An ab initio study of SiH2 fragments on the Si(001) surface

Density functional theory calculations have been performed to find the minimum energy adsorption configuration for SiH₂ on the Si(001) surface. Of the four sites considered, the two most stable are found to differ in adsorption energy by less than 0.01 eV. The energy of a second adsorption event on an adjacent site has been evaluated for the two favourable structures; in one case a strong repulsive interaction is found between the adsorbates, effectively preventing this structure from contributing to the growth mechanism. Recent experimental studies are assessed in the light of these results.     

Stress modifications induced by dimer vacancies in the Si(0 0 1) surface: Monte Carlo simulations

By means of Monte Carlo simulations, we investigate the local stress modifications induced by dimer vacancies (DVs) in the Si(0 0 1) subsurface layers. In presence of n isolated compact DVs, the sites located below these defect rows are under clearly compressive stress in the third layer and under more and more tensile stress, as n increases, in the fourth layer. At higher DVs densities, analogous trends are observed, but the stress modifications are then slightly extended between the dimer rows. Applying our results to the Ge penetration in Si(0 0 1), we show how the knowledge of the local stress may allow predictions of a given impurity behaviour in the vicinity of the surface, provided that the impurity-defect and impurity-impurity interactions do not play a major role compared to the local stress modification induced by the presence of DVs.     

Defect-induced dimer pinning on the Si(0 0 1) surface

Room-temperature STM images frequently show regions of antisymmetric dimer ordering surrounding certain types of defect on the Si(0 0 1) surface. While it has been generally believed that any defect asymmetric with respect to the dimer row would induce this dimer pinning effect, recent experimental results have shown that this is not the case. We present a model, based on a nearest-neighbour Ising treatment of the surface, which allows the extent of pinning caused by a dimer to be predicted from ab initio calculations. We use this model to predict the pinning extent for three phosphorus-containing structures important in a proposed silicon-based quantum computer fabrication scheme, and identify one of these asymmetric features as causing no appreciable pinning. In addition, we use ab initio calculations to identify the effects governing the interaction between neighbouring dimers.     

Surface electromigration of metals on Si(001): In/Si(001)

The possibility of surface electromigration (SE) of metals of In, Ga, Sb and Ag on a very flat Si(001)2×1 substrate (single domain 2×1) was examined by SEM, μ-RHEED and μ-AES under UHV conditions. It was found that Ga, Sb and Ag show no SE on Si(001) surface even at DC annealing temperatures for the desorption of these metals. For In on Si(001), a very fast SE (8000 μm/min) towards the cathode side was found that suddenly sets in at 450°C DC annealing, which was related to a surface phase transition. μ-RHEED and μ-AES observation showed that the SE is related to an ordered 4×3-In phase together with two-dimensional In gas phase over the 4×3-In phase and an In-disordered phase at the front end of SE. Single domain 4×3-In phases were found to occur under sequences of In deposition and DC annealing which involve the In SE on Si(001).     

Towards quantitative understanding of formation and stability of Ge hut islands on Si(001)

We analyze Ge hut island formation on Si(001), using first-principles calculations of energies, stresses, and their strain dependence of Ge/Si(105) and Ge/Si(001) surfaces combined with continuum modeling. We give a quantitative assessment on strain stabilization of Ge(105) facets, estimate the critical size for hut nucleation or formation, and evaluate the magnitude of surface stress discontinuity at the island's edge and its effect on island stability.     

Adsorption of N@C60 on Si(1 0 0)

The interactions between endohedrally doped N@C₆₀ molecules and the Si(1 0 0) surface have been explored via ab initio total energy calculations. Configurations which have the cage located upon the dimer row bonded to two dimers (r2) and within the dimer trench bonded to four dimers (t4) have been investigated, as these have previously been found to be the most stable for the C₆₀ molecule. We have investigated the differences between the adsorption of the C₆₀ and N@C₆₀ molecules upon the Si(1 0 0) surface and found that there are only minimal differences. Two interesting cases are the r2g and t4d configurations, as they both exhibit differences that are not present in the other configurations. These subtle differences have been explored in-depth. It is shown that the effects on the endohedral nitrogen atom, due to its placement within the fullerene cage, are small. Bader analysis has been used to explore differences between the C₆₀ and N@C₆₀ molecules.     

First-principles study of indium on silicon (1 0 0)—the structure, defects and interdiffusion

The atomic structures of indium (In) on silicon (Si) (1 0 0)-(2 × 1) surface are investigated by the local density approximation using first-principles pseudopotentials. Total energy optimizations show that the energetically favored structure is the parallel ad-dimer model. The adsorption energy of In on ideal Si(1 0 0)-(1 × 1) surface is significantly higher than that on reconstructed Si(1 0 0)-(2 × 1) surface, suggesting that In adsorption does not break the Si-Si dimer bond of the substrate. When Si surface contains single dimer vacancy defects, In chain will be interrupted, leading to disconnected In nanowires. Displacive adsorption of In on Si(1 0 0) is also considered, and the calculation suggests that interdiffusion of In into Si substrate will not be favorable under equilibrium conditions.     

The effect of controlled ion bombardment on the electronic structure of the Si(0 0 1) surface

We have studied the effects of controlled ion bombardment on the electronic structure of the Si(0 0 1) surface. The surface was exposed to various doses of Ar⁺ ions accelerated towards the surface at 500 eV. X-ray photoelectron spectroscopy (XPS) spectra of the irradiated H-terminated Si(0 0 1) surface reveal the appearance of peaks that are associated with the presence of cleaved Si bonds. Ultraviolet photoelectron spectroscopy (UPS) spectra of the irradiated Si(0 0 1)2 × 1 surface show that the dimer dangling-bond surface state decays monotonically with increasing dose. These results, coupled with previous scanning tunneling microscopy (STM) studies, indicate that the breaking of dimers, and possibly the creation of adatom-like defects, during ion irradiation are responsible for the changes in the electronic structure of the valence band for this surface.     

Point defects along metallic atomic wires on vicinal Si surfaces: Si(5 5 7)–Au and Si(5 5 3)–Au

Point defects on the metallic atomic wires induced by Au adsorbates on vicinal Si surfaces were investigated using scanning tunneling microscopy and spectroscopy (STM and STS). High-resolution STM images revealed that there exist several different types of defects on the Si(5 5 7)–Au surface, which are categorized by their apparent bias-dependent images and compared to the previous report on Si(5 5 3)–Au [Phys. Rev. B (2007) 205325]. The chemical characteristics of these defects were investigated by monitoring them upon the variation of the Au coverage and the adsorption of water molecules. The chemical origins and the tentative atomic structures of the defects are suggested as Si adatoms (and dimers) in different registries, the Au deficiency on terraces, and water molecules adsorbed dissociatively on step edges, respectively. STS measurements disclosed the electronic property of the majority kinds of defects on both Si(5 5 7)–Au and Si(5 5 3)–Au surfaces. In particular, the dominating water-induced defects on both surfaces induce a substantial band gap of about 0.5 eV in clear contrast to Si adatom-type defects. The conduction channels along the metallic step-edge chains thus must be very susceptible to the contamination through the electronic termination by the water adsorption.     

Barrierless formation and faceting of SiGe islands on Si(001)

The initial stages of the formation of SiGe islands on Si(001) pose a long-standing puzzle. We show that the behavior can be consistently explained by one simple assumption-that for strained SiGe, (001) is a stable orientation but not a facet orientation. Calculations of energy and morphology reproduce the key features of "prepyramid" and "pyramid" islands, and explain the initial formation and subsequent shape transition. Scanning tunneling microscopy measurements confirm the key assumptions and predictions of the model.     

Hydrogen related point defects in silicon based layers: Si(·)H and SiOOH

Layers prepared by pulsed TEA CO₂ pulsed laser ablation (PLA) of SiO and SiO₂ targets in helium were exposed to hydrogen and deuterium atmosphere up to several kPa. The deposited layers were investigated by FTIR, EPR and XP spectroscopy. Among various Si species silyl radical Si(·)H (Si(·)D) at 2166 (1568) cm⁻¹—H(I) center—and silyl hydroperoxide SiOOH (SiOOD) at 3587 (2648) cm⁻¹ were identified in FTIR spectra. Chemical pathways for production of these species are discussed. Experimental results are supported by quantum chemical calculations.     

Long-range structures on the dihydride Si(001) surface

From several large supercell MD simulations with an empirical tight-binding method, we have found the long-range structure on the dihydride Si(001) surface. This structure can be viewed as the well-known canted phase with domain walls. The formation energy of a single domain wall on the surface is estimated to be 1.3–1.5 eV.     

Computer simulations of the effect of atomic structure and coordination on the stabilities and melting behaviour of copper surfaces and nano-particles

We have studied the structures and stabilities of copper nano-particles and the melting properties of copper surfaces using interatomic potential-based molecular dynamics simulations, where the (1 1 1) surface has been shown to be the most stable in terms of surface energy and melting behaviour. Low energy shapes of nano-particles are influenced by the surfaces present and therefore have a higher proportion of (1 1 1) surface. The effect of surface structure on stability becomes less marked as the size of the nano-particle is increased. Melting is observed to occur below the bulk melting temperature in all the surfaces investigated, at increasingly lower temperatures from the (1 1 1), (1 0 0), (1 1 0) down to the (2 1 0) surface, confirming their order of decreasing stability. The melting processes of defective close-packed copper surfaces were also simulated. Steps, kinks, and facets were all shown to accelerate the melting of the surfaces. The melting is shown to initiate at the site of the defect and the results demonstrate that it is the low-coordinated atoms, at the step edge or kink, that are more mobile at lower temperatures. These features facilitate surface melting even further below the melting temperature than was observed for the perfect surfaces. Furthermore, facets of (1 0 0) surface were shown to be unstable even at moderate temperatures on the close-packed surface.     

Submonolayer Au on Si(111) phase diagram

Based on a review of the current literature, a surface phase diagram is proposed for the submonolayer Au on Si(111) system. Kinetic considerations are reviewed and key surface phase diagram features such as the Θ < 0.4 ML metastable structure and the high temperature to Si(111)-(1 × 1)Au second order phase transition are discussed. Experiments to verify certain portions of the phase diagram are proposed.     

Selforganized nanopatterning of Si(0 0 1)

The (2 × n) superstructure of Si(0 0 1) consists of elongated (2 × 1) reconstructed stripes separated by a dimer-vacancy line every few nanometers, thus offering a means to obtain a nanopattered Si(0 0 1) surface. Scanning tunneling microscopy (STM) investigations of Si(0 0 1) substrates that were deoxidized at 880-920 °C reveal that the formation of the (2 × n) depends strongly on the Si coverage of the topmost surface layer. It forms only in a narrow coverage window ranging from 0.6 to 0.8 ML. Systematic Monte Carlo simulations by an algorithm that combines the diffusion of monomers and dimers with the simultaneous deposition of Si onto the Si(0 0 1) surface, corroborate the STM results and suggest Si deposition as a viable alternative for introducing dimer vacancies in a well-defined manner.     

In situ atomic force microscopic observation of growth of islands of organic contaminants on an H–Si(1 1 1) surface

Atomic force microscopic (AFM) images of an H–Si(1 1 1) surface having the atomically flat structure were measured in a normal laboratory atmosphere. By monitoring time series changes in the AFM images, we found that islands grow on the surface. A comparison of the growth of islands with changes in Fourier-transfer IR (FTIR) spectra showed that the islands are formed by organic contaminants adsorbed from the air in the laboratory. Starting chiefly from the step sites, the islands extend to cover the whole surface in about 2 h. Following the adsorption of the organic contaminants, oxidation of the Si surface proceeds gradually. Although the growth rate was slightly slower, similar growth of islands was observed in a plastic bag filled with nitrogen gas with high purity.     

Interior barriers and dimer nucleation on islands

On (1 1 1) islands of platinum as well as iridium self-adsorbed on (1 1 1) planes, it is now established that there are interior barriers impeding the movement of adatoms from the inner region to the steps of the island. We have carried out Monte Carlo simulations of adatoms migrating on such islands to establish the effect of interior barriers on the rate at which adsorbed atoms nucleate to form dimers rather than incorporate into the steps of the island. It is found that interior barriers significantly increase the rate at which dimers are created by collisions of two adatoms, and that the presence of additional step-edge barriers further raises the rate of dimer nucleation.     

Formation mechanism of one-dimensional Si islands on a H/Si(001) surface

The formation mechanism of one-dimensional Si islands on a H/Si(001)-(2x1) surface is studied using scanning tunneling microscopy/spectroscopy and first-principles calculations. We observed that one-dimensional islands that are made from dimer chains are formed at the initial growth stages similar to the bare Si(001) surface. It is found that the number of odd-numbered dimer chains is larger than that of even-numbered dimer chains. We propose the growth processes of the two types of growth edges to explain the observation.