Analysis of Changes in the Intensity of the Intrinsic Luminescence after the Copper Diffusion into Semi-Insulating Undoped GaAs Crystals

An analysis is made of the effect of the copper diffusion into semi-insulating undoped GaAs crystals on the intensity of the intrinsic luminescence. It is shown that the copper diffusion into semi-insulating undoped GaAs crystals could lead both to an increase and to a decrease in the intrinsic luminescence intensity. Analytical expressions connecting the value and the sign of the effect observed with the recombination parameters of crystals pointed and also with the intensity of luminescence excitation are obtained.     

Germanium Incorporation in Ga1–xInxAs LPE Layers and GaAs Bulk Crystals

Atomic absorption spectroscopy (AAS) is used to determine the Ge concentration in Ga_1–xIn_xAs and GaAs. The orientation dependence of Ge incorporation in (111)A-and (111)B oriented samples has been studied. The distribution coefficients for both the orientations were determined to be k_Ge^(111)A = 2.6 · 10⁻² and k_Ge^(111B = 1.4 · 10⁻² for Ga_1–xIn_xAs with 0 ≦ x ≦ 0.13. The differences between the two orientations are explained with the aid of the band bending model. Doping gradients in thick epitaxial layers and along crystal length of polycristalline TGS-grown GaAs ingots have been investigated too. In Ga_1–xIn_xAs layers any Ge concentration gradient couldn't be observed, but in TGS compact crystals Ge concentration increases with crystal length because the melt composition changes significantly during solidification. The results are compared with those of electrical measurements.     

熔体法生长大尺寸有机晶体

大尺寸有机晶体在太赫兹波产生、中子探测、微波激射等多个关系国计民生、涉及国家安全的领域具有重要应用前景.但大尺寸有机单晶生长一直是国际公认的难题,无论是在生长理论、生长方法还是生长设备方面都远远落后,在整个人工晶体领域相对小众;而且有机晶体硬度低、脆性高、易解理等本征特性为加工和后期应用带来了很多困难,制约了相关领域的...     

晶体材料研究——从体块晶体到微纳米晶体

本文首先简要介绍了晶体的重要性和过去几十年来中国晶体材料研究取得的代表性成果.正文主要以我们课题组开展的工作为例,介绍了激光晶体、非线性光学晶体、磁光晶体、声光晶体、半导体晶体、有机晶体、有机-无机复合晶体、二维晶体、单晶光纤、药物结晶、微纳米晶体等方面的研究进展.这些研究实例的维度已覆盖体块-二维-一维-零维,晶体材料已在国防、经济建设、人类健康和科学技术发展的许多领域,发挥了重要作用并仍将是关键材料.     

Silicon Doping of GaAs Single Crystals

The silicon doped GaAs single crystals were grown by means of a horizontal Bridgman method. The relation between the free carrier concentration and silicon concentration determined by chemical analysis was examinated.     

Magnetoplastic Effect in Te-Doped GaAs Single Crystals

Crystallography Reports - The influence of a dc magnetic field on the motion of growth dislocations with a density of (0.7–7.0) × 104 cm–2 and the electron density in the range of...     

Radiation Defects Research in Single Crystals of Lithium Niobate

An information is given on the kinetics of developing ionization defects by γ-radiation, as well as on the destroying of these defects as a result of thermal treatment in oxidizing atmosphere at different temperatures. The presence of several types of ionization defects developing by γ-radiation is found out. Values of diffusion factor for each type of defects are given.     

铌酸钾锂晶体的生长和缺陷

用电阻加热提拉法生长了一系列较大尺寸,组分离子均匀性较好的铌酸钾锂晶体.利用X射线荧光光谱法测量了不同配比的熔体中生长出的晶体组成,用同步辐射X射线测量了晶体结构,结果表明随晶体组成变化,晶体的晶格常数发生了变化.根据晶体组分离子浓度与折射率的关系研究了晶体折射率变化情况,结果表明用本方法生长的大尺寸KLN晶体,寻常折射率no在测量误差范围内没有变化,非寻常折射率ne的变化率在820nm仅为1.22×10-4/mm,在410nm仅为1.93×10-4/mm.晶体的干涉条纹证明了晶体有良好的光学均匀性.结合晶体生长实验,探讨了改进晶体组分离子浓度分布均匀性的方法,结果表明采用籽晶和坩锅向相同方向旋转可以改善晶体生长界面处组分离子浓度的波动,提高晶体组分离子均匀性.晶体的缺陷研究表明晶体结构完整性较好,位错形状与晶体结构相一致,密度为7.5×104,[001]轴是晶体的极化轴.晶体对890～960nm波长范围的cw-Ti:sapphire激光倍频结果表明晶体有良好的倍频性能.     

铌酸锂晶体的缺陷及其控制

针对铌酸锂晶体中的缺陷研究,本文总结了国内外学者提出的不同晶体缺陷模型及各自的特点,并介绍了我们提出的铌位依赖、锂位敏感模型.在分析晶体缺陷研究的基础上提出了对铌酸锂晶体进行缺陷控制的意义及理论依据,指出缺陷控制的主要任务是保护锂格位.本文还简要概括了铌酸锂晶体缺陷控制的主要手段,并建议从反映铌酸锂晶体性能的角度来研究缺陷结构.     

不同颜色AlN单晶缺陷研究

通过物理气相传输(PVT)法在石墨系统中制备了绿色、无色和琥珀色氮化铝(AlN)单晶,在金属系统中制备了琥珀色AlN单晶.晶体中杂质含量测试结果表明石墨系统中琥珀色的AlN晶体比绿色和无色AlN晶体C、Si杂质含量低1～2个数量级,金属系统中琥珀色AlN晶体杂质含量最低,C、Si、O元素含量均在1018 cm-3级别.AlN晶体的吸收图谱和光致发光图谱的分析结果表明,AlN晶体存在着位于4.7 eV、3.5 eV、2.8 eV、1.85 eV的4个吸收峰,其中4.7 eV和3.5 eV的吸收峰导致了AlN吸收截止边的红移,该吸收峰分别源于碳占氮位(CN)的点缺陷和VAl与O杂质的复合缺陷,2.80 eV的吸收峰导致了AlN晶体的琥珀色,该吸收峰是C元素和O元素共同导致的,1.85 eV的吸收峰导致了AlN晶体的绿色,该吸收峰是Si元素和C元素导致的.     

Defects in LEC-grown Indium Phosphide Crystals Doped with Tin

Crystalline defects in Sn-doped LEC indium phosphide have been revealed by chemical etching and analyzed by TEM. Grown-in dislocations, various kinds of defect clusters and colonies of microdefects were found. The symmetrical defect clusters are shown to equate mostly with larger dislocation loops exhibiting shear components and/or other dislocation arrangements generated by a stress source which is positioned in the centre of the dislocation cluster. Those centres are often formed by a plate-like agglomeration composited of tiny inclusions and very small faulted dislocation loops. Such planarly arranged accumulations of microdefects lie on {111} planes. The direct vicinity of single threading grown-in dislocations is always enriched with tiny perfect dislocation loops and precipitates. Additionally, very large isolated interstitial-type perfect dislocation loops with b = a₀/2 〈110〉 have been found by TEM experiments. Mostly, the {110} habit plane of such loops is decorated with an high number of small dislocation loops and precipitates as a consequence of dislocation climb.     

富Te条件下CdTe晶体中的点缺陷研究

基于缺陷化学理论,考虑到富Te的CdTe晶体中可能存在的点缺陷,建立了在Te气氛下退火时,热力学平衡态晶体中的点缺陷模型,其中包括Cd间隙(Cdi)、Cd空位(VCd)、Te间隙(Tei)和Te反位(TeCd).利用质量作用定律和伪化学平衡方程计算了富Te情况下本征CdTe晶体中的点缺陷浓度和费米能级.计算结果系统的揭示了点缺陷浓度、费米能级、Te压以及退火温度之间的关系,发现只有TeCd浓度足够大时才能对费米能级产生钉扎作用.     

制作压电器件氧化锌单晶的评述

氧化锌材料制作压电器件已经有很长的研究历史,自从Robert F.Service在1997年报道氧化锌可以在短波长范围实现蓝光输出后,氧化锌单晶在质量和体积方面取得了很大的研究进展。通过对比分析20世纪60年代以来氧化锌单晶压电特性的研究结果,指出迄今为止制作压电器件的氧化锌单晶仍然需要继续优化。     

Native Point Defects and Nonstoichiometry in GaAs (II) Mechanism of Formation and Degradation of Semiinsulating Properties of Undoped Gallium Arsenide Crystals

The nature of the main electron trap, EL2, in undoped semiinsulating GaAs crystals have been studied both qualitatively and quantitatively. It has been shown that point defects which, most probably, are responsible for the EL2 level are antisite As_Ga defects or (As_i V_Gs) complexes which are indistinguishable from the thermodynamic standpoint. The enthalpy and entropy of As_Ga formation according to the reaction As_As + V_Ga ⇄ As_Ga + V_As are equal to 0.5 eV and −7k, respectively.     

X-ray Characterization of Defect Structure in LEC Annealed GaAs Crystals

Wafers of commercially available semi-insulating (SI) Czochralski-grown GaAs crystals have been annealed at temperatures near the melting point (> 1100 °C) both for relatively short and long time and then rapidly quenched into cold water. Heat-treated crystals have been investigated by X-ray transmission diffraction topography. Cellular structure pattern of the as-grown sample is replaced by images of precipitates spread out over whole sample. This suggests that the excess arsenic condenses as As precipitates with nucleation sites not correlated with cell walls.     

Optical Investigation of Defects in p-type CuInSe2 Single Crystals

Optical absorption spectra in the photon energy range from 0.03 to 1.1 eV and photoreflectance spectra in the range of the fundamental edge are measured on p-type CuInSe₂ single crystals. Besides a dominant contribution to the absorption coefficient due to intervalence band transitions below about 0.75 eV the spectra revealed five additional structures that can be ascribed to defect induced optical transitions with characteristic energies between 0.48 and 0.72 eV. Based on a comparison of the near-edge optical absorption and photoreflectance spectra a shallow defect (donor or acceptor) with an ionisation energy of about 46 meV was identified.     

Bridgman法生长TeO2晶体的缺陷分析

采用Bridgman法生长了二氧化碲(TeO2)晶体,运用光学显微镜、电子衍射光谱、化学腐蚀等方法分析了该方法生长TeO2晶体内部的缺陷.初步讨论了散射点、微裂纹、气泡和黑点、条纹以及腐蚀坑等微缺陷的形成机理.结果表明:晶体内部的散射点来自于原料中杂质,条纹主要是由于晶体内应力引起,晶体内的气泡和黑点和晶体生长的温度密切相关,并就如何减少这些微缺陷进行了初步探讨.     

RbTiOAsO4晶体中的生长缺陷和生长机制

采用溶盐法生长了大尺寸ＲｂｉＯＡｓＯ４晶体。利用同步辐射形貌术和化学腐蚀法,研究了ＲｂＴｉＯＡｓＯ４晶体中的生长缺陷。发现该晶体中的生长缺陷主要生长位错和生长扇界。大部分位钷沿「１００」方向,Ｂｕｒｇｅｒｓ适量为「００１」。在扫描电镜下,对原生ＲｂＴｉＯＡｓＯ４晶体的表面形态进行了观察,根据其表面二次电子像的特征,对不同晶面的生长控制机制进行了讨论。     

DKDP晶体的柱面形貌与缺陷分析

采用原子力显微镜观测全方位生长的DKDP晶体的{100}面形貌,发现有螺旋位错,由此推断DKDP晶体{100}面以螺旋位错机制生长;利用同步辐射X射线白光形貌术观测了DKDP晶体缺陷,探讨了不同生长条件及生长阶段对晶体完整性的影响.     

GaN体单晶的氨热生长及应力调控

采用氨热法在碱性条件下生长了GaN体单晶,SEM照片显示晶体表面有大量裂纹.用拉曼光谱测量GaN晶体的E2 (high)声子拉曼峰,结果表明晶体内部应力波动较大.通过减小温度梯度、籽晶优选及降温程序优化后,得到了无裂纹的氮化镓晶体,(002)和(102)的X射线摇摆曲线FWHM分别为48 arcsec和54 arcsec,显微拉曼光谱表明经过工艺优化后的晶体应力显著降低,应力的来源主要为生长过程中杂质的引入.