Existence and atomic arrangement of microtwins in CdTe epilayers grown on GaAs (211) B substrates

Selected area electron diffraction pattern (SADP) and high-resolution transmission electron microscopy (HRTEM) measurements were carried out to investigate the existence and the atomic arrangement of microtwins in CdTe epilayers grown on GaAs (211) B substrates by using molecular beam epitaxy. The SADP results showed that an epitaxial relationship between the CdTe epilayer and the GaAs substrate was formed. The lattice of the CdTe (211) tilts about 2° with respect to the GaAs (211) B substrate about the CdTe [110]∥GaAs [110] common zone axis. The HRTEM images showed that microtwins were formed in the CdTe epilayers. A possible atomic arrangement of the microtwins is presented on the basis of the HRTEM result. The present observations can help to improve understanding of the microstructural properties in CdTe epilayers grown on GaAs substrates.     

Photoelectron diffraction effects in XPS angular distributions from GaAs(110) and Ge(110) single crystals

Angular distribution measurements of XPS intensities have been made for various spectral lines from GaAs(110) and Ge(110) single-crystal surfaces. Observed angular distribution curves (ADC's) showed steep intensity variations and sharp peaks due to X-ray photoelectron diffraction (XPED) phenomena. The effects of the type of transition process (photoelectron or Auger), electron kinetic energy and crystal structure on the XPED patterns were examined. Considerably different ADC patterns were observed for high-energy photoelectrons and Auger electrons and for low-energy photoelectrons. ADC's for Ga 3d, As 3d and Ge 3d showed almost the same patterns for scans of the type [110] → [100] → [1$\text{1}$0], but they showed substantially different patterns for [110] → [11$\text{1}$] → [00$\text{1}$] scans. These features correspond well with the structural characteristics of GaAs and Ge crystals. A discussion of the applicability of XPS angular distribution measurements to the geometric analysis of crystal surfaces is presented.     

Zeeman studies of the 0.839eV emission in SI GaAs:Cr

The multi-structured zero phonon transitions of the 0.839eV emission observed in SI GaAs:Cr have been investigated by Zeeman measurements. Magnetic splittings for the directions [111], [110] and [100] as well as angular dependence studies in the (110) plane show that the centre has a symmetry axis along [111] with a small orthorhombic distortion. The emissions cannot be due to the isolated [100] Jahn-Teller distorted Cr²⁺ ions observed in magnetic resonance but to [111] centres such as the (Cr²⁺-donor) pairs as suggested by White.     

Self-organized in-plane incorporation of Si atoms in GaAs by molecular beam epitaxy

The preferential attachment of Si atoms at misorientation steps on vicinal GaAs(001) surfaces has been studied by RHEED. By analysing the time evolution of the specular beam intensity and the change in surface reconstruction during Si deposition we show that a self-organized Si incorporation along the step edges takes place. The observed (3×2) structure is due to an ordered array of dimerized Si atoms with missing dimer rows. Taking into account the structure of the (3×2) unit mesh and its orientation with respect to the As-terminated or Ga-terminated steps, a characteristic minimum in the RHEED intensity recording corresponds to the number of Ga step-edge sites. Since the preferential path for Ga as well as for Si adatom diffusion is along the [110] direction, the critical terrace width for wirelike Si attachment is much larger for a misorientation toward (111)As than for a misorientation toward (111)Ga. Despite the high local impurity concentration, the Si-modified surface can be overgrown with GaAs without adverse effects on the growth front. This is promising for the fabrication of doping wires.     

Strain-induced changes in epitaxial layer morphology of highly-strained III/V-semiconductor heterostructures

We present a study of changes in the layer morphology of symmetrically strained (GaIn)As/Ga(PAs) superlattices as a function of strain and off-orientation of substrates. The samples were deposited by metal-organic vapour-phase epitaxy (MOVPE). For samples grown on exactly oriented (100) GaAs substrates sharp 2-dimensional interfaces are observed up to a lattice mismatch (Δd/d)^⊥ = 2.4 · 10^-2. The use of off-oriented (100) substrates leads to a strain induced surface roughening (3-dimensional growth mode) and the formation of laterally ordered thickness modulations during further growth. The surface steps due to the substrate off-orientation are regarded as a cause for this effect. We discuss the structural properties of the samples investigated by transmission electron microscopy (TEM) and high-resolution X-ray diffraction (XRD) as a function of the strain in the individual layers for samples grown on (100) GaAs substrates exactly oriented, 2° off towards [110] and 1.7° off towards [011], respectively.     

Structural properties of size-selected FeCo nanoparticles deposited on W(110)

Size-selected iron and iron–cobalt alloy clusters have been studied with high resolution transmission electron microscopy (HRTEM) and scanning tunneling microscopy (STM). The clusters were produced by a continuously working arc cluster ion source and subsequently size-selected by an electrostatic quadrupole deflector. The crystalline structure of pure clusters has been investigated with HRTEM to ensure a reliable determination of the lattice parameter for the alloy clusters. The composition of the alloy clusters was checked with energy dispersive X-ray spectroscopy (EDX). The height of the deposited FeCo clusters on the (110) surface of tungsten was determined via STM. These results were compared with the lateral size distribution being investigated by TEM and allow a conclusion on the shape of the deposited alloy clusters. Furthermore, the behavior of the alloy clusters on the W(110) surface at elevated temperatures has been examined, at which the clusters show anisotropic spreading.     

Interfacial characteristics of Al/Al2O3/ZnO/n-GaAs MOS capacitor

The interfacial characteristics of Al/Al2O3/ZnO/n-GaAs metal-oxide-semiconductor (MOS) capacitor are investigated. The results measured by X-ray photoelectron spectroscopy (XPS) and high-resolution transmission electron microscopy (HRTEM) show that the presence of ZnO can effectively suppress the formations of oxides at the interface between the GaAs and gate dielectric and gain smooth interface. The ZnO-passivated GaAs MOS capacitor exhibits a very small hysteresis and frequency dispersion. Using the Terman method, the interface trap density is extracted from C-V curves. It is found that the ZnO layer can effectively improve the interface quality.     

Observation of defects and growth orientations of YBa2Cu3Ox thin films with YSZ buffer layers on Si

We have investigated defects and in-plate orientations of YBa₂Cu₃O_x thin films prepared by pulsed laser deposition (PLD) with YSZ as a buffer layer. The films showed c-axis oriented growth with the transition temperature T_co up to 87 K. Several types of defects including thermally induced cracks, grain boundaries and outgrowths were observed by scanning electron microscopy (SEM) and high resolution transmission electron microscopy (HRTEM). The grain boundary provided a favorable path for crack propagation. The outgrowths nucleated on the YSZ surface grew with stoichiometric composition. According to X-ray diffraction (XRD) and HRTEM studies the YSZ buffer layer grew with the orientation relationship, YSZ110//Si110 and YSZ(001)//Si(001) up to the YBCO/YSZ interface. The superconducting YBCO films on top grew mainly with YBCO100//Si110 and YBCO(001)//Si(001), with some minor portions of YBCO110//Si110 and YBCO(001)//Si(001).     

(In, Mn)As nanowires with ultrahigh Mn concentration: Growth, morphology and magnetic anisotropy

(In,Mn)As nanowires with ultrahigh Mn concentration have been successfully grown on GaAs(001) substrates by molecular beam epitaxy. The morphology dependences on Mn concentration and growth temperature are investigated. High Mn concentration and high growth temperature are both necessary for the growth of nanowires. All the (In,Mn)As nanowires are self-aligned along [−110]GaAs, and therefore have the shape magnetic anisotropy with the easy axis along the alignment orientation of the nanowires.     

Wave-function mapping of InAs quantum dots by scanning tunneling spectroscopy

Scanning tunneling spectroscopy is used to investigate the single-electron states and the corresponding squared wave functions of single and freestanding strain-induced InAs quantum dots grown on GaAs(001). Several peaks are found in dI/dV curves, which belong to different single-electron states. Spatially resolved dI/dV images reveal (000), (100), (010), (200), and (300) states, where the numbers describe the number of nodes in [11;0], [110], and [001] directions, respectively. The total number and energetic sequence of states is different for different dots. Interestingly, the (010) state is often missing, even when (200) and (300) states are present. We interpret this anisotropy in electronic structure as a consequence of the shape asymmetry of the dots.     

Synthesis of [100] Wurtzite InN Nanowires and [011] Zinc-Blende InN Nanorods

One-dimensional wurtzite InN nanowires and zincblende InN nanorods are prepared by chemical vapour deposition （CVD） method on natural cleavage plane （110） of GaAs. The growth direction of InN nanowires is [100], with wurtzite structure. The stable crystal structure of InN is wurtzite （w-InN）, zincblende structure （z-InN） is only reported for 2D InN crystals before. However, in this work, the zincblende InN nanorods [011] are synthesized and characterized. The SEM and TEM images show that every nanorod shapes a conical tip, which can be explained by the anisotropy of growth process and the theory of Ehrlich Schwoebel barrier.     

Origin of Schottky barriers in gold contacts on GaAs110

Gold contacts on n-type GaAs(110) have been investigated using scanning tunneling microscopy and spectroscopy in cross-sectional configuration. In spatially resolved current voltage spectroscopy the Schottky barrier potential is visible. We find signatures of delocalized gap states at the interface decaying into the semiconductor and observe a defect density at the interface below 3 x 10(13) cm(-2). Both findings support that the Fermi level pinning at the Au/GaAs(110) interface is dominated by metal-induced gap states.     

Electron density distribution in Si and Ge using multipole, maximum entropy method and pair distribution function analysis

The local, average and electronic structure of the semiconducting materials Si and Ge has been studied using multipole, maximum entropy method (MEM) and pair distribution function (PDF) analyses, using X-ray powder data. The covalent nature of bonding and the interaction between the atoms are clearly revealed by the two-dimensional MEM maps plotted on (100) and (110) planes and one-dimensional density along [100], [110] and [111] directions. The mid-bond electron densities between the atoms are 0.554 e/?³ and 0.187 e/?³ for Si and Ge respectively. In this work, the local structural information has also been obtained by analyzing the atomic pair distribution function. An attempt has been made in the present work to utilize the X-ray powder data sets to refine the structure and electron density distribution using the currently available versatile methods, MEM, multipole analysis and determination of pair distribution function for these two systems.      

掺杂浓度对p-GaAs的带隙变窄的影响

用光致荧光的方法对分子束外延生长的(110)方向的掺Be的GaAs带隙变窄随掺杂浓度的变化进行研究。结果表明:对于P-GaAs,带隙变窄主要是价带上移造成的,杂质能级(带)相对导带的位置不变。因此,电离能随着掺杂浓度的增加而减小。     

高温处理工艺对低压MOCVD外延GaAs/Ge太阳电池的影响

采用自制的低压金属有机化学汽相淀积LP-MOCVD设备,在Ge衬底(100)面向(111)偏9°外延生长出GaAs电池结构,对电池材料进行了X射线衍射分析另外,对由此材料制成的太阳电池进行了性能测试,测试结果表明,Ge衬底的高温处理工艺对GaAs/Ge太阳电池的电流电压特性有一定的影响试验表明,在600～700℃之间高温处理效果较好。     

Surface preparation effect of GaAs(110) substrates on the ZnSe epitaxial layer grown by molecular beam epitaxy

The effect of the surface preparation of the GaAs(110) substrate on the ZnSe epitaxial layer grown by molecular beam epitaxy (MBE) was investigated by means of etch-pit density (EPD) measurements, surface morphology observation, and reflection high-energy electron diffraction (RHEED) analysis. The ZnSe epitaxial layer grown on a GaAs(110) surface prepared by cleaving the (001)-oriented wafer in ultrahigh vacuum (UHV) showed about 5×10⁴ cm^-2 of EPD. This value is much lower than that observed from both the samples grown on the mechanically polished surface with and without a GaAs buffer layer. Due to the non-stoichiometric surface after thermal evaporation of the surface oxide, three-dimensional growth can easily occur on the mechanically polished GaAs(110) substrate. These results suggest that the stoichiometric and atomically flat substrate surface is essential for the growth of low-defect ZnSe epitaxial layers on the GaAs(110) non-polar surface. Received: 21 August 1998 / Accepted: 19 October 1998 / Published online: 28 April 1999     

Surface structure of GaAs(211)

The atomic structures of the two inequivalent (211) surfaces of GaAs have been investigated by LEED. Both surfaces, prepared by etching and heat-cleaning or ion-sputtering and annealing, are unstable and develop large (110) facets which exhibit the atomic geometry of the (110) GaAs surface. These facets entirely cover the surface. Three sets of facets, making 30°, 30° and 54° angles with the (211) plane, are detected on one surface. Only two sets, making 30° angles with the (211) plane, are detected on the other. The reasons for this difference are not understood at this time. The LEED study of Si(211) and Ge(211) shows that the Si surface is flat whereas the Ge surface exhibits reconstructed (311) facets. The structural difference between the (211) surfaces of GaAs and Ge and the facetting of the compound are invoked to explain the problems encountered in the MBE growth of GaAs on Ge(211).     

GaAs/AlGaAs量子阱材料的X射线形貌及其发光性能

本文介绍了用X射线双品形貌术研究MBE生长的GaAs/AlGaAs量子阱材料中的生长缺陷、位错及其对发光性能的影响。同时研究了低温下MBE生长的GaAs/AlGaAs量子阱材料的正交方向的位错。在有应变超品格过渡层高温生长的量子阱材料中,位错及光致发光性能有明显的改善。     

Pressure effects in AlAs/Inx Ga1-xAs/GaAs resonant tunnelling diodes for application in micromachined sensors

This paper reports the current-voltage characteristics of [001]-oriented AlAs/InxGa1-xAs/GaAs resonant tunnelling diodes （RTDs） as a function of uniaxial external stress applied parallel to the [110] and the [1^-10] orientations, and the output characteristics of the GaAs pressure sensor based on the pressure effect on the RTDs. Under [110] stress, the resonance peak voltages of the RTDs shift to more positive voltages. For [1^-10] stress, the peaks shift toward more negative voltages. The resonance peak voltage is linearly dependent on the [110] and [1^-0] stresses and the linear sensitivities are up to 0.69 mV/MPa, -0.69 mV/MPa respectively. For the pressure sensor, the linear sensitivity is up to 0.37 mV/kPa.     

Dependence of the microstructural properties on the substrate temperature in strained CdTe (1 0 0)/GaAs (1 0 0) heterostructures

CdTe thin films were grown on GaAs (1 0 0) substrates by using molecular beam epitaxy at various temperatures. The bright-field transmission electron microscopy (TEM) images and the high-resolution TEM (HRTEM) images showed that the crystallinity of CdTe epilayers grown on GaAs substrates was improved by increasing the substrate temperature. The result of selected-area electron diffraction pattern (SADP) showed that the orientation of the grown CdTe thin films was the (1 0 0) orientation. The lattice constant the strain, and the stress of the CdTe thin film grown on the GaAs substrate were determined from the SADP result. Based on the SADP and HRTEM results, a possible atomic arrangement for the CdTe/GaAs heterostructure is presented.