氢原子吸附的Cu(100)表面原子结构和电子态

用密度泛函理论的总能计算研究了金属铜(100)面的表面原子结构以及在不同覆盖度时氢原子的吸附状态. 研究结果表明, 在Cu(100)c(2×2)/H表面体系中, 氢原子吸附的位置是在空洞位置, 距最外层Cu原子层的距离为0.052 nm, 相应的Cu—H键长为0.189 nm, 并通过计算结构参数优化否定了其它的吸附位置模型. 总能计算得出Cu(100)c(2×2)/H表面的功函数为4.47 eV, 氢原子在这一体系的吸附能为2.37 eV(以孤立氢原子为能量参考点). 通过与衬底原子的杂化, 氢原子形成了具有二维特征的氢能带结构, 在费米能级以下约0.8 eV处出现的表面局域态是Cu(S)-H-Cu(S-1)型杂化的结果. 采用Cu(100)表面p(1×1)、p(2×2)和p(3×3)的三种氢吸附结构分别模拟1, 1/4, 1/9的原子单层覆盖度, 计算结果表明, 随着覆盖度的增加, 被吸附的氢原子之间的距离变短, 使得它们之间的静电排斥和静电能增大, 从而导致表面吸附能和吸附H原子与最外层Cu原子间垂直距离(ZH-Cu)逐渐减小. 在较低的覆盖度下, 氢原子对Cu(100)表面的影响主要表现为单个原子吸附作用的形式. 通过总能计算还排除了Cu(100)表面(根号2×2根号2)R45°-2H缺列再构吸附模型的可能性.     

乙烷在Ni(111)表面的吸附和分解

研究了乙烷在Ni(111)表面解离的可能反应机理, 使用完全线性同步和二次同步变换(complete LST/QST)方法确定解离反应的过渡态. 采用基于第一性原理的密度泛函理论与周期平板模型相结合的方法, 优化了C2H6裂解反应过程中各物种在Ni(111)表面的top, fcc, hcp和bridge位的吸附模型, 计算了能量, 并对布居电荷进行分析, 得到了各物种的有利吸附位. 结果表明, 乙烷在Ni(111)表面C—C解离的速控步骤活化能为257.9 kJ·mol-1, 而C—H解离速控步骤活化能为159.8 kJ·mol-1, 故C—H键解离过程占优势, 主要产物是C2H4和H2.     

水分子在立方ZrO2（110）面吸附与解离的密度泛函理论研究

采用密度泛函理论巾的广义梯度近似(GGA)的PW91方法结合周期性平板模型,研究了H2O,OH和O在立方ZrO2(110)面上不同吸附位的吸附.结果表明,在bridge位H2O以垂直底物甲面氢原子向上模式吸附在立方ZrO2(110)而时发牛解离形成表面羟基,吸附能为150.5 kJ/mo1.而在top位H2O以垂直底物平面氢原子向下模式吸附为物理吸附,吸附能为14.8 kJ/mo1.OH和O在立方ZrO2(110)面的最佳吸附位是top位,其吸附能分别为241.5和209.1 kJ/mo1.同时分析了Mulliken布居、态密度和伸缩振动频率.     

CeO2表面分散态WO3的氨选择性催化还原性能

铈基材料在氨选择性催化还原氮氧化物(NH3-SCR)的研究中备受关注,亦被认为是潜在的新型环境友好型催化剂.CeO2具有独特的氧化还原性能和优良的储释氧性能,易与其它金属氧化物发生协同催化而有利于提高催化剂的催化反应性能,而WO3可以改善催化剂的表面酸性.研究亦报道了WO3可以改善CeO2的NH3-SCR反应的高温活性和N2选择性,其原因在于WO3增加了铈基催化剂NH3的吸附性能且抑制了NH3非选择性氧化成NOx.我们采用浸渍法制备了一系列负载型WO3/CeO2催化剂,并利用XRD,Raman,XPS,H2-TPR,NH3-TPD和in situ DRIFT对其理化性质进行了表征,系统研究了WO3负载量对WO3/CeO2催化剂NH3-SCR催化性能的影响,主要研究的内容包括:(1)WO3/CeO2催化剂中WO3的状态与催化性能之间的关系;(2)WO3负载量对WO3/CeO2催化剂的NH3和NO吸附行为的影响.NH3-SCR反应测试表明WO3负载量对WO3/CeO2催化剂有显著影响,优化的WO3/CeO2催化剂在200–450℃具有良好的脱硝性能,且在300℃通入SO2+H2O条件下依然保持优异的催化活性.XPS和H2-TPR结果表明,WO3分散在CeO2表面抑制了CeO2表面活性氧和表面晶格氧的氧化能力,这导致催化剂对NO的氧化以及对硝酸盐的吸附性能相比于纯CeO2显著降低,同时,in situ DRIFT也证实,随着WO3负载量的增加,WO3/CeO2催化剂表面吸附硝酸盐能力下降.因此,我们认为,由于低活性的晶相WO3覆盖在催化剂表面,阻碍了催化剂的表面活性位,降低了催化剂的氧化还原能力和表面酸量,从而晶相WO3抑制了WO3/CeO2催化剂的催化活性.同时,我们发现在70℃下采用氨水可以洗掉WO3/CeO2催化剂中的晶相WO3,且洗涤后的样品催化活性有所提升,这进一步验证了晶相WO3对催化活性的抑制作用.In situ DRIFT结果表明WO3/CeO2催化剂上NH3-SCR反应是通过Eley-Rideal机理进行,即吸附NH3物种与气相NO之间发生反应.随着WO3负载量的增加,WO3/CeO2催化剂中NH3的吸附能力先增强后减弱,而NO吸附能力持续减弱,这有利于表面酸位在反应过程中不被硝酸盐阻碍,当WO3负载量在分散容量附近时,这种吸附特性的效果发挥到最大,从而最大限度地促进NH3-SCR反应按照Eley-Rideal机理顺利进行.     

锂(100)面上H_2H+H反应动力学的理论研究

本文在H-Li(100)面吸附扩散的ab initio SCF势能面基础上构造了(H_2H+H)/Li(100)面相互作用的推广LEPS势能面,并用QCT方法研究了该体系的反应动力学行为。分析势能面特征得到:H_2在Li(100)面上的吸附无需活化能,H_2在Li(100)面上的解离吸附与吸附位及吸附模式密切相关,H_2的卧式解离比立式解离要容易得多。分析各种碰撞轨迹得到:低覆盖度下双氢原子的表面复合几率很小,H_2的表面解离几率受到H_2振动量子数的控制。本文构造了一种适合于动力学研究的气体-金属表面相互作用势能面,并且,动力学QCT计算结果能够对H_2表面活化的分子束实验作出合理的解释。     

透氧膜反应器内NiO/MgO催化焦炉煤气重整反应途径

对透氧膜反应器内焦炉煤气(COG)重整反应模型进行分析.通过H2+N2、CH4+N2、CO+N2和H2+CH4+N2混合气在透氧膜反应器内重整反应,以及有无催化剂下重整反应和催化剂床层厚度重整反应实验,推测焦炉煤气重整反应模型:首先焦炉煤气中H2在催化剂活性金属镍颗粒上吸附解离,解离后的氢向高活性位迁移"(三相界面")并与膜表面侧晶格氧(或O2-)反应生成H2O.同时CH4也可能在活性镍颗粒上裂解生成CH3*和H*,反应生成的H2O与膜表面催化剂上裂解的碳反应生成H2和CO.未反应完的H2O在催化剂床层内与剩余CH4反应生成H2和CO.     

氢原子在Ti(0001)表面吸附的密度泛函理论研究

用密度泛函理论研究了氢原子的污染对于Ti(0001)表面结构的影响. 通过PAW总能计算研究了p(1×1)、p(1×2)、3^1/2×3^1/2R30[deg]和p(2×2)等几种氢原子覆盖度下的吸附结构, 以及在上述结构下Ti(0001)面fcc格点和hcp格点的氢原子吸附. 结果表明, 在p(1×1)-H、p(1×2)-H、3^1/2×3^1/2R30[deg]-H和p(2×2)-H几种H原子覆盖度下, 以p(1×1)-H结构的单个氢原子吸附能为最大. 在p(1×1)-H吸附结构下, 由于氢原子吸附导致的Ti(0001)表面Ti原子层收缩的理论计算数值分别为-2.85%(hcp吸附)和-4.31%(fcc吸附), 因此实际上最有可能的情况是两种吸附方式都有一定的几率. 而实验中观察到的所谓“清洁”Ti(0001)表面实际上是有少量氢原子污染的表面. 不同覆盖度和氢分压下, 氢原子吸附的污染对Ti(0001)表面结构有极大的影响, 其表面的各种特性都会随覆盖度的不同而产生相应的变化.     

甲硫醇在Cu(111)表面的解离吸附: 密度泛函理论研究

采用基于密度泛函理论的第一性原理方法和平板模型研究了CH₃SH分子在Cu(111)表面的吸附反应.系统地计算了S原子在不同位置以不同方式吸附的一系列构型, 第一次得到未解离的CH₃SH分子在Cu(111)表面顶位上的稳定吸附构型,该构型吸附属于弱的化学吸附, 吸附能为0.39 eV. 计算同时发现在热力学上解离结构比未解离结构更加稳定. 解离的CH₃S吸附在桥位和中空位之间, 吸附能为0.75-0.77 eV. 计算分析了未解离吸附到解离吸附的两条反应路径, 最小能量路径的能垒为0.57 eV. 计算结果还表明S―H键断裂后的H原子并不是以H₂分子的形式从表面解吸附而是以与表面成键的形式存在. 通过比较S原子在独立的CH₃SH分子和吸附状态下的局域态密度, 发现S―H键断裂后S原子和表面的键合强于未断裂时S原子和表面的键合.     

H在Mg(0001)表面吸附、解离和扩散的第一性原理研究

采用基于密度泛函的第一性原理方法, 同时结合Nudged Elastic Band方法, 系统研究了H2分子和H原子在Mg(0001)表面的吸附过程. 给出了H2分子的解离路径和势垒, 结果表明H2分子的吸附过程中仅存在物理吸附; 在给出H原子在Mg(0001)表面的吸附势能面的基础上, 进一步研究了H原子在Mg(0001)表面及体内的扩散过程. 计算发现, Mg(0001) slab存在表面效应, 且对H原子的表面扩散影响较明显. 在此基础上, 通过比较解离、扩散和放氢环节的激活能数据, 为H2分子的解离和氢化物的放氢过程是速控步骤这一结论提供了理论支持.     

激光促进甲醇在杂多化合物上的表面反应

利用红外光谱 (IR)、程序升温脱附 (TPD)和激光促进表面反应 (L SSR)技术 ,研究了甲醇吸附于杂多化合物 H3PMo1 2 O40 · x H2 O、H3PW1 2 O40 · x H2 O、H6 PMo6 W6 O40 · x H2 O表面上所形成体系的振动结构、化学吸附形态和光促表面反应规律 .实验结果表明 ,在各固体材料表面上甲醇同时发生分子吸附和解离吸附 ,且在室温条件下体系即发生显著的光促表面反应 ;与甲醇吸附强度和吸附量相比 ,反应体系的振动结构对 L SSR效率起着更重要的作用 .根据表征和反应结果 ,分析了体系中活性物种的产生途径 ,并给出了反应机理的模型     

Pd(510)台阶面对氢分子解离吸附的影响

本文应用对势方法构造了Ｈ２－Ｐｄ（１００）和Ｈ２－Ｐｄ（５１０）体系相互作用的ＬＥＰＳ势能面．考察了氢分子在Ｐｄ（１００）面上的非活化前驱态解离吸附特性，理论结果和实验符合得很好．对氢分子在Ｐｄ（５１０）台阶面上的解离吸附行为的研究表明，由于台阶的影响，在台阶下形成了非活化直接解离通道，在台阶上及台阶边棱处，主要存在非活化前驱态解离通道；在台阶面上发现了氢分子的活化吸附．     

First principles analysis of H2O adsorption on the (110) surfaces of SnO2, TiO2 and their solid solutions

Both associative and dissociative H(2)O adsorption on SnO(2)(110), TiO(2)(110), and Ti-enriched Sn(1-x)Ti(x)O(2)(110) surfaces have been investigated at low ((1)/(12) monolayer (ML)) and high coverage (1 ML) by density functional theory calculations using the Gaussian and plane waves formalism. The use of a large supercell allowed the simulation at low symmetry levels. On SnO(2)(110), dissociative adsorption was favored at all coverages and was accompanied by stable associative H(2)O configurations. Increasing the coverage from (1)/(12) to 1 ML stabilized the (associatively or dissociatively) adsorbed H(2)O on SnO(2)(110) because of the formation of intermolecular H bonds. In contrast, on TiO(2)(110), the adsorption of isolated H(2)O groups ((1)/(12) ML) was more stable than at high coverage, and the favored adsorption changed from dissociative to associative with increasing coverage. For dissociative H(2)O adsorption on Ti-enriched Sn(1-x)Ti(x)O(2)(110) surfaces with Ti atoms preferably located on 6-fold-coordinated surface sites, the analysis of the Wannier centers showed a polarization of electrons surrounding bridging O atoms that were bound simultaneously to 6-fold-coordinated Sn and Ti surface atoms. This polarization suggested the formation of an additional bond between the 6-fold-coordinated Ti(6c) and bridging O atoms that had to be broken upon H(2)O adsorption. As a result, the H(2)O adsorption energy initially decreased, with increasing surface Ti content reaching a minimum at 25% Ti for (1)/(12) ML. This behavior was even more accentuated at high H(2)O coverage (1 ML) with the adsorption energy decreasing rapidly from 145.2 to 101.6 kJ/mol with the surface Ti content increasing from 0 to 33%. A global minimum of binding energies at both low and high coverage was found between 25 and 33% surface Ti content, which may explain the minimal cross-sensitivity to humidity previously reported for Sn(1-x)Ti(x)O(2) gas sensors. Above 12.5% surface Ti content, the binding energy decreased with increasing coverage, suggesting that the partial desorption of H(2)O is facilitated at a high fractional coverage.     

基于插层化学的单晶氧化钨纳米片的制备、表征与形成机制

结合插层化学与湿化学方法的优点, 建立了一种高比表面积、大径厚比、易分散的二维氧化钨(WO3)纳米片单晶的制备新方法. 微米级WO3与Bi2O3在800 ℃通过固相反应生成层状化合物Bi2W2O9; 所得到的Bi2W2O9经盐酸选择性溶出[Bi2O2]层后得到质子化形式的H2W2O7·xH2O相. 以H2W2O7·xH2O为钨源, 以辛胺插层所得无机-有机混杂纳米带为前驱物, 经硝酸氧化除去前驱物中的有机组分后得到正交相WO3·H2O纳米片; 将所得到的WO3·H2O纳米片在250~ 450 ℃和空气气氛中热处理2~5 h(升温速率为2 ℃/min), 得到单斜相WO3单晶纳米片. TEM与SEM分析结果表明, 单晶WO3·H2O与WO3纳米片的形貌相似, 其大小为(200~500) nm×(200~500) nm, 厚度为10~30 nm; 所得WO3·H2O与WO3纳米片单晶的厚度方向分别为[010]和[001]. N2吸附结果表明, WO3·H2O与WO3纳米片的比表面积分别可达到250与180 m2/g.     

还原态WO_3/Al_2O_3,NiO/Al_2O_3和NiO-WO_3/Al_2O_3催化剂上H_2,CO,O_2的吸附特性

在加氢精制和许多其它催化过程中,Mo,W是主要的活性组分,Co,Ni通常作为助剂,有关Co-Mo体系的研究文献报导很多~[1.2], 但由于钨较难还原和硫化,关于     

Ni(510)台阶面对氢分子解离吸附的影响

应用对势方法获得Ｈ２／Ｎｉ（１００）和Ｈ２／Ｎｉ（５１０）相互作用体系的ＬＥＰＳ势能面，考察了氢分子在Ｎｉ（１００）面上的解离吸附行为。理论计算结果和实验结果符合很好，对Ｈ２／Ｎｉ（５１０）体系的研究表明，台阶的作用为：（１）在台阶下部，氢分子直接解离的最低能量反应途径密度增大，且平动活化垒降低，（２）在台阶上部及台阶边棱处，前驱态的最低能量反应途径密度增大。因此，台阶处成为氢分子解离和复合的活性     

Ni(115)台阶面对氢表面微观动力学行为的影响

用５参数Ｍｏｒｓｅ势模拟氢－镍表面体系相互作用势，考察了氢原子在Ｎｉ（１１５）台面上吸附扩散行为。同时构造了氢分子与Ｎｉ（１００）和Ｎｉ（１１５）台阶面 相互作用推广的ＬＥＰＳ势面面，考察了氢分子解离化学吸附的微观动力学性质。     

WO_3 Anodic Oxide Film——I.Electrochromism and Auto-bleaching mechanism

Electrochromic and auto-bleaching processes at the WO2 anodic film in 0. 5 mol/L H2SO4 solution were investigated by cyclic voltammetry, a. c. impedance technique and photocurrent spectrometry. The colouration mechanism consists of hydrogen adsorption on the WO2 surface and the transport of H atoms in the WO, lattice. The bleaching process involves at least two steps: transport of interstitial H atoms and hydrogen desorption on the W surface, resulting in interstitial H+ ions; then extration of the H+ ions driven by the external electric field. The auto-bleaching arises from the hydroxylation due to both partial interstitial H atoms and a little of water contained in the film.     

A DFT Study for NH3 Adsorption on the GaN （0001） Surface

1 INTRODUCTION Recently, the reaction of NH3 with III-V com- pounds[1～5] has attracted much attention, especially for the wurtzite GaN, since NH3 is the predominant raw stuff for growing crystalline GaN by both of the most important growth techniques[6～9], i.e., organo- metallic chemical vapor deposition (OMCVD) and molecular-beam epitaxy (MBE). Experimentally, Shekhar et al.[2] reported the chemisorption and reaction of hydrogen and ammonia on the single- crystalline GaN (0001…     

Computational study of ethanol adsorption and reaction over rutile TiO(2) (110) surfaces

Studies of the modes of adsorption and the associated changes in electronic structures of renewable organic compounds are needed in order to understand the fundamentals behind surface reactions of catalysts for future energies. Using planewave density functional theory (DFT) calculations, the adsorption of ethanol on perfect and O-defected TiO(2) rutile (110) surfaces was examined. On both surfaces the dissociative adsorption mode on five-fold coordinated Ti cations (Ti(4+)(5c)) was found to be more favourable than the molecular adsorption mode. On the stoichiometric surface E(ads) was found to be equal to 0.85 eV for the ethoxide mode and equal to 0.76 eV for the molecular mode. These energies slightly increased when adsorption occurred on the Ti(4+)(5c) closest to the O-defected site. However, both considerably increased when adsorption occurred at the removed bridging surface O; interacting with Ti(3+) cations. In this case the dissociative adsorption becomes strongly favoured (E(ads) = 1.28 eV for molecular adsorption and 2.27 eV for dissociative adsorption). Geometry and electronic structures of adsorbed ethanol were analysed in detail on the stoichiometric surface. Ethanol does not undergo major changes in its structure upon adsorption with its C-O bond rotating nearly freely on the surface. Bonding to surface Ti atoms is a σ type transfer from the O2p of the ethanol-ethoxide species. Both ethanol and ethoxide present potential hole traps on O lone pairs. Charge density and work function analyses also suggest charge transfer from the adsorbate to the surface, in which the dissociative adsorptions show a larger charge transfer than the molecular adsorption mode.     

Study of adsorption and decomposition of H2O on Ge(100)

The adsorption and decomposition of water on Ge(100) have been investigated using real-time scanning tunneling microscopy (STM) and density-functional theory (DFT) calculations. The STM results revealed two distinct adsorption features of H2O on Ge(100) corresponding to molecular adsorption and H-OH dissociative adsorption. In the molecular adsorption geometry, H2O molecules are bound to the surface via Ge-O dative bonds between the O atom of H2O and the electrophilic down atom of the Ge dimer. In the dissociative adsorption geometry, the H2O molecule dissociates into H and OH, which bind covalently to a Ge-Ge dimer on Ge(100) in an H-Ge-Ge-OH configuration. The DFT calculations showed that the dissociative adsorption geometry is more stable than the molecular adsorption geometry. This finding is consistent with the STM results, which showed that the dissociative product becomes dominant as the H2O coverage is increased. The simulated STM images agreed very well with the experimental images. In the real-time STM experiments, we also observed a structural transformation of the H2O molecule from the molecular adsorption to the dissociative adsorption geometry.