用激光分子束外延在玻璃衬底上生长La0.67Sr0.33MnO3薄膜

采用激光分子束外延技术,在玻璃衬底上制备了La0.67Sr0.33MnO3 (LSMO) 薄膜,X射线衍射测量结果表明在玻璃衬底上生长的LSMO薄膜沿c轴择优取向生长.在外磁场3 T和88, 220, 300 K条件下,LSMO薄膜的磁电阻变化率分别达到-37.8%, -26.8%和-6.07%.实验结果表明,在廉价的玻璃衬底上制备大面积和具有应用价值的锰氧化物薄膜是可行的.     

异质外延生长钙钛矿结构氧化物薄膜

影响直接外延生长氧化物薄膜的因素有很多,最主要的是保证氧化物薄膜的正确成相和在单晶衬底上成核．直接外延生长时,衬底温度影响到薄膜的成相．衬底温度还影响薄膜的生长动力学,并因此影响薄膜的外延生长取向．由于薄膜是首先在衬底表面成核、成相并生长的,因此衬底材料晶格的影响是不容忽视的．衬底材料（或异质外延材料）与薄膜的相互作用是影响外延生长的最直接因素,而晶格常数失配会造成薄膜样品中存在应力并影响样品性质．利用脉冲激光淀积法,我们成功地外延生长了ＹＢａ２Ｃｕ３Ｏ７超导薄膜、Ｓｒ０．５Ｂａ０．５ＴｉＯ３铁电介电薄膜、Ｌａ０．７Ｃａ０．３ＭｎＯ３铁磁巨磁电阻薄膜、Ｌａ０．５Ｓｒ０．５ＣｏＯ３导电薄膜等多种具有钙钛矿结构的氧化物功能薄膜．以这些钙钛矿结构氧化物薄膜的外延生长为例,本文讨论影响氧化物薄膜异质外延生长的因素     

激光分子束外延BaTiO3薄膜最顶层表面原子平面与薄膜生长机理

用激光分子束外延技术在SrTiO₃(001)衬底上外延生长了高质量的BaTiO_{3< /sub>薄膜,薄膜的生长过程由反射式高能电子衍射仪(RHEED)原位实时监测,表明薄膜具有 二维层状生长模式.薄膜的晶体结构和表面形貌分别由X射线衍射和原子力显微镜表征,显示 该薄膜为完全c轴取向四方相晶体结构,其表面具有原子尺度光滑性.采用角分辨X射线光电 子谱技术(ARXPS),研究了BaTiO3薄膜表面最顶层原子种类和排列状况.结果表 明,BaTiO3 关键词： 激光分子束外延 3薄膜')" href="#">氧化物BaTiO3薄膜 最顶层表面 角分辨X射线光电子谱}     

有机分子束外延技术与研究进展

本文介绍了超高真空分子束外延生长有机薄膜的技术及其研究进展 ,讨论了外延材料的纯化过程和杂质对外延薄膜结构的影响 ;从理论和实验观点评论了薄膜的生长性质和膜的有序结构。超高真空有机分子束外延技术是一种多用途的高技术 ,可以生长有机、无机、有机 /无机混和的薄膜结构。这种薄膜结构是未来光学和电子器件有希望应用的新一类工程材料。     

用激光分子束外延在玻璃衬底上生长La0.67Sr0.33MnO3薄膜

采用激光分子束外延技术,在玻璃衬底上制备了La_067Sr_033MnO₃ （LSMO） 薄膜,X射线衍射测量结果表明在玻璃衬底上生长的LSMO薄膜沿c轴择优取向生长.在外磁场3 T和88, 220, 300 K条件下,LSMO薄膜的磁电阻变化率分别达到-378%, -268%和-607%.实验结果表明,在廉价的玻璃衬底上制备大面积和具有应用价值的锰氧化物薄膜是可行的. 关键词： 锰氧化物薄膜 玻璃衬底 外延生长     

有机分子束外延技术与研究进展

本介绍了超高真空分子束外延生长有机薄膜的技术及基研究进展,讨论了外延材料的纯化过程和杂质对外延薄膜的影响;从理论和实验观点评论了薄膜的生长性质和膜的有序结构。超高真空有机分子束外延技术是一种多用途的高技术,可以生长有机、无机、有机／无机混和的薄膜结构。这种薄膜结构是示来光学和电子器件有希望应用的新一类工程材料。     

LaTiO3(110)薄膜分子束外延生长的精确控制和表面截止层的研究

LaTiO₃ 是一种典型的强关联电子材料, 其(110) 薄膜为通过晶格对称性、应变等的设计调控外延结构的物理性质提供了新的机会. 本文研究了SrTiO₃(110) 衬底表面金属La 和Ti 沉积所引起的微观结构变化, 进而利用电子衍射信号对分子束外延薄膜生长表面阳离子浓度的灵敏响应, 发展了原位、实时、精确控制金属蒸发源沉积速率的方法, 实现了高质量LaTiO₃(110) 薄膜的生长和对阳离子化学配比的精确控制. 由于LaTiO₃中Ti³⁺ 3d 电子的库仑排斥作用, 氧原子层截止的(110) 表面更容易实现极性补偿, 因此生长得到的薄膜表面暴露出单一类型的氧截止面.     

钙钛矿结构氧化物薄膜 的外延生长

在成功地外延生长超导、铁电、铁磁等多种性质的钙钛矿结构氧化物薄膜的基础上,讨论影响氧化物薄膜 外延生长的一些因素.考虑到相形成和薄膜长征动力学,在利用脉冲激光淀积法外延生长氧化物薄膜中衬底温度是十分重要的工艺参数.衬底温度对成相和生长薄膜的取向都有影响.考虑到薄膜是首先在衬底表面成核、成相并生长.因此衬底材料晶格的影响是不容忽视的.观察到衬底材料对薄膜外延生长温度的影响.在适当的工艺条件下,利用低温三步法工艺制备得到有很强织构的外延薄膜.这突出表明界面层的相互作用对钙钛矿结构薄膜的取向有着相当大的影响. 关键词：     

高气压反射式高能电子衍射仪监控脉冲激光外延氧化物薄膜

在超高真空分子束外延（MBE）生长技术中，反射式高能电子衍射仪（RHEED）能实时显示半导体和金属外延生长过程，给出薄膜表面结构和平整度的信息，成为MBE必备的原位表面分 析仪.为了研究氧化物薄膜如高温超导（YBa₂Cu₃O₇） 、铁电薄膜（Sr_1-xBa_x TiO₃）及它们的同质和异质外延结构的生长机理，获得高质量的符合各种应用 需要的氧化 物多层薄膜结构，在常规的制备氧化 关键词： 高温超导薄膜 RHEED     

拓扑绝缘体薄膜生长与栅电压调控输运特性研究

文章讨论了三维拓扑绝缘体制备和输运性质研究方面的进展情况.首先介绍了拓扑绝缘体体材料和薄膜的制备,并介绍了文章作者利用分子束外延方法,在硅表面以及高介电常数材料钛酸锶表面生长高质量拓扑绝缘体Bi2Se3薄膜的工作.然后介绍了拓扑绝缘体输运研究的现状,以及文章作者在栅电压调控拓扑绝缘体外延薄膜的化学势和输运性质方面的研究成果.     

High quality PdTe_2 thin films grown by molecular beam epitaxy

PdTe_2,a member of layered transition metal dichalcogenides(TMDs),has aroused significant research interest due to the coexistence of superconductivity and type-II Dirac fermions.It provides a promising platform to explore the interplay between superconducting quasiparticles and Dirac fermions.Moreover,PdTe_2 has also been used as a substrate for monolayer antimonene growth.Here in this paper,we report the epitaxial growth of high quality PdTe_2 films on bilayer graphene/SiC(0001)by molecular beam epitaxy(MBE).Atomically thin films are characterized by scanning tunneling microscopy(STM),X-ray photoemission spectroscopy(XPS),low-energy electron diffraction(LEED),and Raman spectroscopy.The band structure of 6-layer PdTe_2 film is measured by angle-resolved photoemission spectroscopy(ARPES).Moreover,our air exposure experiments show excellent chemical stability of epitaxial PdTe_2 film.High-quality PdTe_2 films provide opportunities to build antimonene/PdTe_2 heterostructure in ultrahigh vacuum for future applications in electronic and optoelectronic nanodevices.     

Electronic structure of molecular beam epitaxy grown 1T'-MoTe_2 film and strain effect

Atomically thin transition metal dichalcogenide films with distorted trigonal(1T') phase have been predicted to be candidates for realizing quantum spin Hall effect. Growth of 1T' film and experimental investigation of its electronic structure are critical. Here we report the electronic structure of 1T'-MoTe_2 films grown by molecular beam epitaxy(MBE).Growth of the 1T'-MoTe_2 film depends critically on the substrate temperature, and successful growth of the film is indicated by streaky stripes in the reflection high energy electron diffraction(RHEED) and sharp diffraction spots in the low energy electron diffraction(LEED). Angle-resolved photoemission spectroscopy(ARPES) measurements reveal a metallic behavior in the as-grown film with an overlap between the conduction and valence bands. First principles calculation suggests that a suitable tensile strain along the a-axis direction is needed to induce a gap to make it an insulator. Our work not only reports the electronic structure of MBE grown 1T'-MoTe_2 films, but also provides insights for strain engineering to make it possible for quantum spin Hall effect.     

Direct observation of high-temperature polaronic behavior in colossal magnetoresistive manganites

The temperature dependence of the electronic and atomic structure of the colossal magnetoresistive oxides La1-xSrxMnO3 (x=0.3, 0.4) has been studied using core and valence level photoemission, x-ray absorption and emission, and extended x-ray absorption fine structure spectroscopy. A dramatic and reversible change of the electronic structure is observed on crossing the Curie temperature, including charge localization on and spin-moment increase of Mn, together with Jahn-Teller distortions, both signatures of polaron formation. Our data are also consistent with a phase-separation scenario.     

Experimental Realization of an Intrinsic Magnetic Topological Insulator

An intrinsic magnetic topological insulator(TI) is a stoichiometric magnetic compound possessing both inherent magnetic order and topological electronic states. Such a material can provide a shortcut to various novel topological quantum effects but remained elusive experimentally for a long time. Here we report the experimental realization of thin films of an intrinsic magnetic TI, MnBi_2Te_4, by alternate growth of a Bi_2Te_3 quintuple layer and a MnTe bilayer with molecular beam epitaxy. The material shows the archetypical Dirac surface states in angle-resolved photoemission spectroscopy and is demonstrated to be an antiferromagnetic topological insulator with ferromagnetic surfaces by magnetic and transport measurements as well as first-principles calculations. The unique magnetic and topological electronic structures and their interplays enable the material to embody rich quantum phases such as quantum anomalous Hall insulators and axion insulators at higher temperature and in a well-controlled way.     

Homogeneous Si films on CaF2/Si(1 1 1) due to boron enhanced solid phase epitaxy

The structure and morphology of Si/CaF₂/Si(1 1 1) structures have been investigated by X-ray diffraction (XRD, GIXRD) and X-ray photoelectron spectroscopy (XPS). While CaF₂ films were grown via molecular beam epitaxy (MBE), Si films on CaF₂/Si(1 1 1) are fabricated by surfactant enhanced solid phase epitaxy (SE-SPE). Here Boron was used as a surfactant to obtain semiconductor films of homogeneous thickness. The Si films are entirely relaxed while the CaF₂ films have both pseudomorphic and relaxed crystallites. After exposure to ambient conditions, the Si films have a very thin native oxide film. The homogeneous Si film partially prevents the incorporation of impurities at the interface between the Si substrate and CaF₂ via migration along residual defects of the CaF₂ film.     

Detection of Fe 3d electronic states in valence band and magnetic properties of Fe-doped ZnO film

Fe-doped ZnO film has been grown by laser molecular beam epitaxy (L-MBE) and structurally characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM), all of which reveal the high quality of the film. No secondary phase was detected. Resonant photoemission spectroscopy (RPES) with photon energies around the Fe 2p-3d absorption edge is performed to detect the electronic structure in the valence band. A strong resonant effect at a photon energy of 710 eV is observed. Fe³⁺ is the only valence state of Fe ions in the film and the Fe 3d electronic states are concentrated at binding energies of about 3.8 eV and 7 eV～ 8 eV. There are no electronic states related to Fe near the Fermi level. Magnetic measurements reveal a typical superparamagnetic property at room temperature. The absence of electronic states related to Fe near the Fermi level and the high quality of the film, with few defects, provide little support to ferromagnetism.     

Structure and properties of Si nanostructures on highly oriented pyrolitic graphite surface

The morphology, electronic structure, and optical properties of self-assembled silicon nanostructures grown on the surface of highly oriented pyrolitic graphite (HOPG) by molecular beam epitaxy have been studied by ultra-high-vacuum scanning tunneling microscopy and X-ray photoemission spectroscopy in situ, as well as by Raman spectroscopy ex situ. At a coverage of less than one monolayer, formation of monolayer silicon nanoislands with an atomic structure similar to that of graphene has been observed.     

The structure and properties of the Si nanostructures on an HOPG surface

The morphology, electronic structure, and optical properties of self-assembled silicon nanostructures grown on the surface of Highly Oriented Pyrolytic Graphite (HOPG) by molecular beam epitaxy were studied by ultra high vacuum (UHV) scanning tunneling microscopy (STM) and X-ray photoemission spectroscopy (XPS) in situ, and by Raman spectroscopy ex situ. At coverages of less than 1 monolayer (ML), the formation of monolayered silicon nanoislands with an atomic structure similar to that of graphene was observed.