B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm

The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-Ⅱ radiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5°. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.     

High performance multilayer La/B4C mirrors with carbon barrier layers

Recent results from manufacturing multilayer La/B₄C mirrors at wavelengths above 6.7 nm with carbon barrier layers are presented. It is shown that maximum reflection R = 58.6% is attained at λ = 6.661 nm.     

Formation of short-period multilayer W/B4C compositions

The quantitative characteristics of the interlayer interaction in multilayer W/B₄C periodic compositions produced by magnetron sputtering are studied by small-angle X-ray diffraction using CuK _?? radiation and by electron microscopy of transverse cuts. It is found that approximately 0.85 nm of the tungsten layer thickness is consumed for the formation of mixed zones at layer boundaries. The mixed layers have a density of 13.4 ± 0.7 g/cm³ and contain tungsten in a bound chemical state. The effect of these mixed zones on the X-ray reflectivity of multilayer W/B₄C compositions is estimated. A method is proposed to determine the layer thickness at a small number of peaks in an X-ray diffraction pattern.     

高反射率Mo/B4C多层膜设计及制备

 运用遗传算法优化设计了Mo/B₄C多层膜结构。入射光入射角度取10°时,设计的理想多层膜膜对数为150,周期为3.59 nm,Gamma值（Mo膜厚与周期的比值）为0.41,峰值反射率为33.29%。采用恒功率模式直流磁控溅射方法制作Mo/B₄C多层膜。通过在Mo/B4C多层膜与基底之间增加15 nm厚的Cr粘附层,提高多层膜与基底的粘附力。另外,还采用调整多层膜Gamma值的方法减小其内应力,调整后多层膜结构周期为3.59 nm, Mo膜厚1.97 nm, B4C膜厚1.62 nm,峰值反射率26.34％。制备了膜对数为150的Mo/B₄C膜并测量了其反射率,在波长7.03 nm处,Mo/B₄C多层膜的近正入射反射率为21.0％。最后对测量结果进行了拟合,拟合得到Mo/B₄C多层膜的周期为3.60 nm,Gamma值0.60,界面粗糙度为0.30 nm。     

高反射率Mo/B4C多层膜设计及制备

运用遗传算法优化设计了Mo/B4C多层膜结构。入射光入射角度取10°时,设计的理想多层膜膜对数为150,周期为3.59 nm,Gamma值（Mo膜厚与周期的比值）为0.41,峰值反射率为33.29%。采用恒功率模式直流磁控溅射方法制作Mo/B4C多层膜。通过在Mo/B4C多层膜与基底之间增加15 nm厚的Cr粘附层,提高多层膜与基底的粘附力。另外,还采用调整多层膜Gamma值的方法减小其内应力,调整后多层膜结构周期为3.59 nm, Mo膜厚1.97 nm, B4C膜厚1.62 nm,峰值反射率26.34％。制备了膜对数为150的Mo/B4C膜并测量了其反射率,在波长7.03 nm处,Mo/B4C多层膜的近正入射反射率为21.0％。最后对测量结果进行了拟合,拟合得到Mo/B4C多层膜的周期为3.60 nm,Gamma值0.60,界面粗糙度为0.30 nm。     

Multilayer La/B4C mirrors in the spectral region near 6.7 nm

The results from measuring reflection factors are presented for multilayer La/B₄/C mirrors with barrier layers of carbon and scandium. It is shown that a higher reflection factor is obtained by depositing a layer of carbon onto a surface of boron carbide. This effect is caused by diminishing absorption in the structure and the reduced width of transition regions.     

Design and fabrication of broad angular range depth-graded C/W multilayer mirror for hard X-ray optics

In this paper, a depth-graded C/W multilayer mirror with broad grazing incident angular range, consisting of three multilayer stacks, each of which has different period thickness d and the layer pair number,was designed and fabricated by direct current (DC) magnetron sputtering.     

Atomic structure of icosahedral B4C boron carbide from a first principles analysis of NMR spectra

Density functional theory is demonstrated to reproduce the 13C and 11B NMR chemical shifts of icosahedral boron carbides with sufficient accuracy to extract previously unresolved structural information from experimental NMR spectra. B4C can be viewed as an arrangement of 3-atom linear chains and 12-atom icosahedra. According to our results, all the chains have a CBC structure. Most of the icosahedra have a B11C structure with the C atom placed in a polar site, and a few percent have a B (12) structure or a B10C2 structure with the two C atoms placed in two antipodal polar sites.     

质子辐照下Mo/Si多层膜反射镜的微观结构状态

利用透射电子显微镜对质子辐照前后空间太阳望远镜Mo/Si多层膜的微观结构进行了表征, 并对其辐照前后反射率的变化进行了测量.研究表明, Mo/Si多层膜经质子辐照后形成了一些缺陷结构,局部区域Mo/Si的周期性遭到破坏, Mo层与Si层的宽度发生了变化,多层膜层与层之间的界面也比辐照前更为粗糙,部分层状结构由于质子辐照发生了明显的扭曲和折断等现象;此外,质子辐照导致了Mo/Si多层膜反射率的下降,这些微观缺陷的形成是光学性能降低的直接诱因. 关键词： 空间太阳望远镜 Mo/Si多层膜 微观结构 反射率     

Measurement of the birefringence properties of the reflecting surface of an interferential mirror

We have set up an apparatus to measure the ellipticity acquired by a linearly polarized light beam after a single quasi-normal reflection on an interferential mirror. Results of measurements performed on a standard 10 cm diameter interferential mirror are presented.     

Investigation of roughness cross correlation in a Ni/C multilayer mirror by X-ray diffuse scattering method

The possibility of applying X-ray diffuse scattering for studying roughness in multilayer X-ray mirrors, including the correlation of roughnesses of neighboring interfaces (roughness cross-correlation) is considered. It is shown that the reliability and informativeness of this method can be improved by rejecting the classical experimental schemes and using alternative schemes in which not only the intensity of diffuse scattering itself, but also its dependence on certain experimental parameters (conditions), vary. Such parameters can be the spatial coherence of incident radiation, the direction of the momentum transfer relative to the specular diffraction plane, or the X-ray wavelength. In the framework of this approach, the results of comparative measurements of diffuse scattering from a Ni/C multilayer X-ray mirror prepared by laser ablation are considered for two close values of photon energy: below (8.325 keV) and above (8.350 keV) the K absorption edge for nickel. It is shown that, in view of effective screening of deep layers in the hard photoabsorption mode, this method provides more reliable (as compared to the standard diffuse scattering method) information on the evolution of interfaces between the layers. It is found that the smoothing of roughness in the experimental sample occurs over large spatial scales such as the micrometer scale. Only large-scale defects with a size exceeding 10 µm are replicated well from layer to layer. Possible physical reasons for the observed effect are considered. It is shown that effective smoothing on the micrometer and submicrometer spatial scales is of fundamental importance for preparing multilayer X-ray mirrors with high reflectances.     

Deformation twinning in boron carbide particles within nanostructured Al 5083/B4C metal matrix composites

The presence of deformation twins is documented in boron carbide reinforcement particles within a nanostructured Al 5083/B₄C metal matrix composite. High resolution transmission electron microscopy analysis suggests that these are (0001) twins. This work discusses the mechanisms responsible for their formation based on crystallographic analysis and mechanical loading conditions. Specifically, we propose that there are two potential models that can be used to describe twin formation in boron carbide particles. The structural models involve slip in the 1/3[1100] (0110) or 1/3[0110] (0110) planes of C–C–C chains and the appropriate reconfiguration of B–C bonds. Analysis of the loading conditions experienced by the boron carbide particles indicates that local high stress intensity and the presence of a high shear force around the boron carbide particles are two factors that contribute to twin formation.     

Design of chirped Mo/Si multilayer mirror in the extreme ultraviolet region

The chirped Mo/Si multilayer mirror in the extreme ultraviolet region is designed to obtain sub-femtosecond pulses from high-order harmonics. Numerical simulations of temporal profile of the pulses are made for superposition of incident high-order harmonics and that of reflected ones by the chirped multilayer mirror.The normal incidence reflectivity and chirp in the wavelength range of 12.5 - 16.5 nm are 6.7% ±0.5%and-3617±171 as2, respectively. Simulation results indicate that the designed chirped multilayer mirror can be used for producing 104-as pulses.     

Effect of defects on the reflectivity of Cr/C multilayer soft X-ray mirror at 4.48 nm

Cr/C is a promising material combination for multilayer mirror in the “near water window region” (4.4-6.7 nm). In the present paper, the effect of defects on the reflectivity of Cr/C soft X-ray multilayer mirror deposited by magnetron sputtering was studied. Formation of thin interlayer due to the interdiffusion, rough interface due to the non-sharp layer and contamination of O happened during the deposition process were found by a method combined by XPS, soft X-ray reflectivity at 4.48 nm and grazing incidence hard X-ray reflectivity at 0.154 nm. The XPS results show that both interlayers (Cr-on-C and C-on-Cr) are mixture composed of C sp2, C sp3, CO, CO, CrCr and CrO bondings. No chromium carbide was found at the interlayer probably due to the blocking of oxides’ formation. Through the analysis of X-ray reflectivity, we obtained the multilayer structure parameters (thickness and roughness) and optical constants of each layer at 4.48 nm. Based on those results, a further calculation was carried out. The result shows that the formation of the thin interlayer contributes little to the decrease of the reflectivity, the rough interface decreases the reflectivity most and the contaminant (O) not only decreases the reflectivity but also shifts the position of the peak.     

X-ray properties and interface study of B4C/Mo and B4C/Mo2C periodic multilayers

We present a comparative study of B₄C/Mo and B₄C/Mo₂C periodic multilayer structures deposited by magnetron sputtering. The characterization was performed by grazing incidence X-ray reflectometry at two different energies and high resolution transmission electron microscopy. The experimental results indicate the existence of an interdiffusion layer at the B₄C-on-Mo interface in the B₄C/Mo system. Thus, the B₄C/Mo multilayers were modeled by an asymmetric structure with three layers in each period. The thickness of B₄C-on-Mo interfacial layer was estimated about 1.1 nm. The B₄C/Mo₂C multilayers present less interdiffusion and are well modeled by a symmetric structure without interfacial layers. This study shows that B₄C/Mo₂C structure is an interesting alternative to B₄C/Mo multilayer for X-ray optic applications.     

中心波长为28.5nm多层膜镜反射率测量

在“星光-Ⅱ”装置上以类Ne铬x射线激光作为标定源，以平场光栅谱仪为分光元件进行了285nm的Mo/Si多层膜反射镜效率测量.介绍了实验方法，给出了实验结果，本次研制的两块多层膜镜反射率分别为31%和9.6%. 关键词： x射线多层膜反射镜 反射率测量 x射线激光     

Use of cluster secondary ions for minimization of matrix effects in the SIMS depth profiling of La/B4C multilayer nanostructures

The elemental composition of La/B₄C multilayer metal structures is studied using SIMS on a TOF.SIMS-5 experimental setup. Analysis conditions that make it possible to considerably enhance the depth resolution are found. They include using low-energy O₂⁺ and Cs⁺ ions for sputtering and cluster secondary ions for registering matrix elements. The roughness evolution in the etching crater region is studied in a layer-by-layer analysis. It is shown that, at an incidence angle of 45° for sputtering ions, the rms roughness increases slightly (from an initial value of 0.5–0.7 nm) in the etching crater of the (La/B₄C)₇₀/Si structure at a depth of 0.5 μm. The profiles of elements in multilayer structures grown using two different types of magnetron systems with stationary and high-frequency discharges are compared. The main contaminations in the structures are determined.     

The deformation of B4C particle in the B4C/2024Al composites after high velocity impact

In the present work, B₄C/2024Al composites with volume fraction of 45% were prepared by a pressure infiltration method. The microstructure of the crater bottom of B₄C/2024Al composite after impact was characterized by transmission electron microscope (TEM), which indicated that recovery and dynamic recrystallization generated in Al matrix, and the grain size distribution was about from dozens of nanometer to 200 nm. Furthermore, the plastic deformation was observed in B₄C ceramic, which led to the transformation from monocrystal to polycrystal ceramic grains. The boundary observed in this work was high-angle grain boundary and the two grains at the boundary had an orientation difference of 30°.     

Mo/Si aperiodic multilayer broadband reflective mirror for 12.5-28.5-nm wavelength range

Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5-28.5 nm at incidence angle of 5° is developed using a numerical optimized method. The multilayer is prepared using direct current magnetron sputtering technology. The reflectivity is measured using synchrotron radiation. The measured mean reflectivity is 7.0% in the design wavelength range of 12.5-28.5 nm. This multilayer broadband reflective mirror can be used in extreme ultraviolet measurements and will greatly simplify the experimental arrangements.     

Reflective phase shift measurement of the Mo/Si multilayer mirror in extreme ultraviolet region

The reflective phase shift of multilayer mirror is one important property required in EUV lithography and attosecond pulses experiments. The reflective phase shift of the periodic Mo/Si multilayer mirror was characterized by combining the reflectivity with total electron yield signal at the synchrotron radiation in Hefei. The multilayer was fabricated using direct current magnetic sputtering method. Using the wavelet transform approach, the period and each layer thickness were obtained, the small angle X-ray reflective data from X-ray diffractometer were fitted using these data as the mutilayer's initial structure. The TEY signal of the multilayer is coincided with the surface electron field of the multilayer. A thick Si layer was used to eliminate the effect of the multilayer's surface layer on the TEY signal. The retrieved difference in reflected phase from the incident phase was obtained combining the reflectivity with the total electron yield signal and it is similar with the calculated phase shift of the multilayer.