MnxSi1-x磁性薄膜的结构研究

利用X射线衍射(XRD)和X射线吸收近边结构(XANES)方法研究了在Si(100)衬底上及600℃温度条件下用分子束外延(MBE)共蒸发方法生长的Mn_xSi_1-x磁性薄膜的结构.由XRD结果表明,只有在高Mn含量(8％和17％)样品中存在着Mn₄Si₇化合物物相.而XANES结果则显示,对于Mn浓度在0.7%到17%之间的Mn_xSi_1-x样品,其Mn原子的XANES谱表现出了一致的谱线特征.基于多重散射的XANES理论计算进一步表明,只有根据Mn₄Si₇模型计算出的理论XANES谱才能够很好的重构出Mn_xSi_1-x样品的实验XANES谱.这些研究结果说明在Mn_xSi_1-x样品中,Mn原子主要是以镶嵌式的Mn₄Si₇化合物纳米晶颗粒存在于Si薄膜介质中,几乎不存在间隙位和替代位的Mn原子. 关键词： xSi_1-x磁性薄膜')" href="#">Mn_xSi_1-x磁性薄膜 分子束外延 XRD XANES     

Cu对Zn1－xFexO稀磁半导体磁性的影响

采用水热法，在温度430 ℃，填充度35%，矿化剂为3 mol·L^-1KOH，前驱物为添加适量的FeCl₂·6H₂O的Zn(OH)₂，反应时间24h，合成了Zn_1-xFe_xO和Zn_1-xFe_xO：Cu稀磁半导体晶体.当在Zn(OH)₂中添加一定量的FeCl₂·6H₂O为前驱物，水热反应产物为掺杂Fe的Zn_1-xFe_xO多种形态晶体混合物，其个体较大的晶体中的Fe原子百分比含量为0.49%—0.52%.采用超导量子干涉磁强计测量了材料的磁性，晶体的磁化强度随温度下降而减小.在前驱物中同时加入适量比例的Cu化合物，合成了共掺杂Cu的Zn_1-xFe_xO：Cu，和Zn_1-xFe_xO相比，其室温下的磁化强度有明显的提高，且在室温下具有铁磁性. 关键词： 氧化锌 水热 稀磁半导体 晶体     

Zn1-xCoxO稀磁半导体薄膜的结构及其磁性研究

利用X射线吸收精细结构、X射线衍射和磁性测量等技术研究脉冲激光气相沉积法制备的Zn_1-xCo_xO (x＝0.01,0.02)稀磁半导体薄膜的结构和磁性.磁性测量结果表明Zn₁-xCo_xO样品都具有室温铁磁性.X射线衍射结果显示其薄膜样品具有结晶良好的纤锌矿结构.荧光X射线吸收精细结构测试结果表明,脉冲激光气相沉积法制备的样品中的Co离子全部进入ZnO晶格中替代了部分Zn的格点位置,生成单一相的Zn_1-xCo_xO 稀磁半导体.通过对X射线吸收近边结构谱的分析,确定Zn_1-xCo_xO薄膜中存在O空位,表明Co离子与O空位的相互作用是诱导Zn_1-xCo_xO产生室温铁磁性的主要原因. 关键词： 1-xCo_xO稀磁半导体')" href="#">Zn_1-xCo_xO稀磁半导体 X射线吸收精细结构谱 脉冲激光气相沉积法     

稀掺杂GaNxAs1－x(x≤0.03)薄膜的调制光谱研究

利用室温下压电调制反射光(PzR)谱技术系统测量了N掺杂浓度为0.0%—3%的分子束外延生长GaN_xAs_1-x薄膜，并对图谱中所观察的光学跃迁进行了指认.在GaN_0.005As_0.995和GaN_0.01As_0.99薄膜的PzR谱中观察到此前只在椭圆偏振谱中才看到的N掺杂相关能态E₁+Δ₁+Δ_N.当N掺杂浓度达到 关键词： 压电调制反射光谱(PzR) xAs_1-x薄膜')" href="#">GaN_xAs_1-x薄膜 分子束外延(MBE)     

Zn1-xCoxO稀磁半导体薄膜的结构及其磁性研究

利用X射线吸收精细结构、X射线衍射和磁性测量等技术研究脉冲激光气相沉积法制备的Zn1-zCoxO(x=0.01,0.02)稀磁半导体薄膜的结构和磁性.磁性测量结果表明Zn1-xCoxO样品都具有室温铁磁性.X射线衍射结果显示其薄膜样品具有结晶良好的纤锌矿结构.荧光X射线吸收精细结构测试结果表明,脉冲激光气相沉积法制备的样品中的Co离子全部进入ZnO晶格中替代了部分Zn的格点位置,生成单一相的Zn1-xCoxO稀磁半导体.通过对X射线吸收近边结构谱的分析,确定Zn1-xCoxO薄膜中存在O空位,表明Co离子与O空位的相互作用是诱导Zn1-xCoxO产生室温铁磁性的主要原因.     

H掺杂对ZnCoO稀磁半导体薄膜结构及磁性能的影响

利用磁控溅射法,采用亚分子分层掺杂技术交替溅射Co靶和ZnO靶,在Si衬底上制备了不同氢氩流量比的H:ZCO薄膜样品,研究了氢氩流量比对薄膜结构特性和磁学性能的影响。所制备的薄膜样品具有c轴择优取向。由于H对表面和界面处悬挂键的钝化作用,随H₂流量比的增加,薄膜的择优取向变差。磁性测量结果显示,薄膜样品的铁磁性随着氢氩流量比的增大而增强。XPS结果表明,随着H含量的增大,金属态Co团簇的相对含量逐渐增加,而氧化态Co离子的相对含量逐渐减小。H:ZCO样品中的铁磁性可能来源于Co金属团簇,H的掺入促使ZnO中的Co离子还原成Co金属团簇,从而增强了薄膜样品的室温铁磁性。     

稀磁半导体Zn1—xCoxSe的光谱特性

本文首次报道一类新型半导体材料：含Ｃｏ＾＋６＋离子的稀磁半导体Ｚｎ１－ｘＣｏｘＳｅ晶体的光谱特性研究实验结果。对组分ｘ＝０．００１，０．００９７，０．０３０，０．０３７系列样品，在７３Ｋ－３００Ｋ范围内分别在可见和近红外区测量了吸收光谱和光致发光谱。实验观测到一系列与ｘ值无关的吸收峰和光致发光峰，两者一一对应，它们分别对应于具有Ｔｄ对称的晶体场中Ｃｏ＾＋＾＋离子不同能级间的跃迁，对这些峰进行了初步     

稀磁半导体Cd_（1－x）Fe_xTe的磁光光谱

在７０－３００Ｋ温度范围内测量了组分ｘ为０．０１和０．０４的Ｃｄ１－ｘＦｅｘＴｅ及ＣｄＴｅ的法拉第效应随入射光子能量的变化，首次获得了Ｃｄ１－ｘＦｅｘＴｅ在布里渊区Γ点和Ｌ点的有效ｇ因子及其与温度的关系。给出了Ｆｅ２＋离子与载流子间的ｓｐ－ｄ交换作用常数Ｎ０（β－α）＝（－１．５７±０．０３）ｅＶ。     

稀磁半导体Zn_（1－x）Co_xSe的光谱特性

本文首次报道一类新型半导体材料：含Ｃｏ＋＋离子的稀磁半导体Ｚｎ１－ｘＣｏｘＳｅ晶体的光谱特性研究实验结果。对组分Ｘ＝０．００１，０．００９７，０．０３０，０．０３７系列样品，在７３Ｋ—３００Ｋ范围内分别在可见和近红外区测量了吸收光谱和光致发光谱。实验观测到一系列与Ｘ值无关的吸收峰和光致发光峰，两者—一对应，它们分别对应于具有几对称的晶体场中Ｃｏ＋＋离子不同能级间的跃迁，对这些峰进行了初步指认。从光致发光谱实验结果给出能隙随Ｘ值的变化。     

MnxSi1-x磁性薄膜的结构研究

利用X射线衍射(XRD)和X射线吸收近边结构(XANES)方法研究了在Si(100)衬底上及600℃温度条件下用分子束外延(MBE)共蒸发方法生长的MnxSi1-x磁性薄膜的结构.由XRD结果表明,只有在高Mn含量(8%和17%)样品中存在着Mn4Si7化合物物相.而XANES结果则显示,对于Mn浓度在0.7%到17%之间的MnxSi1-x样品,其Mn原子的XANES谱表现出了一致的谱线特征.基于多重散射的XANES理论计算进一步表明,只有根据Mn4Si7模型计算出的理论XANES谱才能够很好的重构出MnxSi1-x样品的实验XANES谱.这些研究结果说明在MnxSi1-x样品中,Mn原子主要是以镶嵌式的Mn4Si7化合物纳米晶颗粒存在于Si薄膜介质中,几乎不存在间隙位和替代位的Mn原子.     

Ruderman-Kittel-Kasuya-Yosida-like ferromagnetism in MnxGe1-x

The nature and origin of ferromagnetism in magnetic semiconductors is investigated by means of highly precise electronic and magnetic property calculations on MnxGe1-x as a function of the location of Mn sites in a large supercell. Surprisingly, the coupling is not always ferromagnetic (FM), even for large Mn-Mn distances. The exchange interaction between Mn ions oscillates as a function of the distance between them and obeys the Ruderman-Kittel-Kasuya-Yosida analytic formula. The estimated Curie temperature is in good agreement with recent experiments, and the estimated effective magnetic moment is about 1.7mu(B)/Mn, in excellent agreement with the experimental values, (1.4-1.9)mu(B)/Mn.     

Effect of swift heavy ion irradiation on dilute Fe-doped Sb0.95Se0.05 magnetic semiconductor

A thin film of dilute Fe (0.008)-doped Sb_0.95Se_0.05 alloy was grown on silicon substrate using the thermal evaporation technique. This film was irradiated with swift heavy ions (SHIs) Ag⁺¹⁵ having 200?MeV energy at ion fluences of 1?×?10¹² and 5?×?10¹² ions per cm², respectively. The thickness of the thin film was ～500?nm. We study the effect of irradiation on structural, electrical, surface morphology and magnetic properties of this film using grazing angle XRD (GAXRD), DC resistivity, atomic force microscopy (AFM) and magnetic force microscopy (MFM), respectively. GAXRD suggests that no significant change is observed in this system due to SHI irradiation. The average crystallite size increases with fluence, whereas the AFM image shows the rms roughness decreases due to irradiation with respect to the un-irradiated thin film. The MFM image shows that the magnetic interaction in irradiated film decreases due to the irradiation effect. Although the un-irradiated sample shows metal to semiconducting transition, but after irradiation with fluence of 5?×?10¹² ions per cm², the sharpness of the metal to semiconducting phase transition is observed to increase dramatically at ～300?K. This characteristic of the thin film makes it a promising candidate for an electrical switching device after irradiation.     

Size-dependent spintronic properties of dilute magnetic semiconductor nanocrystals

The electronic structure and magnetic properties of Mn-doped Ge, GaAs, and ZnSe nanocrystals are investigated using real space ab initio pseudopotentials constructed within the local spin-density approximation. The ferromagnetic and half-metallicity trends found in the bulk are preserved in the nanocrystals. However, the Mn-related impurity states become much deeper in energy with decreasing nanocrystalline size, causing the ferromagnetic stabilization to be dominated by double exchange via localized holes rather than by a Zener-like mechanism.     

Sn1-x(In1-yCuy)xO薄膜的合成

利用真空反应蒸发技术,在氧分压约为8.5×10-2Pa、衬底温度为400℃条件下蒸发高纯度的铟、锡和铜,在玻璃衬底上制备出Sn1-x(In1-yCuy)xO薄膜.研究了蒸发源材料质量比不同的样品的薄膜结构、透过率、薄膜的方块电阻和电阻率与温度的关系.实验结果表明,Sn1-x(In1-yCuy)xO透明导电薄膜具有优良的光电特性,而且制备出的Sn1-x(In1-yCuy)xO薄膜中In的含量大大减少,可以成为ITO薄膜的潜在替代材料.     

Two magnetic regimes in doped ZnO corresponding to a dilute magnetic semiconductor and a dilute magnetic insulator

Films of ZnO doped with magnetic ions Mn and Co and, in some cases, with Al have been fabricated with a very wide range of carrier densities. Ferromagnetic behavior is observed in both insulating and metallic films, but not when the carrier density is intermediate. Insulating films exhibit variable range hopping at low temperatures and are ferromagnetic at room temperature due to the interaction of the localized spins with static localized states. The magnetism is quenched when carriers in the localized states become mobile. In the metallic (degenerate semiconductor) range, robust ferromagnetism reappears together with very strong magneto-optic signals and room temperature anomalous Hall data. This demonstrates the polarization of the conduction bands and indicates that, when ZnO is doped into the metallic regime, it behaves as a genuine magnetic semiconductor.     

Local structures of Mn in dilute magnetic semiconductor ZnMnO

The local structures of Mn atoms in (Zn, Mn)O have been investigated by extended x-ray absorption fine structure (EXAFS). For samples with lower Mn concentrations (<11%), EXAFS results show that the majority of Mn atoms are incorporated at Zn substitutional sites. Ferromagnetic behavior has been observed in those ZnMnO samples. It is the direct evidence to suppose that the ferromagnetism in (Zn, Mn)O is not due to Mn-related secondary phases but is intrinsic. When the Mn concentration is increased to 20% or higher, the EXAFS simulation shows the formation of MnO secondary phases and the films show a change from ferromagnetic (FM) to antiferromagnetic (AFM) state. We suggest that Mn-related secondary phases might be responsible for the transformation from FM to AFM state.     

Hydrogen control of ferromagnetism in a dilute magnetic semiconductor

We show that upon exposure to a remote dc hydrogen plasma, the magnetic and electronic properties of the dilute magnetic semiconductor Ga1-xMnxAs change qualitatively. While the as-grown Ga1-xMnxAs thin films are ferromagnetic at temperatures T less, similar 70 K, the samples are found to be paramagnetic after the hydrogenation, with a Brillouin-type magnetization curve even at T=2 K. Comparing magnetization and electronic transport measurements, we conclude that the density of free holes p is significantly reduced by the plasma process, while the density of Mn magnetic moments does not change.