In插入层对硅衬底外延InN晶体质量和光学特性的影响

在Si(111)衬底上分别预沉积0,0.1,0.5,1 nm厚度的In插入层后,采用等离子辅助分子束外延法制备了纤锌矿结构的InN材料,结合X射线衍射(XRD)、扫描电子显微镜(SEM)、吸收谱及光致发光谱研究了不同厚度的In插入层对外延InN晶体质量和光学特性的影响。XRD和SEM的测试结果表明,在Si衬底上预沉积0.5 nm厚的In插入层有利于改善外延InN材料的形貌,提高材料的晶体质量。吸收谱和光致发光谱测试表明,0.5 nm厚In插入层对应的InN样品吸收边蓝移程度最小,光致发射谱半峰宽最窄,并且有最高的带边辐射复合发光效率。可见,引入适当厚度的InN插入层可以改善Si衬底上外延InN材料的晶体质量和光学特性。     

InN分凝的InGaN薄膜的光致发光与吸收谱

我们用低压MOCVD在蓝宝石衬底生长了InGaN/GaN外延层.用X射线衍射(XRD),光致发光谱(PL),光吸收谱等测量手段,研究了InGaN的辐射发光机制.In组分利用Vegard定理和XRD测量得到.我们发现随着In组分的增加,在光吸收谱上发现吸收边的红移和较宽的Urbach带尾;PL谱中低能端的发射渐渐成为主导,并且在PL激发谱中InGaN峰也变宽.我们认为压电效应改变了InGaN的能带结构,从而影响了光学吸收特性.而在InN量子点中的辐射复合则是InGaN层发光的起源.     

硅基低位错密度厚锗外延层的UHV/CVD法生长

利用超高真空化学气相淀积系统, 基于低温缓冲层和插入应变超晶格的方法, 在Si(100)衬底上外延出厚度约为880 nm的纯Ge层. 采用X射线双晶衍射、高分辨透射电镜、原子力显微镜和光致发光谱分别表征了其结构及光学性质. 测试结果显示外延Ge的X射线双晶衍射曲线半高宽为273", 表面均方根粗糙度为0.24 nm, 位错密度约为1.5×10⁶ cm². 在室温下观测到外延Ge的直接带跃迁光致发光, 发光峰值位于1540 nm. 表明生长的Si基Ge材料具有良好的结晶质量, 可望在Si基光电子器件中得到应用.     

ZnO-Si不同退火条件对生长ZnSe薄膜的影响

研究了作为缓冲层的ZnO薄膜在不同的退火时间、退火温度下退火对Si衬底上生长ZnSe膜质量的影响。当溅射有ZnO膜的Si(111)衬底的退火条件变化时，从X射线衍射谱（XRD）和光致发光谱（PL）中可见，ZnSe(111)膜的晶体质量有较大的变化。变温的PL谱表明，Si衬底上生长的具有ZnO缓冲层的ZnSe膜的近带边发射峰起源于自由激子发射。     

AlN缓冲层对ZnO薄膜质量的影响

采用脉冲激光沉积法以AlN为缓冲层在Si(100)衬底上制备了ZnO薄膜,并测量了样品的XRD谱、SEM图和PL谱.结果表明,AlN缓冲层可以提高Si衬底上外延生长ZnO薄膜的晶体质量.改变缓冲层的生长温度(50～500 ℃)所制备样品的测量结果表明,较低温度下生长的AlN缓冲层有利于制备高质量的ZnO外延层薄膜,其中AlN缓冲层生长温度为100 ℃时外延生长ZnO薄膜晶体质量最好.     

AlN插入层对a-AlGaN的外延生长的影响

采用有机金属化学气相沉积(MOCVD)在r面蓝宝石衬底上生长a-AlGaN外延膜,研究了AlN插入层对a-AlGaN外延膜的应力和光学性质的影响。根据高分辨X射线衍射(HRXRD)技术和扫描电子显微镜(SEM)我们可以得到,AlN插入层有效地提高了a-AlGaN外延膜的晶体质量并减小了外延膜材料结构的各向异性。由拉曼光谱得到AlN插入层的引入减小了a-AlGaN外延膜的面内压应力,其原因是AlN插入层可以当作衬底有效的调制与减小a-AlGaN外延膜与r面蓝宝石衬底的晶格失配,从而使a-AlGaN的面内应力得到适当释放。对室温下的光致发光进行测量得到AlN插入层的使用使近带边发射峰(NBE)发生了红移,这可能是由于残余应力的减小引起。     

常压化学气相沉积法在Ag/Si(111)模板上生长ZnO薄膜及其性能研究

在Si衬底上利用磁控溅射的方法沉积1.5 nm厚度的Ag膜用以阻挡Si衬底被氧化。采用常压金属有机化学气相沉积法(MOVCD),在Ag/Si(111)衬底上成功地生长出马赛克结构的ZnO薄膜。用光学显微镜观察表面形貌,结果显示有带晶向特征的微裂纹,裂纹密度为100 cm-1。依据X射线晶体衍射的结果,薄膜结晶质量良好,呈C轴高度择优取向。用双晶X射线衍射得到(002)面的ω扫描半峰宽为1.37°。温度10 K时光致发光谱(PL)观察到自由激子、束缚激子发射及它们的声子伴线。结果表明,金属有机化学气相沉积法方法在Si(111)衬底上制备ZnO薄膜时,Ag是一种有效的缓冲层。     

衬底温度对ZnMgO薄膜结构和光致发光性能的影响

利用超声喷雾热解方法以不同的沉积温度(450～550 ℃)在石英衬底上制备出一系列ZnMgO薄膜。采用X射线衍射仪(XRD)、扫描电子显微镜(SEM)和光致发光谱(PL)表征了样品的晶体结构、表面形貌和光学性能。结果表明衬底温度对薄膜结构性能和光学特性影响显著。所有薄膜都呈六角纤锌矿多晶结构,其中在530 ℃条件下制备的样品C轴择优最明显,晶粒尺寸均匀,表面形貌平整,结晶质量最好。薄膜的光致发光谱显示随着温度的升高深能级跃迁范围逐渐减小,近紫外带边发光峰逐步出现。衬底温度为530 ℃时在374.5 nm处出现了明显的近紫外发光峰,且几乎没有明显的深能级跃迁出现。     

飞秒脉冲激光沉积钕掺杂薄膜特性研究

采用脉冲激光沉积(PLD)技术在Si(100)衬底上生长了Nd∶YAG薄膜以及Nd∶Glass薄膜,利用扫描电子显微镜(SEM)、能谱仪(EDS)、傅里叶变换红外光谱仪(FTIR)、光学掺量振荡器(OPO)以及光栅光谱仪等测试装置分析了薄膜的表面和断面结构形貌、组成成分、光学吸收谱以及光致发光谱。结果表明：在室温衬底温度下生长的Nd∶YAG薄膜以及Nd∶Glass薄膜均呈无规则非定型结构,没有明显的取向性微晶生长;PLD生长的Nd∶YAG薄膜中存在0.15 at.%化学计量比的Nd元素;Nd∶YAG块体靶材在750和808 nm有两个明显的吸收峰,而薄膜没有明显的吸收峰;Nd∶YAG薄膜在808 nm波长泵浦光下没有明显的光致发光谱峰,而Nd∶Glass薄膜在877和1 064 nm波长处有明显的光致发光谱峰。说明在室温衬底温度下生长的Nd∶Glass薄膜中Nd元素以Nd3+光学活性离子形式掺杂进玻璃基质中,而Nd∶YAG薄膜中的Nd元素没有以Nd3+光学活性离子形式掺杂进YAG基质中。     

Effect of AlN Interlayer on α-plane AlGaN Grown by MOCVD

采用有机金属化学气相沉积(MOCVD)在r面蓝宝石村底上生长α-AlGaN外延膜,研究了AlN插入层对 α-AlGaN外延膜的应力和光学性质的影响.根据高分辨X射线衍射(HRXRD)技术和扫描电子显微镜( SEM)我们可以得到,AlN插入层有效地提高了a-AlGaN外延膜的晶体质量并减小了外延膜材料结构的各向异性.由拉曼光谱得到MlN插入层的引入减小了a-AlGaN外延膜的面内压应力,其原因是AlN插入层可以当作衬底有效的调制与减小α-AlGaN外延膜与r面蓝宝石村底的晶格失配,从而使α-AlGaN的面内应力得到适当释放.对室温下的光致发光进行测量得到AlN插入层的使用使近带边发射峰(NBE)发生了红移,这可能是由于残余应力的减小引起.     

Si(111)衬底切偏角对GaN基LED外延膜的影响

利用金属有机化学气相沉积(MOCVD)方法在具有偏角(0°~0.9°)的Si(111)衬底上生长了GaN薄膜。采用高分辨X射线衍射(HRXRD)对Si衬底的偏角进行了精确的测量,利用HRXRD、原子力显微镜(AFM)以及光致发光(PL)对外延薄膜的晶体质量、量子阱中In组分、表面形貌及光学特性进行了研究。结果表明,Si(111)衬底偏角对量子阱中的In组分、 GaN外延膜的表面形貌、晶体质量以及光学性能具有重大影响。为了获得高质量的GaN外延薄膜,衬底偏角必须控制在小于0.5°的范围内。超出该范围,GaN薄膜的晶体质量、表面形貌及光学性能都明显下降。     

Optical properties of vertically aligned self-assembled InGaAs quantum dot layers on (311)A/B and (100) GaAs substrates

In this work, we present substrate orientation effects on optical properties in vertically stacked In_0.5Ga_0.5As layers grown by molecular beam epitaxy on (311)A/B and reference (100) GaAs substrates. Samples were grown for different GaAs spacer thicknesses. The spacer thickness variation shows the influence on PL spectra for all planes. The differences in peak shape, peak position, amplitude and integrated luminescence have been observed for all surfaces. These differences suggest that indium migration in spacer layers is caused by the strain fields induced by islands buried below, and is different at the three surfaces. Vertical electronic coupling between quantum dots is confirmed by photoluminescence temperature dependence.     

Well-aligned ZnO nanowires grown on Si substrate via metal–organic chemical vapor deposition

ZnO nanowires were grown on silicon substrate by metal–organic chemical vapor deposition (MOCVD) without catalysts. The scanning electron microscopy (SEM) observations along with X-ray diffraction (XRD) results suggest that the ZnO nanowires are single crystals vertically well-aligned to silicon substrate. Room-temperature photoluminescence (PL) measurement reveals strong UV emission and weak green emission, which demonstrates that the nanowires are of good optical properties. The mechanism of the catalyst-free growth of ZnO nanowires on silicon substrate is proposed.     

High temperature growth of InN on various substrates by plasma-assisted pulsed laser deposition

InN has attracted much attention due to its optical and electrical properties that make it suitable for the fabrication of infrared optical devices and high-speed electronic devices. In this work we report on the structural properties and morphology of InN thin films grown on different substrates by radiofrequency plasma beam assisted pulsed laser deposition. Sapphire and silicon substrates were considered for the growth of these films. The influence of substrate type and growth parameters on the morphology and structural properties of the resulting InN thin films is discussed. The structural analysis of the samples was performed by means of X-ray diffraction. The morphology of the thin films was investigated through atomic force microscopy. Although growth of InN from a metallic In target using nitrogen radiofrequency plasma assisted pulsed laser deposition was achieved for all the samples, growth conditions were found to play an important role on the crystal quality of the resulting thin films.     

The comparison between CdS thin films grown on Si(111) substrate and quartz substrate by femtosecond pulsed laser deposition

Two kinds of cadmium sulfate (CdS) thin films have been grown at 600 °C onto Si(111) and quartz substrates using femtosecond pulsed laser deposition (PLD). The influence of substrates on the structural and optical properties of the CdS thin films grown by femtosecond pulsed laser deposition have been studied. The CdS thin films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), photoluminescence (PL) and Raman spectroscopy. Although CdS thin films deposited both on Si(111) and quartz substrates were polycrystalline and hexagonal as shown by the XRD , SEM and AFM results, the crystalline quality and optical properties were found to be different. The size of the grains for the CdS thin film grown on Si(111) substrate were observed to be larger than that of the CdS thin film grown on quartz substrate, and there is more microcrystalline perpendicularity of c-axis for the film deposited on the quartz substrate than that for the films deposited on the Si substrate. In addition, in the PL spectra, the excitonic peak is more intense and resolved for CdS film deposited on quartz than that for the CdS film deposited on Si(111) substrate. The LO and TO Raman peaks in the CdS films grown on Si(111) substrate and quartz substrate are different, which is due to higher stress and bigger grain size in the CdS film grown on Si(111) substrate, than that of the CdS film grown on the amorphous quartz substrate. All this suggests that the substrates have a significant effect on the structural and optical properties of thin CdS films. PACS 81.15.Fg; 81.05.Ea; 78.20.-e; 78.67.-n; 42.62.-b     

Wurtzite to zincblende transition of InN films on (011) SrTiO3 by decreasing trimethylindium flows

Wurtzite (w) and zincblende (zb) InN films have been grown on (011) SrTiO₃ (STO) substrates by metal-organic chemical vapor deposition, the epitaxial relationships and optical properties are characterized by X-ray diffraction (XRD), absorption and photoluminescence (PL). Based on XRD θ–2θ and Φ scanning results, the epitaxial relationships between (w- and zb-) InN films and STO substrates are determined, that is, (0001)[1120] _w-InN//(011)[100]_STO and (100)[011]_zb-InN//(011)[100]_STO(100)[011]_{\mathit{zb}\mbox{-}\mathrm{InN}}//(011)[100]_{\mathrm{STO}}. Compared with the w-InN films, the zb-InN films exhibit a red shift in absorption edge and PL spectra, and a much narrower and stronger PL spectrum, implying a better optical quality of zb-InN films. The structure transition is supposed to be due to the difference in atom and bond areal density between the crystal plane of w-InN(0001) and zb-InN(100).     

Synthesis,growth and third order nonlinear optical studies of a rhombohedral crystal: Sodium tetraborate pentahydrate

An apt and a futuristic nonlinear optical material sodium tetraborate pentahydrate (STBPH) was synthesized and grown by the technique of slow evaporation. The structural parameters of the crystal was confirmed by single crystal XRD revealed rhombohedral crystal system. Crystal's broad optical transparency was revealed by UV–Vis absorption spectrum. From the absorption spectrum, theoretical calculations were made to determine absorption coefficient, band gap, Urbach energy and reflectance. The functional groups were identified by FT-IR and FT-Raman spectra. Vicker's microhardness measurement disclosed that the grown crystal belongs to soft material category. Photoluminescence (PL) spectral study of STBPH indicated violet and blue emission peaks respectively at 343.06 nm and at 453.11 nm, 490.19 nm. Dielectric studies reveal the dielectric nature of the grown crystal. TGA-DTA studies showed that the crystal holds good thermal stability. The third order nonlinearities of STBPH was investigated by Z-scan technique manifest its suitability in nonlinear optical applications.     

High growth rate deposition of oriented InN pillar crystals

High growth rate deposition of highly oriented indium nitride (InN) pillar crystals were successfully grown on Si(100) substrate prepared under atmospheric pressure using a halide CVD method (AP-HCVD). The growth rate of InN pillar crystal can be enhanced threefold by AP-HCVD system with metal halide dual sources zone, and the maximum growth rate of 8.33 nm/s was achieved. X-ray diffraction and X-ray pole-figure analyses showed that the each InN pillar crystal grows with a different rotation angle around the 〈001〉 axis. Selected area transmission electron diffraction showed that that they are of high crystal quality.     

Effect of the substrate pretreatment on the epitaxial growth of indium nitride

The influence of the substrate pretreatment on crystallinity of indium nitride films grown on (1 1 1)GaAs by radio frequency sputtering were investigated. It was shown that the crystalline quality of InN layers grown on GaAs can be improved by presputtering the substrate in nitrogen plasma prior to the growth. By Auger electron spectroscopy and atomic force microscopy analysis we revealed that GaN islands form on the surface of GaAs substrate due to the presputtering. The optimum presputtering time for growing InN single crystal was assessed to be the time at which GaN islands cover the substrate surface entirely.