Si中Ge量子点的光致发光

生长温度500℃下，在Si（001）衬底上分子束外延自组织生长锗量子点．700℃退火20分钟后观察到其光致发光．原子力显微镜（AFM）和横截面试样透镜（XTEM）方法用于观察鼻子点的大小和密度．利用喇曼光谱观察不同温度退火引起的Ge与Si之间的互扩散．     

基于量子点的白光二极管的研究进展

量子点又称为纳米晶,是一种由Ⅱ-Ⅵ族或Ⅲ-Ⅴ族元素组成的纳米颗粒(粒径1～10nm),由于电子和空穴的量子限域效应,连续的能带结构变成分立的能级结构,受激后可以发射荧光。量子点的发光光谱可以通过量子点的粒径大小来调节。文章基于量子点的电致发光和光致发光的机理,主要介绍了近年来基于量子点的白光发光二极管的研究进展。     

SiO2膜的薄层化对自组织生长Si纳米量子点发光特性的影响

采用低压化学气相沉积方法,依靠纯SiH4气体的热分解反应,在SiO2表面上自组织生长了Si纳米量子点.实验研究了SiO2膜的薄层化对Si纳米量子点光致发光特性的影响.结果表明,当SiO2膜厚度减薄至6nm以下时,Si纳米量子点中的光生载流子会量子隧穿超薄SiO2层,并逃逸到单晶Si衬底中去,从而减少了光生载流子通过SiO2/Si纳米量子点界面区域内发光中心的辐射复合效率,致使光致发光强度明显减弱.测试温度的变化对Si纳米量子点光致发光特性的影响,则源自于光生载流子通过SiO2/Si纳米量子点界面区域附近非发光中心的非辐射复合所产生的贡献.     

SiO2膜的薄层化对自组织生长Si纳米量子点发光特性的影响

采用低压化学气相沉积方法,依靠纯SiH4气体的热分解反应,在SiO2表面上自组织生长了Si纳米量子点.实验研究了SiO2膜的薄层化对Si纳米量子点光致发光特性的影响.结果表明,当SiO2膜厚度减薄至6nm以下时,Si纳米量子点中的光生载流子会量子隧穿超薄SiO2层,并逃逸到单晶Si衬底中去,从而减少了光生载流子通过SiO2/Si纳米量子点界面区域内发光中心的辐射复合效率,致使光致发光强度明显减弱.测试温度的变化对Si纳米量子点光致发光特性的影响,则源自于光生载流子通过SiO2/Si纳米量子点界面区域附近非发光中心的非辐射复合所产生的贡献.     

面向量子点电致发光二极管的蓝光InP和ZnSe量子点研究现状

作为传统显示器强有力的竞争者之一,量子点发光二极管（QLED）在显示领域备受关注。然而,高性能蓝光QLED器件的发光材料中通常含有镉或铅,这两类重金属有毒元素对人体健康和生态环境不利,也阻碍了QLED器件的规模化商用进程。因此,高质量无镉无铅型蓝光量子点材料的研发成为推动新型显示产业发展的动力和业界迫切追求的目标。历经数十年发展,InP和ZnSe等无镉无铅量子点材料的蓝光发射性能已取得较大进步,随着合成策略及蓝光材料的进一步优化改进,环境友好型蓝光量子点发光二极管器件性能有望追上传统红、绿光量子点器件的步伐。本文分别从合成优化手段、表面包覆策略、核壳结构类型、发光性能参数等方面进行汇总,系统综述了当前无镉无铅型蓝光InP和ZnSe量子点材料的研究进展,指出了QLED蓝光材料未来的发展方向。     

量子点发光二极管的研究进展北大核心CSCD

量子点材料因其独特的发光特性,在显示和固态照明领域具有极高的应用价值。相比于传统显示器件,量子点发光二极管(QLED)具有高的稳定性、良好溶液可加工性和高色彩饱和度等优势,因而其成为新一代显示技术的核心器件。介绍了QLED的构成、工作机理及研究进展,并指出了其在中国显示行业的应用现状与前景。     

氧化镁包埋的氧化锌量子点的制备和光致发光特性研究

介绍了一种简单的方法实现了氧化镁包埋氧化锌量子点,并研究了包埋氧化镁中的氧化锌量子点的形成和光致发光特性.在样品制备过程中,我们利用电子束蒸发氧化镁晶体和热蒸发金属锌同时进行的方法将金属锌包埋到氧化镁薄膜中,然后在不同的温度下(500、600、700、800、900、1000°C)将金属锌在氧气氛中氧化,从而实现利用氧化镁包埋氧化锌量子点的目的.(PH13)     

量子点的形成对Si/Ge界面互扩散的影响

在Si(100)衬底上低温生长了一层完全应变的Ge层,高温退火形成量子点.我们用喇曼光谱研究了量子点形成时Si/Ge界面的互扩散现象,实验表明量子点的形成伴随着Si/Ge原子之间的互扩散,通常在Si衬底上形成的是SiGe合金量子点,而不是纯Ge量子点.     

量子点的形成对Si/Ge界面互扩散的影响

在Si(100)衬底上低温生长了一层完全应变的Ge层,高温退火形成量子点.我们用喇曼光谱研究了量子点形成时Si/Ge界面的互扩散现象,实验表明量子点的形成伴随着Si/Ge原子之间的互扩散,通常在Si衬底上形成的是SiGe合金量子点,而不是纯Ge量子点.     

量子点电视技术浅析

本文分析了WLED电视的技术缺点和量子点电视的技术优越性。传统的WLED电视大多采用“蓝光LED＋黄色荧光粉”的发光模式,虽可让人感觉到白光,不过缺乏红光和绿光使得混色较为困难,是导致色域覆盖率偏低和背光转换效率不高的原因。近年来,随着量子点发光技术的成熟及其在液晶背光中的应用,量子点电视应运而生,性能十分优越。与传统WLED电视比较,量子点电视的色域和能效更高,所以其画面色彩更自然亮丽,并且兼顾节能环保。     

II-VI族半导体量子点的发光特性及其应用研究进展

半导体量子点由于具有独特的发光特性而具有极高的应用价值。结合本实验室的工作介绍了半导体量子点的发光原理和发光特性，在实验中发现核壳结构的CdSe／CdS半导体量子点比没有包覆的CdSe半导体量子点的发光稳定性提高．吸收光谱和发射光谱均发生红移，而且粒径不同．半导体量子点所呈现的颜色也不同，随着粒径的增加吸收光谱和发射光谱向长波方向红移。介绍了半导体量子点在光电子器件和生物医学方面的应用．并对其发展前景进行了展望。     

纳米硅量子点/氮化硅三明治结构的电致发光

采用等离子体化学气相沉积技术制备了两种不同非晶硅层厚度的氮化硅/氢化非晶硅/氮化硅三明治结构,研究了不同能量激光退火对薄膜晶化的影响。通过拉曼分析,发现在激光能量为320mJ时,样品开始晶化,随着能量的提高晶化程度增加,在340mJ时达到最大。根据拉曼晶化峰的偏移,计算得出硅量子点尺寸为2.8nm和4.7nm,表明三明治结构对形成的硅量子点的尺寸具有限制作用。设计并制备了基于该结构的电致发光器件,在偏压大于10V时,在室温下可观测到电致发光。发现不同激光能量下晶化后的样品的电致发光强度不同,发光峰位在680nm和720nm附近。分析表明电致发光来源可以归结为电子空穴对在硅量子点中的辐射复合发光。     

Phase Transition Induced Thermal Reversible Luminescent of Perovskite Quantum Dots Fibers

Converting and patterning high-quality perovskite quantum dots (PQDs) into flexible thin films is of great significance for high-performance solid-state optical applications. However, the poor stability and low quantum efficiency of PQDs after film formation is a big challenge hindering their usability. Here, an in situ synthesis strategy to prepare ligand-free long-term stable CsPb(Br_0.3I_0.7)₃@poly(methylmethacrylate) (PMMA) PQDs fibers with thermal responsive fluorescence performance is demonstrated. The luminescence of the CsPb(Br_0.3I_0.7)₃@PMMA PQDs fibers can rapidly and reversibly quench and recover between heating and cooling cycles. It reveals that the thermally induced phase transition of CsPb(Br_0.3I_0.7)₃ results in this thermally reversible luminescence phenomenon. This temperature-reversible luminescence characteristic not only deepens the comprehension of the temperature-dependent phase transition behavior of perovskite materials but also broadens their applications in the fields of information encryption storage, anti-counterfeiting, temperature warning, and other temperature-responsive fields.     

锗硅双层量子点的光电流特性

在分子束外延 (MBE)系统上用自组织方式生长了硅基双层锗量子点结构 ,并对样品进行光电流谱的测试。通过调节不同外加偏压来改变量子点中的费米能级位置 ,量子点中载流子所处束缚能级将随之发生变化 ,所得到的光电流谱的峰位也将因此而改变。由光电流谱得到的实验结果与常规的光致发光谱的结果相吻合。与单层锗量子点结构相比 ,双层结构的样品在光电特性上有着明显不同 :光电流谱中 ,在 0 .767e V及 0 .869e V处出现了两个峰 ,分别对应于载流子在不同的量子点层中的吸收。用这种结构的样品制成的红外光探测器能够同时对两种不同波长的光进行探测响应     

多层InAs量子点的光致发光研究

采用MBE设备生长了多层InAs/GaAs量子点结构,测量了其变温光致发光谱和时间分辨光致发光谱.结果表明多层量子点结构有利于减小发光峰的半高宽,并且可以提高发光峰半高宽和发光寿命的温度稳定性.实验发现,加InGaAs盖层后,量子点发光峰的半高宽进一步减小,最小达到23.6 meV,并且发光峰出现红移.原因可能在于InGaAs盖层减小了InAs岛所受的应力,阻止了In组分的偏析,提高了InAs量子点尺寸分布的均匀性和质量,导致载流子在不同量子点中的迁移效应减弱.     

Luminescent Colloidal Dispersion of Silicon Quantum Dots from Microwave Plasma Synthesis: Exploring the Photoluminescence Behavior Across the Visible Spectrum

Aiming for a more practical route to highly stable visible photoluminescence (PL) from silicon, a novel approach to produce luminescent silicon nanoparticles (Si‐NPs) is developed. Single crystalline Si‐NPs are synthesized by pyrolysis of silane (SiH₄) in a microwave plasma reactor at very high production rates (0.1–10 g h^?1). The emission wavelength of the Si‐NPs is controlled by etching them in a mixture of hydrofluoric acid and nitric acid. Emission across the entire visible spectrum is obtained by varying the etching time. It is observed that the air oxidation of the etched Si‐NPs profoundly affects their optical properties, and causes their emission to blue‐shift and diminish in intensity with time. Modification of the silicon surface by UV‐induced hydrosilylation also causes a shift in the spectrum. The nature of the shift (red/blue) is dependent on the emission wavelength of the etched Si‐NPs. In addition, the amount of shift depends on the type of organic ligand on the silicon surface and the UV exposure time. The surface modification of Si‐NPs with different alkenes results in highly stable PL and allows their dispersion in a variety of organic solvents. This method of producing macroscopic quantities of Si‐NPs with very high PL stability opens new avenues to applications of silicon quantum dots in optoelectronic and biological fields, and paves the way towards their commercialization.     

InGaAs/GaAs量子阱中自组装InAs量子点的光学性质

在InGaAs/GaAs量子阱中生长了两组InAs量子点样品,用扫描电子显微镜(SEM)测量发现,量子点呈棱状结构,而不是通常的金字塔结构,这是由多层结构的应力传递及InGaAs应变层的各向异性引起的.采用变温光致发光谱(TDPL)和时间分辨谱(TRPL)研究了其光致发光稳态和瞬态特性.研究发现,InGaAs量子阱层可以有效地缓冲InAs量子点中的应变,提高量子点的生长质量,可以在室温下探测到较强的发光峰.在量子阱中生长量子点可以获得室温下1 318 nm的发光,并且使其PL谱的半高宽减小到25 meV.     

Evidence for Edge‐State Photoluminescence in Graphene Quantum Dots

For a practical realization of graphene‐based logic devices, the opening of a band gap in graphene is crucial and has proven challenging. To this end, several synthesis techniques, including unzipping of carbon nanotubes, chemical vapor deposition, and other bottom‐up fabrication techniques have been pursued for the bulk production of graphene nanoribbons (GNRs) and graphene quantum dots (GQDs). However, only limited progress has been made towards a fundamental understanding of the origin of strong photoluminescence (PL) in GQDs. Here, it is experimentally shown that the PL is independent of the functionalization scheme of the GQDs. Following a series of annealing experiments designed to passivate the free edges, the PL in GQDs originates from edge‐states, and an edge‐passivation subsequent to synthesis quenches the PL. The results of PL studies of GNRs and carbon nano‐onions are shown to be consistent with PL being generated at the edge sites of GQDs.     

Highly Luminescent ZnO Quantum Dots Made in a Nonthermal Plasma

Nonthermal plasmas allow the preparation of ligand‐free quantum dots combining high production rates with superior crystalline quality and luminescence properties. Here, ZnO quantum dots are produced in a radiofrequency capacitively‐coupled plasma, exhibiting size dependent photoluminescent quantum yields up to 60% after air exposure—the highest reported to date for any compound semiconductor quantum dots prepared in the gas phase. Systematic studies indicate the importance of the surface for the observed luminescence behavior. The high luminescent quantum yields in the visible range of the spectrum and the ligand‐free, scalable synthesis make these quantum dots good candidates for light emitting applications.     

Resonant Tunneling through Monolayer Si Colloidal Quantum Dots and Ge Nanocrystals

Resonant tunneling through a 4 nm nanocrystal Ge (nc‐Ge) layer and a 2.4 nm monolayer of Si colloidal quantum dots (QD) is achieved with 0.7 nm amorphous Al₂O₃ (a‐Al₂O₃) barriers. The nc‐Ge resonant tunneling diode (RTD) demonstrates a peak‐to‐valley current ratio (PVCR) of 8 and a full width at half maximum (FWHM) of 30 mV at 300 K, the best performance among RTDs based on annealed nanocrystals. The Si QD RTD is first achieved with PVCRs up to 47 and FWHMs as small as 10 mV at room temperature, confirming theoretically expected excellences of 3D carrier confinements. The high performances are partially due to the smooth profile of nc‐Ge layer and the uniform distribution of Si QDs, which reduce the adverse influences of many‐body effects. More importantly, carrier decoherence is avoided in the 0.7 nm a‐Al₂O₃ barriers thinner than the phase coherence length (≈1.5 nm). Ultrathin a‐Al₂O₃ also passivates well materials and suppresses leakage currents. Additionally, the interfacial bandgap of ultrathin a‐Al₂O₃ is found to be similar to the bulk, forming deep potential wells to sharpen transmission curves. This work can be easily extended to other materials, which may enable resonant tunneling in various nanosystems for diverse purposes.