Phosphorus and hydrogen atoms on the (0 0 1) surface of silicon: A comparative scanning tunnelling microscopy study of surface species with a single dangling bond

We present a comparative scanning tunnelling microscopy (STM) study of two features on the Si(0 0 1) surface with a single dangling bond. One feature is the Si-P heterodimer—a single surface phosphorus atom substituted for one Si atom of a Si-Si dimer. The other feature is the Si-Si-H hemihydride—a single hydrogen atom adsorbed to one Si atom of a Si-Si dimer. Previous STM studies of both surface species have reported a nearly identical appearance in STM which has hampered an experimental distinction between them to date. Using voltage-dependent STM we are able to distinguish and identify both heterodimer and hemihydride on the Si(0 0 1) surface. This work is particularly relevant for the fabrication of atomic-scale Si:P devices by STM lithography on the hydrogen terminated Si(0 0 1):H surface, where it is important to monitor the distribution of single P dopants in the surface. Based on the experimental identification, we study the lateral P diffusion out of nanoscale reservoirs prepared by STM lithography.     

Nitroxyl free radical binding to Si(1 0 0): a combined scanning tunneling microscopy and computational modeling study

The ultra-high vacuum scanning tunneling microscope (UHV-STM) was used to investigate the addition of the 2,2,6,6-tetramethyl-1-piperidinyloxy (TEMPO) radical to the Si(1 0 0) surface. Room temperature studies performed on clean Si(1 0 0)-2 × 1 confirm the proposed binding of the unpaired valence electron associated with the singly occupied molecular orbital (SOMO) of the molecule with a Si dangling bond. A strong bias dependence in the topography of isolated molecules was observed in the range of −2.0 to +2.5 V. Semiempirical and density functional calculations of TEMPO bound to a three-dimer silicon cluster model yield occupied state density isosurfaces below the highest occupied (HOMO) and unoccupied state densities isosurfaces above the lowest unoccupied molecular orbital (LUMO) which trend in qualitative agreement with the bias dependent STM topography. Furthermore, the placement of TEMPO molecules on dangling bonds was controlled with atomic precision on the monohydride Si(1 0 0) surface via electron stimulated desorption of H, demonstrating the compatibility of nitroxyl free radical binding chemistries with nanopatterning techniques such as feedback controlled lithography.     

Mechanism of GeH4 dissociation on Si(1 1 1)-(7 × 7)

Results of an STM study of dissociative GeH₄ adsorption on Si(1 1 1)-(7 × 7) at 300 K show that GeH₄ adsorbs under scission of two Ge-H bonds according to GeH₄(g) + 4db → GeH₂(ad) + 2H(ad). GeH₂ binds to two adatom dangling bonds in a bridged configuration, while the two released hydrogen atoms saturate two additional dangling bonds. The GeH₄ sticking coefficient under these conditions is 1.2 × 10⁻⁶, one order of magnitude smaller than for SiH₄.     

Charge transfer in the atomic structure of Ge (1 0 5)

The atomic structure and charge transfer on the Ge (1 0 5) surface formed on Si substrates are studied using scanning tunneling microscopy and spectroscopy (STM and STS). The bias-dependent STM images of the whole Ge (1 0 5) facets formed on a Ge “hut” structure on Si (0 0 1) are observed, which are well explained by the recently confirmed structure model. The local surface density of states on the Ge (1 0 5) surface is measured by STS. The localization of the electronic states expected from charge transfer mechanism is observed in the dI/dV spectra. The surface band gap is estimated as 0.8-0.9 eV, which is even wider than the bulk bandgap of Ge, indicating the strong charge transfer effect to make the dangling bonds stable. The shape of normalized tunnel conductance agrees with the theoretical band structure published recently by Hashimoto et al.     

Early stages of vanadium deposition on Si(1 1 1)-7 × 7

We investigate the low-coverage regime of vanadium deposition on the Si(1 1 1)-7 × 7 surface using a combination of scanning tunnelling microscopy (STM) and density-functional theory (DFT) adsorption energy calculations. We theoretically identify the most stable structures in this system: (i) substitutional vanadium atoms at silicon adatom positions; (ii) interstitial vanadium atoms between silicon adatoms and rest atoms; and (iii) interstitial vanadium - silicon adatom vacancy complexes. STM images reveal two simple vanadium-related features near the Si adatom positions: bright spots at both polarities (BB) and dark spots for empty and bright spots for filled states (DB). We relate the BB spots to the interstitial structures and the DB spots to substitutional structures.     

Atomic structure of the carbon induced Si(0 0 1)-c(4 × 4) surface

The atomic and electronic structures of the Si(0 0 1)-c(4 × 4) surface have been studied by scanning tunneling microscopy (STM) and density functional theory (DFT). To explain the experimental bias dependent STM observations, a modified mixed ad-dimer reconstruction model is introduced. The model involves three tilted Si dimers and a carbon atom incorporated into the third subsurface layer per c(4 × 4) unit cell. The calculated STM images show a close resemblance to the experimental ones.     

The chemisorption of pentacene on Si(0 0 1)-2 × 1

Adsorption structures of the pentacene (C₂₂H₁₄) molecule on the clean Si(0 0 1)-2 × 1 surface were investigated by scanning tunneling microscopy (STM) in conjunction with density functional theory calculations and STM image simulations. The pentacene molecules were found to adsorb on four major sites and four minor sites. The adsorption structures of the pentacene molecules at the four major sites were determined by comparison between the experimental and the simulated STM images. Three out of the four theoretically identified adsorption structures are different from the previously proposed adsorption structures. They involve six to eight Si-C covalent chemical bonds. The adsorption energies of the major four structures are calculated to be in the range 67-128 kcal/mol. It was also found that the pentacene molecule hardly hopped on the surface when applying pulse bias voltages on the molecule, but was mostly decomposed.     

Towards hybrid silicon-organic molecular electronics: The stability of acetone on the Si(0 0 1) surface

We present the results of a combined study using scanning tunneling microscopy (STM) and density functional theory (DFT) of the interaction of acetone [(CH₃)₂CO] with the Si(0 0 1) surface. Three distinct adsorbate features were observed using atomic-resolution STM. One of the features appears as a bright protrusion located above a Si-Si dimer, while the other two are asymmetric about the dimer row and involve a second neighboring Si-Si dimer. One of the two asymmetric features has a protrusion located between the two dimers, while the other has a protrusion which is located at the site of a single dimer and exhibits a dimer sized depression on the adjacent dimer. DFT calculations have been performed for two structures; the four-membered ring structure and dissociation structure. Our calculations show that the bright single-dimer sized feature observed in the STM images could be attributed to either of these two calculated structures. However, neither of the two calculated structures can explain the appearance of the two-dimer wide asymmetric features observed in the experiment.     

Electron-induced H atom desorption patterns created with a scanning tunneling microscope: Implications for controlled atomic-scale patterning on H-Si(1 0 0)

We have used scanning tunneling microscopy (STM) to explore the details of single and multiple H atom desorption from the H-Si(1 0 0)-2 × 1 surface induced by the inelastic scattering of electrons from an STM tip. The desorption of pairs of H atoms from individual Si dimers is rarely observed. Two-H atom desorption most often involves pairs of dimers, in the same or adjacent rows. This suggests that recombinative H₂ desorption via an interdimer reaction pathway, like that observed recently under nanosecond laser heating, may also be operative for electron-induced excitation using STM. Repeatable fabrication of desired size-selected dangling bond (DB) clusters is also achieved. The single atomic precision of the fabrication is a result of the intrinsically unfavorable paired H atom desorption from a single dimer, but does not result from the spatial localization of excitation energy of the Si-H bond under the STM tip as suggested in previous studies.     

Molecular precursor-mediated methanol dissociation on Si(1 1 1)7 × 7: ab initio study

We present an ab initio study of methanol interaction with the Si(1 1 1)7 × 7 surface using a Si(1 1 1)4 × 2 model. The study of the methanol dissociation on Si(1 1 1)4 × 2 shows that pair dissociation on adatom-restatom dangling bonds is largely favoured, in agreement with the experimental observations. The “center” type adatom is slightly more reactive than the “corner” type one, although the difference is weak. Similar behaviour is observed in both adatom types. Our results for a direct CH₃OH dissociation favouring a basic cleavage (adsorption of OH and CH₃ fragments) rather than an acidic one (adsorption of H and OCH₃ fragments), we are finally led to take a kinetic effect into consideration to reconcile theory with experiment. We show that the presence of molecular precursor states is possible. Different orientations with respect to the silicon dangling bonds of these molecular precursors are investigated. However, the corresponding energies are very close and, considering their relative energies, it is finally difficult to discriminate between acidic and basic cleavages.     

Molecular assembly of tetracene on the (2 × 1)O reconstructed Cu(1 1 0) surface

Using a combination of scanning tunneling microscopy (STM) and density functional theory calculations, we have studied the adsorption of tetracene on the Cu(1 1 0) (2 × 1)O substrate. At monolayer coverage the adsorbed molecules are in the flat-laying geometry with their long axis along the close-packed [0 0 1] direction of the substrate and a long-range ordered structure on the length scale up to 100 nm has been observed. DFT calculation results indicate a stronger interaction between tetracene molecules and Cu(1 1 0) substrate than Cu(1 1 0) (2 × 1)O substrate. The preferential adsorption sites have also been pointed out on both substrates. The observed wavelike structure is explained by the interdigitation of C-H bonds of adjacent molecules.     

Theoretical STM images of alkaline-earth metal adsorbed Si(1 1 1)3 × 2 surfaces

We have performed total-energy calculations to study theoretical scanning tunneling microscopy (STM) images of the Si(1 1 1)3 × 2 surfaces induced by the adsorption of alkaline-earth metals (AEMs). Previously, in a series of works on Ba/Si(1 1 1) system, we have found that the observed Si(1 1 1)3 × 1-Ba LEED phase indeed has a 3 × 2 periodicity with a Ba coverage of 1/6 ML and the HCC substrate structure. Based on results of the Ba case, we proposed that the HCC structure is also adopted for other AEM atoms, which was confirmed by our recent work. In this paper, we mainly report the STM simulations for different AEM systems to compare with existing experimental data. We discuss the difference in the detailed STM images for different AEM adsorbates. Especially, the difference in filled-state images between Mg and other AEM atoms is attributed to the strong Mg-Si interaction.     

Density functional study of ethylamine and allylamine on Si(1 0 0)-2 × 1 and Ge(1 0 0)-2 × 1 surfaces

We have investigated the interactions of ethylamine and allylamine with models of the Si(1 0 0)-2 × 1 and Ge(1 0 0)-2 × 1 semiconductor surfaces. Ab initio molecular orbital calculations, along with density functional theory (DFT), are used to examine the interaction of these amines with cluster models of the semiconductor surfaces. The transition states and final adsorption products for adsorption of the molecules are predicted. The DFT calculations show the amines form N-dative bond states with Si(1 0 0)-2 × 1 or Ge(1 0 0)-2 × 1 as the initial adsorption product. The initial dative-bond products can be further activated, resulting in N-H bond cleavage on both surfaces. The overall reaction of a given amine on Si(1 0 0) via N-H dissociation is more exothermic than on the Ge(1 0 0) surface.     

Atomic and electronic structure of acetic acid on Ge(1 0 0)

We have performed ab initio density-functional theory (DFT) calculations in order to investigate the atomic and electronic structure of acetic acid adsorbed on Ge(1 0 0) surface. Due to its acidity, acetic acid dissociates and the resulting electron-rich acetate group reacts with the electron-deficient down-Ge atom through nucleophilic addition (mono-dentate structure). Further reaction between the electron-rich up-Ge atom and the carboxylic oxygen atom results in bidentate bridged structures, which are energetically most favorable among the tested geometries. The existence of the dissociated H atom on the neighboring Ge atoms and the buckling of Ge dimers are found to affect the feasibility of the formation of bidentate structures. We obtain the simulated STM images from the optimized adsorption geometries for most favorable structures. Theoretical STM images for on-top bidentate structures show characteristic features having on-top protrusions, while those for end-bridged structures show protrusions localized at one side of a dimer row.     

STM study of the Mo(1 1 2) and Mo(1 1 1) surfaces

The Mo(1 1 2) and Mo(1 1 1) surfaces have been studied by STM and DFT/GGA modeling. Due to high quality and cleanness of the surfaces, for the first time good STM images of large fragments of the Mo(1 1 2) and Mo(1 1 1) have been obtained. Lack of atomic resolution in the rows of the Mo(1 1 2) surface is attributed to flatness of distribution of density of the electronic states along the rows. This suggestion is illustrated by comparison of STM images for Mo(1 1 1) and Mo(1 1 2) and model calculations of STM pictures for these surfaces.     

Fabrication and scanning tunneling microscopy studies of the Si(1 1 1)-(√31 × √31)-In surface

We report on the fabrication of single phase of the Si(1 1 1)-(√31 × √31)-In reconstruction surface, observed by scanning tunneling microscopy (STM) at room temperature. By depositing specific amounts of indium atoms while heating the Si(1 1 1)-(7 × 7) substrate at a critical temperature, the single phase of Si(1 1 1)-(√31 × √31)-In surfaces could be routinely obtained over the whole surface with large domains. This procedure is certified by our high-resolution STM images in the range of 5-700 nm. Besides, the high resolution STM images of the Si(1 1 1)-(√31 × √31)-In surface were also presented.     

Hydrogen-induced metallization of the 3C-SiC(0 0 1)-(3 × 2) surface

A surprising metallization of the SiC(0 0 1)-(3 × 2) surface induced by hydrogen adsorption was discovered in recent experiments. The effect was ascribed to dangling bonds created on the third layer of the surface system by H adsorption and stabilized by steric hindrance. We have investigated the surface metallization by density functional calculations. Our total-energy minimizations show that dangling bonds on the third layer are very unstable. Instead, H adatoms form angular Si-H-Si bonds on the third layer after the asymmetric dimers on the top layer have been saturated by H forming monohydrides. The novel Si-H-Si bonds on the third layer give rise to a metallic surface, indeed. But the mechanism for metallization is very different from the one suggested originally. Likewise, H atoms can also occupy bridge positions in angular Si-H-Si bonds on the second layer and induce metallization, as well. In addition to monohydrides on the top-layer dimers, we have also investigated dihydride surfaces with additional H on the second and/or third layer. The dihydride surface structure with H adsorbed on both the second and third layers is energetically most favorable and is also metallic. In all three cases the new Si-H-Si bonds are the origin of the surface metallization while its nature is somewhat more intricate, as will be discussed.     

A new structural model for the SiC(0 0 0 1)(3 × 3) surface derived from first principles studies

A new structural model with fluctuant Si-trimers and missing Si-adatom is proposed for Si-terminated 6H-SiC(0 0 0 1)(3 × 3) reconstruction. The atomic and electronic structures of the model are studied using first principles pseudopotential density-functional approach. The calculated surface electronic density of states coincides quantitatively with the experimental results of photoemission and electron energy loss spectroscopy. Based on the calculations, the Patterson map and scanning tunneling microscopic (STM) images simulated for the new model agree more satisfactorily with the experimental X-ray diffraction and STM observations than that for previously proposed models. The calculations of formation energies suggest that the new structure would be formed under the environment of dilute Si vapor around the surface in the preparation process.     

Atomic surface structure of Si(1 0 0) substrates prepared in a chemical vapor environment

Subsequent III-V integration by metal-organic vapor phase epitaxy (MOVPE) or chemical vapor deposition (CVD) necessitates elaborate preparation of Si(1 0 0) substrates in chemical vapor environments characterized by the presence of hydrogen used as process gas and of various precursor molecules. The atomic structure of Si(1 0 0) surfaces prepared in a MOVPE reactor was investigated by low energy electron diffraction (LEED) and scanning tunnelling microscopy (STM) available through a dedicated, contamination-free sample transfer to ultra high vacuum (UHV). Since the substrate misorientation has a fundamental impact on the atomic surface structure, we selected a representative set consisting of Si(1 0 0) with 0.1°, 2° and 6° off-cut in [0 1 1] direction for our study. Similar to standard UHV preparation, the LEED and STM results of the CVD-prepared Si(1 0 0) surfaces indicated two-domain (2 × 1)/(1 × 2) reconstructions for lower misorientations implying a predominance of single-layer steps undesirable for subsequent III-V layers. However, double-layer steps developed on 6° misoriented Si(1 0 0) substrates, but STM also showed odd-numbered step heights and LEED confirmed the presence of minority surface reconstruction domains. Strongly depending on misorientation, the STM images revealed complex step structures correlated to the relative dimer orientation on the terraces.     

Atomic and electronic structures of thin NaCl films grown on a Ge(0 0 1) surface

Density functional theory (DFT) with LDA and GGA have been employed to study the interface and thin film properties of NaCl on a Ge(0 0 1) surface. The atomic and electronic structures of thin NaCl films from one to ten monolayers were analyzed. The layer adsorption energies show that a quasi-crystalline (0 0 1) fcc NaCl film is built up via a layer-by-layer growth mode with NaCl thickness above 2 ML. Simulated STM images show a well-resolved (1 × 1) NaCl atomic structure for sample bias voltage V_s < −2.5 V and the bright protrusions should be assigned to the Cl⁻ ions of the NaCl film. The Ge substrate dimer is reserved and buckled like a clean Ge(0 0 1)-p(2 × 2) surface as the result of weak interface interaction between the dangling bonds coming from valence π states of the Ge substrate and the 3p states of the interfacial Cl⁻ ion. These results are consistent with the experiments of STM, LEED and EELS.