Polymerization of para-xylylene derivatives. V. Effects of the sublimation rate of di-p-xylylene on the crystallinity of parylene C deposited at different temperatures

Poly(chloro-p-xylylene) was synthesized in a manner similar to poly(p-xylylene) using Gorham's method at various cryogenic temperatures. The effect of the sublimation rate of dimer on the kinetics of deposition, crystallinity, and crystalline structure was studied. Increasing the sublimation rate of the dimer increases the deposition rate similar to that of poly(p-xylylene). However, an increase in crystallinity, in contrast to Parylene N, is observed, although, in general, Parylene C has lower crystallinity relative to Parylene N. No polymorphism is observed either by decreasing the deposition temperature or by increasing the sublimation rate of the dimer. Solution annealing and isothermal annealing both bring about crystallization without any structural transformation. Solution annealing removes the oligomers and dimers, but no crystalline oligomers are ever detected under the scanning electron microscope (SEM). The surface topology of films synthesized from ambient temperature to ?40°C is very similar to Parylene N. At lower temperatures, in the region ?50 to ?60°C, a rod-type morphology is observed similar to Parylene N. The surface topology of samples synthesized at ?196°C is totally different from that of Parylene N. All low temperature synthesized samples are amorphous.     

Polymerization of para-xylylene derivatives (parylene polymerization). IV. Effects of the sublimation rate of di-p-xylylene on the morphology and crystallinity of parylene N deposited at different temperatures

The effect of the sublimation rate of di-p-xylylene on the crystallinity and morphology of Parylene N deposited on stainless steel was studied as a function of substrate temperature. For a given rate of dimer sublimation, the deposition rate increases with decreasing substrate temperature. Increasing the sublimation rate of the dimer increases the deposition rate 10-fold, decreases the crystallinity, and shifts the appearance of the hexagonal β structure towards higher substrate temperature for samples synthesized from room temperature (RT) to ?60°C. Solution annealing resulting from solvent extraction, and isothermal annealing, increase the crystallinity of the polymers and result in structures containing both α and β polymorphs. The surface topology, as revealed by scanning electron microscopy (SEM), for polymers synthesized from RT to ?40°C shows a globular structure, whereas low temperature samples exhibit a rod-type morphology. For higher sublimation rates of the dimer, SEM micrographs show that oligomeric species start appearing on the polymer films after a period of 4–5 days. Solvent extraction removes the oligomeric crystals, and GPC analysis of the resulting extract indicates that most of the oligomers range in molecular weight from 100 to 900. The cross-sectional morphology for fractured low temperature samples, however, reveals different morphologies as polymerization proceeds. It is postulated that in the temperature range ?50 to ?78°C, both surface condensation and surface adsorption of monomer occurs, leading to different morphologies and lower crystallinity. The polymer synthesized at liquid nitrogen temperature shows the presence of voids along with different morphologies. X-ray diffractograms of polymers synthesized at liquid nitrogen reveal a considerable amount of amorphous phase in the films. Hence, it is inferred that, although the liquid nitrogen polymerization is a solid state polymerization of the crystalline monomer, it does not lead to 100% crystalline material, and the reasons for this are discussed.     

Polymerization of para-xylylene derivatives (parylene polymerization). I. Deposition kinetics for parylene N and parylene C

Kinetic aspects of parylene N [unsubstituted poly(para-xylylene)] and Parylene C [monochlorosubstituted poly(para-xylylene)] were studied. The conversion of starting material (dimer of either p-xylylene or chloro-para-xylylene) to polymer is quantitative (ca. 100%). Consequently, the total polymer formed in a closed system is directly proportional to the amount of dimer charged. However, the percentage of the total amount of polymer formed which deposits on substrate surfaces, placed in the deposition chamber, as well as the polymer film growth rate are dependent on operational factors such as the temperature of the substrate, sublimation of dimer temperature, flow pattern of the reactive species, etc. Parylene C, being a heavier and more polar molecule, has the tendency to deposit easily in the deposition chamber compared to the deposition of Parylene N. Parylene C also has a higher ceiling temperature for deposition than Parylene N. This situation has been investigated from the viewpoint of excess thermal energy which hinders polymer formation (deposition) due to the exceedingly high entropy change necessary for polymer deposition to occur. The addition of a cool (i.e., room temperature) inert gas was shown to increase the deposition of Parylene N on substrate surfaces placed in the deposition chamber. The deposition increase and acceleration of deposition (film growth) rate were found to be related to the size and molecular weight of the inert gas pressure maintained in the system. The accelerating effect is explained by the increase in third-body collisions to dissipate the excess thermal energy of the reactive species.     

Polymerization of para-xylylene derivatives (parylene polymerization). III. Heat effects during deposition of parylene N at different temperatures

Thermal effects accompanying the vacuum deposition of poly-para-xylene (Parylene N) at different temperatures have been studied by following the changes in the temperature of the substrate. Similarly to the case of polychloro-para-xylylene (Parylene C), two distinct exothermic effects were observed; one discrete, resulting in sharp exothermic spikes and the other continuous, resulting in the shift of the baseline. The spike effect, attributed to the solid-state polymerization of para-xylylene, is observed at the low-temperature range, the upper limit of which moves higher for higher deposition rates. The shift of a baseline as a function of deposition temperature exhibits two maxima, one independent of deposition rate and the second moving toward higher temperatures (that is, toward the first maximum) for higher deposition rates. First maximum falls at about ? 72°C and is attributed to the melting point of para-xylylene crystals. X-ray diffraction studies of polymer samples have shown that the existence of the second maximum is always followed by the appearance of an additional crystalline phase in the respective range of deposition temperatures. When the deposition rate is high enough, the second maximum merges with the first one, or virtually disappears. Under such conditions the new crystalline phase is no more detectable. It is postulated that the evolution of the additional amount of heat resulting in the appearance of the second maximum is due to the cyclization reaction and the formation of cyclic oligomers. This reaction very likely requires a particular spatial arrangement of monomer molecules and, therefore, it is suggested to take place in certain domains of the crystalline lattice.     

Parylene C at subambient temperatures

Dependence of Parylene C deposition rate on dimer sublimation temperature, inert gas pressure, substrate temperature, and mass of dimer has been investigated. It was found that Parylene C deposition proceeds best at ambient temperature and produces film of optimum performance. Opacity in the film results from its rough morphology and not from the incorporation of the dimer in the film as is normally thought. This was evidenced from scanning electron microscopy and from an estimation of the volatile contents of the Parylene C films. Deposition of Parylene C at liquid nitrogen temperature proceeds via trapping of active monomer species followed by spontaneous polymerization. A quantitative study of the monomer to polymer transition by ESR spectroscopy is presented.     

Functionalization of parylene during its chemical vapor deposition

Two possible mechanisms for the reaction of four halogenated (metha)acrylate‐based molecules with Parylene [poly (paraxylylene)] during its chemical vapor deposition were proposed. The chemical reactivity of acrylate double bond with the paraxylylene biradical was calculated for all four (metha)acrylate‐based molecules. These calculations allowed the evaluation of the energetically favorable mechanism and indeed a direct correlation was found between both predicted and experimental reactivities. Next, the reactivity of the (metha)acrylate‐modified Parylene films was evaluated through their reaction with different amines. The obtained amidated Parylene films were characterized with X‐ray photoelectron spectroscopy, Kaiser test for primary amines, and fluorescence microscopy. The strong reactivity of (metha)acrylate‐modified Parylene films toward nucleophilic substitution emphasizes a general method for the functionalization of self‐supported Parylene films grown on the reacting solutions using the novel solid on liquid deposition process. This paves the way to the development of multifunctional materials in a one‐step process resulting from the deposition Parylene over liquid patterns. © 2011 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011     

Study on parylene/SiO<Subscript>2</Subscript> composite films for protection of KDP crystals

In this paper, parylene/SiO₂ composite films were reported to protect KDP crystals, indispensable cells in ICF experiments, from moisture. FTIR, UV-NIR spectra and XPS were used to analyze the properties of films. Laser damage threshold of films was also measured. With porous silica coating on surface of parylene film, the transmittance of dual layers can be raised to more than 91%. KDP crystals with poly(p-xylylene)/SiO₂ coating could work well in ambient atmosphere for more than half a year.     

Tensile film stress of parylene deposited on liquid

We found that liquid droplets encapsulated by Parylene deposited directly on a liquid surface deformed toward spherical shapes during Parylene deposition. This deformation suggested that the film stress was tensile. We calculated the film stress of such Parylene films by studying the surface mean curvature of the droplet shape and found the film stress measured about 0.7-0.9 MPa tensile. This film stress is of opposite type to that of as-deposited Parylene films deposited on solid substrates, which was compressive. This difference might indicate a profound change of the Parylene polymer due to the use of liquid surface as deposition substrate. The tensile film stress and its effect on the droplet shape also have implications in the fabrication and operation of Parylene microdevices that have encapsulated liquid structures such as microlens or micropumps.     

Polymerization of para-xylylene derivatives (parylene polymerization). II. Heat effects during deposition of parylene C at different temperatures

Thermal effects accompanying vacuum deposition of poly(chloro-para-xylylene) in the temperature range between ?196 and 0°C have been studied using two separate methods. One is based on the recording of the rate of evaporation of liquid nitrogen and it is used for the deposition at ?196°C, and the second involves the recording of changes in the substrate temperature and is used for the deposition in the range of ?162 to 0°C. These methods enable us to observe two distinct effects: fast (discrete), resulting in the appearance of sharp, exothermic spikes; and slow (continuous), resulting in the shift of the baseline. The shift of the baseline exhibits a well-defined maximum at about ?65°C and this temperature is attributed to the melting point of the monomer. The fast process always occurs below this temperature and is explained as a solid state, chain addition polymerization. The quantification of the heat effect at ?196°C strongly suggests that the quinonoid form of the monomer participates in the propagation step of this chain reaction. The fast (solid state) and the continuous modes of polymerization may occur simultaneously in the range of about ?140 and ?65°C. The frequency of the initiation which is the formation of dimer radical seems to control the occurrence of these two modes of polymerization.     

The Effect of Thermal Treatment on the Structural and Electrokinetic Properties of Porous Glass Membranes

The properties of porous glass membranes prepared by acid leaching of sodium borosilicate glasses 8B and 8V and also 8B glass containing small amounts of fluorine and phosphorus (SFP) are comprehensively studied. The effect of the composition and conditions of thermal treatment of the original and porous glasses on their structural (specific surface area, structure resistance coefficient, average pore radius, volume porosity, and filtration factor) and electrokinetic characteristics (conductivity, counterion transport numbers, and electrokinetic potential) in KCl solutions at neutral pH values is studied. It is shown that an increase in thermal treatment temperature T _TT of the porous glasses from 120 to 750°C leads to a decrease in structure resistance coefficient β of 8B membranes. For membranes prepared from SFP glass, β values, efficiency coefficients, and counterion transport numbers are virtually independent of T _TT at 120–600°C and increase at T _TT = 750°C. Specific surface area and volume porosity decrease with a rise in T _TT for all studied membranes. The observed regularities of variations in the membrane characteristics are explained by the increasing fraction of large pores because of sintering of small pores with an increase in T _TT and by the different amounts of secondary silica in the pore space of porous glasses.__________Translated from Kolloidnyi Zhurnal, Vol. 67, No. 3, 2005, pp. 299–307.Original Russian Text Copyright © 2005 by Volkova, Ermakova, Sidorova, Antropova, Drozdova.     

Low Dielectric Constant Organosilicate Films Prepared by Sol-Gel and Templating Methods

Low dielectric constant organosilicate films with controllable microstructure have been successfully synthesized by multiple-step sol-gel process and templating method, which are the two basic methods to establish porous network in the films. Ultra-low dielectric constant (k) of around 2.0 can be achieved for both films. The microstructure such as porosity, pore interconnection and pore size of the two types of the films have been studied and compared. It has been found that the sol-gel films have a higher level of porosity comparing to the templating films to obtain the same k value. The sol-gel film has a majority of closed pores with pore size around 5 nm. The templating film has a closed pore structure with pore size around 10 nm. Preliminary results present a very positive prospective for intermetal dielectric applications.     

Preparation of a large Mesoporous CeO2 with crystalline walls using PMMA colloidal crystal templates

Inverse opals of crystalline CeO₂ were synthesized by using close-packed poly(methyl methacrylate) (PMMA) latex spheres of various sizes as templates, resulting in pore sizes, which could be scaled down even to the mesopore region (30–40 nm). The latex spheres were synthesized by emulsion polymerization, and the PMMA particle size could be substantially decreased by addition of sodium dodecyl sulfate (SDS) as surfactant. Owing to the larger pore wall thickness, the CeO₂ with large mesopores preserves an intact porosity to higher temperatures than previously reported mesoporous CeO₂ obtained from surfactant templates. The porosity and crystallinity were studied by microscopic techniques, wide angle X-ray diffraction (XRD), N₂ sorption, and Hg porosimetry. The evolution of crystallinity (crystallite size and lattice parameters) was determined for different annealing temperatures by means of Rietveld refinements of the XRD data. Thereby, our study allowed getting general insights into the crystallization behavior of sol–gel derived porous CeO₂ frameworks.     

Gas transport properties of thermotropic liquid-crystalline copolyesters. I. The effects of orientation and annealing

Gas transport properties are reported for two series of films prepared from copolyesters of 73 mol % hydroxybenzoic acid (HBA) and 27 mol % 2,6-hydroxynaphthoic acid (HNA) which systematically vary the degree of orientation and annealing time. Scanning electron microscopic (SEM) photomicrographs of the liquid-crystalline polymer (LCP) films showed evidence of a skin-core structure and polydomain texture. The degree of orientation in the films was quantified by analyzing the azimuthal intensity of the x-ray reflection associated with the lateral packing of the nematic mesophase. Using heat of fusion data from differential scanning calorimetry (DSC), the films were found to contain low levels of crystallinity estimated to be in the range of 5 to 15 wt %, which increased with annealing time. Permeability measurements were made for He, H₂, O₂, N₂, Ar, and CO₂ at 35°C and the diffusivities were computed from time-lag data. The films exhibited excellent barrier properties resulting largely from very low gas solubility coefficients. A moderate reduction in permeability was observed with increased orientation, which could be attributed directly to a decrease in the effective diffusivity. The effect of increased crystallinity from annealing on the permeability coefficients was smaller than would be expected for similar changes in the crystallinity of conventional polymers. Analysis using a simple two-phase model suggests that a mechanism dominated by transport in a small volume fraction of boundary regions possibly could account for the bulk transport properties of these materials.     

Structural variety of CdS in films synthesized by vapor deposition polymerization

Poly(p-xylylene)—CdS (PPX—CdS) nanocomposite films with different thicknesses (～0.2, ～0.5, ～1, and ～1.5 μm) and concentrations of CdS from 5 to 90 vol.%, as well as single-component CdS and PPX films with various thicknesses were studied by X-ray diffraction. The films were synthesized on polished silicon or quartz substrates by low-temperature vapor deposition method. It was shown that CdS nanoparticles in PPX—CdS films, depending on their thickness and CdS content, can have an X-ray amorphous structure, a defect crystal structure (RCP structure), or a wurtzite-type crystal structure. Similar structures were observed for single-component CdS films of the corresponding thickness. The sizes of the coherent scattering regions of CdS were determined for some nanocomposite and single-component films. Poly(p-xylylene) in the studied nanocomposite films was characterized by an X-ray amorphous structure.

     

Dielectric and piezoelectric properties of dense and porous PZT films prepared by sol-gel method

PZT films with different microstructure and Zr:Ti ratios were fabricated on ITO/glass and platinized silicon wafer substrates by dip-coating. A dense film of 2% porosity and a porous film of 19% porosity were obtained by repetition of thin and thick coatings, respectively. Development of pores during heating the film was examined and heating process factors were investigated. In the film fabricated on ITO/glass substrates, an existence of non-perovskite and low permittivity layer was confirmed by measurement of film thickness dependence of the dielectric constant. Among the films studied, the film with molar composition of Ti:Zr = 5:5 exhibited the largest dielectric constant and apparent piezoelectric coefficient, d ₃₃, though the values were small. Apparent piezoelectric coefficients of d ₃₃ and g ₃₃ of the porous films were larger than those of the dense films.     

In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry

Ellipsometric porosimetry (EP) is a handy technique to characterize the porosity and pore size distribution of porous thin films with pore diameters in the range from below 1 nm up to 50 nm and for the characterization of porous low-k films especially. Atomic layer deposition (ALD) can be used to functionalize porous films and membranes, e.g., for the development of filtration and sensor devices and catalytic surfaces. In this work we report on the implementation of the EP technique onto an ALD reactor. This combination allowed us to employ EP for monitoring the modification of a porous thin film through ALD without removing the sample from the deposition setup. The potential of in situ EP for providing information about the effect of ALD coating on the accessible porosity, the pore radius distribution, the thickness, and mechanical properties of a porous film is demonstrated in the ALD of TiO(2) in a mesoporous silica film.     

Structural,compositional and hardness properties of hydrogenated amorphous carbon nitride thin films synthesized by dense plasma focus device

The hydrogenated amorphous carbon nitride (a‐CN_x:H) thin films were synthesized on the SS‐304 substrates using a dense plasma focus device. The a‐CN_x:H thin films were synthesized using CH₄/N₂ admixture gas and 20 focus deposition shots on substrates placed at different distances from the anode top. X‐ray photoelectron spectroscopy and Raman analysis confirmed different C–N bonding in the a‐CN_x:H thin films. A decrease in the N/C ratio as well as the sp³/sp² ratio with an increase in the substrate distance has been observed. The higher amount of C–N formation for the film synthesized at 10 cm is observed which decreases with increasing distance. The X‐ray photoelectron spectroscopy and Raman analysis affirmed the C ≡ N presence in all the thin films synthesized at different distances. The morphology of the synthesized a‐CN_x:H thin films showed nanoparticles and nanoparticle clusters formation at the surface. The hardness results showed comparatively lower hardness of the a‐CN_x:H thin films due to the presence of C ≡ N. The C–N formation with lower amount of C ≡ N and a higher N/C ratio as well as a higher sp³/sp² ratio for the films synthesized at 10 cm show reasonably higher hardness. Copyright © 2016 John Wiley & Sons, Ltd.     

Synthesis of 1,1,9,9-tetrafluoro[2.2]paracyclophane and its polymerization by vapor deposition method

1,1,9,9-Tetrafluoro[2.2]paracyclophane ( 1 ) was prepared successfully as white crystals in 72% yield via two-step reactions from 1,9-diketo[2.2]-paracyclophane. The polymerization of 1 by the vapor deposition method was carried out at pyrolysis temperature range of 400 to 800°C and deposition temperature range of ?20 to 20°C, and a tough, transparent poly(α,α-difluoro-p-xylylene) film was obtained in 72% yield at the pyrolysis temperature of 750°C and the deposition temperature of ?20°C. It was found that the pyrolysis of 1 gave a reactive α,α-difluoro-p-xylylene, which polymerized on the head-to-tail addition to give poly(α,α-difluoro-p-xylylene). Some properties such as solubility, thermal stability, glass transition temperature, and density for poly(α,α-difluoro-p-xylylene) were studied. © 1995 John Wiley & Sons, Inc.     

Adsorption, desorption, and diffusion of nitrogen in a model nanoporous material. I. Surface limited desorption kinetics in amorphous solid water

The adsorption and desorption kinetics of N2 on porous amorphous solid water (ASW) films were studied using molecular beam techniques, temperature programed desorption (TPD), and reflection-absorption infrared spectroscopy. The ASW films were grown on Pt(111) at 23 K by ballistic deposition from a collimated H2O beam at various incident angles to control the film porosity. The experimental results show that the N2 condensation coefficient is essentially unity until near saturation, independent of the ASW film thickness indicating that N2 transport within the porous films is rapid. The TPD results show that the desorption of a fixed dose of N2 shifts to higher temperature with ASW film thickness. Kinetic analysis of the TPD spectra shows that a film thickness rescaling of the coverage-dependent activation energy curve results in a single master curve. Simulation of the TPD spectra using this master curve results in a quantitative fit to the experiments over a wide range of ASW thicknesses (up to 1000 layers, approximately 0.5 microm). The success of the rescaling model indicates that N2 transport within the porous film is rapid enough to maintain a uniform distribution throughout the film on a time scale faster than desorption.     

Thermal oxidative stability of poly-p-xylylenes

The air oxidation of poly-p-xylylene films was studied at temperatures between 125 and 200°C. The oxidation kinetics were obtained from neutron activation (NA) oxygen analyses and infrared (IR) Spectroscopy. A correlation between the NA oxygen analyses and mechanical properties indicated that the amount of oxygen incorporated into these polymers before a significant degradation mechanical properties is about 1000 ppm for poly(dichloro-p-xylylene) and 5000 ppm for poly(monochloro-p-xylylene) or poly-p-xylylene. The activation energy for the oxidation of these polymers was about 30 kcal/mole. Long-term-use (100,000 hr) temperatures were also estimated for each of the poly-p-xylylenes studied. The 100,000-hr maximum continuous-use temperature is 112°C for poly(dichloro-p-xylylene), 72°C for poly(monochloro-p-xylylene), and 57°C for poly-p-xylylene.