Electrochemical characteristics of alumina dielectric layers

The electrochemical characteristics of alumina dielectric layers were studied using a surface roughness factor and an impedance spectroscopy. From the limiting diffusion current method, the surface area factor of the dielectric anodic layer with low electrical conductivity was estimated to be 1.03. As alumina dielectric films on Al have a variable stoichiometry, the electrochemical behavior of Al₂O₃ layer can be monitored by evaluating an equivalent circuit with Young impedance of dielectric constant with a vertical decay of conductivity.     

Dielectric properties of polyacrylamide polymer films

Summary Polyacrylamide polymer films of thickness 4.15 μm were prepared by isothermal immersion technique. The dielectric capacitance and dielectric loss of the films were studied as functions of frequency and temperature in the range 100 Hz|10 MHz and (300|450)K, respectively. Two dielectric loss peaks were observed in the dielectric loss spectra and were identified as β and α peaks. The β peak was attributed to the reorientation of dipoles and the α-peak was attributed to the deformations accompanied by large changes in the directions or locations of the dipoles.     

基底微缺陷对介质薄膜光学性能影响的理论研究

基于非均匀膜理论提出一种存在微缺陷的介质基底的折射率分层模型，将基底依次分为表面层、亚表面层和体材料层，其中表面层和亚面层分别等效为折射率服从统计分布的非均匀膜，将它们分别再次细分为N₁和N₂个子层，每一子层均视为均匀介质 膜.应用光学薄膜特征矩阵法对其进行理论分析，并对单层介质膜的光学性能进行数值计算. 研究结果表明：基底的表面和亚表面微缺陷改变了薄膜和基底的等效折射率，导致了准Brew ster角和组合反射率与理想情形的偏离.同时这些微缺陷也改变了光在薄膜和基底中的传播 特性，因此反射相移和相位差均偏离理想情形.在研究基底的微缺陷对多层介质膜光学性能 影响的分析和计算时，该模型同样适用. 关键词： 微缺陷 介质薄膜 非均匀膜 光学性能     

利用Raman散射光谱研究铜铟镓硒薄膜表面的掺杂调节作用

主要研究了采用溅射后硒化方法制备CIGS(铜铟镓硒)薄膜太阳电池的吸收体材料中的表面层掺杂调节问题。并利用Raman散射谱分析研究了样品表面层特征峰的移用,研究结果表明: CIGS薄膜表面层由富In表面层调节为富CuGa表面层后,Raman特征峰位向高波数移动,表明薄膜表面的Ga含量随之变化,并导致表面能带的相应改变,经计算证实了富CuGa表面层样品较之富In表面层样品具有更高的表面能带,从而改善了以此材料为吸收层的太阳电池器件性能, V_oc提高了74 mV,填充因子上升8％,最终使器件转换效率η相应提高了约2％。提高了V_oc与FF。同时表明Raman散射谱作为一种灵敏的表面表征手段,在研究太阳电池吸收层表面状态时十分有力。     

α-SiN:H薄膜的光学声子与VO2基Mott相变场效应晶体管的红外吸收特性

从器件构成材料中α-SiN:H，VO₂，Al薄膜介电常数弥散特性的Lorentz多谐振模型出发，研究了器件在金属表面等离子体与VO₂，特别是α-SiN:H薄膜光学声子共同作用下的红外吸收特性；得到了在不同的光谱范围器件的红外吸收特性随着α-SiN: H钝化层几何厚度的变化关系，与中心工作波长10μm对应的且经过位相修正以后钝化层的几何厚度为λ/4n时的红外吸收光谱、以及VO₂的相变对吸收光谱的影响. 关键词： 红外吸收特性 Mott相变 场效应晶体管 二氧化钒     

Features of the surface morphology of CaF<Subscript>2</Subscript>/Si(100) films obtained by solid-phase epitaxy

The dielectric parameters of calcium fluoride films grown on the Si(100) surface by solid-phase epitaxy (group 2) and without it (group 1) are analyzed. It is established experimentally that the deposition mode of CaF₂ films immediately after growth of the Si buffer layer at a substrate temperature of 530°C is not suitable for producing high-quality dielectric layers. The use of solid-phase epitaxy at the initial stage of the nucleation of CaF₂ layers enables the production of single crystal uniformly thick films with high dielectric properties.     

Enhanced light transmission through cascaded metal films perforated with periodic hole arrays

We report experimental results on enhanced light transmission through two periodically perforated metal films separated by a layer of dielectric. A perforated metal film (single metallic structure) exhibits extraordinary optical transmission, and when two such perforated metal films are spaced by a dielectric layer (cascaded metallic structure), the transmission is further increased. The maximum transmission of the cascaded metallic structure, which depends on the distance between the two metal films, can be more than 400% greater than that of a corresponding single metallic structure. It is proposed that the coupling of surface plasmon polaritons between the two metal films is involved in the process.     

Optical spectroscopy of the surface of nanoporous diamond films

We have studied the IR absorption spectra of samples of porous ultrananocrystalline diamond (UNC diamond) obtained by selective etching of the sp ² phase in UNC diamond films. We show that the surface of porous UNC diamond is polyfunctional. We have studied the behavior of surface hydride, carbonyl, carboxyl, and hydroxyl groups as a function of annealing temperature in air and the time kept under normal conditions for UNC diamond films previously oxidized at 430°C–450°C. In the range from a few minutes to a few months, we studied the kinetics for establishment of the steady state for the functional adsorbed layer on the diamond surface under normal conditions. The observed growth in the intensity of the transmission bands due to hydride (CH _x ) and other hydrogen-containing functional groups is explained by dissociation of water molecules on the surface of the UNC diamond films.     

人工调控微结构压电驻极体的热稳定性和电荷动态特性

利用表面带有周期性结构的硬质模板,通过冷压工艺将周期结构图案复制到多孔聚四氟乙烯(PTFE)薄膜表面,再经过热黏合工艺与致密氟化乙丙烯共聚物(FEP)薄膜复合,制备出了高度有序的微孔结构复合膜,并用电晕充电的方法对复合膜进行极化处理,最终获得氟聚合物复合膜压电驻极体.借助对这类复合膜压电驻极体介电谐振谱的测量,得到了材料的杨氏模量.并利用等温热老化工艺对它们的压电系数d33的热稳定性进行了考察.最后通过短路热刺激放电谱的测量和分析,讨论了该复合膜在热老化处理后的电荷动态 关键词： 有序结构 压电驻极体 压电性 电荷动态特性     

Nanostructure,conductivity, and reflectivity of thin iron and (Fe) X (BaF2) Y films

Fe and (Fe) _X (BaF₂) _Y films 10- to 160-nm-thick are grown on a polymer substrate by vacuum evaporation. The surface relief and nanostructure of the films are examined. The dependence of the conductivity on the film thickness is obtained, and a correlation between the conductivity and surface relief is found. The influence of the BaF₂ dielectric phase on the conductivity and reflectivity of the Fe films is studied. It is shown that the BaF₂ layer to some extent slows down oxidation and maintains the reflectivity of the Fe films compared with pure iron films exposed to air.     

Electronic structure and simulation of the dielectric function of β-FeSi2 epitaxial films on Si(111)

The optical functions of iron disilicide (β-FeSi₂) thin epitaxial films are calculated from the reflectance spectra in the energy range 0.1–6.2 eV with the use of the Kramers-Kronig (KK) integral relations. A comparison of the results of calculations from the transmittance and reflectance spectra and the data obtained from the reflectance spectra in terms of the Kramers-Kronig relations indicates that the fundamental transition at an energy of 0.87±0.01 eV is a direct transition. An empirical model is proposed for the dielectric function of β-FeSi₂ epitaxial films. Within this model, the specific features in the electronic energy-band structure of the epitaxial films are described in an analytical form. It is shown that the maximum contributions to the dielectric function and the reflectance spectrum in the energy range 0.9–1.2 eV are made by the 2D M ₀-type second harmonic oscillator with an energy of 0.977 eV. This oscillator correlates with the second direct interband transition observed in the energy-band structure of β-FeSi₂.     

Oxidation and reduction of thin Ru films by gas plasma

The oxidation and reduction of Ru thin films grown on a Si(1 0 0) surface were studied by X-ray photoemission spectroscopy (XPS). Ru thin films were oxidized with O₂ plasma generated by an rf discharge, and their XPS spectra were measured. The spectra were decomposed into several components for Ru suboxides attributable to different stages of oxidation. After sufficient exposure to oxygen, a stoichiometric rutile RuO₂ layer was found to have formed near the surface. Thermal annealing at 500 K resulted in a thicker RuO₂ layer. Experiments demonstrated that the Ru oxide layer can be removed by H(D) atoms via the desorption of water molecules.     

Structure,the lattice dynamic,and the dielectric characteristics of Sr<Subscript>0.5</Subscript>Ba<Subscript>0.5</Subscript>Nb<Subscript>2</Subscript>O<Subscript>6</Subscript> films

Solid solution Sr_0.5Ba_0.5Nb₂O₆ films have been synthesized on a (111)Pt/(001)Si substrate by rf deposition in an oxygen atmosphere. The depolarized Raman spectra, the structure, and the dielectric characteristics of the films have been studied over a wide temperature range. It is found that the films were singlephase, had the tetragonal tungsten bronze structure, and had a pronounced axial texture with axis 001 directed perpendicular to the substrate surface. It is shown that the film material undergoes a diffuse phase transition to the state of a relaxor ferroelectric in the temperature range 300–425 K. Possible reasons of the regularities observed are discussed.     

Determination of the element distribution in films deposited using the plasma focus facility by Rutherford backscattering

The C, Cu and W element profiles in films deposited using a plasma focus facility are studied by the Rutherford backscattering of 2-MeV He⁺ ions. The films are deposited onto glass substrates in Ar plasmaforming gas. The element profiles are found to depend significantly on the kinetic energy of particles. The penetration depth of particles with the velocity ~10⁵ m/s is about 1.5 μm. The corresponding element profiles showing the distribution of elements over the thickness of the glass are non-linear. For each element, the maximum layer depth is observed under the glass surface. The formation of Cu, W and C layers under the glass surface and their overlapping is a feature of films deposited using the plasma focus facility. Such an arrangement of layers evidences the significant difference between this method of film deposition and conventional techniques at low rates of atom deposition, as well as diffusion-based methods. The obtained films are found to have dielectric properties.     

Microwave measurement of the permittivity of ferroelectric films by electrodeless and coplanar waveguide methods

Ferroelectric films on dielectric substrates prepared by reactive rf sputtering have been studied. The temperature and external electric field dependencies of the permittivity of the films are deduced. It is shown that deposition of metallic electrodes onto the surface of the film leads to an increase in the permittivity and to an enhancement of the dependency of on temperature and the external electric field. The observed effects may be explained by the formation of an electrode-film interface layer.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 4, pp. 8–12, April, 1990.     

新型MOLEDs的光学性能

将负折射率介质层(NRIDL)引入到微腔有机电致发光器件(MOLEDs)中,设计了新型的微腔器件。利用传输矩阵法对此器件的反射率大小、器件厚度对发射峰的影响以及电致发光(EL)光谱性质进行了分析和讨论。结果表明:与普通微腔器件相比,新型微腔器件的谱线宽度显著窄化,峰值强度明显增强,并且受腔体长度的影响较小。这些结果为进一步提高微腔器件的发光色纯度、薄化器件厚度提供了新方法。     

Method for the formation of graphene films

A method is proposed to form graphene films using thermodiffusion of carbon atoms from an amorphous carbon or silicon-carbon film with a nanosized thickness through a catalyst film, their accumulation at the catalyst layer/barrier layer interface, and the subsequent carbon quasi-liquid-graphene phase transition. One of the advantages of this method of producing graphene films is the possibility of their formation directly on a dielectric layer and the subsequent suspension of a graphene film over the substrate surface using membrane technologies, which excludes the necessity of using complex procedures to separate a graphene film from the substrate.     

X-ray spectroscopic examination of thin HfO<Subscript>2</Subscript> films ALD- and MOCVD-grown on the Si(100) surface

HfO₂ films 5 nm thick grown on Si(100) substrates by the methods of MOCVD hydride epitaxy and atomic layer deposition (ALD) are studied using X-ray photoelectron spectroscopy combined with Ar⁺ ion etching and X-ray reflectometry. It is found that (i) the ALD-grown HfO₂ films are amorphous, while the MOCVD-grown films show signs of a crystal structure; (ii) the surface of the ALD-grown films is more prone to contamination and/or is more reactive; and (iii) the amount of interfacial silicon dioxide in the case of the MOCVD-grown film is greater than in the case of the films synthesized by ALD. It is also shown that the argon ion etching of the HfO₂ film results in the formation of a metallic hafnium layer at the interface. This indicates that HfO₂ can be used not only as a gate dielectric but also as a material suitable for fabricating nanodimensional conductors by direct decomposition.     

Investigation of structural relaxation and surface modification of ultrathin films of poly(ethylene terephthalate)

We studied dynamic properties of ultrathin films of poly(ethylene terephthalate) spincoated on different substrates, by means of dielectric spectroscopy and surface patterning experiments. We did not observe any variations of structural dielectric relaxation dynamics for films spincoated on aluminium substrate having thicknesses down to 40 nm. On the same substrate, 13 nm thick films are instead characterized by a reduction of the chains mobility. Surprisingly the chains dynamics as probed by a surface nanopatterning experiment evidenced a strong dependence on the substrate interaction even for 50 nm thick films, where dielectric relaxation dynamics is unaffected. It can be deduced that different length scales characterise dielectric relaxation dynamics and the processes related to the surface patterning, even if both are related to the chain mobility. Further experiments are wished to better understand this intriguing scenario.     

紫外辐照对聚醚酰亚胺薄膜介电性能的影响北大核心CSCD

研究了不同紫外辐照时间对聚醚酰亚胺(PEI)薄膜介电性能的影响。采用FT-IR和SEM表征了PEI薄膜的分子结构和微观形貌。结果表明,紫外辐照后PEI薄膜在1742cm^(-1)处的吸收峰比原薄膜增大,说明PEI分子链中的C=O基团随辐照时间的增加而增加,并在薄膜表面产生了微裂纹。对PEI薄膜的介电性能进行的研究结果表明,随着紫外辐照时间的增加,PEI薄膜的介电常数和介电损耗增大,而表面电阻率下降,体积电阻率基本不变。并随紫外辐照时间的增加,直流击穿强度呈先增加后降低的趋势,一定辐照剂量可使薄膜发生交联反应,使击穿场强较原薄膜提高20%以上。