switching behaviour of a tantalum oxide nanolayer‐based nonvolatile memory with Pt/TaO_5–x/TaN structure, which was prepared at room temperature through a processing compatible with CMOS technology. The tantalum oxide nanolayer with thickness of about 5 nm was fabricated by plasma oxidation of TaN films. The switching mechanism can be explained by the modulation of the local oxygen‐deficient conduction channel resulting from oxygen ions drift. This Letter represents a cost‐efficient method for developing nanoscale restive switching nonvolatile memories. (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Structural analysis and crystal-field calculations of Nd^3＋ in Gdx Lu1-x TaO4（x = 0.85） polycrytalline

The crystal structural parameters of Nd 3+-doped rare earth orthotantalate Gd x Lu 1 x TaO 4(x = 0.85) are determined by applying the Rietveld refinement to its X-ray diffraction,and its emission and excitation spectra at 77 K are analysed.The relativistic model of ab initio self-consistent DV-Xα method,which is applied to the cluster NdO 8 in Gd x Lu 1 x TaO 4,and the effective Hamiltonian model are used to investigate its spin-orbit and crystal-field parameters.The free-ions and crystal-field parameters are fitted to the experimental energy levels at 77 K with a root-mean-square deviation of 14.92 cm 1.According to the crystal-field calculations,96 levels of Nd 3+ are assigned.Finally,the fitting results of free-ions and crystal-field parameters are compared with those already reported for Nd 3+:YAlO 3.The results indicate that the free-ion parameters are similar to those of the Nd3+ in Gdx Lu1-x TaO4 and YAlO 3 hosts,and the crystal-field interaction of Nd3+ in Gdx Lu1-x TaO4 is stronger than that in YAlO 3.     

Fully room‐temperature‐fabricated TiN/TaOx/Pt nonvolatile memory devices

The reliable resistive switching properties of TiN/TaO_x/Pt structures fabricated with a fully room‐temperature process are demonstrated in this letter. The devices exhibited a low operation voltage of 0.6 V as well as good endurance up to 10⁵ cycles. No data loss was reported upon continuous readout for more than 10⁴ s at 125 °C. Multilevel storage is feasible due to the dependence of the low resistance state (LRS) on the initial “SET” (switch from high to low RS) compliance current. The values of LRS showed no dependence on the size of the device, which correlated with the localized conductive filament mechanism. This nonvolatile multilevel memory effect and the fully room‐temperature fabrication process make the TiN/TaO_x/Pt memory devices promising for future nonvolatile memory application. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Luminescent properties of Tb activated GdTaO4 with M and M′ type structure under UV-VUV excitation

The photoluminescence of Tb³⁺ doped M and M′ type gadolinium orthotantalate Gd_1−xTb_xTaO₄ (0.01≤x≤0.20) was investigated under ultraviolet and vacuum ultraviolet excitation. For the samples of Gd_1−xTb_xTaO₄ with different crystallographic structures, emission spectra were the same in addition to intensity; the optimal concentration for Tb³⁺ was about 10 mol % in M type Gd_1−xTb_xTaO₄ but 5 mol % in M′ type Gd_1−xTb_xTaO₄. These differences could be corresponding with the difference in structures. In addition, compared to commercial Zn₂SiO₄: Mn²⁺, the integrated intensity of M and M′ type GdTaO₄: Tb³⁺ could reach 67% and 85%, respectively, of that at 147 nm excitation, which indicates that GdTaO₄: Tb³⁺ would be a promising vacuum ultraviolet phosphor for application in PDP and Hg-free lamp.     

Ultraviolet light emissions from N2 microplasma electrically induced by metal-insulator-semiconductor devices

Various metal-insulator-semiconductor (MIS) devices in the form of Au/SiO_x(x<2)/Si, Au/AlO_y(y<1.5)/Si, Au/SiO_x/ZnO and Au/AlO_y/ZnO have been fabricated. For each device, once a sufficiently high positive voltage is applied on the Au electrode, the same ultraviolet (UV) emission with a spectrum featuring several specific peaks is detected. Interestingly, such UV emissions related to the MIS devices originate from the external N₂ microplasma. It is believed that at the high enough positive voltages the highly energetic electrons emitted out of the Au electrode activate the air to generate the N₂ microplasma.     

Molecular electronics and spintronics devices produced by the plasma oxidation of photolithographically defined metal electrode

Tunnel junction based molecular devices, which utilize the two metal electrodes of a metal–insulator–metal tunnel junction as the two electrical leads to connect with molecular channels, can overcome the long standing fabrication challenges for developing futuristic molecular devices. However, producing an ultrathin insulator is the most challenging step in this tunnel junction based molecular device fabrication. A simplified molecular device approach was developed by avoiding the need of depositing a new material on the bottom electrode for growing ultrathin insulator. This paper discusses the new approach for insulator growth by one-step oxidation of a tantalum (Ta) bottom electrode, in the pholithographically defined region, i.e., ultrathin tantalum oxide (TaO _x ) insulator was grown by oxidizing bottom Ta metal electrode itself. Organometallic molecular clusters (OMCs) were bridged across 1–3 nm TaO _x along the perimeter of a tunnel junction to establish the highly efficient molecular conduction channels. OMC transformed the asymmetric transport profile of TaO _x based tunnel junction into symmetric one. A TaO _x based tunnel junction with the top ferromagnetic (NiFe) electrode exhibited the transient current suppression by several orders. Further studies by independent research groups will be needed to strengthen the current suppression phenomenon, and to realize the full potential of TaO _x based molecular devices.     

Physical and chemical properties of nanostructured CoO-AlOx granular films

A series of nano CoO-AlO_x granular films were prepared by Ar-O₂ reactive rf sputtering and their resistive and magnetoresistive properties were measured for studying the spin-dependent properties. Transmission electron microscopy and X-ray photoelectron spectroscopy are also utilized to investigate the structures and chemical states of these samples. Based on our results, the particles of CoO with radius around 2 nm could be magnetic at room temperature and provide a large tunneling magnetoreststance of −6% through the AlO_x barrier.     

Luminescent properties of Sr2.5−3x/2Ba0.5SmxAlO4F oxyfluorides

Effective orange Sm³⁺-doped Sr_2.5Ba_0.5AlO₄F phosphors excited at 254 and 408 nm excitation were prepared by the solid-state method. The excitation and emission spectra of Sr_2.5?3x/2Ba_0.5Sm_xAlO₄F and Sr_2.5?3x/2Ba_0.5Sm_xAlO_4?αF_1?δ (x=0.001～0.1) based on photoluminescence spectroscopy are investigated. The defects in anion-deficient Sr_2.5?3x/2Ba_0.5Sm_xAlO_4?αF_1?δ (x=0.001, 0.01) are monitored by broad-band photoluminescence emission centered near 480 nm along with the orange emission transitions of Sm³⁺. CIE values and relative luminescent intensities of Sr_2.5?3x/2Ba_0.5Sm_xAlO₄F and Sr_2.5?3x/2Ba_0.5Sm_xAlO_4?αF_1?δ by changing the Sm³⁺ content (x=0.001～0.1) are discussed.     

Preparation of the subnanometer thick epitaxial Al2O3(0001) layers on Fe(110) for magnetic tunnel junctions

Growth as well as crystallographic and electronic properties of thin AlO_x layers on Fe(110) were studied by means of low-energy electron diffraction and Auger-electron spectroscopy. Al layers of different thickness were deposited on Fe(110) and successfully oxidized to AlO_x. The step-by-step oxidation of thin Al layers at room temperature leads to the formation of amorphous AlO_x on top of the Fe(110) surface. A subsequent annealing at 250 °C of the oxidized 7-Å thick Al layer results in the formation of a well-ordered Al₂O₃(0001) layer on the Fe(110) surface.     

STUDIES ON THE DYNAMICS OF OPTICAL BISTABILITY SWITCHING IN THE INTERNAL FABRY-PEROT CAVITY WITH A CdSxSe1-x-DOPED GLASS CHANNEL WAVEGUIDE

We report the optical bistability in CdS_xSe_1-x-doped glass channel waveguide with rise and fall times of about 24 and 30ps, respectively, in bistable switching by means of fiber coupling input with a power of about 3mW. The third-order nonlinear susceptibility (x⁽³⁾) of CdS_xSe_1-x-doped glass is estimated experimentally to be 1.8×10^-9 esu. The high speed switching and the value of x⁽¹⁾ show that the optical bistability is caused by an optical nonlinearity which can be attributed to the band-filling effect.     

Thermal stability and chemical bonding states of AlOxNy/Si gate stacks revealed by synchrotron radiation photoemission spectroscopy

Annealing-temperature dependence of the thermal stability and chemical bonding states of AlO_xN_y/SiO₂/Si gate stacks grown by metalorganic chemical vapor deposition (MOCVD) using new chemistry was investigated by synchrotron radiation photoemission spectroscopy (SRPES). Results have confirmed the formation of the AlN and AlNO compounds in the as-deposited samples. Annealing the AlO_xN_y samples in N₂ ambient in 600-800 °C promotes the formation of SiO₂ component. Meanwhile, there is no formation of Al-O-Si and Al-Si binding states, suggesting no interdiffusion of Al with the Si substrate. A thermally induced reaction between Si and AlO_xN_y to form volatile SiO and Al₂O is suggested to be responsible for the full disappearance of the Al component that accompanies annealing at annealing temperature of 1000 °C. The released N due to the breakage of the Al-N bonding will react with the SiO₂ interfacial layer and lead to the formation of the Si₃-N-O/Si₂-N-O components at the top of Si substrate. These results indicate high temperature processing induced evolution of the interfacial chemistry and application range of AlO_xN_y/Si gate stacks in future CMOS devices.     

Characteristics of CeCoIn5/Al/AlOx/Nb and CeCoIn5/Al/AlOx/Al tunnel junctions

We report characteristics of CeCoIn₅/Al/AlO_x/Nb and CeCoIn₅/Al/AlO_x/Al tunnel junctions fabricated on the (0 0 1) surface of CeCoIn₅ crystal platelets. The main result of this work is the observation of a low Josephson current (as compared with that expected from the Ambegaokar–Baratoff formula), which is consistent with idea that the order parameter in the heavy-fermion superconductor CeCoIn₅ has unconventional pairing symmetry.