A study of phase equilibria and heterojunctions in Ga–In–As–Sb quaternary system

The phase diagram of the Ga–In–As–Sb quaternary system has been determined experimentally and also has been treated on the base of thermodynamic calculations. The liquidus data were obtained by DTA and solidus data were determined using electron microprobe analysis on LPE-layers of Ga_xIn_1–xAs_ySb_1–y on GaSb and InAs substrates. Isolattice-parameter heterostructures prepared on these substrates were free of mismatch dislocations and suitable for application to light-emitting diodes and semiconductor lasers.     

The electrical and structural properties of InyGa1 ? yAs/InxAl1 ? xAs/InP quantum wells with different InAs content

In _x Al_{1 − x} As/In _y Ga_{1 − y} As/In _x Al_{1 − x} As/InP HEMT structures has been investigated with a change in the InAs molar fraction both in the quantum well and the buffer layer. The electrical parameters of the samples are measured at different temperatures. The structural parameters of the layers and the characteristics of the interfaces between them are determined by double-crystal X-ray diffraction. An increase in the Hall mobility and electron concentration, as well as in the structural quality of the samples, is observed alongside an increase in the InAs molar fraction in the quantum well. It is established that high electron mobility is retained at small (to 5%) mismatches between the buffer layer and substrate.     

LPE growth of p(n)InAs1-ySby-n(p)GaSb(AlxGa1-xSb) Heterostructures

This paper presents the results of LPE–growth of p(n)InAs_1-ySb_y-n(p)GaSb(Al_xGa_1-xSb) heterostructures. It is shown the optimum technological regimes for growth of heterostructures p(n)InAs_1-ySb_y-n(p)GaSb(Al_xGa_1-xSb) with a decreased lattice matching of the materials forming the heterojunction.     

Dislocation density in InxGa1–xAs films grown on GaAs substrates with intermediate buffer layer InGaAsP of variable composition

In_xGa_1–xAs films with x = 0.03 and 0.05 were grown from an In Ga As P liquid phase. Because of high value of distribution coefficient of P we have heterojunction GaAs In_yGa_1–yP_zAs_1–x–In_xGa_1–xAs. The influence of Phosphorus atom fraction (X_p) in liquid phase on dislocation density in the top In_xGa_1–xAs layer was studied. It was found that dislocation density (N_d) as a function of X_p is a curve with some minima. The minima of N_d for substrates of (111) A and (111) B orientations are observed in the different intervals of X_p axis. — The width of N_d minimum is decreased if the substrate is misoriented from the (111) plane. — It was supposed that the clusters exist in the liquid phase. On the basis of this assumption one can explain the influence of substrate position over or under the melt on the film perfection. The diameter of these clusters is estimated to be about 500 Å.     

Characterization of the optical properties of LPE InxGa1−xAsyP1−y thin layers grown on InP

A series of In_xGa_1?xAs_yP_1?y single-crystal thin layers have been grown on an InP substrate in a vertical liquid phase epitaxy furnace with a rotating slide boat system. The optical properties of these LPE quaternary alloys lattice-matched to InP have been investigated mainly by photoluminescence and electroreflectance measurements. Photoluminescence spectra of In_xGa_1?xAs_y P_1?y epitaxial layers are dominated by a strong luminescence line due to band-edge emission. At low temperatures, around 4.2 K, we have observed complicated luminescence bands with many fine structures. Electroreflectance spectra for the LPE In_xGa_1?xAs_yP_1?y layers are sufficiently broad to fulfil the low-field condition, and the analysis enabled us to determine precisely the band gap energy.     

Studies on the lattice match and strain in the epitaxial growth of III – V alloys on inas and GaSb substrates

The compositional conditions to deposit the epitaxial films of III – V materials lattice matched to InAs and GaSb substrates have been investigated and the results are presented in the form of charts. The validity of our theoretical predictions has been tested by comparing with the available experimental results. Strain in the Ga_xIn_{1 − x}As_ySb_{1 − y} quaternary alloy has been visualised as three-dimensional perspective plots.     

Miscibility gap calculation for Ga1−xInxNyAs1−y including strain effects

A method including strain effects is introduced for calculating the miscibility gap of the Ga_xIn_1−xN_yAs_1−y material system. The Gibbs free energy is computed using the delta lattice parameter model and the conventional solution model. The contribution caused by the strain energy due to the mismatch between substrate and epitaxial layer is added. The spinodal points can be calculated from this expression. The critical temperature above which the solid is metastable has been found to be increased due to strain effects. It is pointed out that the result of the calculation depends on the choice of substrate. The miscibility gaps for Ga_xIn_1−xAs, GaN_yAs_1−y and Ga_xIn_1−xN_yAs_1−y are evaluated by this method for a more realistic model of crystal growth.     

The effect of annealing on the surface morphology of strained and unstrained InxAl1−xN thin films

In_xAl_1−xN is a particularly useful group-III nitride alloy because by adjusting its composition it can be lattice matched to GaN. Such lattice-matched layers may find application in distributed Bragg reflectors (DBRs) and high electron mobility transistors (HEMTs). However, compared with other semiconducting nitride alloys, In_xAl_1-xN has not been researched extensively. In this study, thin In_xAl_1−xN epilayers were grown by metal-organic vapour phase epitaxy (MOVPE) on GaN and Al_yGa_1−yN layers. Samples were subjected to annealing at their growth temperature of 790 °C for varying lengths of time, or alternatively to a temperature ramp to 1000 °C. Their subsequent surface morphologies were analysed by atomic force microscopy (AFM). For both unstrained In_xAl_1−xN epilayers grown on GaN and compressively strained epilayers grown on Al_yGa_1−yN, surface features and fissures were seen to develop as a consequence of thermal treatment, resulting in surface roughening. It is possible that these features are caused by the loss of In-rich material formed on spinodal decomposition. Additionally, trends seen in the strained In_xAl_1−xN layers may suggest that the presence of biaxial strain stabilises the alloy by suppressing the spinode and shifting it to higher indium compositions.     

Study of the relationship between the crystal structure of nanolayers and electrical properties in Al x Ga1? x As/In y Ga1? y As pseudobinary heterostructures by double-crystal X-ray diffraction

The structural parameters of individual layers of samples of a Al _x Ga_1−x As/In _y Ga_1−y As/GaAs pseudomorphic heterostructure have been determined by double-crystal X-ray diffraction. A relationship of the technological parameters of fabrication of heterostructures with their structural and electrical properties is established. The increase in the mobility of the 2D electron gas in the samples under study, caused by the increase in the growth temperature of the Al _x Ga_1−x As spacer layer and the decrease in the time of silicon δ doping from the two sides of the quantum well, correlates well with the degree of the sample structural quality. Original Russian Text ? R.M. Imamov, I.A. Subbotin, G.B. Galiev, 2008, published in Kristallografiya, 2008, Vol. 53, No. 2, pp. 210–213.     

X-ray diagnostics of P-HEMT AlGaAs/InGaAs/GaAs structures

The structural characteristics of the P-HEMT AlGaAs/InGaAs/GaAs heterostructure have been studied by high-resolution X-ray diffractometry. The parameters of the heterostructure layers were determined by simultaneous analysis of the X-ray reflection curves for the (004) and (113) crystallographic planes. Interface diffusion has been established for the In_yGa_1?yAs quantum well and the Al_xGa_1?x As spacer layer, which are characterized by reconstructed profiles of the lattice parameter distribution and anisotropic distribution of random displacements in the layer plane and in the perpendicular direction.     

Digitally alloyed modulated precursor flow epitaxial growth of AlxGa1−xN layers with AlN and AlyGa1−yN monolayers

We propose a new growth scheme of digitally alloyed modulated precursor flow epitaxial growth (DA-MPEG) using metalorganic and hydride precursors for the growth of Al_xGa_1−xN layers with high-Al content at relatively low temperatures. The growth of high-quality, high-Al content Al_xGa_1−xN layers (x_Al>50%) that are composed of AlN and Al_yGa_1−yN monolayers on AlN/sapphire template/substrates by DA-MPEG was demonstrated. The overall composition of the ternary Al_xGa_1−xN material by DA-MPEG can be controlled continuously by adjusting the Column III mole fraction of the atomic Al_yGa_1−yN sub-layer. X-ray diffraction and optical transmittance results show that the AlGaN materials have good crystalline quality. The surface morphology of DA-MPEG AlGaN samples measured by atomic force microscopy are comparable to high-temperature-grown AlGaN and are free from surface features such as nano-pits.     

X-ray diffraction studies of interdiffusion in InAs—GaAs powder blends

Interdiffusion in the pseudobinary system In_xGa_1−xAs is investigated by means of X-ray diffractometry of annealed powder blends. The interpretation of the experimental results by means both of the concentric spheres and concentric cubes model yields for In_0.43Ga_0.57As an activation energy of (5.39 ± 0.11) eV. This value shows that the diffusion mechanism could be a vacancy one as in the pure compounds. According to the lower atomic radius the Ga atoms within the temperature interval of 550–625 °C diffuse more easily than the In atoms.     

AlGaAs/InGaP interfaces in structures prepared by MOVPE

Al_0.3Ga_0.7As/In_1−xGa_xP structures were prepared by low-pressure MOVPE. Lattice matched and strained ones with top In_1−xGa_xP layers as well as reverse ones with top Al_0,3Ga_0,7As layers were examined. The structures were studied by photoluminescence, X-ray and atomic force microscope (AFM) methods. An additional photoluminescence peak from the Al_0.3Ga_0.7As/In_1−xGa_xP interface was observed in our samples and it was attributed to a type-II band offset. A conduction band offset of 0.121 eV was measured in the Al_0.3Ga_0.7As/In_0.485Ga_0.515P lattice-matched structure and a linear dependence of the conduction band offset on In_1−xGa_xP composition, with a zero offset in the Al_0.3Ga_0.7As/In_0.315Ga_0.685P structure, was determined. The valence band discontinuity had a nearly constant value of 0.152 eV.     

Die Konzentrationsabhängigkeit des Brechungsindex von Ga(PAs)- und (GaIn)P-Mischkristallen

In the two systems of mixed crystals Ga_xPAs_1–x and Ga_xIn_1–xP the refraction index — using the wavelength of the green Hg line (λ = 5461 Å) — is determined ellipsometrically in dependence on the mole fraction x. The nonlinearity parameter c_n of this dependence is compared with that estimated theoretically by the use of PENNS model.     

Growth of InAs1–ySby solid solutions for obtaining decreased lattice mismatch in the InAs-GaSb (AlxGa1–nSb) system

This paper presents the results of investigation of the technological conditions of LPE growth of InAs_1–ySb_y solid solutions on InAs substrates. It is shown that the chosen regions of composition of InAs_1–ySb_y solid solutions and experimentally determined technological conditions allow the obtaining of InAs_1–ySb_y solid solutions with lattice parameter values close to those of the Al_xGa_1–xSb (0 ≦ x ≦ 0.2) solid solutions.     

Germanium Incorporation in Ga1–xInxAs LPE Layers and GaAs Bulk Crystals

Atomic absorption spectroscopy (AAS) is used to determine the Ge concentration in Ga_1–xIn_xAs and GaAs. The orientation dependence of Ge incorporation in (111)A-and (111)B oriented samples has been studied. The distribution coefficients for both the orientations were determined to be k_Ge^(111)A = 2.6 · 10⁻² and k_Ge^(111B = 1.4 · 10⁻² for Ga_1–xIn_xAs with 0 ≦ x ≦ 0.13. The differences between the two orientations are explained with the aid of the band bending model. Doping gradients in thick epitaxial layers and along crystal length of polycristalline TGS-grown GaAs ingots have been investigated too. In Ga_1–xIn_xAs layers any Ge concentration gradient couldn't be observed, but in TGS compact crystals Ge concentration increases with crystal length because the melt composition changes significantly during solidification. The results are compared with those of electrical measurements.     

Study of InxGa1–xP/GaAs Films Formation on the Basis of In–Ga–P Liquidus Precised Investigation

It is shown that the In–Ga–P melt which is prepared by contacting with the GaP seed becomes supersaturated in reality. Some peculiarities of In_xGa_1–xP/GaAs films formation at quasi-equilibrium conditions are described. It is observed that the saturated In–Ga–P melt dissolves the GaAs substrate when isothermally contacting if the In_xGa_1–xP equilibrium solid has the lattice parameter less than that of GaAs. As a result some InGaAsp deposit arises on the substrate. This phenomenon takes place if the In–Ga–P melt is just supercooled. This instability of the liquid-solid interface is explained on the basis of the relaxation theory of non-equilibrium liquid-solid contact which has been created by the author in previous papers.     

Investigation of the possibility of obtaining homogeneous Ga<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>In<Subscript>x</Subscript>Sb crystals under weak flow conditions

The possibility of growing macrohomogeneous Ga_{1 ? x}In_xSb crystals with x = 0.2 was studied using the axial heating process close to the melt/crystal interface. The grown ingots were analyzed by a JSM-5300 scanning electron microscope and the experimental results were compared with the results of numerical simulation. It was shown that, as a whole, the mathematical model adequately describes the processes of the steady-state heat and mass transfer. It was found that, at the crystallization of Ga_{1 ? x}In_xSb by the axial heating process under conditions of weak laminar flows, longitudinal homogeneity is observed when a dead zone is formed in the melt and that the crystallization regime is similar to diffusion. It was shown that the composition of the grown crystals strongly depends on the structure of a melt flow and its dynamics.     

Electron-beam microprobe analysis of epitaxial GaxIn1−xP solid solutions

Ga_xIn_1–xP epitaxial layers were investigated by means of a scanning electron microscope X-ray microanalyser. The conditions for quantitative X-ray microprobe analysis are discussed. The growth of Ga_xIn_1–xP layers is possible on GaP substrates with x > 0,8 and on GaAs with 0,3 < x < 0,6. For the deposition of layers with 0,5 < x < 0,8 two substrate materials are possible: GaAs_1–xP_x or Ga_xIn_1–xP with suitable compositions. These materials must be epitaxially deposited by step by step layer growth or by vapour phase epitaxy, respectively.     

InGaAsP quaternary layers on InP (100) substrate analysed by ion backscattering and channeling

In_1−xGa_xAs_yP_1−y layers LPE grown on InP(001) substrates are analysed by the Rutherford backscattering and channeling techniques. In addition to the layer thicknesses the compositions are determined from the random spectra and compared with the PL and XRD results. The high dechanneling rate of the He⁺ ions for [100] incidence is attributed to the displaced atoms in the distorted crystal lattice of these otherwise high-quality epitaxial layers. We find a characteristic value of Δ_χdist(0.1) = 2.3 ± 0.3% which must be taken into account for estimations of crystalline quality.