Characterization of DC reactive magnetron sputtered NiO films using spectroscopic ellipsometry

Thin NiO films were deposited at 500 °C on n-type Si(1 1 1) by a DC reactive magnetron sputtering in a gas mixture of oxygen and argon. The ratio between the flow rates of oxygen and argon was respectively set at 1:4, 1:2, and 1:1. The dependence of structures and optical properties of NiO films were investigated using grazing incidence X-ray diffraction and spectroscopic ellipsometry in the spectral region of 1.5-5.0 eV. Ni-rich NiO films were obtained when the ratio between the flow rates of oxygen and argon was 1:4 and 1:2 in sputtering process. And when the ratio was 1:1, a relatively pure NiO film was formed. The partial pressure of oxygen could significantly influence the thickness and roughness of films. Refractive index n, extinction coefficient k, and direct gap energy and indirect gap energy of the NiO films were also subject to the influence of the partial pressure of oxygen.     

Thermally tunable optical constants of vanadium dioxide thin films measured by spectroscopic ellipsometry

Smart materials with reversible tunable optical constants from visible to near-infrared wavelengths could enable excellent control over the resonant response in metamaterials, tunable plasmonic nanostructures, optical memory based on phase transition and thermally tunable optical devices. Vanadium dioxide (VO₂) is a promising candidate that exhibits a dramatic change in its complex refraction index or complex dielectric function arising from a structural phase transition from semiconductor to metal at a critical temperature of 70 °C. We demonstrated the thermal controllable reversible tunability of optical constants of VO₂ thin films. The optical/dielectric constants showed an abrupt thermal hysteresis which confirms clearly the electronic structural changes. Temperature dependence of dielectric constants as well as optical conductivity of sputtered VO₂ thin films was also reported and compared to previous theoretical and experimental reports.     

Observation of strong light-matter coupling by spectroscopic ellipsometry

We report on the observation of strong coupling between excitons and cavity photons in a ZnO-based microresonator up to room temperature. The ZnO-based resonator was grown by means of pulsed laser deposition (PLD) on c-sapphire substrate and consists of a half-wavelength ZnO-cavity between two Bragg reflectors, each made of 10.5 layer pairs of yttria stabilized zirconia and Al₂O₃. Angle-resolved spectroscopic ellipsometry revealed the resonator to be in the strong coupling regime at room temperature. This was confirmed for temperatures between 10 K and 290 K by means of angle-resolved photoluminescence and reflection experiments. Prior studies on a Fabry–Perot resonator containing a half-wavelength YSZ-cavity (empty resonator) demonstrate the ability of ellipsometry to gain comprehensive information on mode-structure properties of resonators without coupling effects.     

FTIR and spectroscopic ellipsometry investigations of the electron beam evaporated silicon oxynitride thin films

FTIR and variable angle spectroscopic ellipsometer in conjunction with computer simulation were employed to investigate the electron beam evaporated SiO_xN_y thin films. FTIR showed a large absorption band located between 600 and 1250 cm⁻¹, which indicates that Si-O and Si-N bands are overlap in SiO_xN_y films. A three layers model was used to fit the calculated data to the experimental ellipsometric spectra. The main layer was described by Cauchy model while the interface layer and the surface layer were described using Tauc-Lorenz oscillator and Bruggeman effective medium approximation, respectively. The thickness, the refractive index and the extinction coefficient were accurately determined. The refractive index at 630 nm was found to increase from 1.74 to 1.85 with increasing the film thickness from 191.6 to 502.2 nm. The absorption coefficient was calculated from the obtained extinction coefficient values and it has been used to calculate the Tauc and Urbach energies.     

Nanostructure characterization of high k materials by spectroscopic ellipsometry

In this work, the optical and structural properties of high k materials such as tantalum oxide and titanium oxide were studied by spectroscopic ellipsometry, where a Tauc-Lorentz dispersion model based in one (amorphous films) or two oscillators (microcrystalline films) was used. The samples were deposited at room temperature by radio frequency magnetron sputtering and then annealed at temperatures from 100 to 500 °C. Concerning the tantalum oxide films, the increase of the annealing temperature, up to 500 °C does not change the amorphous nature of the films, increasing, however, their density. The same does not happen with the titanium oxide films that are microcrystalline, even when deposited at room temperature. Data concerning the use of a four-layer model based on one and two Tauc-Lorentz dispersions is also discussed, emphasizing its use for the detection of an amorphous incubation layer, normally present on microcrystalline films grown by sputtering.     

Investigation of the optical anisotropy of PET and PEN films by VIS-FUV to IR spectroscopic ellipsometry

In the last years, a significant amount of research is being performed in the field of polymer research for novel applications, such as flexible electronic devices, photovoltaic cells, high performance optics, data storage, etc. Toward this direction, in this work, the optical anisotropy of biaxially stretched poly(ethylene terephthalate) (PET) and poly(ethylene naphthalate) (PEN) films has been extensively investigated. The optical properties of the films have been studied in terms of their optical, electronic and vibrational response, by Fourier transform IR spectroscopic ellipsometry (FTIRSE) (900-3500 cm⁻¹) and Vis-fUV variable angle SE (1.5-6.5 eV) techniques. The films optical anisotropy is the result of the stretching procedure during their fabrication, which results to the structural rearrangement of the macromolecular chains parallel to the stretching direction and to a higher structural symmetry. During the SE spectra analysis, the films have been approximated as uniaxial materials with their optic axis parallel to the sample/ambient interface leading to the accurate determination of the principal components ?_||(ω) and ?_⊥(ω) of the dielectric function ?(ω). The detailed study of the electronic transitions has been performed in the Vis-fUV region, where the characteristic features corresponding to the n → π* electronic transitions of the carbonyl -CO group and the ¹A_1g → ¹B_1u transition due to the π → π* excitation of the π-electron structures have been identified and analysed. Furthermore, the FTIRSE spectra allowed the accurate identification and assignment of the features of ?(ω) to the vibrational modes of the various bonding structures characteristic of the PET and PEN macromolecular chains.     

Optical arrangement and proof of concept prototype for mid infrared variable angle spectroscopic ellipsometry

We present an optical setup for variable angle mid infra red spectroscopic ellipsometry. The arrangement can be placed into the sample compartment of a Bruker ifs66v/s vacuum Fourier transform infrared spectrometer. A first prototype of the setup has been tested in the spectral range from 650 cm⁻¹ to 4000 cm⁻¹ and can measure incidence angles between 8° and 87°. We compare the measured data to reference measurements with a commercial variable angle infrared spectroscopic ellipsometer. The comparison gives a proof of concept for the discussed optical arrangement.     

AlN:Cr thin films synthesized by pulsed laser deposition: Studies by X-ray diffraction and spectroscopic ellipsometry

The structure and optical properties of AlN thin films doped with Cr atoms were studied by X-ray diffractometry, Fourier transform infrared spectroscopy and spectroscopic ellipsometry analyses. The films were synthesized by pulsed laser deposition from an AlN:Cr (10% Cr) target onto Si(1 0 0) wafers in vacuum at residual pressure of 10⁻³ Pa or in nitrogen at a dynamic pressure of 0.1 Pa. The study of the XRD patterns revealed that both phases co-existed in the synthesized films and that the amorphous one was prevalent. Two different amorphous matrices, i.e. two types of chemical bond arrangements, were found in films deposited at 0.1 Pa N₂. By difference, deposition in vacuum resulted in the coexistence of hexagonal and cubic crystallites embedded into an amorphous matrix. The introduction of Cr atoms into the AlN lattice causes a broadening of the IR spectrum along with the shift toward higher wavenumbers of the characteristic Al-N bands at 2351 cm⁻¹ and 665 cm⁻¹, respectively. This was related to the generation of a compressive stress inside films. In comparison to the optical constants of pure AlN films, the synthesized AlN:Cr films exhibited a smaller refractive index and showed a weak absorption throughout the 300-800 nm spectral region, characteristic to amorphous AlN structure.     

Characterization of In/Pd and Pd/In/Pd thin films by ellipsometric, XRD and AES methods

In/Pd and Pd/In/Pd thin films were prepared by thermal evaporation on the SiO₂ substrate in a vacuum. The structural and optical properties of the films were investigated by means of X-ray diffractometry (XRD), Auger electron spectroscopy (AES) and spectroscopic ellipsometry (SE). Auger depth profile studies were performed in order to determine the composition of elements in the Pd-In systems. Interdiffusion of metals was detected at room temperature. Optical properties of Pd-In composite layers formed due to the interdiffusion were derived from ellipsometric quantities Ψ and Δ measured in the photon energy range 0.75-6.50 eV at different angles of incidence. The effective optical spectra show absorption peaks dependent on the composition of nonuniform films. The XRD patterns indicated formation of Pd_1−xIn_x intermetallic phases in the samples.     

椭偏光谱法研究溶胶-凝胶TiO2薄膜的光学常数

以钛酸丁酯为前驱体,采用溶胶-凝胶工艺成功制备了TiO₂薄膜.利用反射式椭圆偏振光谱仪测量了薄膜的椭偏参量Ψ和Δ,并用Cauchy模型对椭偏参数进行数据拟合,得到了薄膜的厚度和光学常数在380—800 nm的色散关系.用分光光度计测量了薄膜的反射率,并用干涉法计算薄膜的厚度;使用原子力显微镜观测了薄膜的表面微结构,分析讨论了不同退火温度处理的薄膜微结构与光学常数之间的关系.研究结果表明,Cauchy模型能较好地符合溶胶-凝胶TiO₂薄 关键词： 光学常数 2薄膜')" href="#">TiO₂薄膜 溶胶-凝胶 椭圆偏振     

Spetroscopic ellipsometry study on electrical and elemental properties of Sb-doped ZnO thin films

Room-temperature spectroscopic ellipsometry data has been analyzed to determine the complex dielectric functions, ɛ(E) = ɛ₁(E) + iɛ₂(E) of as-deposited Sb-doped ZnO (SZO) thin films grown on n-Si(100) substrates by dual ion beam sputtering deposition system for different growth temperatures (T_g). The dielectric functions have been obtained from ellipsometry data analyses using Cody-Lorentz oscillator in the GenOsc model. A gradual reduction in the value of electron concentration and finally the conversion of doping characteristics from donor type to acceptor type was observed with the rise in T_g. This, in turn, resulted in the decline of broadening of ɛ₁ peaks, and hence in the increase of excitonic lifetime. Optical band-gap energy was observed to decrease with increase in T_g from 200 to 300 °C, and then rise continuously with further increase in T_g. X-ray diffraction measurements showed that all SZO films had (002) preferred crystal orientation. Hall measurement and X-ray photoelectron spectroscopy analysis confirmed that the change in the electrical conduction from n-to p-type was due to the enhancement in the value of Sb⁵⁺/Sb³⁺ ratio and Sb_Zn–2V_Zn complex formation in SZO films.     

Si nanocrystals in silicon nitride: An ellipsometric study using parametric semiconductor models

Low-pressure chemical vapour deposited Si₃N₄/nc-Si/Si₃N₄ layers prepared on Si substrates were characterized by spectroscopic ellipsometry. Model Dielectric Function (MDF) was applied to obtain the thickness and the dielectric spectra of the middle nc-Si layer. Sensitive effect of the deposition time was obtained on the MDF parameters. A comparison is presented between the studied samples and reference materials.     

金刚石薄膜的红外椭圆偏振光谱研究

采用红外椭圆偏振光谱对微波等离子体化学气相沉积法（MPCVD）和热丝化学气相沉积法（H-FCVD）制备的金刚石薄膜在红外波长范围（2.5—12.5μm）的光学参数进行了测量.建立了不同的光学模型，且在模型中采用Bruggeman有效介质近似方法综合考虑了薄膜表面和界面的椭偏效应.结果表明，MPCVD金刚石膜的椭偏数据在模型引入了厚度为77.5nm的硅表面氧化层、HFCVD金刚石膜引入879nm粗糙层之后能得到很好的拟合.最后对两种模型下金刚石薄膜的折射率和消光系数进行了计算，表明MPCVD金刚石薄膜的红外 关键词： 金刚石薄膜 红外椭圆偏振光谱 光学参数 有效介质近似     

Real time ellipsometry for monitoring plasma-assisted epitaxial growth of GaN

GaN is grown on Si-face 4H-SiC(0 0 0 1) substrates using remote plasma-assisted methods including metalorganic chemical vapour deposition (RP-MOCVD) and molecular beam epitaxy (MBE). Real time spectroscopic ellipsometry is used for monitoring all the steps of substrate pre-treatments and the heteroepitaxial growth of GaN on SiC. Our characterization emphasis is on understanding the nucleation mechanism and the GaN growth mode, which depend on the SiC surface preparation.     

Quantifying protein adsorption on combinatorially sputtered Al-, Nb-, Ta- and Ti-containing films with electron microprobe and spectroscopic ellipsometry

Although metallic biomaterials are widely used, systematic studies of protein adsorption onto such materials are generally lacking. Combinatorial binary libraries of Al_1−xNb_x, Al_1−xTa_x, Al_1−xTi_x, Nb_1−xTa_x, Nb_1−xTi_x, and Ta_1−xTi_x (0 ? x ? 1) and a ternary library of Al_1−xTi_xTa_y (0 ? x ? 1 and 0 ? y ? 0.7), along with their corresponding pure element films were sputtered onto glass substrates using a unique magnetron sputtering technique. Films were characterized with wavelength-dispersive spectroscopy (WDS), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). Fibrinogen and albumin adsorption amounts were measured by wavelength-dispersive spectroscopy (WDS) and spectroscopic ellipsometry (SE) equipment, both high throughput techniques with automated motion stage capabilities. Protein adsorption onto these films was found to be closely correlated to the alumina surface fraction, with high alumina content at the surface leading to low amounts of adsorbed fibrinogen and albumin. Protein adsorption amounts obtained with WDS and SE were in good agreement for all films.     

Characterization of SIPOS films by spectroscopic ellipsometry and transmission electron microscopy

The structural and compositional properties of undoped SIPOS thin films have been studied by spectroscopic ellipsometry and transmission electron microscopy. It is shown that in most cases the former method provides fast and reliable results. The growth rate and crystallinity of SIPOS layers are studied as a function of N₂O concentration in the gas phase and annealing temperature.     

Application of spectroscopic ellipsometry to the investigation of the optical properties of cobalt-nanostructured silica thin layers

Spectroscopic ellipsometry is used to investigate optical properties of cobalt-implanted silica thin films. The films under investigation are 250 nm thick thermal SiO₂ layers on Si substrates implanted with Co⁺ ions at energy of 160 keV and at fluences of 10¹⁷ ions/cm² for different temperatures of substrate during implantation (77 and 295 K). Changes due to Co⁺ implantation are clearly observed in the optical response of the films. Optical behaviours are furthermore different for the three implantation temperatures. To understand the optical responses of these layers, the ellipsometric experimental data are compared to different models including interference effects and metal inclusions effects into the dielectric layer. The simulated ellipsometric data are obtained by calculating the interferences of an inhomogeneous layer on a Si substrate. The material within this layer is considered as an effective medium which dielectric function is calculated using the Maxwell-Garnett effective medium approximation. We show that although the structures of these layers are very complicated because of ion-implantation mechanisms, quite simple models can provide relatively good agreement. The possibilities of ellipsometry for the study of the optical properties of such clusters-embedded films are discussed. We especially provide the evidence that ellipsometry can give interesting information about the optical properties of nanostructured layers. This is of special interest in the field of nanostructured layered systems where ellipsometry appears to be a suitable optical characterization technique.     

In-operando spectroscopic ellipsometry studies of IrO2 dynamic instabilities: Guide to in-situ growth of pyrochlore iridate thin films

The instability of iridium oxide at high temperature has long been a bottleneck for in growing pyrochlore iridate thin films in a vacuum chamber. To overcome this problem, we investigated the chemical instability of IrO₂ thin films, which are the simplest form of iridate, via in-operando spectroscopic ellipsometry (SE). We observed that IrO₂ thin films undergo IrO₂ dissociation and IrO₃ gas formation depending on the thermodynamic conditions. The chemical kinetics observations of IrO₂ were confirmed by ex-situ X-ray diffraction and atomic force microscopy. SE experimental data were compared with models used to describe the evolution of the two chemical reactions. Real-time in-operando SE analysis based on the Maxwell Garnett theory yielded a precise IrO₂ dissociation speed for the given thermodynamic conditions. Moreover, the real-time in-operando SE technique allowed us to observe the phase transition from solid IrO₂ to gaseous IrO₃. This study on the chemical instability of IrO₂ at high temperature affords insights into a new method for in-situ pyrochlore iridate and other iridates thin-film growth.     

In-depth characterization and computational 3D reconstruction of flagellar filament protein layer structure based on in situ spectroscopic ellipsometry measurements

In this study, we have reconstructed the statistical 3D structure of hundreds of nanometers thick surface immobilized flagellar filament protein layers in their native environment, in buffer solution. The protein deposition onto the surface activated Ta₂O₅ film was performed in a flow cell, and the immobilization process was followed by in situ spectroscopic ellipsometry. A multilayer optical model was developed, in that the protein layer was described by five effective medium sublayers. Applying this method, an in-depth analysis of the protein layer formation was performed. Based on the kinetics in the distribution of the surface mass density, the statistical properties of the filamentous film could be determined computationally as a function of the measurement time. It was also demonstrated that the 3D structure of the protein layer can be reconstructed based on the calculated in-depth mass density profile. The computational investigation revealed that the filaments can be classified into two individual groups in approximately equal ratio according to their orientation. In the first group the filaments are close to laying position, whereas in the second group they are in a standing position, resulting in a significantly denser sublayer close to the substrate than at a larger distance.