Ta2O5-PMMA复合栅绝缘层对OFETs性能的影响

选用五氧化二钽（Ta₂O₅）-聚甲基丙烯酸甲酯（PMMA）复合材料作为栅绝缘层制备了并五苯有机场效应晶体管（OFETs）。通过在Ta₂O₅表面旋涂一层PMMA可以降低栅绝缘层的表面粗糙度,增大其场效应晶体管的迁移率。研究了厚度在20~60 nm范围内的PMMA对复合绝缘层表面形貌、粗糙度以及器件电学性能的影响。结果表明,当PMMA厚度为40 nm时,器件的电学性能最佳。与单一的Ta₂O₅栅绝缘层器件相比,其场效迁移率由4.2×10^-2 cm²/（V·s）提高到0.31 cm²/（V·s）;栅电压增加到-20 V时,开关电流比由2.9×10²增大到2.9×10⁵。     

Ta_2O_5-PMMA复合栅绝缘层对OFETs性能的影响（英文）

选用五氧化二钽(Ta_2O_5)-聚甲基丙烯酸甲酯(PMMA)复合材料作为栅绝缘层制备了并五苯有机场效应晶体管(OFETs)。通过在Ta_2O_5表面旋涂一层PMMA可以降低栅绝缘层的表面粗糙度,增大其场效应晶体管的迁移率。研究了厚度在20~60 nm范围内的PMMA对复合绝缘层表面形貌、粗糙度以及器件电学性能的影响。结果表明,当PMMA厚度为40 nm时,器件的电学性能最佳。与单一的Ta_2O_5栅绝缘层器件相比,其场效迁移率由4.2×10~(-2)cm~2/(V·s)提高到0.31 cm~2/(V·s);栅电压增加到-20 V时,开关电流比由2.9×10~2增大到2.9×10~5。     

氧化锌锡薄膜晶体管的研究

在ITO玻璃基底上用射频磁控溅射技术生长氧化锌锡(ZnSnO)沟道有源层、用PECVD生长SiO₂薄膜作为薄膜晶体管的栅绝缘层研制了薄膜晶体管(TFT), 器件的场效应迁移率最高达到μ_n=9.1 cm²/(V ·s),阈值电压-2 V,电流开关比为10⁴. 关键词： 氧化锌锡 薄膜晶体管 场效应迁移率     

蒸镀法制备全有机并五苯薄膜场效应晶体管

以全蒸镀方法在真空室内一次性制备了正装结构的全有机并五苯薄膜场效应晶体管。正装结构全蒸镀法有利于简化工艺制备程序,缩小器件尺寸,提高集成度。制备的绝缘层厚度仅为50nm的全有机薄膜场效应晶体管,器件的工作电压降至10V,相同电压下饱和输出电流有了明显提高。筛选适当的有机绝缘材料,改善全有机薄膜场效应晶体管有源层/绝缘层的界面性能,使阈值电压几乎降至0V,场效应迁移率提高了3倍多,输出饱和电流也有了明显的提高。     

对以并五苯和酞菁铜为不同有源层的有机薄膜晶体管特性研究

通过扫描电镜和X射线衍射对SiO₂衬底上生长并五苯和酞菁铜薄膜的表面形貌进行表征,并得到在SiO₂衬底上生长的并五苯薄膜是以岛状结构生长,其大小约为100nm,且薄膜有较好的结晶取向,呈多晶态存在. 酞菁铜薄膜则没有表现出明显的生长机理,其呈非晶态存在. 还对通过掩膜的方法制作得以酞菁铜和并五苯为有源层的顶栅极有机薄膜晶体管的特性进行了研究. 有源层的厚度为40nm,绝缘层SiO₂的厚度为250nm,器件的沟道宽长比(W/关键词： 有机薄膜晶体管 并五苯薄膜 酞菁铜薄膜 μ_EF)')" href="#">场效应迁移率(μ_EF)     

基于聚(4-乙烯基苯酚)衬底修饰层喷墨打印的小分子有机半导体薄膜制备和表征

采用旋涂法预先在SiO₂衬底表面形成一层聚（4-乙烯基苯酚）（PVP）作为表面修饰层,以喷墨打印的6,13-双（三异丙基甲硅烷基乙炔基）并五苯（TIPS并五苯）作为有源层制作有机薄膜晶体管,有效改善了有机半导体薄膜的形貌。采用真空热蒸镀工艺制备源漏电极,形成底栅顶接触结构的有机薄膜晶体管（OTFT）器件。作为对比,在未经过表面修饰的SiO₂衬底上采用相同条件打印TIPS并五苯薄膜晶体管,发现在经过PVP修饰的SiO₂衬底上打印的单点厚度更均匀,咖啡环效应被抑制或被消除;而通过多点交叠打印形成的矩形薄膜的晶粒尺寸更大,相应的OTFT器件具有更高的场效应迁移率。在有PVP修饰层的衬底上制作的OTFT,器件在饱和区的平均场效应迁移率达到了0.065 cm²·V^-1·s^-1;而直接在SiO₂衬底上制作的器件,相应的平均场效应迁移率仅为0.02 cm²·V^-1·s^-1。     

不同表面修饰制备高性能柔性薄膜晶体管

分别采用六甲基二硅胺(HMDS,Hexamethyldisilazane)和聚苯乙烯/氯硅烷复合材料修饰聚乙烯基苯酚(PVP)绝缘层制备了底接触的有机薄膜晶体管并研究了其半导体层的表面形貌和器件的电学性能。原子力显微镜观察发现,并五苯半导体薄膜在不同的界面修饰上的生长形貌产生了很大变化。在PVP上沉积的并五苯晶粒尺寸都小于150 nm,经过聚苯乙烯/氯硅烷复合材料和HMDS处理后的PVP表面生长的并五苯晶粒尺寸则分别在200~400 nm和400~600 nm。大尺寸的晶粒能够减小器件沟道内的陷阱浓度,从而有效地提高电学性能。PVP绝缘层采用聚苯乙烯/氯硅烷和HMDS修饰后,与未修饰的器件相比迁移率分别提高了58倍和82倍。采用HMDS作为表面修饰层制备柔性OTFT,并五苯场效应晶体管的关态电流约为10-9A,电流的开关比超过104,最大场效应迁移率约可达0.338 cm2·V-1·s-1.     

基于复合绝缘层SiNx/PMMA的有机金属-绝缘层-半导体器件

为改善有机半导体器件的界面性能,在氮化硅层上旋涂聚甲基丙烯酸甲酯(PMMA)构成复合绝缘层。首先,利用原子力显微镜研究了不同浓度的PMMA复合绝缘层的表面形貌及粗糙度。接着,蒸镀六联苯(p-6P)、酞菁铜和金电极,构成有机的金属-绝缘层-半导体(MIS)器件。最后,研究了MIS器件的回滞效应及电性能。实验结果表明,复合绝缘层的粗糙度为单绝缘层的1/5,大约1.4 nm。复合绝缘层上的p-6P薄膜随着PMMA浓度增加形成更大更有序的畴,但单绝缘层上薄膜呈无序颗粒状。复合绝缘层的有机MIS器件几乎没有回滞现象,但单绝缘层的器件最大回滞电压约为12.8 V,界面陷阱电荷密度约为1.16×10~(12) cm~(-2)。复合绝缘层有机薄膜晶体管的迁移率为1.22×10~(-2) cm~2/(V·s),比单绝缘层提高了60%,饱和电流提高了345%。基于复合绝缘层的MIS器件具有更好的界面性能和电性能,可应用到有机显示领域。     

溶胶凝胶法制备高性能锆铝氧化物作为绝缘层的薄膜晶体管

本文采用溶胶凝胶法制备了锆掺杂铝氧化物(锆铝氧化物)和铪铟锌氧化物薄膜,并用于制造薄膜晶体管的绝缘层和有源层.锆铝氧化物绝缘层具有较高的介电常数,其相对介电常数为19.67,且薄膜表面光滑,致密,其表面粗糙度仅为0.31 nm.获得的薄膜晶体管具备良好的器件性能,当器件宽长比为5时,器件的饱和迁移率为21.3 cm2/V·s,阈值电压为0.3 V,开关比可以达到4.3×107,亚阈值摆幅仅有0.32 V/dec.     

基于聚噻吩/聚己内酯共混物的有机薄膜晶体管

选择聚3-己基噻吩(P3HT)/聚己内酯(PCL)双晶共混体系制备了不同配比的共混物有机薄膜晶体管。电学性能研究发现,随着共混物中P3HT含量降低,薄膜晶体管的场效应迁移率、开关电流比和阈值电压等性能缓慢降低。当P3HT质量分数为40%时,共混物薄膜仍具有较好的场效应性能,迁移率为0.008 cm²·V^-1·s^-1,开关电流比为5×10³,阈值电压为45.5 V。原子力显微镜测试结果表明:共混物成膜时发生明显的垂直相分离,在界面处形成连续的半导体层,有利于载流子传输。     

N2O Plasma表面处理对SiNx基IGZO-TFT性能的影响

采用N₂O plasma处理SiN_x薄膜作为绝缘层,以室温下沉积的铟镓锌氧化物(IGZO)作为有源层制备了 IGZO薄膜晶体管。与常规的IGZO-TFT相比,N₂O plasma处理过的IGZO-TFT的迁移率由原来的4.5 cm²·V^-1·s^-1增 加至8.1 cm²·V^-1·s^-1,阈值电压由原来的11.5 V减小至3.2 V,亚阈值摆由原来的1.25 V/decade减小至0.9 V/decade。采用C-V方法计算了两种器件的陷阱态,结果发现N₂O plasma处理过的IGZO-TFT的陷阱态明显小于普通的IGZO-TFT的陷阱态,表明N₂O plasma处理SiN_x绝缘层是一种改善IGZO-TFT器件性能的有效方法。     

Electrical characteristics of top contact pentacene organic thin film transistors with SiO<Subscript>2</Subscript> and poly(methyl methacrylate) as gate dielectrics

Organic thin film transistors (OTFTs) were fabricated using pentacene as the active layer with two different gate dielectrics, namely SiO₂ and poly(methyl methacrylate) (PMMA), in top contact geometry for comparative studies. OTFTs with SiO₂ as dielectric and gold deposited on the rough side of highly doped silicon (n⁺-Si) as gate electrode exhibited reasonable field effect mobilities. To deal with poor stability and large leakage currents between source/drain and gate electrodes in these devices, isolated OTFTs with reduced source/drain contact area were fabricated by selective deposition of pentacene on SiO₂/PMMA through shadow mask. This led to almost negligible leakage currents and no degradation in electrical performance even after 14 days of storage under ambient conditions. But, the field effect mobilities obtained were lower than 10⁻³ cm² V⁻¹ s⁻¹, whereas by using PMMA as gate dielectric with chromium deposited on the polished side of n⁺-Si as gate electrode, improved field effect mobilities (>0.02 cm² V⁻¹ s⁻¹) were obtained. PMMA-based OTFTs also exhibited lower leakage currents and reproducible output characteristics even after 30 days of storage under ambient conditions.      

Improved Performance by a Double-Insulator Layer in Organic Thin-Film Transistors

Organic thin film transistors based on pentacene are fabricated by the method of full evaporation. The thickness of insulator film can be controlled accurately, which influences the device operation voltage markedly. Compared to the devices with a single-insulator layer, the electric performance of devices by using a double-insulator as the gate dielectric has good improvement. It is found that the gate leakage current can be reduced over one order of magnitude, and the on-state current can be enhanced over one order of magnitude. The devices with double-insulator layer exhibit field-effect mobility as large as 0.14cm^2/Vs and near the zero threshold voltage. The results demonstrate that using a proper double insulator as the gate dielectrics is an effective method to fabricate OTFTs with high electrical performance.     

Enhanced electrical properties of pentacene-based organic thin-film transistors by modifying the gate insulator surface

A reliable surface treatment for the pentacene/gate dielectric interface was developed to enhance the electrical transport properties of organic thin-film transistors (OTFTs). Plasma-polymerized fluorocarbon (CFx) film was deposited onto the SiO₂ gate dielectric prior to pentacene deposition, resulting in a dramatic increase of the field-effect mobility from 0.015 cm²/(V s) to 0.22 cm²/(V s), and a threshold voltage reduction from −14.0 V to −9.9 V. The observed carrier mobility increase by a factor of 10 in the resulting OTFTs is associated with various growth behaviors of polycrystalline pentacene thin films on different substrates, where a pronounced morphological change occurs in the first few molecular layers but the similar morphologies in the upper layers. The accompanying threshold voltage variation suggests that hole accumulation in the conduction channel-induced weak charge transfer between pentacene and CFx.     

A high mobility C60 field-effect transistor with an ultrathin pentacene passivation layer and bathophenanthroline/metal bilayer electrodes

C₆₀ field-effect transistor (OFET) with a mobility as high as 5.17 cm²/V·s is fabricated. In our experiment, an ultrathin pentacene passivation layer on poly-(methyl methacrylate) (PMMA) insulator and a bathophenanthroline (Bphen)/Ag bilayer electrode are prepared. The OFET shows a significant enhancement of electron mobility compared with the corresponding device with a single PMMA insultor and an Ag electrode. By analysing the C₆₀ film with atomic force microscopy and X-ray diffraction techniques, it is shown that the pentacene passivation layer can contribute to C₆₀ film growth with the large grain size and significantly improve crystallinity. Moreover, the Bphen buffer layer can reduce the electron contact barrier from Ag electrodes to C₆₀ film efficiently.     

Organic insulator layer influence on the electrical properties of N,N’-di (2-ethylhexyl) - 3, 4, 9, 10-perylene diimide organic thin-film transistors: Experiment and modeling

In this work, n- type organic thin film transistors (OTFTs) based on different kinds of organic dielectrics were fabricated, characterized and theoretically investigated. Three kinds of organic insulators were applied as dielectric gate which are: divinyl tetramethyl disiloxane-bis (benzo-cyclobutene) (BCB), poly(vinylalcohol) (PVA) and poly (4-vinyl phenol) (PVP). Analytical model was applied to describe the electrical behavior of the fabricated OTFTs and to explain the absence of saturation of the drain current for the device based on PVA dielectric. In addition, Meyer–Neldel rule-grain boundary model was applied for the calculation of total resistance of OTFTs based on different dielectrics materials. The theoretical results of output characteristics and total resistance showed an excellent agreement with the experimental measurements. The experimental and theoretical calculations revealed that the n-channel OTFTs based on BCB as an insulator layer exhibited superior electrical characteristics in terms of threshold voltage, mobility and drain current compared with the devices based on PVA and PVP as a gate insulator layer. The device based on BCB organic insulator layer has the largest mobility of 4?×?10^?3 cm² V^?1 s^?1, the smallest leakage current relative to the devices based on PVA and PVP. While, the device fabricated with PVP organic insulator gate has a large trap density on the PVP-EHPDI interface which causes a pronounced decrease in field effect mobility and consequently drain current.     

Optimization and improvement of TIPS–pentacene transistors (OTFT) with UV–ozone and chemical treatments using an all-step solution process

We fabricated an organic thin-film transistor (OTFT) using an all-step solution process. The printed layers, in which the electrode (silver), dielectric layer (BaTiO₃–PMMA), source–drain layer, and semiconductor 6,13-Bis(triisopropylsilylethynyl)pentacene(TIPS–pentacene), were optimized using roll-to-roll, an inkjet printer, and drop-casting. After coating the source–drain layer, we applied ultraviolet (UV)–ozone and self-assembled monolayer (SAM) treatments to the composite layer. The OTFTs treated with the UV–ozone and SAM treatments were found to exhibit excellent performance and good properties in comparison to silicon-based OTFTs.     

Effect of stacked dielectric with high dielectric constant and surface modification on current enhancement in pentacene thin-film transistors

The effect of a stacked dielectric has been studied on pentacene thin-film transistors (TFTs) with respect to the current enhancement, the crystalline polymorph, and the structural change of the film. Here we show that the performance improvement of the device is successfully achieved by the dielectric effects of the high dielectric constant and the surface modification in hybrid dielectric configuration. The systematic analysis on the device feature governed by the interfacial property was carried out for a hybrid structured insulator system using SiO₂ and cross-linked (C-L) polyvinyl alcohol (PVA), including the surface modified layer of dilute polymethyl methacrylate (PMMA). Through thickness combinations of bilayer dielectrics with low-k SiO₂ and high-k PVA, the device also exhibits noticeable enhancement of the current drivability up to the current level of 94 μA at a practical gate bias of ?30 V. Moreover, we present the effect of a surface-modified layer with dilute PMMA. After the formation of ultra-thin PMMA layer in a bilayer insulator, the organic dielectric shows an effectively changed surface property into hydrophobicity even on a strong hydroxyl-rich dielectric surface, resulting in the distinct increase of structural order in the film due to the reduction of surface free energy.