Properties study of ZnO:Ga crystal on pulsed radiation detections

In this paper, properties on pulsed radiation detections of ZnO:Ga crystal grew by a magnetron sputtering method were studied. The time response to pulsed laser,pulsed hard X rays and single α particles, the energy response to pulsed hard X ray, the scintillation efficiency to γ rays, the response to pulsed proton, and the relations of the light intensity varied with the proton energy were measured and analyzed in detail. Results show that the ZnO:Ga crystal has potential applications in the regime of pulse radiation detection .     

Properties study of ZnO:Ga crystal on pulsed radiation detections

In this paper, properties on pulsed radiation detections of ZnO：Ga crystal grew by a magnetron sputtering method were studied. The time response to pulsed laser, pulsed hard X rays and single α particles, the energy response to pulsed hard X ray, the scintillation efficiency to γ rays, the response to pulsed proton, and the relations of the light intensity varied with the proton energy were measured and analyzed in detail. Results show that the ZnO：Ga crystal has potential applications in the regime of pulse radiation detection.     

Photoconductivity in metal-semiconductor-metal planar structures with ZnO:Ga and ZnO:Li films

Influence of UV radiation on photoelectric properties of ZnO:Ga and ZnO:Li films prepared by the electron-beam evaporation method was investigated. The photoconductivity was measured, using metal-semiconductor-metal planar structures where metallic aluminum was used as ohmic electrodes. The kinetics of rise and decay of the photoconductivity in these structures was studied. The change of photoconductivity under the action of UV radiation is considered as a result of the photoexcitation-relaxation into the conduction band and photochemical processes of absorption-desorption of oxygen at the film surface. The influence of a MgF₂ protective layer deposited on ZnO:Ga and ZnO:Li films was studied. Measurements of the spatial distribution of the potential between the anode and cathode for determination of the homogeneity of conductivity in the investigated planar structures were performed by the moving probe method.     

ZnO:Ga晶体对硬X射线的时间及能量响应

 介绍了ZnO:Ga晶体对重复频率快脉冲硬X 射线的时间响应,利用X射线荧光分析仪测量了ZnO:Ga晶体对10～100 keV硬X射线的能量响应。结果表明:ZnO:Ga晶体对硬X射线响应的上升时间为316 ps,半高宽为440 ps;对40 keV以上的X射线的能量响应很平坦。该晶体可以作为一种新颖的硬X射线探测元件。     

Measurement of the luminescence properties of Gd2O2S:Pr,Ce,F powder scintillators under X-ray radiation

The aim of the present study was to investigate the absolute luminescence efficiency of gadolinium oxysulfide powder scintillators, doped with praseodymium, cerium and fluorine (Gd₂O₂S:Pr,Ce,F). Gd₂O₂S:Pr,Ce,F is a non-hygroscopic material, emitting green light with short decay time. For the purposes of this study, two scintillating screens with coating thicknesses 35.7 and 71.2 mg/cm², were prepared in our laboratory from Gd₂O₂S:Pr,Ce,F powder (Phosphor Technology, Ltd) by sedimentation on silica substrates. The light emitted by the phosphors under investigation was evaluated by performing measurements of the absolute efficiency under X-ray exposure conditions with tube voltages ranging from 50 to 130 kV. Results were compared with previously published data for Gd₂O₂S:Eu screens. The spectral compatibility of Gd₂O₂S:Pr,Ce,F with various existing optical detectors, was investigated after emission spectra measurements. Particle size and morphology parameters of the Gd₂O₂S:Pr,Ce,F powder phosphor were verified via scanning electron microscope (SEM) micrographs. Absolute efficiency was found to maximize at 60 kVp for the 71.2 mg/cm² and at 90 kVp for the 35.7 mg/cm² Gd₂O₂S:Pr,Ce,F screens. Absolute efficiency of the 71.2 mg/cm² Gd₂O₂S:Pr,Ce,F screen was higher in the whole X-ray tube voltage range showing potential interest for non-CT medical imaging (i.e. dental radiology) or industrial digital radiography.     

Timing characteristics of the scintillation response of Gd3Al2Ga3O12:Ce and Gd3Al2.6Ga2.4O12:Ce single crystal scintillators

The timing characteristics of scintillation response of Czochralski-grown Gd₃Al₂Ga₃O₁₂:Ce and Gd₃Al_2.6Ga_2.4O₁₂:Ce single crystals were compared. The photoelectron yield, scintillation decay times, and coincidence time resolution were measured. At 662 keV γ-rays, the photoelectron yield of 6200 phe MeV⁻¹ obtained for Gd₃Al₂Ga₃O₁₂:Ce is higher than that of 4970 phe MeV⁻¹ obtained for Gd₃Al_2.6Ga_2.4O₁₂:Ce, while an inferior energy resolution of the former (7.2% vs. 5.6%) is observed. Scintillation decays are approximated by sum of exponentials with the dominant fast component decay time and its relative intensity of 89 ns (73%) for Gd₃Al₂Ga₃O₁₂:Ce and 136 ns (69%) for Gd₃Al_2.6Ga_2.4O₁₂:Ce. The coincidence time resolution obtained for Gd₃Al₂Ga₃O₁₂:Ce is superior than that of Gd₃Al_2.6Ga_2.4O₁₂:Ce. The normalized time resolution was also discussed in terms of a number of photoelectrons and decay characteristics of the light pulse.     

Conductivity increase of ZnO:Ga films by rapid thermal annealing

Due to a constant increase in demands for transparent electronic devices the search for alternative transparent conducting oxides (TCO) is a major field of research now. New materials should be low-cost and have comparable or better optical and electrical characteristics in comparison to ITO. The use of n-type ZnO was proposed many years ago, but until now the best n-type dopant and its optimal concentration is still under discussion. Ga was proposed as the best dopant for ZnO due to similar atomic radius of Ga³⁺ compared to Zn²⁺ and its lower reactivity with oxygen. The resistivity ρ of ZnO:Ga/Si (100) films grown by PEMOCVD was found to be 3×10⁻² Ω cm. Rapid thermal annealing (RTA) was applied to increase the conductivity of ZnO:Ga (1 wt%) films and the optimal regime was determined to be 800  C in oxygen media for 35 s. The resistivity ratio before and after the annealing and the corresponding surface morphologies were investigated. The resistivity reduction () was observed after annealing at optimal regime and the final film resistivity was approximately ≈4×10⁻⁴ Ω cm, due to effective Ga dopant activation. The route mean square roughness (R_q) of the films was found to decrease with increasing annealing time and the grain size has been found to increase slightly for all annealed samples. These results allow us to prove that highly conductive ZnO films can be obtained by simple post-growth RTA in oxygen using only 1% of Ga precursor in the precursor mix.     

Transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering at low temperature

Ga-doped ZnO (ZnO:Ga) transparent conductive films were deposited on glass substrates by DC reactive magnetron sputtering. The structural, electrical, and optical properties of ZnO:Ga films were investigated in a wide temperature range from room temperature up to 400 °C. The crystallinity and surface morphology of the films are strongly dependent on the growth temperatures, which in turn exert an influence on the electrical and optical properties of the ZnO:Ga films. The film deposited at 350 °C exhibited the relatively well crystallinity and the lowest resistivity of 3.4 × 10⁻⁴ Ω cm. More importantly, the low-resistance and high-transmittance ZnO:Ga films were also obtained at a low temperature of 150 °C by changing the sputtering powers, having acceptable properties for application as transparent conductive electrodes in LCDs and solar cells.     

Growth characteristics and properties of ZnO:Ga thin films prepared by pulsed DC magnetron sputtering

Transparent conductive ZnO:Ga thin films were deposited on Corning 1737 glass substrate by pulsed direct current (DC) magnetron sputtering. The effects of process parameters, namely pulse frequency and film thickness on the structural and optoelectronic properties of ZnO:Ga thin films are evaluated. It shows that highly c-axis (0 0 2) oriented polycrystalline films with good visible transparency and electrical conductivity were prepared at a pulsed frequency of 10 kHz. Increasing the film thickness also enlarged the grain size and carrier mobility which will subsequently lead to the decrease in resistivity. In summary, ZnO:Ga thin film with the lowest electrical resistivity of 2.01 × 10⁻⁴ Ω cm was obtained at a pulse frequency of 10 kHz with 500 nm in thickness. The surface RMS (root mean square) roughness of the film is 2.9 nm with visible transmittance around 86% and optical band gap of 3.83 eV.     

掺Ga对ZnO电子态密度和光学性质的影响

采用密度泛函理论下的第一性原理平面波赝势方法,研究了掺Ga对纤锌矿ZnO电子态密度和光学性质的影响.从晶体配位场理论分析了掺Ga前后ZnO的成键情况及态密度的变化.计算得到掺Ga后电子浓度为2.42×10²¹ cm^-3,ZnO的载流子浓度提高了10⁴倍.比较分析掺Ga前后ZnO的介电函数、复折射率、吸收光谱和反射光谱可得,ZnO光吸收边向高能端移动,光学带隙增大.在可见光区,ZnO光吸收系数与反射率减小,光透过率显著提高,使ZnO:Ga成为 关键词： 密度泛函理论 态密度 光学性质 ZnO:Ga     

表面化学处理和退火对p-GaN/ZnO:Ga接触特性的影响

ZnO∶Ga(GZO)透明电极沉积在p-GaN表面,用作透明电流扩展层。直接沉积在p-GaN上的p-GaN/GZO存在较大的势垒,容易形成肖特基接触,而良好的欧姆接触对功率LED器件至关重要。为了降低接触势垒,采用盐酸和氢氧化钠溶液对GaN表面进行去氧化层处理,并对p-GaN/GZO进行退火处理,研究表面处理和退火对p-GaN/GZO接触特性的影响。研究表明:碱性溶液处理有利于降低接触势垒;退火处理后,接触势垒略有增加。     

Scintillation response of Y3Al5O12:Pr3+ single crystal scintillators

In this paper we present the photoluminescence (PL) and scintillation response of Pr³⁺-doped Y₃Al₅O₁₂ (YAG:Pr) single crystals grown by the Czochralski method with different Pr³⁺ concentrations of 0.16, 0.33, and 0.65 mol%. PL spectra and decay curves were measured for both the fast 5d → 4f and slow 4f → 4f emissions. The PL decay times were evaluated which evidence concentration quenching especially in ¹D₂ → ³H₄ emission for the highest Pr³⁺ concentration. Light yield (LY) of 15,600 photons per MeV and energy resolution of 6.4% at 662 keV γ-rays were obtained with the YAG:Pr (0.33%) crystal. The LY non-proportionality and energy resolution versus γ-ray energy were measured and the intrinsic resolution was calculated. A good proportionality of the LY was found within 7% over the energy range from 1274.5 keV down to 32 keV. The estimated photofraction in the pulse height spectra of 320 and 662 keV γ-rays was also determined and compared with the theoretical one calculated using WinXCom program.     

Ga/N高共掺浓度对ZnO导电性能和红移影响的第一性原理研究

采用密度泛函理论框架下的第一性原理平面波超软赝势方法, 建立了未掺杂ZnO单胞和两种不同浓度的Ga/N高共掺ZnO超胞模型, 分别进行了几何结构优化、总态密度分布和能带分布的计算. 研究表明, ZnO高共掺Ga/N的条件下, Ga/N高共掺浓度越大, 导电性能越弱, 并且高掺杂后高能区红移效应显著, 计算得到的结果与实验结果的变化趋势一致. 关键词： Ga/N高共掺ZnO 电导率 红移 第一性原理     

Luminescence and scintillation properties of advanced Lu3Al5O12:Pr3+ single crystal scintillators

In this paper we present the luminescence and scintillation properties of Lu₃Al₅O₁₂:Pr (LuAG:Pr) single crystals with Pr³⁺ concentration of 0.13 wt %, grown by the Czochralski method. The light yield and energy resolution were measured under 662 keV γ-ray excitation. The dominant emission band peaking at 310 nm with a shoulder at 370 nm was observed in the photoluminescence spectrum. High light yield of 24,500 ph/MeV and an energy resolution of 5.3 % were obtained for a 6 × 6 × 2 mm³ LuAG:Pr sample. Light yield dependence on sample height and shaping time was measured. The estimated photofraction in pulse height spectrum and total mass attenuation coefficient at 662 keV γ-rays were also determined and compared with the theoretical ones calculated using the WinXCom program.     

ZnO高掺杂Ga的浓度对导电性能和红移效应影响的第一性原理研究

采用基于密度泛函理论框架下的第一性原理平面波超软赝势方法,在相同环境条件下建立了浓度不同的由Ga原子取代Zn原子的Zn_1-xGa_xO模型.对低温高掺杂Ga原子的Zn_1-xGa_xO半导体的能带结构、态密度和吸收光谱进行了计算.结果表明:Ga原子浓度越大,进入导带的相对电子数越多,但是电子迁移率反而减小.通过对掺杂和未掺杂ZnO的电导率以及最小间隙带宽度分别进行了比较 关键词： ZnO高掺杂Ga 电导率 红移 第一性原理     

Ga高掺杂对ZnO的最小光学带隙和吸收带边影响的第一性原理研究

采用基于密度泛函理论框架下的第一性原理平面波超软赝势方法, 建立了纯的和四种不同Ga掺杂量的ZnO超胞模型, 分别对模型进行了几何结构优化、能带结构分布、态密度分布和吸收光谱的计算. 结果表明, 在本文限定的Ga掺杂量2.08 at%–6.25 at%的范围内, 随着Ga掺杂量的增加, 掺杂后的ZnO体系体积变化不是很大, 但是, 掺杂体系ZnO的能量增加, 掺杂体系变得越来越不稳定, 同时, 掺杂体系ZnO的Burstein-Moss 效应越显著, 最小光学带隙变得越宽, 吸收带边越向高能方向移动. 计算结果和实验结果相一致. 关键词： Ga高掺杂ZnO 电子结构 吸收光谱 第一性原理     

Emission of Cu-related complexes in ZnO:Cu nanocrystals

Photoluminescence (PL), its temperature dependence, scanning electronic microscopy (SEM) and X ray diffraction (XRD) have been applied for the comparative study of varying the emission, morphology and crystal structure of ZnO and ZnO:Cu nanocrystals (NCs) versus technological routines, as well as the dependence of ZnO:Cu NC parameters on the Cu concentration. A set of ZnO and ZnO Cu NCs was prepared by the electrochemical (anodization) method at a permanent voltage and different etching durations with follows thermal annealing at 400 °C for 2 h in ambient air. The size of ZnO NCs decreases from 300 nm×540 nm down to 200 nm×320 nm with etching duration increasing. XRD study has confirmed that thermal annealing stimulates the ZnO oxidation and crystallization with the formation of wurtzite ZnO crystal lattice. XRD method has been used for monitoring the lattice parameters and for confirming the Cu doping of ZnO Cu NCs. In ZnO Cu NCs four defect related PL bands are detected with the PL peaks at 1.95–2.00 eV (A), 2.15-2.23  eV (B), 2.43–2.50 eV (C) and 2.61–2.69 eV (D). Highest PL intensities of orange, yellow and green emissions have been obtained in ZnO Cu NCs with the Cu concentration of 2.28 at%. At Cu concentration increasing (≥2.28 at%) the PL intensities of the bands A, B, C decrease and the new PL band peaked at 2.61–2.69 eV at 10 K appears in the PL spectrum. The variation of PL intensities for all PL bands versus temperature has been studied and the corresponding activation energies of PL thermal decay have been estimated. The type of Cu-related complexes is discussed using the correlation between the PL spectrum transformation and the variation of XRD parameters in ZnO Cu NCs.     

Optimization of parameters for deposition of Ga-doped ZnO films by DC reactive magnetron sputtering using Taguchi method

Ga-doped ZnO (ZnO:Ga) transparent conductive films were deposited on glass substrates by DC reactive magnetron sputtering. Taguchi method was used to find the optimal deposition parameters including oxygen partial pressure, argon partial pressure, substrate temperature, and sputtering power. By employing the analysis of variance, we found that the oxygen and argon partial pressures were the most influencing parameters on the electrical properties of ZnO:Ga films. Under the optimized deposition conditions, the ZnO:Ga films showed acceptable crystal quality, lowest electrical resistivity of 2.61 × 10⁻⁴ Ω cm, and high transmittance of 90% in the visible region.     

氧化锌掺铝绒面薄膜在有机光伏电池中的应用

目前有机光伏电池的吸光活性层电学传输特性和光学吸收特性的不匹配是制约其能量转换效率提升的主要原因之一. 通过陷光结构对入射光进行调控, 提高电池对光的约束和俘获能力从而达到“电学薄”和“光学厚”的等效作用, 是解 决有机光伏电池电学和光学不匹配的有效手段. 本文采用湿法刻蚀技术获得了系列时间梯度的绒面氧化锌掺铝薄膜, 并将其作为有机光伏电池的入射陷光电极, 显著增强了电池的光学吸收. 研究发现, 当使用浓度0.5%的稀HCL腐蚀30 s后的氧化锌掺铝薄膜作为入射电极后, 电池的光电性能和效率显著增强. 基于此绒面电极电池的电流密度比平面结构的电池提高了8.17%, 效率改善了11.29%. 通过对绒面电极表面的修饰处理, 实现了电极与光活性层之间良好的界面接触, 从而减小了对电池的开路电压和填充因子的影响.     

Comparison of Lu3Al5O12:Pr and Bi4Ge3O12 scintillators for gamma-ray detection

The scintillation properties of Lu₃Al₅O₁₂:Pr³⁺ (LuAG:Pr) single crystal grown by the Czochralski method with praseodymium concentration of 0.19 mol% were investigated. For a comparison, a good quality Bi₄Ge₃O₁₂ (BGO) single crystal grown by Bridgman method was also studied. The light yield and energy resolution were measured using photomultiplier tube (XP5200B PMT) readout. Moderate light yield of 15,900 photons per MeV was measured for the LuAG:Pr(0.19%) crystal. For 662 keV gamma rays (¹³⁷Cs source), an energy resolution of 6.5% obtained for LuAG:Pr(0.19%) is much better than that of 9.0% obtained for BGO. The light yield non-proportionality and energy resolution versus energy of gamma rays were measured and the intrinsic resolution of the crystals was determined after correcting the measured energy resolution for PMT statistics. The LuAG:Pr(0.19%) showed a good proportionality of the light yield within 5% over the energy range from 1274.5 keV down to 32 keV, which is much better than that of 14% for BGO. The photofraction was determined at 320 and 662 keV for both crystals and compared with the ratio of the cross-sections for the photoelectric effect to the total one calculated using WinXCOM program.