首页 | 本学科首页   官方微博 | 高级检索  
相似文献
 共查询到20条相似文献,搜索用时 15 毫秒
1.
Measurements of the γi-coefficient, the ignition voltage and the normal cathode fall of the glow discharge on gas-covered cathode surfaces for the combinations Mo—Ne+, Ar+, Kr+, Xe+ and Fe—Ne+ are described. H2, N2 and O2 are used for covering the cathodes with a monomolecular adsorption layer. Measurements are carried out with a dynamic method according to VARNEY in the range 30 ? X/p0 ? 400 V cm?1 Torr?1.  相似文献   

2.
Non-relativistic configuration interaction (CI) ab initio calculations using large basis sets have been carried out to determine the potential curves of the first electronic states of Ne2 +, Ar2 + and Kr2 +. The spin—orbit interaction was treated assuming that the spin—orbit coupling constant is independent of the internuclear separation (R). For Ar2 +, calculated dissociation energies and equilibrium separations are in good agreement with experimental results. The calculations for Ne2 + suggest that the lowest vibrational level of the I(1/2u) ground state observed by threshold photoelectron spectroscopy by Hall et al. [1995, J. Phys. B: At. molec. opt. Phys., 28, 2435] and assigned to either ν = 0 or ν = 2 actually corresponds to ν = 4. The calculations also predict the I(1/2g) state of Ne2 + and Ar2 + to possess a double-well potential and that of Kr2 + to be repulsive at short range and to only possess a single shallow well at large internuclear separation. The ab initio calculations provide an explanation for the observation made by Yoshii et al. [2002, J. chem. Phys., 117, 1517] that Kr2 + and Xe2 + dissociate after photoemission from the II(1/2u) state to the I(1/2g) state whereas Ar2 + does not.  相似文献   

3.
4.
Using a 1,3 MeV Van de Graaff-accelerator the sputtering ratioS of polycristalline copper bombarded by normally incident Ne+-, Ar+-, Kr+-, and Xe+-ions was measured in the energy range from 75 keV to 1 MeV. In the case of Kr+-ions a broad, plateau-like maximum of the sputtering-curveS=f(E) was found at about 100 keV, for Xe+-ions a more pronounced maximum at about 125 keV. The results are discussed applying the theories ofGoldman-Simon, Pease, andMartynenko.  相似文献   

5.
Using a 1.3MeV Van de Graaff-accelerator the sputtering ratioS of polycristalline copper bombarded by Ne+-, Ar+-, Kr+- and Xe+-ions was measured as a function of the angle of incidence in the range from 0? to 45?. The ion-energy was varied from 100 keV to 1 MeV. The sputtering ratio was found to increase with bombarding angle asS=S(0?)· (2- cos α)/cos α for Ne+-, Ar+- and Kr+-ions and asS=S(0?)/cos3/2 α for Xe+-ions. The increase of the sputtering ratio was found to be independent of the ion-energy.  相似文献   

6.
The effects of H+, C+, N+, Ne+, Al+, P+, Cl+, Ar+, Ga+, As+, Kr+, Sb+, Xe+, Au+ and Tl+ ion implantation on the anodic oxidation of Si have been investigated as a function of dose and energy, in the as-implanted stage and after heat treatment at temperatures up to 1050°C. It is speculated that the location, in the formed oxide, of agglomerates containing the dopant, and the influence of these agglomerates on oxygen diffusion in SiO2 and/or oxygen evaluation at the oxide/solution interface are factors which account for the enhancement/retardation of the anodic oxidation.  相似文献   

7.
The influence of the primary ion species (He+, Ne+, Ar+, Kr+, Xe+ and SF5+) and substrate material (graphite, Al, Cu, Ag and Pb) on the secondary ion emission from molecular overlayers of the purine base adenine was investigated in dependence on the layer thickness. The measurements showed an increasing yield with increasing mass of the primary ions and its number of constituents. The yield enhancement, defined as the ratio between the maximum yield obtained from approximately a monolayer coverage of adenine to the yield obtained from a multilayer coverage, was shown to depend on the substrate material. However, a clear dependence on the primary ion species was not found.  相似文献   

8.
Analytical expressions for the binding energy of electrons and positrons in dielectric clusters, analyzed in this work, neglect the elastic effects. Therefore, we present the density-functional theory for neutral liquid clusters that experience the spontaneous deformation. Using the 1/R-expansion, R being the cluster radius, the exact analytical expressions for the size corrections to the chemical potential, surface tension, and atomic density are derived from the condition of mechanical equilibrium. The problem of calculating these corrections is reduced to calculating the quantities for a liquid with a flat surface. The size compression and tension of density occur in the 1/R and 1/R 2 orders respectively. The sizes of charged rigid and elastic critical clusters, for which the electron or positron binding energy is close to zero, are calculated for Xe N ? , Kr N ? , Ar N ? , Ne N + , He N + . The calculations show significant contribution of self-compression to the binding energy of the excess electron in contrast to the positron.  相似文献   

9.
Quadrupole moment and dipole polarizability tensor components are calculated at the correlated complete-active-space self-consistent-field (CASSCF) and complete-active-space perturbation-theory (CASPT) levels for 2P states of O?, F, Ne+, Na2+, S?, Cl, Ar+, 98, K2+ , Se?, Br, Kr+, Rb2+ and 3P, 1D, 1S states of O?, F+, Ne2+, Na3+, S, Cl+, Ar2+, K3+, Se, Br+, Kr2+, Rb3+. Relativistic corrections are included perturbatively for the 34- and 35-electron systems.  相似文献   

10.
We report on a photoluminescence study of silicon samples subjected to different dry etching processes. Several luminescence lines, known from defects produced by high-energy irradiation, manifest damage of the crystalline material. Noble gas ion beam etching (using Ne+, Ar+, Kr+, and Xe+) with ion energies as low as 400 eV produces characteristic luminescence lines which correspond to defects within a 200–300 Å thick surface layer. Incorporation of carbon during CF4 reactive ion etching produces the familiar G-line defect. The G-line photoluminescence intensity in our samples is directly correlated with the substitutional carbon concentration, as determined by infrared absorption measurements before the etch process; we therefore suggest that a simple method to determine the substitutional carbon concentration in a crystalline silicon sample is a standard dry etching process and a comparison of the resulting G-line photoluminescence intensity to a calibrated sample. The sensitivity of this method seems to be better than 1014 carbon atoms/cm3.  相似文献   

11.
Ziel der Arbeiten war die Untersuchung von Systemvarianten zur simultanen Bestimmung von Gesamtstickstoff und 15N in organischem Probematerial für problemorientierte Anwendungen der 15N-Tracertchnik auf Gebieten der Landwirtschaftsforschung, Biologie, Medizin und Umweltforschung unter Benutzung des emissionsspektroskopischen Analysators NOI-6 zur 15N-Analyse. Von der Vielzahl der prinzipiell verfügbaren kommerziellen Stickstoffanalysatoren konnten folgende Geräte zur Kopplung mit dem NOI-6 eingesetzt werden:

  • —FP 228 der Fa. LECO,

  • —CHN 89.00 der Fa. DANI,

  • —NA 1500 der Fa. Carlo Erba und

  • —Roboprep von der Fa. Europa Scientific.

Obwohl das Grundprinzip aller kommerziellen “Dumas”-Stickstoffbestimmungsgeräte das gleiche ist, gibt es im Detail, der Konzeption und Ausführung der Geräte beachtliche Unterschiede. Zur simultanen Bestimmung von Gesamtstickstoff und 15N wurden die angegebenen Geräte – FP 228, CHN 89.00, NA 1500 und Roboprep mit dem NOI-6 gekoppelt. Es lassen sich prinzipiell alle getesteten Gerätevarianten für die simultane Bestimmung von Gesamtstickstoff und 15N verwenden. Wie Detailuntersuchungen, u.a. des Memory-Effektes oder die Einflüsse des Gesamtstickstoffs auf die Messung der 15N-Konzentration zeigen, sind in jedem Falle sorgfältige Kalibrierungen erforderlich.

Aim of the work was the examination of system-versions for the simultaneous determination of total Nitrogen and N15 in organic sample-material for problem orientated use of the N15 Tracertechnique in the fields of agricultural research, biology, medicine and environmental research by use of the emission spectroscopic NOI-6 Analyzer. There are a lot of commercially available Nitrogen-Analyzers. The following Nitrogen-Analyzers were tested and coupled with the NOI-6 N15 Analyzer-System:

  • —FP 228 LECO,

  • —CHN 89.00 DANI,

  • —NA 1500 Carlo Erba and

  • —Roboprep Europa Scientific.

The fundamental principle of all Nitrogen-Analyzers is the same. There are notable differences in details, conceptions and design of different devices. For the simultaneous determination of total nitrogen and N15 were coupled the pretended “Nitrogen Analyzers” FP 228, CHN 89.00, NA 1500 and Roboprep with the NOI-6 Analyzer. Generally it is possible to use all the tested equipment-versions for the simultaneous determination of total Nitrogen and N15. Extensive examinations -also of the “Memory-effect” and the influence of the total Nitrogen amount to the measurement of the N-15 concentration -show the necessity of a careful calibration in each case.  相似文献   

12.
The surface composition of PbO has been studied with X-ray photoelectron spectroscopy after bombardment with several inert gas ions of 400 eV. The results show reduction of PbO to metallic Pb with the degree of damage following the order He+ > Ne+ >Ar+. Both Kr+ and Xe+ did not reduce the oxide. The depth of damage varied from ≈9 Å for He+ to ≈1 Å for Ar+ bombardment. The results were compared to a collisional and a thermal model of the sputtering process.  相似文献   

13.
Mit einer radiochemischen Methode, die auf dem Prinzip der Isotopenverdünnung beruht, wird die Kinetik des Korrosionsprozesses bei Kohlenstoffstahl OL-32 unter Einwirkung von Salzsäure (0,5 N) in Anwesenheit einiger Gemische von Wasser und organischem Lösungsmittel verfolgt. Es wird die Wirkung des Reaktionsmediums (Wasser/organisches Lösungsmittel) auf die Geschwindigkeitskonstante des Korrosionsprozesses untersucht und ein Ansteigen der Werte dieser Konstante bei Erhöhung der Wasserkonzentration im gegebenen System beobachtet. Das führt zu der Schlußfolgerung, daß das organische Lösungsmittel eine hemmende Rolle gegenüber der Korrosionswirkung von Salzsäure auf die entsprechenden Metallproben spielt. Als radioaktiver Tracer wurde55+59 Fe in Form von 55+59FeCl3(10?3 M) mit einer spezifischen Aktivität von 2 × 10?6 Ci/ml eingesetzt.  相似文献   

14.
Light emission during sputtering of graphite targets with 1–10 keV Ne+, Kr+ and Xe+ beams has been investigated in the 180-600 nm wavelength range. Beside the characteristic lines of sputtered C1 and C1 +, a continuum superimposed with a number of broad structures was observed in the 250-520 nm range, and having a maximum at 386 nm. Mass analysis of the sputtered flux confirmed the presence of negative carbon clusters C m - , C2 - being the dominant one. Ion beam parameters i.e. ion mass, energy, current density and ion dose were varied to identify the origin of the continuum emission. On the basis of the experimental results, it is suggested that the continuum is predominantly due to the overlapping of various band systems of sputtered C2 with a small contribution from the heavier sputtered carbon clusters Cm (m>2). Received 24 September 1999 and Received in final form 11 February 2000  相似文献   

15.
Es wird die Abhängigkeit der Impulsdichte vom Füllstand bei Meßanordnungen mit γ-Streustrahlungssonden verschiedener Länge untersucht. Verwendet werden die Nuklide 60Co und 137Cs. Ein nahezu linearer Anstieg der Impulsdichte mit dem Füllstand wird bei Füllgütern kleiner Ordnungszahl nur bei Sondenlängen L ≥ μ0 ?1.erzielt. Der Einfluß des Schüttwinkels und der Dichte des Füllgutes wird diskutiert.  相似文献   

16.
Abstract

Electron diffraction studies have been made of polycrystalline Ni films irradiated with well separated beams of ions of different nature, namely ions of inert (He+, Ne+, Ar+, Kr+, Xe+) and reactive (N+ and O+) gases. The Ni films were prepared under vacuum conditions (P? 3·10?6Pa during evaporation) preventing an appreciable contamination of the films with impurities. The samples were irradiated at T? 300 K with ion beams of energies from 10 to 100 keV in the dose range between 5·1016 cm?2 and the value leading to sample destruction.

Irradiation with noble gas ions revealed no phase transitions in the Ni films. A similar result was obtained in irradiation of Fe and Cr films with He+ ions. The bombardment of Ni films with reactive gas ions does cause changes in the lattice structure of the samples under study, depending on the nature of the bombarding ions. The N+ ion bombardment gives rise to the hcp phase with the lattice parameters typical of the Ni3N compound, and the O+ ion bombardment results in the fcc phase with the NiO-type parameter.

The conclusion is drawn on the chemical origin of the phase transformations in the Ni films under ion bombardment. The necessity of revising the concept about the polymorphous nature of phase transformations induced in the films of transition metals by ion bombardment is substantiated.  相似文献   

17.
When the surface of a solid is bombarded with ions a fraction of the primary energy is reemitted by ion reflection and sputtering. The contribution of ion reflection or sputtering to energy reflection is determined by the mass ratio of the bombarding ions to the target atoms.1,2 In the case of light ions the contribution of reflected ions is dominant. Results for He+ and Ne+ bombardment were described in a previous paper.3 The present paper deals with results for Ar+, Kr+, and Xe+ bombardment of the same targets as investigated before.3 The energies of the mass selected bombarding ions range from 9 to 16 keV. The measurements were carried out by means of the thermic detector described in a separate paper.4 For the given mass ratios most of the reemitted energy is related to sputtering.  相似文献   

18.
Theγ-decay of levels in21Ne up to 10 MeV excitation energy has been investigated byn — γ coincidence measurements initiated with the18O(α, nγ) reaction at 12, 13, 14.5 and 15.4 MeV bombarding energies. Spin(-parity) assignments of excited states are obtained by combining then — γ angular correlation measurements performed atE α=11, 11.82 and 13.6 MeV with a consideration of lifetimes, neutron penetrabilities of the unbound states, and information from the mirror nucleus21Na. The resulting values of Ex[keV]?J π are as follows: 4525-5+, 4686-3+, 5431-7+, 5549-3+, 5819-7?, 6175-7+, 6268-9+, 6550-9, 6639-9, 7006-7+, 7041-9, 7356-7 or 9, 7422-11(?), 7648-7+, 7981-11 or (7+), 8154-9, 8240-11, 8664-9? or 11 or 13?, 9401-13?, 9867-13? or 15+, 9941-13? or 15 or 17+. The assignment of mirror levels in21Ne —21Na has been extended to the 6175 keV level of21Ne. Excitation energies, electromagnetic properties, Gamow?Teller matrix elements and spectroscopic factors of positive parity states are compared with the results of shell-model calculations which employ a unifieds—d shell Hamiltonian and the unrestricted configuration space of the 0d 5/2 —1s 1/2—0d3/2 shell. Collective properties contained in shell model wave functions are explored up to the termination of bands atJ=17/2 or 19/2. The spectrum of intruder states in21Ne is observed to begin with a 5628 keV,J π=7/2+ state. The 7422, 8664 and 9401 keV levels are assigned as members of previously established negative-parity rotational bands.  相似文献   

19.
Für einen speziellen technischen Anwendungszweck, bei welchem 85Kr-Konzentrationen von weniger als 10?5 μCi/cm3 in Gasproben von 40 Ncm3 nachzuweisen sind, wurde eine Meβeinrichtung konzipiert und aufgebaut. Sie besteht aus einem nichtselbstlöschenden Auslösezählrohr, in welchem die Gasprobe selbst als Zählgas fungiert, und den zugehörigen elektrischen Betriebsmitteln.

Charakteristische Daten sind die Meβempfindlichkeit k = 0,8 und der Nulleffekt z0 = 92 min?1.  相似文献   

20.
Für die Bestimmung von tritiummarkiertem Wasserstoff wird eine Gaszählrohr-Apparatur beschrieben, die aus einer Vakuumanlage und einer Antikoinzidenz-Zähleinrichtung besteht. Mit der vorgestellten Anlage können bei einer spezifischen 3H-Aktivität der Lösung von A8 = 25 mCi/ml 1,5 · 10?11 mol Wasserstoff nachgewiesen werden. Die Anlage läβt sich auβer füH* 2 und andere tritiumhaltige Verindungen auch zur Untersuchung von 14C- bzw. 35S-markierten Gasen einsetzen.  相似文献   

设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号