Influence of excitation power on temperature-dependent photoluminescence of phase-separated InGaN quantum wells

Temperature-dependent photoluminescence(PL) of phase-separated InGaN quantum wells is investigated over a broader excitation power range. With increasing excitation power from 0.5 ^xW to 50 mW, the In-rich quasi-quantum dot(QD)-related PL peak disappears at about 3 mW, while temperature behavior of the InGaN matrix-related PL peak energy(linewidth) gradually evolves from a strong S-shaped(W-shaped)temperature dependence into a weak ^S-shaped15(an approximately ￡tV-shaped75), until becoming an invertedV-shaped(a monotonically increasing) temperature dependence. This indicates that, with increasing excitation power, the carrier localization effect is gradually reduced and the QD-related transition is submerged by the significantly enhanced InGaN matrix-related transition, while the carrier thermalization effect gradually increases to become predominant at high excitation powers.     

Phonon satellites and time-resolved studies of carrier recombination dynamics in InGaN quantum wells

We have studied the photoluminescence and time-resolved photoluminescence of a set of InGaN quantum wells with well thickness from 1 to 7.5 nm. An analysis of the phonon satellites at 5 K shows Huang–Rhys factors from 0.32 to 0.44. The increase of this factor is caused by the electron–hole separation induced by the piezoelectric field. The time-resolved photoluminescence at room temperature shows that the decay time of the 1 and 2 nm wells does not depend on the wavelength. The maximum decay time is around 600 ps for the 2, 3 and 4 nm wells. However, for the 3 and 4 nm wells a decrease of the photoluminescence decay time is observed at the highest wavelengths. This suggest the onset of a non-radiative process in these samples. The optimum well width for efficient emission for these single quantum wells was found to be 2 nm.     

InGaN/GaN多量子阱的组分确定和晶格常数计算

采用金属有机化学气相沉积(MOCVD)技术以蓝宝石为衬底在n型GaN单晶层上生长了InGaN/GaN多量子阱结构外延薄膜，利用高分辨X射线衍射(HRXRD)，卢瑟福背散射/沟道(RBS/channeling)，以及光致发光(PL)技术对InGaN/GaN多量子阱结构薄膜分别进行了平均晶格常数计算、In原子替位率计算和In组分的定量分析.研究表明：InGaN/GaN多量子阱的水平和垂直方向平均晶格常数分别为a_epi=0.3195nm，c_epi=0.5198nm，In原子的替位率为99.3%，利用HRXRD和RBS/channeling两种分析技术计算In的组分分别是0.023和0.026，并与样品生长时设定的预期目标相符合，验证了两种实验方法的准确性；而用室温条件下的光致发光谱(PL)来计算InGaN/GaN多量子阱中In的组分是与HRXRD和RBS/channeling的实验结果相差很大，说明用PL测试In组分的方法是不适宜的. 关键词： InGaN/GaN多量子阱 高分辨X射线衍射 卢瑟福背散射/沟道 光致发光     

Optical properties of InGaAsBi/GaAs strained quantum wells studied by temperature-dependent photoluminescence

The effect of bismuth on the optical properties of InGaAsBi/GaAs quantum well structures is investigated using the temperature-dependent photoluminescence from 12 K to 450 K.The incorporation of bismuth in the InGaAsBi quantum well is confirmed and found to result in a red shift of photoluminescence wavelength of 27.3 meV at 300 K.The photoluminescence intensity is significantly enhanced by about 50 times at 12 K with respect to that of the InGaAs quantum well due to the surfactant effect of bismuth.The temperature-dependent integrated photoluminescence intensities of the two samples reveal different behaviors related to various non-radiative recombination processes.The incorporation of bismuth also induces alloy non-uniformity in the quantum well,leading to an increased photoluminescence linewidth.     

低温近场光学显微术对InGaN/GaN多量子阱电致发光温度特性的研究

使用实验室自制的低温近场光学显微镜研究了InGaN/GaN多量子阱发光二极管在室温和液氮 温度下的近场光学像和近场光谱，发现随着温度的降低，不仅近场光学像的光强起伏大大减 小，量子阱发光峰先蓝移后红移，而且在液氮温度下在光子能量更高的位置上出现了新的发 光峰.通过对实验结果的分析，我们将这个新出现的峰归结为p-GaN层中导带底-受主能级间 跃迁形成. 关键词： InGaN/GaN多量子阱 发光二极管 近场光学 低温     

Effects of a prestrained InGaN interlayer on the emission properties of InGaN/GaN multiple quantum wells in a laser diode structure

The electroluminescence (EL) and photoluminescence (PL) spectra of InGaN/GaN multiple quantum wells (MQWs) with a prestrained InGaN interlayer in a laser diode structure are investigated. When the injection current increases from 5 mA to 50 mA, the blueshift of the EL emission peak is 1 meV for the prestrained sample and 23 meV for a control sample with the conventional structure. Also, the internal quantum efficiency and the EL intensity at the injection current of 20 mA are increased by 71% and 65% respectively by inserting the prestrained InGaN interlayer. The reduced blueshift and the enhanced emission are attributed mainly to the reduced quantum-confined Stark effect (QCSE) in the prestrained sample. Such attributions are supported by the theoretical simulation results, which reveal the smaller piezoelectric field and the enhanced overlap of electron and hole wave functions in the prestrained sample. Therefore, the prestrained InGaN interlayer contributes to strain relaxation in the MQW layer and enhancement of light emission due to the reduction of QCSE.     

Effects of InGaN barriers with low indium content on internal quantum efficiency of blue InGaN multiple quantum wells

Blue In_0.2Ga_0.8N multiple quantum wells (MQWs) with In_xGa_{1 - x}N (x=0.01-0.04) barriers are grown by metal organic vapour phase epitaxy. The internal quantum efficiencies (IQEs) of these MQWs are studied in a way of temperature-dependent photoluminescence spectra. Furthermore, a 2-channel Arrhenius model is used to analyse the nonradiative recombination centres (NRCs). It is found that by adopting the InGaN barrier beneath the lowest well, it is possible to reduce the strain hence the NRCs in InGaN MQWs. By optimizing the thickness and the indium content of the InGaN barriers, the IQEs of InGaN/InGaN MQWs can be increased by about 2.5 times compared with conventional InGaN/GaN MQWs. On the other hand, the incorporation of indium atoms into the intermediate barriers between adjacent wells does not improve IQE obviously. In addition, the indium content of the intermediate barriers should match with that of the lowest barrier to avoid relaxation.     

Influence of barrier thickness on the structural and optical properties of InGaN/GaN multiple quantum wells

The structural and optical properties of InGaN/GaN multiple quantum wells(MQWs) with different barrier thicknesses are studied by means of high resolution X-ray diffraction(HRXRD), a cross-sectional transmission electron microscope(TEM), and temperature-dependent photoluminescence(PL) measurements. HRXRD and cross-sectional TEM measurements show that the interfaces between wells and barriers are abrupt and the entire MQW region has good periodicity for all three samples. As the barrier thickness is increased, the temperature of the turning point from blueshift to redshift of the S-shaped temperature-dependent PL peak energy increases monotonously, which indicates that the localization potentials due to In-rich clusters is deeper. From the Arrhenius plot of the normalized integrated PL intensity, it is found that there are two kinds of nonradiative recombination processes accounting for the thermal quenching of photoluminescence,and the corresponding activation energy(or the localization potential) increases with the increase of the barrier thickness.The dependence on barrier thickness is attributed to the redistribution of In-rich clusters during the growth of barrier layers,i.e., clusters with lower In contents aggregate into clusters with higher In contents.     

Effect of built-in electric field on electron Raman scattering in InGaN/GaN coupled quantum wells

Electron Raman scattering (ERS) in wurtzite In_xGaN_1−x/GaN coupled quantum wells (CQWs) is investigated by effective-mass approximation and second-perturbation approach, including a strong built-in electric field (BEF) effect due to the piezoelectricity and spontaneous polarization. The dependence of differential cross-section (DCS) on structural parameters of CQWs is studied. Our results show that the strong BEF gives rise to a remarkable reduction of the DCS, which is around three orders smaller than that of the CQWs without BEF. With the presence of the BEF, the emitted photon energy decreases about 10 times as a consequence of quantum-confined Stark effect.     

Blue InGaN light-emitting diodes with dip-shaped quantum wells

InGaN based light-emitting diodes (LEDs) with dip-shaped quantum wells and conventional rectangular quantum wells are numerically investigated by using the APSYS simulation software. It is found that the structure with dip-shaped quantum wells shows improved light output power, lower current leakage and less efficiency droop. Based on numerical simulation and analysis, these improvements on the electrical and the optical characteristics are attributed mainly to the alleviation of the electrostatic field in dip-shaped InGaN/GaN multiple quantum wells (MQWs).     

Analysis of localization effect in blue-violet light emitting InGaN/GaN multiple quantum wells with different well widths

Four blue-violet light emitting InGaN/GaN multiple quantum well(MQW) structures with different well widths are grown by metal–organic chemical vapor deposition. The carrier localization effect in these samples is investigated mainly by temperature-dependent photoluminescence measurements. It is found that the localization effect is enhanced as the well width increases from 1.8 nm to 3.6 nm in our experiments. The temperature induced PL peak blueshift and linewidth variation increase with increasing well width, implying that a greater amplitude of potential fluctuation as well as more localization states exist in wider wells. In addition, it is noted that the broadening of the PL spectra always occurs mainly on the low-energy side of the PL spectra due to the temperature-induced band-gap shrinkage, while in the case of the widest well, a large extension of the spectral curve also occurs in the high energy sides due to the existence of more shallow localized centers.     

垒掺In提高InGaN/GaN多量子阱发光特性

利用金属有机物化学气相淀积技术在蓝宝石衬底上生长InGaN/GaN多量子阱结构.对多量子阱垒层掺In和非掺In进行了比较研究，结果表明，垒掺In 的样品界面质量变差，但明显增加了光致发光谱的峰值强度和积分强度，带边峰与黄光峰强度之比增大，降低了表面粗糙度.利用这两种结构制备了相应的发光二极管(LED)样品.通过电荧光测量可知，垒掺In的LED比非掺In的LED有较高的发光强度和相对均匀的波长，这主要是由于垒掺In后降低了阱与垒之间晶格失配的应力，从而降低了极化电场，提高了辐射复合效率. 关键词： InGaN/GaN多量子阱 X射线双晶衍射 原子力显微镜 光致发光     

纤锌矿InGaN staggered量子阱中的激子态和光学性质

本文将基于有效质量近似下的变分法,理论研究了纤锌矿InGaN/GaN staggered量子阱中的激子态和光学性质.数值结果显示了InGaN量子阱中的量子尺寸和staggered受限垒对束缚于量子阱中的激子态和光学性质有着明显的影响.当阱宽增加时,量子受限效应减弱,激子结合能降低,带间发光波长增加.另一方面,当量子阱中staggered受限势增加时,量子受限效应增强,激子结合能升高,带间发光波长降低.本文的理论结果证明了可以通过调节staggered垒高和量子尺寸来调控纤锌矿InGaN staggered量子阱中的激子态和光学性质.     

InGaN/GaN multiple quantum well solar cells with an enhanced open-circuit voltage

In this paper,InGaN/GaN multiple quantum well solar cells (MQWSCs) with an In content of 0.15 are fabricated and studied.The short-circuit density,fill factor and open-circuit voltage (V oc) of the device are 0.7 mA/cm 2,0.40 and 2.22 V,respectively.The results exhibit a significant enhancement of V oc compared with those of InGaN-based hetero and homojunction cells.This enhancement indicates that the InGaN/GaN MQWSC offers an effective way for increasing V oc of an In-rich In x Ga 1 x N solar cell.The device exhibits an external quantum efficiency (EQE) of 36% (7%) at 388 nm (430 nm).The photovoltaic performance of the device can be improved by optimizing the structure of the InGaN/GaN multiple quantum well.     

纤锌矿InGaN staggered量子阱中的激子态和光学性质

本文将基于有效质量近似下的变分法,理论研究了纤锌矿InGaN/GaN staggered 量子阱中的激子态和光学性质。数值结果显示了InGaN量子阱中的量子尺寸和staggered受限垒对束缚于量子阱中的激子态和光学性质有着明显地影响。当阱宽增加时,量子受限效应减弱,激子结合能降低, 带间发光波长增加。另一方面,当量子阱中staggered受限势增加时,量子受限效应增强,激子结合能升高,带间发光波长降低。本文的理论结果证明了可以通过调节staggered垒高和量子尺寸来调控纤锌矿InGaN staggered 量子阱中的激子态和光学性质。     

Effect of electron screening on the photoluminescence in GaAs/AlGaAs quantum wells

Magneto-photoluminescence of one-side-doped GaAs/AlGaAs single quantum well is measured. Dependence of the spectra on the well width revealed that the long range screening effect of two-dimensional electrons on a free hole plays an important role in the process of recombination.     

MBE生长PbSe/PbSrSe量子阱结构的光致中红外发光的研究

研究了分子束外延技术生长的PbSe/PbSrSe多量子阱结构的中红外光致荧光现象.高分辨率X射线衍射（HRXRD）谱观察到了多量子阱所特有的多级卫星峰,表明量子阱界面陡峭.变温光致荧光谱测量显示量子阱结构对电子空穴有强的限制效应,在相同温度下,量子阱样品的荧光峰峰位相对PbSe体材料有一定的蓝移.发现量子阱样品的荧光强度同温度有关,温度从150 K上升到230 K时,荧光强度逐渐增大,温度继续升高,荧光强度缓慢下降,但在高于室温时,仍能观察到较强的荧光发射,这说明该量子阱结构材料具有应用于室温工作的中红外 关键词： PbSe/PbSrSe多层量子阱（MQWs） 光致中红外荧光 高分辨X射线衍射（HRXRD）     

In源流量与Ⅲ族流量之比对InGaN/GaN多量子阱性质的影响

利用x射线三轴晶衍射和光致发光谱研究了生长参数In源流量与Ⅲ族流量之比对InGaN/GaN多量子阱结构缺陷(如位错密度和界面粗糙度)和光致发光的影响.通过对（0002）对称和（1012）非对称联动扫描的每一个卫星峰的ω扫描，分别测量出了多量子阱的螺位错和刃位错平均密度，而界面粗糙度则由（0002）对称衍射的卫星峰半高全宽随级数的变化得出.试验发现多量子阱中的位错密度特别是刃位错密度和界面粗糙度随In源流量与Ⅲ族源流量比值的增加而增加，导致室温下光致发光性质的降低，从而也证明了刃位错在InGaN/GaN 关键词： x射线三轴晶衍射 界面粗糙度 位错 InGaN/GaN多量子阱     

Photoluminescence and photoluminescence excitation of AlGaAs/GaAs quantum wells with growth-interrupted heterointerfaces grown by molecular beam epitaxy

We have measured the photoluminescence (PL) and PL excitation (PLE) of AlGaAs/GaAs single quantum wells with growth-interrupted heterointerfaces. PLE shows the small Stokes shifts of less than 1 meV indicating the extremely flat heterointerfaces without microroughness. Photoluminescence spectra show four peaks originating from different monolayer terraces. These peaks exhibit a doublet splitting. We assigned this doublet to free excitons and excitons bound to neutral donors from the strong well width dependence of doublet splitting.     

Characteristics of InGaN light emitting diode depending on Si-doping on InGaN layers below quantum wells

Effect of Si-doping on InGaN layers below the quantum wells (QWs), which cause different levels of charge concentration in the depletion region, have been investigated for InGaN light emitting diodes (LEDs). Four groups of InGaN LEDs with different levels of Si-doping on InGaN/GaN layers below quantum-wells have been produced for the experiment (i.e., 0.5 × 10¹⁷ cm^?3 for group A, 1 × 10¹⁷ cm^?3 for group B, 5 × 10¹⁷ cm^?3 for group C, and 1 × 10¹⁸ cm^?3 for group D.) The reverse leakage current of LED can be significantly decreased and the light output power of LED can be enhanced by lowering the background charge concentration in the depletion region of LED. Such result enables us to improve the device lifetime by inhibiting the degradation of the GaN-based LED.