利用硅光电池测量硅单晶半导体材料的禁带宽度

以白炽灯为光源照射单晶硅光电池,测量在硅光电池前加不同截止波长的滤色片时的短路电流.通过短路电流和截止波长的关系,经拟合得到单晶硅材料的长波限,再利用半导体材料的长波限与半导体的禁带宽度Eg的关系,即Eg=hc/λ,计算得出其禁带宽度.     

Experimental evidence of the vacancy-mediated silicon self-diffusion in single-crystalline silicon

We have determined silicon self-diffusivity at temperatures 735-875 degrees C based on the Raman shift of longitudinal optical phonon frequencies of diffusion annealed 28Si/30Si isotope superlattices. The activation enthalpy of 3.6 eV is obtained in such low temperature diffusion annealing. This value is significantly smaller than the previously reported 4.95 eV of the self-interstitial mechanism dominating the high temperature region T>855 degrees C and is in good agreement with the theoretical prediction for the vacancy-mediated diffusion. We present a model, containing both the self-interstitial and the vacancy terms, that quantitatively describes the experimentally obtained self-diffusivity between 735 and 1388 degrees C, with the clear crossover of the two diffusion mechanisms occurring around 900 degrees C.     

On the morphological instability of silicon/silicon dioxide nanowires

Silicon–silicon dioxide core-shell nanowires grown on gold-coated silicon wafers by thermal evaporation of silicon monoxide sometimes show an oscillation in diameter. The two possible causes for this behaviour are a self-oscillation process during the growth or the so-called Rayleigh instability. By analyzing the thickness distribution of the nanowires, we will show that a self-oscillation process is responsible for the periodic instability during growth. In contrast, during post-growth etching and oxidation the nanowires can develop Rayleigh instabilities, leading to silicon nanocrystals embedded in silicon dioxide nanowire. PACS 61.46.+w; 81.10.-h; 81.40.-z     

Resonance effects in the non-radiative de-excitation of silicon in porous silicon

Resonant silicon Auger KLL and 2s and 2p photoemission spectra of a porous silicon sample have been studied when excited by photons in the energy domain of the 1s edge in pure silicon and silicon oxide. Characteristic features of a resonant process could be detected. In particular, the constant initial state spectrum of the 2p state of silica behaves similarly to that encountered in systems which present a well-defined atomic level. This is due to the existence of a well-localized molecular orbital built in the SiO₄ unit. The use of high-energy photons, which generate high-energy electrons, allows these photoemission experiments to be quite bulk sensitive.     

氮化硅薄膜中硅纳米颗粒的形成机制研究

采用等离子体增强化学气相沉积技术,以SiH₄作为硅源, NH₃和N₂共同作为氮源,在单晶硅衬底上制备了不同的氮化硅薄膜. X射线衍射分析薄膜晶体结构,通过计算晶格尺寸大小证明了纳米硅颗粒的存在. 傅里叶变换红外光谱分析了薄膜中的键合作用的变化并结合化学反应过程对氮化硅薄膜中纳米硅颗粒的形成机制进行了研究,发现Si—Si键作为硅纳米颗粒的初始位置, 当反应朝着生成Si—Si的方向进行时,可以促进氮化硅薄膜中硅纳米颗粒的形成. X射线衍射分析和光致发光实验结果表明Si—Si键浓度增大时, 所形成的纳米硅颗粒的尺寸和浓度都随之增大.     

Boron implanted in silicon: Segregation at angular configurations of the silicon/silicon dioxide oxidation boundary

Based on computer simulation of the physicochemical segregation processes involving dopants implanted into a host material (silicon), the details of boron injection were investigated for four types of angular configurations (direct and inverse kinks and cavities of the “trench” and “square” types) of the “silicon/silicon dioxide” oxidation boundary. A complicated picture of the B distribution inside the Si and SiO₂ regions and at the SiO₂/Si front was obtained and analyzed in general terms.     

Phase equilibrium in the formation of silicon carbide by topochemical conversion of silicon

Methods of linear algebra were used to find a basis of independent chemical reactions in the topochemical conversion of silicon into silicon carbide by the reaction with carbon monoxide. The pressure–flow phase diagram was calculated from this basis, describing the composition of the solid phase for a particular design of vacuum furnace. It was demonstrated that to grow pure silicon carbide, it is necessary to ensure the pressure of carbon monoxide less than a certain value and its flow more than a certain value, depending on the temperature of the process. The elastic fields around vacancies formed were considered for the first time in calculating the topochemical reaction. It was shown that the anisotropy of these fields in a cubic crystal increases the constant of the main reaction approximately fourfold.     

Pulsed CO2 laser-driven production of ultrafine silicon,silicon carbide,silicon nitride and silicon oxynitride powders

Summary Ultrafine Si, Si₃N₄, SiC and silicon oxynitride powders have been produced by irradiating gas-phase reactants by means of a CO₂ laser. The mechanism of SiH₄ CO₂ laser-induced absorption and dissociation is discussed on the basis of the results of the spectral and time-resolved measurement of fragment chemiluminescence. The role played by the SiH₂ radical in the powder formation is investigated. The quality of Si, Si₃N₄, SiC and silicon oxynitride powders is checked by means of several off-line diagnostics (IR spectroscopy, X-ray diffraction at wide and small angle, BET analysis). The possibility of controlling powder stoichiometry and doping from the gas-phase reactant concentration is discussed.     

Radiation enhanced silicon self-diffusion and the silicon vacancy at high temperatures

We report proton radiation enhanced self-diffusion (RESD) studies on Si-isotope heterostructures. Self-diffusion experiments under irradiation were performed at temperatures between 780 degrees C and 872 degrees C for various times and proton fluxes. Detailed modeling of RESD provides direct evidence that vacancies at high temperatures diffuse with a migration enthalpy of H(m)(V)=(1.8+/-0.5) eV significantly more slowly than expected from their diffusion at low temperatures, which is described by H(m)(V)<0.5 eV. We conclude that this diffusion behavior is a consequence of the microscopic configuration of the vacancy whose entropy and enthalpy of migration increase with increasing temperature.     

Metastability of amorphous silicon from silicon network rebonding

We propose a network rebonding model for light-induced metastability in amorphous silicon, involving bonding rearrangements of silicon and hydrogen atoms. Nonradiative recombination breaks weak silicon bonds and generates dangling bond-floating bond pairs, with very low activation energies. The transient floating bonds annihilate, generating local hydrogen motion. Charged defects are also found. Support for these processes is found with tight-binding molecular dynamics simulations. The model accounts for major experimental features of the Staebler-Wronski effect including electron-spin resonance data, the t(1/3) kinetics of defect formation, two types of metastable dangling bonds, and hysteretic annealing.     

Excimer-laser-induced micropatterning of silicon dioxide on silicon substrates

Highly resolved micropatterns induced on SiO₂-coated Si sample surfaces have been investigated using a KrF excimer laser (λ: 248 nm and τ: 23 ns). Uniform micropatterns were observed to form in the oxide layer after laser-induced melting of interfaces. The pattern size can be controlled either by the laser parameters or even by the oxide layer thickness. SEM analysis identified that the micropatterns were virtually initiated at the molten interface and the oxide layer followed the interface patterning to change its profile. Simulation of laser interaction with double-layered structures indicated that the oxide layer could melt or be ablated due to interface superheating when it was deposited on a highly absorbing Si substrate. IR analysis has demonstrated that the structural properties of the SiO₂ layer undergo no appreciable changes after laser radiation. This process provides a possible basis for its application in micropatterning of transparent materials using excimer lasers. Received: 4 September 2000 / Accepted: 13 September 2000 / Published online: 30 November 2000     

Mechanism of silicon epitaxy on porous silicon layers

The mechanism of silicon epitaxy on porous Si(111) layers is investigated by the Monte Carlo method. The Gilmer model of adatom diffusion extended to the case of arbitrary surface morphology is used. Vacancies and pendants of atoms are allowed in the generalized model, the activation energy of a diffusion hop depends on the state of the neighboring positions in the first and second coordination spheres, and neighbors located outside the growing elementary layer are also taken into account. It is shown that in this model epitaxy occurs by the formation of metastable nucleation centers at the edges of pores, followed by growth of the nucleation centers along the perimeter and the formation of a thin, continuous pendant layer. Three-dimensional images of surface layers at different stages of epitaxy were obtained. The dependence of the kinetics of the epitaxy process on the amount of deposited silicon is determined for different substrate porosities. Pis’ma Zh. éksp. Teor. Fiz. 67, No. 7, 512–517 (10 April 1998)     

The effect of X-rays on the electrophysical properties of silicon and silicon p-n junctions

Results are given on experiments on the effect of X-rays on the conductivity and concentration of charge carriers and their mobility in monocrystalline silicon with electron and hole conductivity.It is shown that changes in the parameters studied due to X-rays depend on the intensity of the irradiation and are similar in hole and in electron silicon.     

Study of the formation of silicon nanoclusters in silicon dioxide during electron beam irradiation

Irradiation of silicon dioxide by an electron beam with a high specific power leads to the formation of silicon nanocrystals in the irradiated region and the formation of a modified region, i.e., a Si-SiO₂ nano-composite. This work is devoted to studying the formation of this nanocomposite and of its luminescence properties.     

Hydrogenated silicon fullerenes: effects of H on the stability of metal-encapsulated silicon clusters

Ab initio calculations of H interaction on Si12M, Si18M2 (M=Cr, Mo, and W), and Zr@Si(16) fullerene (f) show relatively weak binding of H in agreement with experimental results of H free Si12M and Si18M2 clusters. Adsorption of H enhances sp(3) bonding between the Si atoms, weakens the M-Si cage interactions, and leads to distortions in the cages. Si12CrH12 has 4 mu(B) magnetic moment in contrast to zero for Si12Cr. Removal of the M atom leads to stable empty cages of Si12H12, f-Si16H16, and f-Si20H20 with large highest occupied-lowest unoccupied molecular orbital gaps of 2.5-3.0 eV, making them attractive for optoelectronic applications.     

IR spectra of carbon-vacancy clusters in the topochemical transformation of silicon into silicon carbide

Using infrared (IR) spectroscopy and spectral ellipsometry, we experimentally confirmed the previously predicted mechanochemical effect of the stoichiometric composition disorder leading to the formation of carbon-vacancy structures in silicon carbide (SiC) films grown on silicon substrates by the atom substitution method. It was found that a band at 960 cm^–1 in the IR spectra of SiC films on silicon, corresponding to “carbon-vacancy clusters” is always present in SiC films grown under pure carbon monoxide (CO) or in a mixture of CO with silane (SiH₄) on Si substrates of different orientation and doping level and type. There is no absorption band in the region of 960 cm–1 in the IR spectra of SiC films synthesized at the optimum ratio of the CO and trichlorosilane (SiHCl₃) gas pressures. The previously predicted mechanism of the chemical reaction of substitution of Si atoms for carbon by the interaction of gases CO and SiHCl₃ on the surface of the silicon substrate, which leads to the formation of epitaxial layers of single-crystal SiC, is experimentally confirmed.     

Influence of the temperature on the photoluminescence of silicon clusters embedded in a silicon oxide matrix

Amorphous silicon oxide thin films were prepared by co-evaporation of Si and SiO in ultra-high vacuum. Different compositions were obtained by changing the evaporation rate of silicon. After thermal annealing treatments, the dissociation of the silicon oxide in pure silicon and silicon dioxide leads to the formation of silicon clusters embedded in a silicon oxide matrix. Thus the samples were annealed to different temperatures up to 950°C. Depending on the annealing temperature and on the composition, different cluster sizes were obtained. The photoluminescence (PL) energy depends on the cluster size and a large range of wavelengths is obtained from 500 to 750 nm. The PL, attributed to a confinement effect of the electron–hole pairs in the silicon particles, is studied as a function of the temperature. It is demonstrated that the continuous decrease of PL intensity with the temperature from 77 to 500 K depends on the structure of the samples. For samples with well-separated clusters, the PL decreases rapidly with the temperature. For samples containing clusters separated by a small distance, the PL weakly depends on the temperature. No shift of the energy is observed. The results are discussed by taking into account the competition between the radiative recombination in the silicon clusters and the non-radiative escape of the carriers via a hopping mechanism.