N2 emission in NO and N2O reduction on Rh(100) and Rh(110)

The angular distribution of desorbing N(2) was studied in both the thermal decomposition of N(2)O(a) on Rh(100) at 60-140 K and the steady-state NO (or N(2)O) + D(2) reaction on Rh(100) and Rh(110) at 280-900 K. In the former, N(2) desorption shows two peaks at around 85 and 110 K. At low N(2)O coverage, the desorption at 85 K collimates at about 66 degrees off normal towards the [001] direction, whereas at high coverage, it sharply collimates along the surface normal. In the NO reduction on Rh(100), the N(2) desorption preferentially collimates at around 71 degrees off normal towards the [001] direction below about 700 K, whereas it collimates predominantly along the surface normal at higher temperatures. At lower temperatures, the surface nitrogen removal in the NO reduction is due to the process of NO(a) + N(a) --> N(2)O(a) --> N(2)(g) + O(a). On the other hand, in the steady-state N(2)O + D(2) reaction on Rh(110), the N(2) desorption collimates closely along the [001] direction (close to the surface parallel) below 340 K and shifts to ca. 65 degrees off normal at higher temperatures. In the reduction with CO, the N(2) desorption collimates along around 65 degrees off normal towards the [001] direction above 520 K, and shifts to 45 degrees at 445 K with decreasing surface temperature. It is proposed that N(2)O is oriented along the [001] direction on both surfaces before dissociation and the emitted N(2) is not scattered by adsorbed hydrogen.     

N+NO reaction on Rh(111) surfaces studied with fast near-edge X-ray absorption fine structure spectroscopy: role of NO dimer as an extrinsic precursor

We studied the mechanism of the N+NO reaction on Rh(111) surfaces by means of fast near-edge X-ray absorption fine structure spectroscopy. This reaction is important as a basis of NOx reduction reactions on platinum-group metal surfaces. Atomic nitrogen layers on Rh(111) were titrated with NO at various temperatures. N2O is exclusively formed and desorbs into the gas phase below 350 K. The consumption rate of atomic nitrogen exhibits strange temperature dependence between 100 and 350 K; the reaction proceeds slower with increasing temperature. Reaction kinetics analyses and isotope-controlled experiments have revealed that the surface N atoms do not react with chemisorbed NO molecules but with NO dimers weakly bound on top of the chemisorbed layer, which play a role as an extrinsic precursor. The present results may support the possibility that NO dimers participate in various NO-related synthetic, biochemical, and surface reactions as an intermediate.     

NO2在Ag/Pt(110)双金属表面上的吸附和分解

利用俄歇电子能谱(AES)和程序升温脱附谱(TDS)研究了NO₂在Ag/Pt(110)双金属表面的吸附和分解.室温下NO₂ 在Ag/Pt(110)双金属表面发生解离吸附, 生成NO(ads)和O(ads)表面吸附物种. 在升温过程中NO(ads)物种发生脱附或者进一步分解. 500 K时NO₂在Ag/Pt(110)双金属表面发生解离吸附生成O(ads)表面吸附物种. Pt 向Ag传递电子, 从而削弱Pt－O键的强度, 降低O(ads)从Pt 表面的并合脱附温度. 发现能够形成具有稳定组成的Ag/Pt(110)合金结构, 其表现出与Pt(110)-(1×2)相似的解离吸附NO₂能力, 但与O(ads)的结合明显弱于Pt(110)-(1×2). 该AgPt(110)合金结构是可能的低温催化直接分解氮氧化物活性结构.     

Ambient Pressure X-ray Photoelectron Spectroscopy Study of Oxidation Phase Transitions on Cu(111) and Cu(110)

The surface structure effect on the oxidation of Cu has been investigated by performing ambient-pressure X-ray photoelectron spectroscopy (APXPS) on Cu(111) and Cu(110) surfaces under oxygen pressures ranging from 10⁻⁸ to 1 mbar and temperatures from 300 to 750 K. The APXPS results show a subsequential phase transition from chemisorbed O/Cu overlayer to Cu₂O and then to CuO on both surfaces. For a given temperature, the oxygen pressure needed to induce initial formation of Cu₂O on Cu(110) is about two orders of magnitude greater than that on Cu(111), which is in contrast with the facile formation of O/Cu overlayer on clean Cu(110). The depth profile measurements during the initial stage of Cu₂O formation indicate the distinct growth modes of Cu₂O on the two surface orientations. We attribute these prominent effects of surface structure to the disparities in the kinetic processes, such as the dissociation and surface/bulk diffusion over O/Cu overlayers. Our findings provide new insights into the kinetics-controlled process of Cu oxidation by oxygen.     

Water dissociation associated with NO2 coadsorption on Mo(110)-(1 x 6)-O: effect of coverage and electronic properties of oxygen

Water dissociation on an oxygen-covered Mo(110) surface was investigated using temperature-programmed reaction spectroscopy (TPRS) and infrared reflectance absorbance spectroscopy (IRAS). Adsorbed hydroxyl formation is enhanced by increasing the coverage of chemisorbed oxygen prior to exposure to water up to saturation (0.66 ML). Additional oxidation of the surface using NO(2) suppresses the formation of hydroxyl species (OH). There is no detectable change in the reaction of NO(2) on Mo(110)-(1 x 6)-O when either the water or hydroxyl is adsorbed on the Mo(110)-(1 x 6)-O surface prior to NO(2) adsorption. In contrast, NO(2) induces the displacement of water into the gas phase and the conversion of hydroxyl species to molecular water. Infrared spectra show that the dissociation of NO(2) populates three types of terminal oxygen sites on Mo(110)-(1 x 6)-O, and the population of the terminal oxygen at step sites increases with respect to the amount of NO(2) deposited. Overall, these results suggest that the oxidic property of oxygen results in a lack of activity for the water dissociation.     

The role of Oad in the decomposition of NH3 adsorbed on Ir(110): a combined TPD and high-energy resolution fast XPS study

High energy resolution fast XPS combined with TPD experiments were used to study the effect of chemisorbed oxygen on the adsorption and dissociation of NH(3) on Ir(110). Below 250 K the presence of O(ad) does not influence NH(3) decomposition. Above 250 K O(ad) enhances NH(3) dissociation, which results in three times as much N(2) formation and less molecular NH(3) desorption compared to the experiments without O(ad). The effect of O(ad) can be attributed to destabilization of NH(ad) on the surface, resulting in a further dehydrogenation towards N(ad). The presence of O(ad) on the surface lowers the temperature at which the N(ad) combination reaction takes place by as much as 200 K, due to repulsive interaction between N(ad) and O(ad). NO is formed above 450 K if both N(ad) and O(ad) are present on the surface.     

In situ oxidation study of Pt(110) and its interaction with CO

Many interesting structures have been observed for O(2)-exposed Pt(110). These structures, along with their stability and reactivity toward CO, provide insights into catalytic processes on open Pt surfaces, which have similarities to Pt nanoparticle catalysts. In this study, we present results from ambient-pressure X-ray photoelectron spectroscopy, high-pressure scanning tunneling microscopy, and density functional theory calculations. At low oxygen pressure, only chemisorbed oxygen is observed on the Pt(110) surface. At higher pressure (0.5 Torr of O(2)), nanometer-sized islands of multilayered α-PtO(2)-like surface oxide form along with chemisorbed oxygen. Both chemisorbed oxygen and the surface oxide are removed in the presence of CO, and the rate of disappearance of the surface oxide is close to that of the chemisorbed oxygen at 270 K. The spectroscopic features of the surface oxide are similar to the oxide observed on Pt nanoparticles of a similar size, which provides us an extra incentive to revisit some single-crystal model catalyst surfaces under elevated pressure using in situ tools.     

Adsorption and interaction of ethylene on RuO2(110) surfaces

Ethylene (C2H4) adsorbed on the stoichiometric and oxygen-rich RuO2(110) surfaces, exposing coordinatively unsaturated Ru-cus and O-cus atoms, is investigated by applying high-resolution electron energy-loss spectroscopy and thermal desorption spectroscopy in combination with isotope labeling experiments. On the stoichiometric RuO2(110) surface C2H4 adsorbs and desorbs molecularly. In contrast, on the oxygen-rich RuO2(110) surface ethylene adsorbs molecularly at 85 K and is completely oxidized through interaction with O-cus and O-bridge upon annealing to 500 K. The first couple of reactions are observed at 200 K taking place on Ru-cus: A change from pi- to sigma-bonding, formation of -C=O and -C-O groups, and dehydrogenation giving rise to H2O adsorbed at Ru-cus. Maximum reaction rate is reached for C2H4 chemisorbed at Ru-cus with O-cus neighbors on each side. A model for the first couple of reactions is sketched. For the final combustion, C2H4 reacts both with O-cus and O-bridge. Ethylene oxide is not detected under any circumstance.     

Catalytic oxidation of ammonia on RuO2(110) surfaces: mechanism and selectivity

The selective oxidation of ammonia to either N2 or NO on RuO2(110) single-crystal surfaces was investigated by a combination of vibrational spectroscopy (HREELS), thermal desorption spectroscopy (TDS) and steady-state rate measurements under continuous flow conditions. The stoichiometric RuO2(110) surface exposes coordinatively unsaturated (cus) Ru atoms onto which adsorption of NH3 (NH3-cus) or dissociative adsorption of oxygen (O-cus) may occur. In the absence of O-cus, ammonia desorbs completely thermally without any reaction. However, interaction between NH3-cus and O-cus starts already at 90 K by hydrogen abstraction and hydrogenation to OH-cus, leading eventually to N-cus and H2O. The N-cus species recombine either with each other to N2 or with neighboring O-cus leading to strongly held NO-cus which desorbs around 500 K. The latter reaction is favored by higher concentrations of O-cus. Under steady-state flow condition with constant NH3 partial pressure and varying O2 pressure, the rate for N2 formation takes off first, passes through a maximum and then decreases again, whereas that for NO production exhibits an S-shape and rises continuously. In this way at 530 K almost 100% selectivity for NO formation (with fairly high reaction probability for NH3) is reached.     

CO和NO在CuO及Cu2O(110)表面吸附选择规律研究

采用离散变分Xα方法分别计算了CO和NO以C（或N）端顶位吸附在CuO（110）及Cu2O（110）表面上的基态势能曲线,结果表明：CO在Cu2O表面上的吸附强,而在CuO表面上的吸附弱;NO则在CuO表面上吸附强,在Cu2O表面上吸附弱．它们的吸附能的大小顺序为：CuO－NO＞Cu2O－CO＞Cu2O－NO＞CuO－CO．对于CuO－NO（或CO）吸附体系,主要是Cu的3d轨道与吸附分子的2π轨道间的相互作用;对于Cu2O－CO（或NO）吸附体系,则主要是吸附质分子的5σ及2π分子轨道与其顶位Cu1的4s及4p轨道和侧位Cu2的3d轨道相互作用．本文通过吸附势能曲线、态密度分析、成键分析及电荷转移量和方向等方面对实验现象做了合理的解释．     

Kinetics of CO oxidation on high-concentration phases of atomic oxygen on Pt(111)

Temperature-programmed reaction spectroscopy (TPRS) and direct, isothermal reaction-rate measurements were employed to investigate the oxidation of CO on Pt(111) covered with high concentrations of atomic oxygen. The TPRS results show that oxygen atoms chemisorbed on Pt(111) at coverages just above 0.25 ML (monolayers) are reactive toward coadsorbed CO, producing CO(2) at about 295 K. The uptake of CO on Pt(111) is found to decrease with increasing oxygen coverage beyond 0.25 ML and becomes immeasurable at a surface temperature of 100 K when Pt(111) is partially covered with Pt oxide domains at oxygen coverages above 1.5 ML. The rate of CO oxidation measured as a function of CO beam exposure to the surface exhibits a nearly linear increase toward a maximum for initial oxygen coverages between 0.25 and 0.50 ML and constant surface temperatures between 300 and 500 K. At a fixed CO incident flux, the time required to reach the maximum reaction rate increases as the initial oxygen coverage is increased to 0.50 ML. A time lag prior to the reaction-rate maximum is also observed when Pt oxide domains are present on the surface, but the reaction rate increases more slowly with CO exposure and much longer time lags are observed, indicating that the oxide phase is less reactive toward CO than are chemisorbed oxygen atoms on Pt(111). On the partially oxidized surface, the CO exposure needed to reach the rate maximum increases significantly with increases in both the initial oxygen coverage and the surface temperature. A kinetic model is developed that reproduces the qualitative dependence of the CO oxidation rate on the atomic oxygen coverage and the surface temperature. The model assumes that CO chemisorption and reaction occur only on regions of the surface covered by chemisorbed oxygen atoms and describes the CO chemisorption probability as a decreasing function of the atomic oxygen coverage in the chemisorbed phase. The model also takes into account the migration of oxygen atoms from oxide domains to domains with chemisorbed oxygen atoms. According to the model, the reaction rate initially increases with the CO exposure because the rate of CO chemisorption is enhanced as the coverage of chemisorbed oxygen atoms decreases during reaction. Longer rate delays are predicted for the partially oxidized surface because oxygen migration from the oxide phase maintains high oxygen coverages in the coexisting chemisorbed oxygen phase that hinder CO chemisorption. It is shown that the time evolution of the CO oxidation rate is determined by the relative rates of CO chemisorption and oxygen migration, R(ad) and R(m), respectively, with an increase in the relative rate of oxygen migration acting to inhibit the reaction. We find that the time lag in the reaction rate increases nearly exponentially with the initial oxygen coverage [O](i) (tot) when [O](i) (tot) exceeds a critical value, which is defined as the coverage above which R(ad)R(m) is less than unity at fixed CO incident flux and surface temperature. These results demonstrate that the kinetics for CO oxidation on oxidized Pt(111) is governed by the sensitivity of CO binding and chemisorption on the atomic oxygen coverage and the distribution of surface oxygen phases.     

Promotion of formaldehyde production from adsorbed methoxy by oxidation of Mo(110) with NO2

The reaction of methoxy (OCH3) in the presence of NO2 is studied on a thin-film oxide of Mo(110) for its relevance to the alkane-assisted reduction of NO(x). Temperature-programmed reaction indicates that oxygen deposited by NO2 dissociation promotes formaldehyde evolution. This pathway is not observed in any appreciable amount for methoxy on the thin-film oxide of Mo(110), nor for the reaction of methoxy in the presence of NO or O2. No new intermediates, in particular those containing C-N bonds, are detected after NO2 is exposed to the surface containing methoxy. Furthermore, infrared spectra provide evidence that the presence of NO2 does not significantly perturb the methoxy intermediate. These results indicate that surface oxidation rather than intermolecular complexation is the most likely mechanism by which NO2 promotes the evolution of oxygenates. In addition, the presence of methoxy decreases the capacity of the Mo surface to reduce NO2. No N2 is produced, and molecular desorption predominates. There are also no NO(x) species present after heating to 500 K when NO2 reacts in the presence of methoxy, whereas monomeric NO and dinitrosyl are present when NO2 reacts alone. These results are discussed in the context of CH4-assisted NO(x) reduction.     

Density functional theory study of the oxidation of ammonia on the IrO2(110) surface

In this study, we employed density functional theory (DFT) to investigate the oxidation of ammonia (NH(3)) on the IrO(2)(110) surface. We characterized the possible reaction pathways for the dehydrogenation of NH(x) species (x = 1-3) and for the formation of the oxidation products N(2), N(2)O, NO, NO(2), and H(2)O. The presence of oxygen atoms on coordinatively unsaturated sites (O(cus)) of the oxygen-rich IrO(2)(110) surface promotes the oxidation of NH(3) on the surface. In contrast, NH(3) molecules prefer undergoing desorption over oxidation on the stoichiometric IrO(2)(110) surface. Moreover, the O(cus) atoms are also the major oxidants leading to the formation of oxidation products; none of the oxidations mediated by the bridge oxygen atoms were favorable reactions. The energy barrier for formation of H(2)O as a gaseous oxidation product on the IrO(2)(110) surface is high (from 1.83 to 2.29 eV), potentially leading to the formation of nitrogen-atom-containing products at high temperature. In addition, the selectivity toward the nitrogen-atom-containing products is dominated by the coverage of O(cus) atoms on the surface; for example, a higher coverage of O(cus) atoms results in greater production of nitrogen oxides (NO, NO(2)).     

Surface and subsurface oxidation of Mo2C/Mo(100): low-energy ion-scattering, auger electron, angle-resolved X-ray photoelectron, and mass spectroscopy studies

The interaction of oxygen with a carburized Mo(100) surface was investigated at different temperatures (300-1000 K). The different information depths of low-energy ion-scattering (LEIS) spectroscopy, with topmost layer sensitivity, Auger electron spectroscopy (AES), and angle-resolved X-ray photoelectron spectroscopy (ARXPS) allowed us to discriminate between reactions on the topmost layer and subsurface transformations. According to ARXPS measurements, a carbide overlayer was prepared by the high-temperature decomposition of C(2)H(4) on Mo(100), and the carbon distribution proved to be homogeneous with a Mo(2)C stoichiometry down to the information depth of XPS. O(2) adsorbs dissociatively on the carbide layer at room temperature. One part of the chemisorbed oxygen is bound to both C and Mo sites, indicated by LEIS. Another fraction of oxygen atoms probably resides in the hollow sites not occupied by C. The removal of C from the outermost layer by O(2), in the form of CO, detected by mass spectroscopy (MS), was observed at 500-600 K. The carbon-depleted first layer is able to adsorb more oxygen compared to the Mo(2)C/Mo(100) surface. Applying higher doses of O(2) at 800 K results in the inward diffusion of O and the partial oxidation of Mo atoms. This process, however, is not accompanied by the removal of C from subsurface sites. The depletion of C from the bulk starts only at 900 K (as shown by MS, AES, and XPS), very probably by the diffusion of C to the surface followed by its reaction with oxygen. At T(ads) = 1000 K, the carbon content of the sample, down to the information depth of XPS, decreased further, accompanied by the attenuation of the C concentration gradient and a substantially decreased amount of oxygen.     

预吸附氧对NO在Pt(110)表面吸附和分解的影响

 利用程序升温反应谱、X射线光电子能谱和高分辨电子能量损失谱研究了NO在清洁和预吸附氧的Pt(110)表面的吸附和分解. 在清洁的Pt(110)表面,室温下低覆盖度时NO以桥式吸附为主,高覆盖度时NO以线式吸附为主. 加热过程中部分NO(主要是桥式吸附物种)分解,生成N2和N2O. 室温下O2在Pt(110)表面发生解离吸附. Pt(110)表面预吸附氧会抑制桥式吸附NO的生成,并导致其脱附温度降低40 K. 降低脱附温度有利于桥式吸附NO的分子脱附,从而抑制分解反应. 这些结果从表面化学的角度合理地解释了铂催化剂在富氧条件下对NO分解能力的降低.     

Catalytic oxidation of methanol on Pd metal and oxide clusters at near-ambient temperatures

Supported Pd clusters catalyze methanol oxidation to methyl formate with high turnover rates and >90% selectivity at near ambient temperatures (313 K). Metal clusters are much more reactive than PdO clusters and rates are inhibited by the reactant O(2). These data suggest that ensembles of Pd metal atoms on surfaces nearly saturated with chemisorbed oxygen are required for kinetically-relevant C-H bond activation in chemisorbed methoxide intermediates. Pd metal surfaces become more reactive with increasing metal particle size. The higher coordination of surface atoms on larger clusters leads to more weakly-bound chemisorbed species and to a larger number of Pd metal ensembles available during steady-state catalysis. Chemisorbed oxygen removes H-atoms formed in C-H bond activation steps and inhibits methoxide decomposition and CO(2) formation, two functions essential for the high turnover rates and methyl formate selectivities reported here.     

Acetone and water on TiO2(110): competition for sites

The competitive interaction between acetone and water for surface sites on TiO2(110) was examined using temperature programmed desorption (TPD). Two surface pretreatment methods were employed, one involving vacuum reduction of the surface by annealing at 850 K in ultrahigh vacuum (UHV) and another involving surface oxidation with molecular oxygen. In the former case, the surface possessed about 7% oxygen vacancy sites, and in the latter, reactive oxygen species (adatoms and molecules) were deposited on the surface as a result of oxidative filling of vacancy sites. On the 7% oxygen vacancy surface, excess water displaced all but about 20% of a saturated d6-acetone first layer to physisorbed desorption states, whereas about 40% of the first layer d6-acetone was stabilized on the oxidized surface against displacement by water through a reaction between oxygen and d6-acetone. The displacement of acetone on both surfaces is explained in terms of the relative desorption energies of each molecule on the clean surface and the role of intermolecular repulsions in shifting the respective desorption features to lower temperatures with increasing coverage. Although first layer water desorbs from TiO2(110) at slightly lower temperature (275 K) than submonolayer coverages of d6-acetone (340 K), intermolecular repulsions between d6-acetone molecules shift its leading edge for desorption to 170 K as the first layer is saturated. In contrast, the desorption leading edge for first layer water (with or without coadsorbed d6-acetone) shifted to no lower than 210 K as a function of increasing coverage. This small difference in the onsets for d6-acetone and water desorption resulted in the majority of d6-acetone being compressed into islands by water and displaced from the first layer at a lower temperature than that observed in the absence of coadsorbed water. On the oxidized surface, the species resulting from reaction of d6-acetone and oxygen was not influence by increasing water coverages. This species was stable up to 375 K (well past the first layer water TPD feature) where it decomposed mostly back to d6-acetone and atomic oxygen. These results are discussed in terms of the influence of water in inhibiting acetone photo-oxidation on TiO2 surfaces.     

NO and dichloroethene reactivity on single crystal and supported Cu nanoparticles: just how big is the materials gap?

Infrared and molecular beam experiments are used to compare and contrast the adsorption and reaction of NO and trans-1,2-dichloroethene on Cu(110) and on Cu nanoclusters deposited on a 5 A thick Al(2)O(3) film. The overall reaction of NO, leading to decomposition, is almost identical in the two systems, with both types of Cu surfaces promoting the formation of NO dimers, which are precursors to the dissociation products N(2)O, N(2) and O. Although the overall reaction is independent of surface structure, the IR spectra clearly show differences in the adsorption sites occupied on the single crystal and the clusters, a disparity that is also shown by CO adsorption experiments. In contrast, the reaction pathway of dichloroethene does show differences on the two types of Cu surfaces. On both surfaces, the initial reaction step is insensitive to structure and efficient dechlorination leads to the production of adsorbed acetylene. However, the fate of this intermediate depends critically on the underlying surface. On Cu(110), the acetylene trimerises readily into benzene at 350 K. However, this reaction shows a significant size dependent behaviour on the supported nanocluster systems, with the probability for trimerisation diminishing with decreasing cluster size.     

CeO2(110)表面上CO氧化反应的密度泛函理论研究

利用密度泛函理论系统研究了O2与CO在CeO2(110)表面的吸附反应行为. 研究表明, O2在洁净的CeO2(110)表面吸附热力学不利, 而在氧空位表面为强化学吸附, O2分子被活化, 可能是重要的氧化反应物种. CO在洁净的CeO2(110)表面有化学吸附与物理吸附两种构型, 前者形成二齿碳酸盐物种, 后者与表面仅存在弱的相互作用. 在氧空位表面, CO可分子吸附或形成碳酸盐物种, 相应吸附能均较低. 当表面氧空位吸附O2后(O2/Ov), CO可吸附生成碳酸盐或直接生成CO2, 与原位红外光谱结果相一致. 过渡态计算发现,O2/Ov/CeO2(110)表面的三齿碳酸盐物种经两齿、单齿过渡态脱附生成CO2. 利用扩展休克尔分子轨道理论分析了典型吸附构型的电子结构, 说明表面碳酸盐物种三个氧原子电子存在离域作用, 物理吸附的CO及生成的CO2电子结构与相应自由分子相似.     

Infrared chemiluminescence study of CO2 formation in CO + NO reaction on Pd(110) and Pd(111) surfaces

Infrared (IR) chemiluminescence studies of CO2 formed during steady-state CO + NO reaction over Pd(110) and Pd(111) surfaces were carried out. Kinetics of the CO + NO reaction were studied over Pd(110) using a molecular-beam reaction system in the pressure range of 10-2-10-1 Torr. The activity of the CO + NO reaction on Pd(110) was much higher than that of Pd(111), which was quite different from the result of other experiments under a higher pressure range. On the basis of the experimental data on the dependence of the reaction rate on CO and NO pressures and the reaction rate constants obtained by using a reaction model, the coverage of NO, CO, N, and O was calculated under various flux conditions. From the analysis of IR emission spectra in the CO + O2 reaction on Pd(110) and Pd(111), the antisymmetric vibrational temperature (TVAS) was seen to be higher than the bending vibrational temperature (TVB) on Pd(110). In contrast, TVB was higher than TVAS on Pd(111). These behaviors suggest that the activated complex for CO2 formation is more bent on Pd(111) than that on Pd(110), which is reflected by the surface structure. Both TVB and TVAS for the CO + O2 reaction on Pd(110) and Pd(111) increased gradually with increasing surface temperature (TS). On the other hand, in the case of the CO + NO reaction on Pd(110) and Pd(111), TVAS decreased and TVB increased significantly with increasing TS. TVB was lower than TVAS at lower TS, while TVB was higher than TVAS at higher TS. Comparison of the data obtained for the two reactions indicates that TVB in the CO + NO reaction on Pd(110) at TS = 800 and 850 K is much higher than that in the CO + O2 reaction on Pd(110).