掺杂GaN/AlN超晶格第一性原理计算研究

第一性原理计算方法在解释实验现象和预测新材料结构及其性质上有着重要作用. 因此, 通过基于密度泛函理论的第一性原理的方法, 本文系统地研究了Mg和Si掺杂闪锌矿和纤锌矿两种晶体结构的GaN/AlN超晶格体系中的能量稳定性以及电学性质. 结果表明: 在势阱层(GaN 层)中, 掺杂原子在体系中的掺杂形成能不随掺杂位置的变化而发生变化, 在势垒层(AlN层)中也是类似的情况, 这表明对于掺杂原子来说, 替代势垒层(或势阱层)中的任意阳离子都是等同的; 然而, 相比势阱层和势垒层的掺杂形成能却有很大的不同, 并且势阱层的掺杂形成能远低于势垒层的掺杂形成能, 即掺杂元素(Mg_Ga, Mg_Al, Si_Ga和Si_Al)在势阱区域的形成能更低, 这表明杂质原子更易掺杂于结构的势阱层中. 此外, 闪锌矿更低的形成能表明: 闪锌矿结构的超晶格体系比纤锌矿结构的超晶格体系更易于实现掺杂; 其中, 闪锌矿结构中, 负的形成能表明: 当Mg原子掺入闪锌矿结构的势阱层中会自发引起缺陷. 由此, 制备以闪锌矿结构超晶格体系为基底的p型半导体超晶格比制备n型半导体超晶格需要的能量更低并且更为容易制备. 对于纤锌矿体系来说, 制备p型和n型半导体的难易程度基本相同. 电子态密度对掺杂体系的稳定性和电学性质进一步分析发现, 掺杂均使得体系的带隙减小, 掺杂前后仍然为第一类半导体. 综上所述, 本文内容为当前实验中关于纤锌矿结构难以实现p型掺杂问题提供了一种新的技术思路, 即可通过调控相结构实现其p型掺杂.     

B、N单掺杂3C-SiC电子结构和光学性质的第一性原理研究

采用第一性原理的密度泛函理论赝势平面波方法,计算了未掺杂与B、N单掺杂3C-SiC的电子结构和光学性质.结果表明:掺杂改变了3C-SiC费米面附近的电子结构;B掺杂使得禁带宽度减小,价带顶上移,费米能级进入价带,形成p型半导体;N掺杂使得禁带宽度减小,导带底下移,费米能级进入导带,形成n型半导体.B、N掺杂均提高了3C-SiC在低能区的折射率、消光系数和吸收系数,增强了对红外光谱的吸收.     

外来原子替代碳的氟化石墨烯的磁性和电子性质

采用基于自旋极化密度泛函理论的第一性原理计算,研究了在氟化石墨烯中少量C原子被M原子(M=B,N,Si,P)替代后原子片的磁性和电子性质.结果表明:不同原子掺杂后的氟化石墨烯的电子结构会发生很大的变化,并有很大的不同.掺杂B和P原子后,纳米原子片由半导体转变为金属,并且由非磁性转变为磁性;掺杂N原子后,材料则仍为半导体,但具有磁性;进一步讨论了掺杂原子浓度与磁性的关系.对于Si原子掺杂的氟化石墨烯原子片,其半导体性质不变,但禁带宽度也会发生改变.     

第一性原理研究B掺杂Mn_4Si_7的电子结构和光学性质

采用基于密度泛函理论的第一性原理计算方法,对未掺杂及B掺杂Mn_4Si_7的电子结构和光学性质进行理论计算.研究结果表明,未掺杂Mn_4Si_7是间接带隙半导体,其禁带宽度为0.786 eV,B掺杂后其禁带宽度下降为0.723 eV. B掺杂Mn_4Si_7是p型半导体材料.未掺杂Mn_4Si_7在近红外区的吸收系数达到10~5 cm~(-1),B掺杂引起Mn_4Si_7的折射率、吸收系数、反射系数及光电导率增加.     

Limits on passivating defects in semiconductors: the case of Si edge dislocations

By minimizing the free energy while constraining dopant density, we derive a universal curve that relates the formation energy (E(form)) of doping and the efficiency of defect passivation in terms of segregation of dopants at defect sites. The universal curve takes the simple form of a Fermi-Dirac distribution. Our imposed constraint defines a chemical potential that assumes the role of "Fermi energy," which sets the thermodynamic limit on the E(form) required to overcome the effect of entropy such that dopant segregation at defects in semiconductors can occur. Using Si edge dislocation as an example, we show by first-principles calculations how to map the experimentally measurable passivation efficiency to our calculated E(form) by using the universal curve for typical n- and p-type substitutional dopants. We show that n-type dopants are ineffective. Among p-type dopants, B can satisfy the thermodynamic limit while improving electronic properties.     

Effect of excess hydrogen on the electronic properties of passivated diamond

Recently, Yan et al. reported a theoretical approach to overcome the n-type doping problem of diamond by passivating the B acceptor and the reduction of ionization energy of dopants. Using the proposed approach, we have systemically investigated the effect of excess H atoms on the electronic properties of a passivated system [diamond doped with (B+H) complex] based on the variation of Fermi level from first-principle calculations. The results show that the excess H atom is responsible for n-type behavior when all valence electrons of substitutional B atom participate in the hybridization between substitutional B and H atoms. On the contrary, when part of valence electrons of the substitutional B atom participates in the hybridization, H atoms make the passivated system show p-type or insulator behavior. Further study indicates that the excess H atoms are more apt to make the passivated system show p-type rather than n-type behavior under the same conditions. It leads to a much more comprehensive understanding of the interaction between the excess H atoms and the passivated system compared with that of Yan et al. The results may be useful to provide guidance for experimental work on obtaining n-type diamond in the future.     

Exploring the effect of dopant (Si,P, S,Ge, Se,and Sb) in arsenene: A DFT study

The structural, electronic and magnetic properties of arsenene were investigated using DFT (density functional theory). The charge transfer, large biding energies, and short bond lengths indicate that the doped structures are robust. Si, S, Ge and Se doping induce magnetic state in arsenene. The principal contribution to the magnetic moment is originated in the p-orbital of dopants and adjacent As atoms, as is suggested by the results of the application of PDOS (Projected Density of States). More importantly, the low effective mass of electrons in arsenene doped by Si, P and Sb implies high carrier mobility, which indicates the three types of structures are high efficiency n-type semiconductors.     

Different substitutions lead to differences in the transport and recombination properties of group V doped SiCNTs

Silicon carbide nanotubes (SiCNTs) has attractive application prospects in the field of micro-nanodevices. Based on first-principle, we find that a shallow and a deep impurity levels appearing when a group-V element replaces a C, while only one deep impurity level appears when a group-V replaces a Si. This indicates that different electronic properties will be generated when group-V replace different sites of SiCNTs. Further numerical simulation results show that when dopant replaces C, the conductivity is about an order of magnitude higher than dopant replaces Si, and the conductivity increase with increasing temperature; the non-equilibrium minority carrier lifetime decrease with increasing temperature, when group-V replace the C, they are strong n-type, when replace the Si, they are in weak n-type and strong p-type. These results will help reveal the doping mechanism of SiC nanomaterials and the selection of dopants, and provide a theoretical basis for the preparation of micro-nanodevices.     

Zinc oxide, a multifunctional material: from material to device applications

In this paper we report on some of the recent advances in transparent thin film oxide semiconductors, specifically zinc oxide produced by radio frequency magnetron sputtering at room temperature, with multifunctional properties. By controlling the deposition parameters it is possible to produce undoped material with electronic semiconductor properties, or by doping it to get either n-type or p-type semiconductor behavior. In this work we refer to our experience in producing n-type doped zinc oxide as transparent electrode to be used in optoelectronic applications such as solar cells and position sensitive detectors, while the undoped zinc oxide can be used as active layer of fully transparent thin film transistors.     

Comparison of ferromagnetism in n- and p-type magnetic semiconductor thin films of ZnCoO

Both n- and p-type diluted magnetic semiconductor ZnCoO are made by magnetron co-sputtering with, respectively, dopants of Al and dual dopants of Al and N. The two sputtering targets are compound ZnCoO with 5% weight of Co and pure metal Al. Sputtering gases for n- and p-type films are pure Ar and N₂, respectively. These films are magnetic at room temperature and possess free electron- and hole-concentration of 5.34×10²⁰ and 5.27×10¹³ cm⁻³. Only the n-type film exhibits anomalous Hall-effect signals. Magnetic properties of these two types of films are compared and discussed based on measurements of microstructure and magneto-transport properties.     

Influence of background carriers on magnetic properties of Mn-doped dilute magnetic Si

Using hybrid exchange density functional calculations we show that the type of background carriers has profound effects on magnetic interactions in Mn doped dilute magnetic Si. The p- and n-type Si were simulated by introducing an extra hole and an extra electron, respectively in the 64 atoms Si supercell. In case of p-type Si compensated by a homogeneous background potential and 1.6% Mn, the ground state is ferromagnetic, whereas other conditions remaining the same, the ground state becomes antiferromagnetic for the n-type Si. The exchange energies in Mn-doped extrinsic Si are higher by about 1 eV/Mn atom compared to the Mn doped intrinsic Si. Calculated electronic structures reveal that in p-type Si:Mn the hole localises over Mn and the short range magnetic coupling increases. Our calculations indicate that localisation of magnetic polarons at the Mn site is likely, which in turn enhances long range magnetic interaction between Mn ions and responsible for FM stabilisation. On the other hand, in the n-type host electron–electron repulsion increases within Mn–Si impurity band and the short range coupling decreases, which destroys the long range spin polarisation. These calculations explain the observed ferromagnetism in the p-type Si:Mn at higher temperatures than in the n-type Si:Mn and the magnetic moments of the systems compare well with experiments.     

First principle study of the influence of vacancy defects on optical properties of GaN

We employ plane-wave with ultrasoft pseudopotential method to calculate and compare the total density of states and partial density of states of bulk-phase GaN,Ga0.9375 N,and GaN0.9375 systems based on the first-principle density-functional theory(DFT).For Ga and N vacancies,the electronic structures of their neighbor and next-neighbor atoms change partially.The Ga0.9375 N system has n-type semiconductor conductive properties,whereas the GaN0.9375 system has p-type semiconductor conductive properties.By studying the optical properties,the influence of Ga and N vacancy defects on the optical properties of GaN has been shown as mainly in the low-energy area and very weak in high-energy area.The dielectric peak influenced by vacancy defects expands to the visible light area,which greatly increases the electronic transition in visible light area.     

纤锌矿结构ZnO中定位Ga-N共掺杂对p型掺杂效率的影响

采用第一性原理和密度泛函理论的方法,计算未掺杂、N单掺杂和Ga-N共掺杂纤锌矿结构ZnO的总能、电荷密度和能带结构.总能计算表明,Ga原子的共掺杂使总能极大地降低,从而显著提高杂质N原子在ZnO中的稳定性.电荷密度分布显示,总能的降低主要是Ga-N共掺杂后Ga原子的3d态和N原子的2p态电子之间的强杂化相互作用所致.特别是在Ga原子的负电荷和N原子的正电荷沿c轴排成一线的共掺杂构型中,较大的局域极化场的变化引起价带顶向禁带中的大分裂,降低了N受主的激活能,将空穴的浓度提高了三个量级,有效地提高p型掺杂效率.     

Graft and characterization of 9-vinylcarbazole conjugated molecule on hydrogen-terminated silicon surface

Using wet chemical reaction between N-vinylcarbazole and hydrogen-terminated silicon surface, we present a new and simple route to directly bond π-conjugated organic molecule on silicon surface. The Si can be in the form of single crystal Si including heavily doped p-type Si, intrinsic Si, heavily doped n-type Si, on Si(1 1 1) and Si(1 0 0), and on n-type polycrystalline Si. The covalent bond between 9-vinylcarbazole and silicon surface was confirmed by reflectance FTIR, XPS and contact angle measurement, respectively. A data-encompassing explanation for the mechanism discusses the possible route of the reaction. This simple and low-costly reaction offers an attractive route to attach functional conjugated molecules onto the semiconductor surface which aims to create some unique molecular device in the future.     

Electronic and transport properties of zigzag phosphorene nanoribbons doped with ordered Si atoms

Using density functional theory (DFT) and the nonequilibrium Green's function method, we explored the electronic structures and transport properties of zigzag phosphorene nanoribbons (ZPNRs) with ordered doping of Si atoms. Our results show that both pristine and Si-doped ZPNRs exhibit metallic properties and the conductance of the doped ZPNRs nanoribbons can be modulated effectively by changing doping positions and concentrations. As different doping positions, different transmission currents can be obtained even with the same doping concentration. Moreover, current amplification factors vary with the doping concentrations. In addition, compared with the pristine system, negative differential resistance effect can also be observed in doped system (Si3), which occurs in lower bias range.     

稀土Gd掺杂新型二维材料磷烯改性研究

本文采用第一性原理赝势平面波法, 计算并分析了稀土Gd掺杂磷烯的物理结构、电子结构、磁性以及光学性质. 计算表明: 在掺杂原子Gd附近引起了磷烯物理结构上的变化. 能带数量明显增多变密, 带隙变窄由0.921eV变为0.578eV. 同时, 由于Gd原子的4f和5d轨道电子两种自旋取向分布具有不对称性, 给体系引入了强磁性, 计算得到的自旋磁矩为7.470B. 磷烯材料的复介电函数是各向异性的, 同时可以得出磷烯材料在其它光学性质方面也是各向异性的. Gd掺杂后使材料的介电性能增强. 在紫外光的能量范围内, 不同极化方向上的反射率和损失函数的峰值降低, 说明Gd的掺入使材料对紫外光的敏感度有所减弱. 希望以上研究结果能为新型二维材料磷烯在光电和稀磁半导体材料的设计与开发方面提供理论依据.     

Impurity doping into Mg2Sn: A first-principles study

We studied the formation energy and atomic structure of impurities in Mg₂Sn using first-principles plane-wave total energy calculations. Twenty elements, namely H, Li, Na, K, Rb, Sc, Y, La, Cu, Ag, Au, B, Al, Ga, In, N, P, As, Sb, and Bi, were selected as the impurity species. We considered structural relaxation of the atoms within the second nearest neighbors of the impurity atom in the 48-atom supercell. The results of the formation energy calculations suggested that Sc, Y, La, P, As, Sb, and Bi are good n-type dopants whereas Li and Na are good p-type dopants. The electrical properties of Li-, Na-, and Ga-doped Mg₂Sn and La-doped Mg₂(Si, Sn) composites reported previously can be explained by the low formation energies of Li, Na, Ga, and La in Mg₂Sn.     

调控硼硫掺杂比实现金刚石n型转变的研究

金刚石半导体由于其特殊的机械性能使其在极端环境下有较广的应用前景. 虽然通过硼(B)元素掺杂较易得到p型金刚石半导体,但具有优异电学性能的n型半导体却鲜见报道. 硼、硫（S）原子因半径及外层电子互补,其协同掺杂易合成p型或n型半导体,但其物理机理尚不清晰.在课题组已有实验报道基础上,借助第一性原理探究了B-S不同比例单掺杂及共掺杂金刚石的形成能、晶体内的存在形式及电子结构,从原子尺度揭示了金刚石由p型向n型半导体转变的阈值掺杂比例. 通过实验与理论的对比发现B在晶格内趋向团聚,而过量的S掺杂则发生析出.     

Computationally predicting spin semiconductors and half metals from doped phosphorene monolayers

First-principles computations are performed to investigate phosphorene monolayers doped with 30 metal and nonmetal atoms. The binding energies indicate the stability of all doped configurations. Interestingly, the magnetic atom Co doping induces the absence of the magnetism while the magnetism is realized in phosphorene with substitutional doping of nonmagnetic atoms (O, S, Se, Si, Br, and Cl). The magnetic moment of transition metal (TM)-doped systems is suppressed in the range of 1.0-3.97 μ_B. The electronic properties of the doped systems are modulated differently; O, S, Se, Ni, and Ti doped systems become spin semiconductors, while V doping makes the system a half metal. These results demonstrate potential applications of functionalized phosphorene with external atoms, in particular to spintronics and dilute magnetic semiconductors.     

剪切形变对硼氮掺杂碳纳米管超晶格电子结构和光学性能的影响

碳纳米管作为最先进的纳米材料之一, 在电子和光学器件领域有潜在的应用前景, 因此引起了广泛关注. 掺杂、变形及形成超晶格为调制纳米管电子、光学性质提供了有效途径. 为了理解相关机理, 利用第一性原理方法研究了不同剪切形变下扶手椅型硼氮交替环状掺杂碳纳米管超晶格的空间结构、电子结构和光学性质. 研究发现, 剪切形变会改变碳纳米管的几何结构, 当剪切形变大于12%后, 其几何结构有较大畸变. 结合能计算表明, 剪切形变改变了掺杂碳纳米管超晶格的稳定性, 剪切形变越大, 稳定性越低. 电荷布居分析表明, 硼氮掺杂碳纳米管超晶格中离子键和共价键共存. 能带和态密度分析发现硼氮交替环状掺杂使碳纳米管超晶格从金属转变为半导体. 随着剪切形变加剧, 纳米管超晶格能隙逐渐减小, 当剪切形变大于12%后, 碳纳米管又从半导体变为金属. 在光学性能中, 剪切形变的硼氮掺杂碳纳米管超晶格的光吸收系数及反射率峰值较未受剪切形变的均减小, 且均出现了红移.