溶剂预处理结合热退火提升聚噻吩结晶度及其光伏性能

活性层的微观形貌在很大程度上决定了聚合物光伏器件的性能表现并依赖于制备工艺条件。为了改善薄膜内部分子排布结构并追求较高的器件光电转化效率,采用溶液法制备了基于P3HT：PCBM的聚合物太阳能电池（器件结构:ITO/PEDOT：PSS/P3HT：PCBM/Al）,通过改变器件制备流程中活性层退火处理工艺,研究了热退火、溶剂退火以及溶剂预处理结合热处理的双重退火对聚合物太阳电池性能的影响。研究发现:双重退火的光伏器件的各项性能参数均优于单一退火处理器件,获得了3.25%的光电转化效率。原子力显微镜及X射线衍射仪的表征结果进一步证明:双重退火处理能够在促进聚合物给体良好有序结晶的同时保证共混组分适度地相分离,从而有利于光生激子的解离以及载流子的传输。     

退火气压对于P3HT∶PCBM微观形貌及光伏性能的影响

通过精确设定不同的退火环境气压, 实现对P3HT(Poly(3-hexylthiophene -2,5-diyl)与PCBM(［6,6］-Phenyl C61 butyric acid methyl ester)体系中聚噻吩结晶度以及共混相分离程度的控制, 并在此基础上制备了结构为ITO/PEDOT∶PSS/P3HT∶PCBM/Al的正型光伏器件。在允许的压强设定范围内, 器件各项性能参数均随退火环境压强的增大表现出先升高后下降的变化规律, 并统一于气压设定为1 500 mTorr时获得最大值。从活性层的紫外-可见(UV-Vis)吸收光谱中发现P3HT在510 nm吸收峰以及550和600 nm肩峰附近的吸收强度随退火气压升高而增大, 在气压为1 500 mTorr时达到最高, 吸收强度的提升源于聚合物分子π—π堆叠的增加。原子力显微镜(AFM)进一步分析结果表明, 高气压环境(>1 000 mTorr)能够促进P3HT∶PCBM共混组分在退火过程中形成较大程度的相分离, 而当环境压强合适时(1 500 mTorr)适度的相分离利于聚合物形成良好有序结晶, 从而能够提升活性层内部载流子传输能力, 保证较高的短路电流与填充因子, 制备的器件也因此表现出良好的光伏性能, 光电转化效率达到3.56%。     

退火气压对于P3HT∶PCBM微观形貌及光伏性能的影响

通过精确设定不同的退火环境气压,实现对P3HT(Poly(3-hexylthiophene -2,5-diyl)与PCBM([6,6]-Phenyl C₆₁ butyric acid methyl ester)体系中聚噻吩结晶度以及共混相分离程度的控制,并在此基础上制备了结构为ITO/PEDOT∶PSS/P3HT∶PCBM/Al的正型光伏器件。在允许的压强设定范围内,器件各项性能参数均随退火环境压强的增大表现出先升高后下降的变化规律,并统一于气压设定为1 500 mTorr时获得最大值。从活性层的紫外-可见(UV-Vis)吸收光谱中发现P3HT在510 nm吸收峰以及550和600 nm肩峰附近的吸收强度随退火气压升高而增大,在气压为1 500 mTorr时达到最高,吸收强度的提升源于聚合物分子π—π堆叠的增加。原子力显微镜(AFM)进一步分析结果表明,高气压环境(>1 000 mTorr)能够促进P3HT∶PCBM共混组分在退火过程中形成较大程度的相分离,而当环境压强合适时(1 500 mTorr)适度的相分离利于聚合物形成良好有序结晶,从而能够提升活性层内部载流子传输能力,保证较高的短路电流与填充因子,制备的器件也因此表现出良好的光伏性能,光电转化效率达到3.56%。     

不同环境压强下溶剂退火对聚合物太阳能电池性能的影响

通过改变溶剂退火时的环境压强控制溶剂的蒸发速率,在不同压强下进行加压溶剂退火制备了基于聚-3己基噻吩:富勒烯衍生物(P3HT:PCBM)的体异质结聚合物太阳能电池。X射线衍射(XRD)、紫外-可见吸收光谱(UV-Vis)以及原子力显微镜(AFM)的测试结果表明,增大溶剂退火的环境气压改善了薄膜的结晶度,增强了有源层的光吸收,提高了P3HT和PCBM的相分离程度,更有利于激子的解离和载流子传输。与在常压下溶剂退火相比,在2.0 MPa压强下对有源层进行溶剂退火的器件的光电转换效率提高了29%,达到了3.69%。     

阴极缓冲层对于不同惰性气氛气压退火处理的 P3HT∶PCBM光伏性能的影响

制备了基于聚(3-己基噻吩)(P3HT)与可溶性富勒烯衍生物(PCBM)共混体系的太阳能电池。通过改变活性层退火处理时惰性气氛环境的压强,在一定程度上实现对共混物相分离以及聚合物结晶度的控制,研究了LiF作为阴极缓冲层对不同压强下退火处理的器件性能的影响。实验发现,LiF层的关键作用在于稳定开路电压以及提升短路电流,从而带动转化效率整体提升。结果表明,LiF层可以改善器件活性层与金属电极接触的界面形态,而器件的最终性能则由活性层的微观形貌与电极界面形态共同决定。     

利用Ag_2O/PEDOT:PSS复合缓冲层提高P3HT:PCBM聚合物太阳能电池器件性能的研究

利用Ag2O/PEDOT:PSS(聚(3,4-乙撑二氧噻吩):聚苯乙烯磺酸盐)作为复合阳极缓冲层,制备了P3HT:PCBM(聚(3-已基噻吩):富勒烯衍生物)聚合物太阳能电池器件,并通过改变氧化银插入层的厚度来分析复合缓冲层对器件性能的影响.实验发现,具有阳极缓冲层修饰的器件在退火处理后,光伏性能得到了改善.相比于单一PEDOT:PSS缓冲层的器件,Ag2O/PEDOT:PSS复合缓冲层可以增大器件的短路电流密度和外量子效率,使器件效率得到提高.分析表明,退火处理可以有效改善活性层的薄膜形貌,增加光的吸收和激子的解离,而较薄氧化银的引入,可以有效降低阳极处空穴的输运势垒,提高器件空穴收集效率,并能充当化学间隔层,提高器件光伏性能和稳定性.     

CdSe量子点掺杂聚合物太阳能电池光谱响应特性研究

采用喷涂法分别制备了基于P3HT∶PCBM体异质结和P3HT∶PCBM∶QDs体异质结光活性层的有机太阳能电池器件,并对其光电响应进行了表征和对比。同时采用光谱手段对两者的光活性层进行对比分析。实验结果表明,量子点的加入拓宽了薄膜吸收光谱,同时增强了光致电子转移过程,从而改善了器件的光谱响应;双源共喷制备的P3HT∶PCBM∶QDs体异质结器件转化效率比同样是喷涂制备的P3HT∶PCBM体异质结提高了25%。     

缓冲层提高有机聚合物光伏电池性能研究

在分析有机聚合物复合体光伏电池机理及等效电路模型基础上,研究了界面旋涂缓冲层对聚合物给体/受体复合体结构光伏器件性能的影响.制备了基于P3HT/PCBM的给体 受体复合体薄膜有机光伏电池,并分别在有机活性层和ITO基底之间以及有机活性层和电极之间插入TFB和F8BT缓冲层.实验证明：在ITO和活性层之间旋涂TFB作为阳极缓冲层,可增加有机聚合物光伏器件的短路电流,在活性层和电极之间插入F8BT作为阴极缓冲层,可增大光伏器件的开路电压,提高器件的转换效率.     

退火处理ZnPc(OC_8H_(17)OPyCH_3I)_8阴极缓冲层的倒置有机太阳能电池

制备了以Zn Pc(OC8H17OPy CH3I)8为阴极缓冲层、P3HT∶PCBM为有源层的有机太阳能电池。对阴极缓冲层Zn Pc(OC8H17OPy CH3I)8薄膜分别进行了溶剂蒸汽退火和过渡舱惰性气体流退火处理,并利用原子力显微镜(AFM)对缓冲层表面形貌进行了表征。结果表明:这两种退火方法都使缓冲层形貌得以改善。电池效率从2.14%提高到3.76%,电流密度从8.12 m A/cm2提高到10.71 m A/cm2,填充因子从0.45提高到0.61。与传统器件相比,退火处理的阴极缓冲层器件的稳定性也得到了改善,器件寿命延长了1.4倍。这种简单阴极界面处理方法为改善聚合物太阳能电池性能提供了有效途径。     

微纳光栅结构增强聚合物太阳能电池光吸收的研究

基于共轭聚合物给体材料P3HT和富勒烯衍生物受体材料PCBM共混的体异质结结构的聚合物太阳能电池,因其空穴载流子迁移率低而限制了P3HT:PCBM功能层厚度,从而影响了器件对入射光的吸收.在聚合物功能层表面引入微纳光栅结构可以使器件内电场重新分布并改善器件的光吸收.本文基于时域有限差分方法仿真得到了光栅周期为1μm,占空比为0.5以及入射波长分别为500和700 nm时二维器件内光电场分布;并基于严格耦合波分析方法计算得到了不同光栅深度和光栅占空比的器件光吸收.理论分析表明:插入微纳光栅结构后,由于光栅衍射增强作用使器件内出现了光聚焦现象;当占空比为0.5时,光栅深度为10 nm的器件在入射波长为512 nm时,器件光学吸收增加了4.2%.基于聚二甲基硅氧烷的微压印技术,制备了微纳光栅结构聚合物太阳能,器件结构为ITO/PEDOT:PSS光栅层/P3HT:PCBM/LiF/Al.该器件与平板器件的性能对比实验证实,通过在PEDOT:PSS上引入微纳光栅结构,器件能量转化效率增加了31%.     

利用等时退火法预估等温退火效应实验研究

对电离辐照损伤后的MOS器件的等温和等时退火特性进行了研究，结果发现，首先，100℃等 温退火是有效的，等时退火所需的全过程时间最短；其次，+5V栅偏压退火相对于0V和浮空 偏置条件，阈值电压恢复速度快、恢复程度大；最后，利用等时退火数据对等温效应进行了 理论预估，实验等温曲线和预估结果吻合得较好. 关键词： 等温退火 等时退火 MOS器件     

Effect of annealing on magnetoimpedance of Co68Fe4Zr10Cu2B16 ribbons

Magnetoimpedance (MI) in Co₆₈Fe₄Zr₁₀Cu₂B₁₆ alloy has been investigated in the frequency range 500 kHz–5 MHz and with the application of external steady magnetic field in the longitudinal direction, up to 100 Oe. MI measurements were carried out on as-cast ribbons and also on conventionally annealed and Joule-annealed ribbons. In as cast ribbons, the maximum MI observed is 13% at a frequency of 500 kHz and it decreases to 5% and 4% with conventional annealing at 100 °C and 150 °C, respectively. On the other hand, MI decreases to 8% and 6% with Joule annealing employing currents of 100 mA and 200 mA, respectively. However, Joule annealing with the application of a magnetic field of 5–10 Oe in the transverse direction causes the MI to decrease to 12% and 11% for currents of 100 mA and 200 mA, respectively. In the as-cast ribbons, double peak behavior is observed in all the frequencies whereas, in the annealed ribbons, double peak behavior in general is observed only at high frequencies.     

Crystallization of hydrogenated amorphous silicon carbon films with laser and thermal annealing

The crystallization of silicon rich hydrogenated amorphous silicon carbon films prepared by Plasma Enhanced Chemical Vapor Deposition technique has been induced by excimer laser annealing as well as thermal annealing. The excimer laser energy density (E_d) and the annealing temperature were varied from 123 to 242 mJ/cm² and from 250 to 1200 °C respectively. The effects of the two crystallization processes on the structural properties and bonding configurations of the films have been studied. The main results are that for the laser annealed samples, cubic SiC crystallites are formed for E_d ≥ 188 mJ/cm², while for the thermal annealed samples, micro-crystallites SiC and polycrystalline hexagonal SiC are observed for the annealing temperature of 800 and 1200 °C respectively. The crystallinity degree has been found to improve with the increase in the laser energy density as well as with the increase in the annealing temperature.     

Quantum annealing by ferromagnetic interaction with the mean-field scheme

Quantum annealing is a novel method for combinatorial optimization problems. In this paper, we discuss the appropriate choice of quantum fluctuations in quantum annealing. The existence of room of choices of quantum fluctuations is an advantage of quantum annealing over simulated annealing. We consider the ferromagnetic interaction as a source of quantum fluctuations. Using the mean-field annealing scheme, we show that quantum annealing by ferromagnetic interaction is more efficient than the conventional quantum annealing and simulated annealing in the ground state search of the random-field Ising model.     

Nonstationary Markov chains and convergence of the annealing algorithm

We study the asymptotic behavior as timet + of certain nonstationary Markov chains, and prove the convergence of the annealing algorithm in Monte Carlo simulations. We find that in the limitt + , a nonstationary Markov chain may exhibit phase transitions. Nonstationary Markov chains in general, and the annealing algorithm in particular, lead to biased estimators for the expectation values of the process. We compute the leading terms in the bias and the variance of the sample-means estimator. We find that the annealing algorithm converges if the temperatureT(t) goes to zero no faster thanC/log(t/t ₀) ast+, with a computable constantC andt ₀ the initial time. The bias and the variance of the sample-means estimator in the annealing algorithm go to zero likeO(t^–1+) for some 0<1, with =0 only in very special circumstances. Our results concerning the convergence of the annealing algorithm, and the rate of convergence to zero of the bias and the variance of the sample-means estimator, provide a rigorous procedure for choosing the optimal annealing schedule. This optimal choice reflects the competition between two physical effects: (a) The adiabatic effect, whereby if the temperature is loweredtoo abruptly the system may end up not in a ground state but in a nearby metastable state, and (b) the super-cooling effect, whereby if the temperature is loweredtoo slowly the system will indeed approach the ground state(s) but may do so extremely slowly.     

不同退火方式对Ni/SiC接触界面性质的影响

采用快速热退火(rapid thermal annealing, RTA)法和脉冲激光辐照退火(laser spark annealing, LSA)法, 在n型4H-SiC的Si面制备出Ni电极欧姆接触. 经传输线法测得RTA样品与LSA样品的比接触电阻分别为5.2×10^-4 Ω·cm², 1.8× 10^-4 Ω·cm². 使用扫描电子显微镜、原子力显微镜、透射电子显微镜、拉曼光谱等表征手段, 比较了两种退火方式对电极表面形貌、电极/衬底截面形貌和元素成分分布、SiC衬底近表层碳团簇微结构的影响. 结果表明, 相比于RTA, LSA法制备出的欧姆接触在电极表面形貌、界面形貌、电极层组分均匀性等方面都具有明显优势, 有望使LSA成为一种非常有潜力的制备欧姆接触的退火处理方法.     

电解有机溶液法在Si表面制备类金刚石薄膜及退火对其结构的影响

在对不同有机溶剂分子结构分析的基础上,选取甲醇、DMF(N,N-二甲基甲酰胺)和乙腈溶液为碳源,以脉冲直流电源电解有机溶液的方法在Si片上制得了含氢类金刚石薄膜(DLC薄膜),并研究了退火对薄膜结构的影响.通过X射线光电子能谱(XPS),喇曼(Raman)和红外(IR)光谱对薄膜的结构进行了分析表征.XPS表明薄膜的主要成分为C,喇曼光谱显示所得薄膜为典型DLC薄膜.喇曼和红外光谱还表明,膜中含有大量H并且主要键合于sp³碳处.随着退火的进行薄膜中的H被去除.随温度升高薄膜电阻率的下 关键词： 类金刚石薄膜 退火     

Sequence alignment using simulated annealing

We apply simulated annealing to amino acid sequence alignment, a fundamental problem in bioinformatics, particularly relevant to evolution. Our goal was obtaining results comparable to those reached through dynamic programming algorithms, like the Needleman-Wunsch algorithm, as well as making a connection between physics and bioinformatics through a representative example.     

Critical approach distances and critical angles for channelling

The critical angles and critical approach distances, which determine the limits for the channelling of energetic ions, down open crystal directions are established by the methods of computer simulation and compared with simple analytical models. For non-vibrating rows or planes a good agreement between the two is obtained. The complicating effects of thermal vibrations can be accounted for by empirical formulae.