Influences of different oxidants on characteristics of La_2O_3/Al_2O_3 nanolaminates deposited by atomic layer deposition

A comparative study of two kinds of oxidants(H_2O and O_3) with the combination of two metal precursors(TMA and La(~iPrCp)_3) for atomic layer deposition(ALD) La_2O_3/Al_2O_3 nanolaminates is carried out. The effects of different oxidants on the physical properties and electrical characteristics of La_2O_3/Al_2O_3 nanolaminates are studied. Initial testing results indicate that La_2O_3/Al_2O_3 nanolaminates could avoid moisture absorption in the air after thermal annealing. However, moisture absorption occurs in H_2O-based La_2O_3/Al_2O_3 nanolaminates due to the residue hydroxyl/hydrogen groups during annealing. As a result, roughness enhancement, band offset variation, low dielectric constant and poor electrical characteristics are measured because the properties of H_2O-based La_2O_3/Al_2O_3 nanolaminates are deteriorated. Addition thermal annealing effects on the properties of O_3-based La_2O_3/Al_2O_3 nanolaminates indicate that O_3 is a more appropriate oxidant to deposit La_2O_3/Al_2O_3 nanolaminates for electron devices application.     

Metal-to-insulator transition in two-dimensional ferromagnetic monolayer induced by substrate

Two-dimensional(2D) ferromagnetic(FM) materials have great potential for applications in next-generation spintronic devices. Since most 2D FM materials come from van der Waals crystals, stabilizing them on a certain substrate without killing the ferromagnetism is still a challenge. Through systematic first-principles calculations, we proposed a new family of 2D FM materials which combines TaX(X = S, Se or Te) monolayer and Al_2O_3(0001) substrate. The TaX monolayers provide magnetic states and the Al_2O_3(0001) substrate stabilizes the former. Interestingly, the Al_2O_3(0001)substrate leads to a metal-to-insulator transition in the Ta X monolayers and induces a band gap up to 303 meV. Our study paves the way to explore promising 2D FM materials for practical applications in spintronics devices.     

Review of gallium oxide based field-effect transistors and Schottky barrier diodes

Gallium oxide(Ga_2O_3), a typical ultra wide bandgap semiconductor, with a bandgap of ~4.9 e V, critical breakdown field of 8 MV/cm, and Baliga's figure of merit of 3444, is promising to be used in high-power and high-voltage devices.Recently, a keen interest in employing Ga_2O_3 in power devices has been aroused. Many researches have verified that Ga_2O_3 is an ideal candidate for fabricating power devices. In this review, we summarized the recent progress of field-effect transistors(FETs) and Schottky barrier diodes(SBDs) based on Ga_2O_3, which may provide a guideline for Ga_2O_3 to be preferably used in power devices fabrication.     

Fluorescence spectra of colloidal self-assembled CdSe nano-wire on substrate of porous Al_2O_3/Au nanoparticles

We present a self-assembly method to prepare array nano-wires of colloidal CdSe quantum dots on a substrate of porous Al_2 O_3 film modified by gold nanoparticles. The photoluminescence(PL) spectra of nanowires are in situ measured by using a scanning near-field optical microscopy(SNOM) probe tip with 100-nm aperture on the scanning near-field optical microscope. The results show that the binding sites from the edge of porous Al_2 O_3 nanopores are combined with the carboxyl of CdSe quantum dots' surface to form an array of CdSe nanowires in the process of losing background solvent because of the gold nanoparticles filling the nano-holes of porous Al_2 O_3 film. Compared with the area of nonself-assembled nano-wire, the fluorescence on the Al_2 O_3/Au/CdSe interface is significantly enhanced in the self-assembly nano-wire regions due to the electron transfer conductor effect of the gold nanoparticles' surface. In addition, its full width at half maximum(FWHM) is also obviously widened. The method of enhancing fluorescence and energy transfer can widely be applied to photodetector, photocatalysis, optical display, optical sensing, and biomedical imaging, and so on.     

Fe-Cr-Al合金高温氧化行为电子理论研究

从电子层面系统研究Fe-Cr-Al合金氧化膜的形成机理,杂质硫对氧化膜黏附性的影响,稀土元素在改善氧化膜黏附性方面的作用,揭示合金氧化的物理本质.研究表明氧使Al在合金表层的环境敏感镶嵌能最低,促使Al原子从合金内部向合金表面扩散,最终在合金表面偏聚.由于氧与Al间的亲和力较大,氧原子易与Al结合生成Al2O3保护膜.杂质S在基体/氧化膜界面的环境敏感镶嵌能较低,可通过扩散偏聚在基体/氧化膜界面,削弱氧化膜与合金基体的结合力.当合金中加入Y后,Y易与S结合形成稳定的硫化物,阻碍S向基体/氧化膜界面的偏聚,显著提高氧化膜的黏附性,提高合金抗高温氧化能力.     

RF溅射的SiO_2和SiO_2/Al/SiO_2薄膜的喇曼散射光谱研究

用射频溅射(RF Sputtering)法制成了SiO_2和SiO_2/Al/SiO_2薄膜。应用喇曼光谱研究了薄膜结构。结果表明:RF溅射制成的SiO_2薄膜是含有大量环结构缺陷的玻璃态;SiO_2/Al/SiO_2层状薄膜的喇曼光谱中观察到Al_2O_3的特征峰,证实了Al/SiO_2薄膜界面确有氧化还原反应发生;从喇曼光谱中Al_2O_3的特性峰的位置和相对强度可推断出,SiO_2/Al/SiO_2薄膜界面处的Al_2O_3是非晶γ-Al_2O_3。     

Low thermal expansion and broad band photoluminescence of Zr0.1Al1.9Mo2.9V0.1O12

A new material of Zr0.1Al1.9Mo2.9V0.1O12 is synthesized by the traditional solid state synthesis method.The phase transition,coefficient of thermal expansion,and luminescence properties of Zr0.1Al1.9Mo2.9V0.1O12 are explored with Raman spectrometer,dilatometer,and x-ray diffraction(XRD)diffractometer.The results show that the Zr0.1Al1.9Mo2.9V0.1O12 possesses the strong broad-band luminescence characteristics almost in the whole visible region.The sample is crystallized in a monoclinic structure group of P21/a(No.14)crystallized at room temperature(RT).The crystal is changed from monoclinic to orthorhombic structure when the temperature increases to 463 K.The material has very low thermal expansion performance in a wide temperature range.Its excellent low thermal expansion and strong pale green light properties in a wide temperature range suggest its potential applications in light-emitting diode(LED)and other optoelectronic devices.     

Coupling-induced spectral splitting for plasmonic sensing with ultra-high figure of merit

We investigate a kind of spectral splitting effect in a plasmonic multilayer system, which consists of stacked Al_2 O_3 and SiO_2 layers, a thin metal film, and a dielectric prism substrate. The results illustrate that an obvious peak appears in the center of the surface plasmon resonance(SPR)-induced reflection spectral dip in the structure with the SiO_2/Al_2 O_3/SiO_2 layers. This spectral splitting response can be regarded as an electromagnetically induced transparency(EIT) like effect,which is attributed to the coupling and interference between the SPR on the metal film and guided-mode resonance(GMR)in the Al_2 O_3 layer. The theoretical calculations agree well with the numerical simulations. It is also found that the reflection spectrum will be further split by the introduction of another Al_2 O_3 layer into the multilayer structure. The reintroduced GMR in the Al_2 O_3 layer changes the coupling and interference process between the SPR and GMR field, giving rise to the generation of ultra-narrow reflection dip. Especially, the spectral splitting can facilitate the realization of plasmonic sensors with ultra-high figure of merit(583), which is about 5 times larger than that of traditional SPR sensors. These results will provide a new avenue to the light field manipulation and optical functionalities, especially biochemical and environmental sensing.     

微通道板离子壁垒膜及其对入射离子的阻止作用

给出了三代微光像管中微通道板离子壁垒膜对入射正离子阻止作用的描述,引进了核阻止本领、电子阻止本领和平均射程的概念。结合Tomas-Fermi屏蔽势进行了分析讨论和Monte-Carlo模拟计算,给出Al₂O₃和SiO₂薄膜对不同能量垂直入射时的核、电子阻止的定量结果。得出了Al₂O₃薄膜阻止本领比SiO₂阻止本领高的结论。证实了选用Al₂O₃离子壁垒膜的科学性和可行性。     

γ-Al_2O_3高温相变的激光Raman光谱研究

通过不同波长的Raman激发光对γ-Al2O3的高温相变过程进行了研究。发现用632.8 nm激发光测得的位于1175、1241cm-1和1370、1400cm-1,对应于514.5 nm激发光时位于4808、4875cm-1和5003、5033cm-1的谱峰均是Al2O3中杂质的荧光光谱。较低波数的二个谱峰与θ-Al2O3有关,而较高波数的二个谱峰与α-Al2O3有关。随着焙烧温度升高,从800℃开始γ-Al2O3逐渐向θ-Al2O3和α-Al2O3转变,θ-Al2O3的谱峰强度在1100~1200℃焙烧时最大,当温度继续升高到1250℃全部转变成α-Al2O3,并且Al2O3的相变是从表层开始的。     

Comparison between AlN and Al_2O_3 ceramics applied to barrier dielectric of plasma actuator

This paper reports the material characterization and performance evaluation of an AlN ceramic based dielectric barrier discharge(DBD) plasma actuator. A conventional Al_2O_3 ceramic is also investigated as a control. The plasma images,thermal characteristics and electrical properties of the two actuators are compared and studied. Then, with the same electrical operating parameters(12-kV applied voltage and 11-kHz power frequency), variations of the surface morphologies,consumed power and induced velocities are recorded and analyzed. The experimental results show that the AlN actuator can produce a more uniform discharge while the discharge of the Al_2O_3 actuator is easier to become filamentary. The later condition leads to higher power consumption and earlier failure due to electrode oxidation. In the plasma process,the power increment of the AlN actuator is higher than that of the Al_2O_3 actuator. The induced velocity is also influenced by this process. Prior to aging, the maximum induced velocity of the AlN actuator is 4.2 m/s, which is about 40% higher than that of the Al_2O_3 actuator. After 120-min plasma aging, the maximum velocity of the aged AlN actuator decreases by 27.8% while the Al_2O_3 actuator registers a decrease of 25%.     

Synthesis of free-standing Ga_2O_3 films for flexible devices by water etching of Sr_3Al_2O_6 sacrificial layers

Flexible electronic devices have attracted much attention due to their practical and commercial value. Integration of thin films with soft substrate is an effective way to fabricate flexible electronic devices. Ga_2O_3 thin films deposited directly on soft substrates would be amorphous mostly. However, the thickness of the thin film obtained by mechanical exfoliation method is difficult to control and the edge of the film is fragile and easy to be damaged. In this work, we fabricated free-standing Ga_2O_3 thin films using the water-soluble perovskite Sr_3Al_2O_6 as a sacrificial buffer layer. The obtained Ga_2O_3 thin films were polycrystalline. The thickness and dimension of the films were controllable. A flexible Ga_2O_3solar-blind UV photodetector was fabricated by transferring the free-standing Ga_2O_3 film on a flexible polyethylene terephthalate substrate. The results displayed that the photoelectric performances of the flexible Ga_2O_3 photodetector were not sensitive to bending of the device. The free-standing Ga_2O_3 thin films synthesized through the method described here can be transferred to any substrates or integrated with other thin films to fabricate electronic devices.     

纳米Al2O3表面接枝修饰的XPS研究

在纳米Al2O3表面接枝聚缩醛可在粒子表面建立起空间位阻稳定层, 不但提高了纳米粒子的分散稳定性, 还可以增强纳米粒子与树脂基体的相容性. X射线光电子能谱(XPS)的分析结果表明, 经过聚缩醛接枝改性的纳米Al2O3的Al(2p)峰几乎消失, O(1s)峰也相应降低, 与之相对应的是C(1s)峰有了明显的增长, 对C(1s)峰精细扫描及分峰拟合表明, 纳米Al2O3表面碳元素中有61.92%属于接枝物聚缩醛的有机碳, 接枝物聚缩醛与纳米Al2O3形成了Al-O-C键, 两者产生化学结合. 同时对比XPS和热失重分析(TG)的数据结果, 可以推测聚缩醛主要分布在纳米Al2O3的表面, 而在体相中独立存在的概率较小.     

Improvement of Performance of HfS_2 Transistors Using a Self-Assembled Monolayer as Gate Dielectric

This work details a study based on HfS_(2 )transistors utilizing an n-octadecylphosphonic acid-based self-assembled monolayer(SAM)as the gate dielectric.The fabrication of the SAM-based two-dimensional(2D)material transistor is simple and can be used to improve the quality of the interface of air-sensitive 2D materials.In comparison to HfS_(2) transistors utilizing a conventional Al_2O_(3) gate insulator by atomic layer deposition,HfS_(2) transistors utilizing an SAM as the gate dielectric can reduce the operation region from 4 V to 2 V,enhance the field-effect mobility from 0.03 cm~2/Vs to 0.75 cm~2/Vs,improve the sub-threshold swing from 404 m V/dec to 156 m V/dec,and optimize the hysteresis to 0.03 V,thus demonstrating improved quality of the semiconductor/insulator interface.     

Investigation of black phosphorus field-effect transistors and its stability

In this paper, the electrical properties of black phosphorus(BP) are investigated. Back-gated field-effect transistors (FETs) array with different channel length are fabricated on the same BP nanoflake. The device exhibits high current on/off ratio (5 × 10³), high field-effect mobility (130 cm² V^?1 s^?1) and low contact resistance (917 Ω μm). In addition, the stability of BP device is also explored. Results show that the 10 nm Al₂O₃ dielectric layer can effectively depress the exposure of BP flakes with air and then protect the BP devices from ambient degradation. There is no noticeable degradation in device performance for the devices with 10 nm Al₂O₃ passivating layer even after being exposed in air for 2 weeks.     

Substitution priority of Eu~(2+) in multi-cation compound Sr_(0.8)Ca_(0.2)Al_2Si_2O_8 and energy transfer

A blue phosphor was obtained by doping Eu~(2+)into a multi-cation host Sr_(0.8)Ca_(0.2)Al_2Si_2O_8 through high temperature solid state reaction.The emission spectra show a continuous red-shift behavior from 413 nm to 435 nm with Eu~(2+)concentration increasing.The substitution priority of Eu~(2+)in Sr_(0.8)Ca_(0.2)Al_2Si_2O_8 was investigated via x-ray diffraction(XRD)and temperature properties in detail:the Ca~(2+)ions are preferentially substituted by Eu~(2+)at lower doping,and with the Eu~(2+)concentration increasing,the probability of substitution for Sr~(2+)is greater than that of replacing Ca~(2+).Accordingly,we propose the underlying method of thermal property to determine the substitution of Eu~(2+)in the multi-cation hosts.Moreover,the abnormal increase of emission intensity with increasing temperature was studied by the thermoluminescence spectra.The energy transfer mechanism between the Eu~(2+)ions occupying different cation sites was studied by the lifetime decay curves.A series of warm white light emitting diodes were successfully fabricated using the blue phosphors Sr~+_(0.8)Ca_(0.2)Al_2Si_2O_8:Eu~2 with commercial red phosphor (CaSr)SiAlN_3:Eu~(2+)and green phosphor(Y Lu)_3Al_5O_(12):Ce~(3+),and the luminescent efficiency can reach 45 lm/W.     

A simulation study of field plate termination in Ga_2O_3 Schottky barrier diodes

In this work, the field plate termination is studied for Ga_2O_3 Schottky barrier diodes(SBDs) by simulation. The influence of field plate overlap, dielectric material and thickness on the termination electric field distribution are demonstrated.It is found that the optimal thickness increases with reverse bias increasing for all the three dielectrics of SiO_2, Al_2 O_3, and HfO_2. As the thickness increases, the maximum electric field intensity decreases in SiO_2 and Al_2O_3, but increases in HfO_2.Furthermore, it is found that SiO_2 and HfO_2 are suitable for the 600 V rate Ga_2O_3 SBD, and Al_2O_3 is suitable for both600 V and 1200 V rate Ga_2O_3 SBD. In addition, the comparison of Ga_2O_3 SBDs between the SiC and GaN counterpart reveals that for Ga_2O_3, the breakdown voltage bottleneck is the dielectric. While, for SiC and GaN, the bottleneck is mainly the semiconductor itself.     

Ca~(2+)离子替代对Sr_4Al_(14)O_(25):Eu~(2+),Dy~(3+)结构和发光性能的影响

采用高温固相反应按化学式Sr4-xCaxAl14O25:Eu2+,Dy3+(x=0,0.8,1.6,2.4,3.2,4)配比原料,合成长余辉发光材料.X射线衍射分析表明当x2.4时,产物物相均为Sr4Al14O25正交结构;当x2.4时,产物物相转变为CaAl4O7单斜结构.对掺Ca量不同,但结构仍保持Sr4Al14O25的样品采用360nm激光照射,发射光谱表明样品发光均由以Eu2+为发光中心的电子4f65d→4f7跃迁所致,并且随着Ca掺入量的增加,样品发射光谱峰位逐渐蓝移.这是由于Ca2+取代Sr2+位置后,导致晶格收缩,影响Eu2+的5d能级劈裂情况,从而影响电子4f65d→4f7跃迁.余辉衰减检测和热释光谱分析发现,不同Ca掺入量的样品余辉衰减快慢不同,是由于其中存在的陷阱能级深度不同,且陷阱能级越深,其余辉时间越长.     

利用倾斜角度蒸发法制备Al/Al_2O_3/Al超导隧道结

利用电子束曝光法对双层光刻胶进行曝光来制备悬空掩模结构,在此基础上利用电子束蒸发系统采用倾斜角度蒸发法制备铝超导薄膜,采用热氧化法在底层铝膜表面形成氧化铝作为势垒层,制备出铝SIS超导隧道结,并在360mK的情况下对铝结进行了Ⅰ～Ⅴ特性的初步测量.铝隧道结的成功制备为下一步构建超导量子比特器件,研究其量子特性奠定了良好的基础.     

Total Ionization Dose Effects on Charge Storage Capability of Al_2O_3/HfO_2/Al_2O_3-Based Charge Trapping Memory Cell

Because of the discrete charge storage mechanism, charge trapping memory(CTM) technique is a good candidate for aerospace and military missions. The total ionization dose(TID) effects on CTM cells with Al_2O_3/HfO_2/Al_2O_3(AHA) high-k gate stack structure under in-situ 10 keV x-rays are studied. The C-V characteristics at different radiation doses demonstrate that charge stored in the device continues to be leaked away during the irradiation,thereby inducing the shift of flat band voltage(V_(fb)). The dc memory window shows insignificant changes, suggesting the existence of good P/E ability. Furthermore, the physical mechanisms of TID induced radiation damages in AHA-based CTM are analyzed.