A glass thinning and texturing method for light incoupling in thin‐film polycrystalline silicon solar cells application

For polycrystalline silicon (poly‐Si) thin‐film solar cells on ～3 mm borosilicate glass, glass thinning reduces the glass absorption and light leaking to neighbouring cells; the glass texturing of the sun‐facing side suppresses reflection. In this Letter, a labour‐free wet etching method is developed to texture and thin the glass at the same time in contrast to conventionally separated labour‐intensive glass thinning and texturing processes. For 2 cm² size poly‐Si thin‐film solar cells on glass superstrate, this wet etching successfully thins down the glass from 3 mm to 0.5 mm to check the ultimate benefit of the process and introduces a large micron texture on the sun‐facing glass surface. The process enhances J_sc by 6.3% on average, with the optimal J_sc enhancement of 8%, better than the value of 4.6% found in the literature. This process also reduces the loss in external quantum efficiency (EQE loss), which is due to light leaking to neighbouring cells, dramatically. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Optical management in high‐efficiency thin‐film silicon micromorph solar cells with a silicon oxide based intermediate reflector

In the effort to increase the stable efficiency of thin film silicon micromorph solar cells, a silicon oxide based intermediate reflector (SOIR) layer is deposited in situ between the component cells of the tandem device. The effectiveness of the SOIR layer in increasing the photo‐carrier generation in the a‐Si:H top absorber is compared for p–i–n devices deposited on different rough, highly transparent, front ZnO layers. High haze and low doping level for the front ZnO strongly enhance the current density (J_sc) in the μc‐Si:H bottom cell whereas J_sc in the top cell is influenced by the angular distribution of the transmitted light and by the reflectivity of the SOIR related to different surface roughness. A total J_sc of 26.8 mA/cm² and an initial conversion efficiency of 12.6% are achieved for 1.2 cm² cells with top and bottom cell thicknesses of 300 nm and 3 μm, and without any anti‐reflective coating on the glass. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Compatibility of glass textures with E-beam evaporated polycrystalline silicon thin-film solar cells

For polycrystalline silicon thin films on glass, E-beam evaporation capable of high-rate deposition of amorphous silicon (a-Si) film precursor up to 1 μm/minute is a potentially low-cost solution to replace the main stream a-Si deposition method—plasma enhanced chemical vapour deposition (PECVD). Due to weak absorption of near infrared light and a target of 2 μm Si absorber thickness, glass substrate texturing as a general way of light trapping is vital to make E-beam evaporation commercially viable. As a result, the compatibility of e-beam evaporation with glass textures becomes essential. In this paper, glass textures with feature size ranging from ～200 nm to ～1.5 micron and root-mean-square roughness (Rms) ranging from ～10 nm to 200 nm are prepared and their compatibility with e-beam evaporation is investigated. This work indicates that e-beam evaporation is only compatible with small smooth submicron sized textures, which enhances J _sc by 21 % without degrading V _oc of the cells. Such textures improve absorption-based J _sc up to 45 % with only 90 nm SiN _x as the antireflection and barrier layer; however, the enhancement degrades to ～10 % with 100 nm SiO _x +90 nm SiN _x as the barrier layer. The absorption-based J _sc is abbreviated by J _sc(A), which is deduced by integrating the multiplication product of the measured absorption and the AM1.5G spectrum in the wavelength range 300–1050 nm assuming unity internal quantum efficiency at each wavelength. This investigation is also relevant to other thin-film solar cell technologies which require evaporating the absorber onto textured substrate/superstrate.     

Optimum design of InGaP/GaAs dual-junction solar cells with different tunnel diodes

We design the InGaP/GaAs dual-junction (DJ) solar cells by optimizing short-circuit current matching between top and bottom cells using the Silvaco ATLAS. The relatively thicker base layer of top cell exhibits a larger short-circuit current density (J _sc) while the thicker base layer of bottom cell allows for a smaller J _sc. The matched J _sc of 10.61±0.05 and 13.25±0.06 mA/cm ² under AM1.5G and AM0 illuminations, respectively, are obtained, leading to the increased conversion efficiency. The base thicknesses of top InGaP cells are optimized at 0.8 and 0.65 μm for AM1.5G and AM0 illuminations, respectively, and the base thicknesses of bottom GaAs cells are optimized at 2 μm. For the optimized solar cell structure, the maximum J _sc = 10.66 mA/cm ² (13.31 mA/cm ²), V _oc =  2.34 V (2.35 V), and fill factor =  87.84% (88.1%) are obtained under AM1.5G (AM0) illumination, exhibiting a maximum conversion efficiency of 25.78% (23.96%). The effect of tunnel diode structure, i.e, GaAs/GaAs, AlGaAs/AlGaAs, and InGaP/InGaP, on the characteristics of solar cells is investigated. The photogeneration rate in the DJ solar cell structure is also obtained by incident light of different wavelengths.     

Nanotextured multicrystalline Al‐BSF solar cells reaching 18% conversion efficiency using industrially viable solar cell processes

We report recent achievements in adapting industrially used solar cell processes on nanotextured surfaces. Nanostructures were etched into c‐Si surfaces by dry exothermic plasma‐less reaction of F species with Si in atmospheric pressure conditions and then modified using a short post‐etching process. Nanotextured multicrystalline wafers are used to prepare Al‐BSF solar cells using industrially feasible solar cell proc‐ essing steps. In comparison to the reference acidic textured solar cells, the nanostructured cells showed gain in short circuit current (J_sc) of up to 0.8 mA/cm² and absolute gain in conversion efficiency of up to 0.3%. The best nanotextured solar cell was independently certified to reach the conversion efficiency of 18.0%. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Impurity photovoltaic effect in silicon solar cell doped with sulphur: A numerical simulation

The impurity photovoltaic effect (IPV) has mostly been studied in various semiconductors such as silicon, silicon carbide and GaAs in order to increase infrared absorption and hence cell efficiency. In this work, sulphur is used as the IPV effect impurity incorporated in silicon solar cells. For our simulation we use the numerical device simulator (SCAPS). We calculate the solar cell performances (short circuit current density J_sc, open circuit voltage V_oc, conversion efficiency η and quantum efficiency QE). We study the influence of light trapping and certain impurity parameters like impurity concentration and position in the gap on the solar cell performances. Simulation results for IPV effect on silicon doped with sulphur show an improvement of the short circuit current and the efficiency for sulphur energy levels located far from the middle of the band gap especially at E_c-E_t=0.18 eV.     

Micromorph tandem solar cells: optimization of the microcrystalline silicon bottom cell in a single chamber system

We report on the development of single chamber deposition of microcrystalline and micromorph tandem solar cells directly onto low-cost glass substrates. The cells have pin single-junction or pin/pin double-junction structures on glass substrates coated with a transparent conductive oxide layer such as SnO₂ or ZnO. By controlling boron and phosphorus contaminations, a single-junction microcrystalline silicon cell with a conversion efficiency of 7.47% is achieved with an i-layer thickness of 1.2 μm. In tandem devices, by thickness optimization of the microcrystalline silicon bottom solar cell, we obtained an initial conversion efficiency of 9.91% with an aluminum (Al) back reflector without a dielectric layer. In order to enhance the performance of the tandem solar cells, an improved light trapping structure with a ZnO/Al back reflector is used. As a result, a tandem solar cell with 11.04% of initial conversion efficiency has been obtained.     

Light intensity and temperature dependence on performance of a photoelectrochemical cells of ITO/TiO<Subscript>2</Subscript>/PVC-LiClO<Subscript>4</Subscript>/graphite

The photovoltaic characteristics of a photoelectrochemical cell of ITO/TiO₂/PVC-LiClO₄/graphite are reported. This paper is concerned with the influence of light intensity and temperature on short-circuit current density, J_sc and open-circuit voltage, V_oc of the device. The photoelectrochemical cell material was a screen-printed layer of titanium dioxide onto an ITO-covered glass substrate, which was used as a working electrode of the cell. The solid electrolyte was polivinylchloride-lithium perchlorate. The graphite film serves as a counter electrode of the cell. The current density–voltage characteristics of the device under an illumination of 20, 40, 60, 80 and 100 mW cm⁻² light from a tungsten halogen lamp were recorded at 40 °C as well as under an illumination of 100 mW cm⁻² at 30, 35, 40, 45 and 50 °C, respectively. It was found that the short-circuit current density, J_sc of the device increases with both light intensity and temperature. The J_sc obtained at 100 mW cm⁻² was 1.0 μAcm⁻² and that at 50 °C was 0.7 μAcm⁻².     

Improvement of solar cell efficiency by applying Si3N4 nanopattern on glass substrate

A cylindrical Si₃N₄ nanopattern whose heights was 200 nm was fabricated on a glass substrate, and an aluminum-doped zinc oxide (AZO) layer was grown on the nanopatterned glass substrate. The nanopattern was applied to an amorphous silicon solar cell in order to increase the light-scattering effect, thus enhancing the efficiency of the solar cell. The reflectance of the solar cell on the Si₃N₄ nanopattern decreased and its absorption increased. Compared to a flat substrate, the short-circuit current density (J_sc) and conversion efficiency of a solar cell on the Si₃N₄ nanopatterned substrate were improved by 17.9% and 24.2%, respectively, as determined from solar simulator measurements.     

Investigating the performance of P3HT:PCBM organic solar cells involving gamma-irradiated PEDOT:PSS layer

In this work, we investigated for the first time the characteristics of (poly (3-hexylthiopene) and [6, 6]-phenyl C61-butyric acid methyl ester) (P3HT:PCBM) blends-based organic solar cell with 1.25?mg/mL boric-acid (H₃BO₃)-doped poly(3,4-ethylenedioxythiophene): poly(styrenesulfonate) (PEDOT:PSS) layer which is irradiated under the 40 Gray (Gy) dose of gamma (γ) ray. Experimental results showed that the parameters of solar cell improved with exposure to low-dose gamma radiation. In particular, it has provided a significant improvement in short-circuit current density (J_sc) and power conversion efficiency (PCE). About 49% increase in PCE to 1.22% and 40% increase in J_sc to 6.28?mA/cm² was obtained between the bare device and the device containing irradiated PEDOT:PSS:H₃BO₃. Also, it was determined that the H₃BO₃-doped PEDOT:PSS is more stable to temperature. More importantly, solar cell containing gamma-irradiated PEDOT:PSS:H₃BO₃ showed best performance comparing to conventional PEDOT:PSS-based cell.     

Highly efficient ARC less InGaP/GaAs DJ solar cell numerical modeling using optimized InAlGaP BSF layers

An effective BSF is a key structural element for an efficient solar cell, either in a multi-junction or in a single-junction device. In this paper, two important materials AlGaAs and InAlGaP with their varied thickness (i.e. 0.05–1.0)?μm both for top BSF and bottom BSF cells are investigated using the computational numerical modeling TCAD tool Silvaco ATLAS. It has been found that under the current matching condition with the relatively thinner (30?nm) top BSF layer and the thicker (1,000?nm) bottom BSF layer, the cell exhibit an overall enhancement of short-circuit current density J_sc and open circuit voltage Voc thereby improving the overall efficiency of the cell. A wide band gap material In_0.5(Al_0.7 Ga_0.3)_0.5P is proved to be a better choice for both window and BSF layer by increasing 6.2% more efficiency than using other widely used Al_0.7 Ga_0.3 As material under the same cell configuration because of its high photo generation rate. For this optimized cell structure, the maximum J_sc = 16.10?mA/cm², V_oc =?2.392V, and fill factor = 87.52% are obtained under AM1.5G illumination, exhibiting a maximum conversion efficiency of 32.1964% (1 sun) and 36.6781% (1,000 suns). This work reports the Influence of different BSF material and structures on the characteristics and efficiency of Multi-Junction solar cells. The detail photo-generation rates and EQE in this optimized ARC less DJ solar cell structure are also observed. The major stages of the modeling are explained and the simulation results are validated with published experimental data to demonstrate the accuracy of our results produced by the model utilizing this technique.     

Low resistance dye-sensitized solar cells based on all-titanium substrates using wires and sheets

Low resistance dye-sensitized solar cells (DSSCs) based on all-titanium substrates were proposed in this paper. To minimize the internal resistance of DSSCs, the titanium wires and titanium sheets were used as the substrates of the photoanode and the counter electrode, respectively. Compared with the FTO substrate, titanium wires could absorb much diffused light by back reflection since the reflectivity in the titanium sheet was highly increased up to 53.12%. Furthermore, the transmittance of the front cover was increased by 13.2% using the super white glass instead of FTO substrate. The thickness of TiO₂ thin film coated on titanium wire was optimized to achieve a high cell performance. The efficiency of 5.6% for the cell was obtained with a J_sc of 15.41 mA cm⁻², V_oc of 0.59 V, and FF of 0.62. The results showed that the titanium-based DSSCs had superiority for producing the large-scale DSSCs without metal grid line.     

单室沉积高效非晶硅/微晶硅叠层太阳电池的研究

采用甚高频等离子体增强化学气相沉积技术,在前期单室沉积的微晶硅薄膜太阳电池和非晶硅/微晶硅叠层太阳电池研究的基础上,通过对微晶硅底电池本征层硅烷浓度的优化,获得了初始效率达到11.02%(电池面积1.0 cm²)的非晶硅/微晶硅叠层太阳电池.同时,100 cm²的非晶硅/微晶硅叠层太阳电池的组件效率也达到了9.04%. 关键词： 非晶硅/微晶硅叠层电池 单室 甚高频     

Electrical and optical properties of nanowires based solar cell with radial p-n junction

In our studies the absorption, transmittance and reflectance spectra for periodic nanostructures with different parameters were calculated by the FDTD (Finite-Difference Time-Domain) method. It is shown that the proportion of reflected light in periodic structures is smaller than in case of thin films. The experimental results showed the light reflectance in the spectral range of 400–900 nm lower than 1% and it was significantly lower in comparison with surface texturing by pyramids or porous silicon.Silicon nanowires on p-type Si substrate were formed by the Metal-Assisted Chemical Etching method (MacEtch). At solar cells with radial p-n junction formation the thermal diffusion of phosphorus has been used at 790 °C. Such low temperature ensures the formation of an ultra-shallow p-n junction. Investigation of the photoelectrical properties of solar cells was carried out under light illumination with an intensity of 100 mW/cm². The obtained parameters of NWs' solar cell were I_sc = 22 mA/cm², U_oc = 0.62 V, FF = 0.51 for an overall efficiency η = 7%. The relatively low efficiency of obtained SiNWs solar cells is attributed to the excessive surface recombination at high surface areas of SiNWs and high series resistance.     

Light trapping for a‐Si:H/µc‐Si:H tandem solar cells using direct pulsed laser interference texturing

We present a‐Si:H/µc‐Si:H tandem solar cells on laser textured ZnO:Al front contact layers. Direct pulsed laser interference patterning (DLIP) was used for writing arrays of one‐dimensional micro gratings of submicron period into ZnO:Al films. The laser texture provides good light trapping which is indicated by an increase in short‐circuit current density of 20% of the bottom cell limited device compared to cells on planar ZnO:Al. The open‐circuit voltage of the cells on laser textured ZnO:Al is almost the same as for cells on planar substrates, indicating excellent growth conditions for amorphous and microcrystalline silicon on the U‐shaped grating grooves. DLIP is a simple, single step and industrially applicable method for large area periodic texturing of ZnO:Al thin films. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Oriented ZnO nanotubes arrays decorated with TiO2 nanoparticles for dye-sensitized solar cell applications

Dye-sensitized solar cells (DSSCs) based on a novel composite photoanode of TiO₂ nanoparticles coating on electrodeposited ZnO nanotube arrays are fabricated and characterized. An efficiency of 3.94 % is achieved for the composite cell, increasing 86.7 % than 2.11 % of the ZnO nanotubes cell. The short-circuit current (J _sc) and open-circuit voltage (V _oc) are also enhancing 52.9 % and 25.3 %, respectively. The improvements are because of the high surface area of TiO₂ nanoparticles, as well as fast electron transport and light scattering effect of ZnO nanotubes.     

低温超薄高效Cu(In,Ga)Se2太阳电池的实现

衬底温度保持恒定, 在Se气氛下按照一定的元素配比顺序蒸发Ga, In, Cu制备厚度约为0.7 μrm的Cu(In_0.7Ga_0.3)Se₂ (CIGS)薄膜. 利用X射线衍射仪分析薄膜的晶体结构及物相组成, 扫描电子显微镜表征薄膜形貌及结晶质量, 二次离子质谱仪测试薄膜内部元素分布, 拉曼散射谱 分析薄膜表面构成, 带积分球附件的分光光度计测量薄膜光学性能. 研究发现在Ga-In-Se预制层内, In主要通过晶界扩散引起Ga/(Ga+In)分布均匀化. 衬底温度高于450 ℃时, 薄膜呈现单一的Cu(In_0.7Ga_0.3)Se₂相; 低于400℃, 薄膜存在严重的Ga的两相分离现象, 且高含Ga相主要存在于薄膜的上下表面; 低于300 ℃, 薄膜结晶质量进一步恶化. 薄膜表层的高含Ga相Cu(In_0.5Ga_0.5)Se₂以小晶粒形式均匀分布于薄膜表面, 增加了薄膜的粗糙度, 在电池内形成陷光结构, 提高了超薄电池对光的吸收. 加上带隙值较小的低含Ga相的存在, 使电池短路电流密度得到较大改善. 衬底温度在550 ℃–350 ℃变化时, 短路电流密度J_SC是影响超薄电池转换效率的主要因素; 而衬底温度T_sub低于300 ℃时, 开路电压V_OC和填充因子FF降低已成为电池性能减退的主要原因. T_sub为350 ℃时制备的0.7 μm左右的超薄CIGS电池转换效率达到了10.3%. 关键词： 2薄膜')" href="#">Cu(In,Ga)Se₂薄膜 衬底温度 超薄 太阳电池     

Minimizing optical losses in bulk heterojunction polymer solar cells

The efficiency that a solar cell can reach is ultimately limited by the number of photons absorbed in its active layer. Bulk heterojunction polymer solar cells are fabricated from a stack of thin film layers, each of which is thinner than a single wavelength from an incident photon within its absorption band. One consequence of this thin film layer stack is a strong optical interference between the various layers that can change the quantity of light dissipated in the active layer by 50%. Here we use optical modeling to quantitatively calculate the dissipation in each of the various layers as functions of wavelength and layer thickness. Using this information the loss free short circuit current density can be calculated (J_scmax). Optimization of J_scmax leads to direct improvements in the efficiency of the solar cell through improved light dissipation in the active layer. The optical properties for a P3HT:PCBM active layer and a model Lorentzian low band gap spectrum are optimized and ideal fabrication conditions are reported for these materials. PACS 72.40.+w; 72.80.Le     

Effects of annealing on ion-implanted Si for interdigitated back contact solar cell

Effects of annealing on the properties of P- and B-implanted Si for interdigitated back contact (IBC) solar cells were investigated with annealing temperature of from 950 to 1050 °C. P-implanted samples annealed at 950 °C were enough to activate dopants and recover the damage by implantation. As the annealing temperature was increased, the diode properties of P-implanted samples were degraded, while that of B-implanted samples were improved. However, in order to activate an implanted B ion, B-implanted samples needed an annealing of above 1000 °C. The implied V_oc of lifetime samples by quasi-steady-state photoconductance decay followed the trend of diode properties on annealing temperature. Finally, IBC cell was fabricated with a two-step annealing at 1050 °C for B of the emitter and 950 °C for P of the front and back surface fields. The IBC cell had V_oc of 618 mV, J_sc of 35.1 mA/cm², FF of 78.8%, and the efficiency of 17.1% without surface texturing.     

Fabrication and characterization of nanocrystalline n-CdO/p-Si as a solar cell

A nanocrystalline CdO/Si solar cell was fabricated via deposition of a CdO thin film on p-type silicon substrate with approximately 370 nm thickness using solid–vapor deposition for Cd powder at 1274 K with argon and oxygen flow. Scanning electron microscopy revealed that the product was a Cadmium oxide nanocrystalline. X-ray diffraction and energy dispersive X-ray analysis were used to characterize the structural properties of the solar cell. The nanocrystalline thin film had a grain size of 38 nm. The solar cell yielded a minimum effective reflectance that exhibited excellent light-trapping at wavelengths ranging from 400 to 1000 nm. Photoluminescence spectroscopy was conducted to investigate the optical properties. The direct band gap energy of the nanocrystalline CdO thin film was 2.46 eV. CdO/Si solar cell photovoltaic properties were examined under 100 mW/cm² solar radiation. The cell showed an open circuit voltage (V_oc) of 457 mV, a short-circuit current density (J_sc) of 18.5 mA/cm², a fill factor (FF) of 0.652, and a conversion efficiency (η) of 5.51%.