Large negative refractive index modification induced by irradiation of femtosecond laser inside optical glasses

We report on the refractive index modification (Δn) and its cross sectional profile of the created lines inside the different types of optical glasses, containing BaO, TiO₂, or La₂O₃ as a metal oxide. The lines were fabricated by scanning a stage and focusing the femtosecond laser pulses, 800 nm wavelength, a 250 kHz repetition rate and 200 fs pulse duration, from the Ti:sapphire regenerative amplifier system. The Δn measurements were performed with the qualitative phase microscopy technique. As a result, it was found that the Δn and its sign are different depending on glass types. For example, in the glasses containing TiO₂, the Δn became smaller in the modified region and some of them showed relatively large decrease of the Δn, Δn < −0.01, with about 10 μm width. Such a glass material could be useful for the compact optics and optical devices.     

Structural changes in fused silica after exposure to focused femtosecond laser pulses

Using in situ Raman scattering in a confocal microscopy setup, we have observed changes in the network structure of fused silica after modifying regions inside the glass with tightly focused 800-nm 130-fs laser pulses at fluences of 5-200 J cm(-2). The Raman spectra show a large increase in the peaks at 490 and 605cm(-1), owing to 4- and 3-membered ring structures in the silica network, indicating that densification occurs after exposure to the femtosecond laser pulses. The results are consistent with the formation of a localized plasma by the laser pulse and a subsequent microexplosion inside the glass.     

紧聚焦飞秒脉冲与石英玻璃相互作用过程中的电子动量弛豫时间研究

本文通过数值模拟(3+1)维扩展的广义非线性薛定谔方程,研究了紧聚焦飞秒激光脉冲在诱导石英玻璃的非线性电离过程中电子动量弛豫时间对于该电离过程的影响.计算结果证明电子动量弛豫时间会直接影响入射脉冲在焦点区域所形成的峰值场强、自由电子态密度和能流等参量的分布态势,因此在与实验结果相比较后发现适合于相互作用过程的电子动量弛豫时间的理论值约为1.27 fs.进一步的研究表明,电子动量弛豫时间与逆韧致吸收效应、雪崩电离的概率、等离子体密度、等离子体的自散焦效果以及间接引起的焦平面位置的移动都有着密切的联系.当前的研究结果表明电子动量弛豫时间在飞秒激光脉冲与物质相互作用的过程中发挥着重要作用.     

Measurement of the collision time of dense electronic plasma induced by a femtosecond laser in fused silica

Electronic plasma induced by a focused femtosecond pulse (130 fs, 800 nm) in fused silica was investigated by use of pump-probe technology. Pump and probe shadow imaging and interferometric fringe imaging were combined to determine electronic collision time tau in the conduction band, and tau was measured to be 1.7 fs at an electron density near 5 x 10(19) cm(-3). The lifetime of the electronic plasma is also measured to be approximately 170 fs by use of the time-resolved shadow imaging technique.     

Optical waveguide arrays induced in fused silica by void-like defects using femtosecond laser pulses

We report a new approach to the microfabrication of permanent optical waveguide arrays inside fused silica induced by focusing infrared femtosecond laser pulses with microjoule energy. These arrays consist of waveguides limited by void-like damage zones with very loose coupling among adjacent guides, thus allowing the excitation of a single one. The proposed method shows the possibility of using created void-like structures for both the fabrication of integrated optical devices as well as for the control of previously induced refractive index change regions. PACS 42.65.Re; 42.82.Et; 42.79.-e     

飞秒激光所致金纳米粒子析出的玻璃非线性吸收

依据Z-scan技术,使用波长532nm的纳秒脉冲,研究了通过聚焦的飞秒脉冲诱导并辅以热处理得到的金纳米粒子析出的玻璃的非线性吸收.观察到金纳米粒子析出的玻璃具有饱和吸收特性.根据局域场效应,对实验结果拟合,得到在接近表面等离子体共振激发情况下,金纳米粒子三阶极化率虚部分别为Imχ(3)m=57×10-7esu.玻璃样品中金纳米粒子的非线性响应主要起源于热电子贡献. 关键词： 带内跃迁 带间跃迁 热电子贡献     

Nanosecond and femtosecond excimer laser ablation of fused silica

Ablation of fused silica using standard excimer lasers (20–30 ns pulse duration at 193, 248, and 308 nm) and a short pulse laser system (500 fs at 248 nm) is reported. Ablation rates range from several hundred nm/pulse (193 nm or fs-laser) up to about 6 m/pulse (308 nm). The performance of the ablation is found to depend not only on wavelength and pulse duration but also on the existing or laser induced surface quality (e.g., roughness) of the material. Special ablation phenomena are observed. At 193 nm and moderate fluence (3 J/cm²) ablation takes place at the rear side of a plate without affecting the front side, whereas at higher fluence normal ablation at the front side occurs. At 248 nm (standard excimer) the existence of two consecutive ablation phases is observed: smooth ablation at low rate is followed by explosive ablation at high rate. Using fs-pulses smooth shaped holes are formed during the first pulses, whereas high pulse numbers cause the development of a ripple structure in the ablation craters.The results lead to the conclusion that two different ablation mechanisms are involved: the first is based on two photon bulk absorption, the second on controlled surface damage in relation with (partially laser induced) singularity conditions at the surface.Presented at LASERION '91, June 12–14, 1991, München (Germany)     

Spatially resolved measurement of femtosecond laser induced refractive index changes in transparent materials

We present a practical method to determine femtosecond laser induced refractive index changes in transparent materials. Based on an iterative Fourier transform algorithm, this technique spatially resolves the refractive index of complex structures by combining the dimensions of the modified region with the corresponding phase change extracted from far-field intensity measurements. This approach is used to characterize optical waveguides written by a femtosecond laser in borosilicate glass.     

High power supercontinuum generation by dual-color femtosecond laser pulses in fused silica

High power supercontinuum (SC) is generated by focusing 800 nm and 400 nm femtosecond laser pulses in fused silica with a microlens array. It is found that the spectrum of the SC is getting broader compared with the case of a single laser pulse, and the spectral energy density between the two fundamental laser wavelengths is getting significantly higher by optimizing the phase matching angle of the BBO. It exceeds μJ/nm over 490 nm range which is from 380 nm to 870 nm, overcoming the disadvantage of relative lower power in the ranges far from the fundamental wavelength.     

Wavelength-tunable multicolored femtosecond laser pulse generation in a fused silica glass plate

We obtained an array of multicolored femtosecond laser pulses with as many as 17 different colors that are spatially isolated. The mechanism of generation was proved to be cascaded four-wave mixing and with the following procedure. The output beam from a femtosecond laser was split into two. One of the two beams was pulse-compressed with a hollow core fiber and the intensity of the other was reduced. The two beams were synchronized and combined with a small crossing angle in a plate of fused silica glass plate. The wavelengths of the sidebands are continuously tunable from near-ultraviolet to near-infrared. The pulse duration, spatial mode, spectrum, and energy stability of the sidebands were studied. As many as fifteen spectral up-shifted pulses and two spectral downshifted pulses were obtained with spectral bandwidths broader than 1.8 octaves. Properties such as pulse energy as high as 1 μmJ, 45 fs pulse duration, smaller than 1.1 times of the diffraction limit Gaussian spatial profile, and better than 2% RMS power stability of the generated sidebands make it can be used in various experiments. The characterization showed that the sidebands have sufficiently good qualities to enable application to for various multicolor femtosecond laser experiments, for example, a multicolor pump-probe experiment.     

Ultrafast time-resolved photography of femtosecond laser induced modifications in BK7 glass and fused silica

The dynamics of absorption after excitation of fused silica and BK7 glass with femtosecond laser radiation are visualized by transient absorption spectroscopy. Focusing laser radiation with pulse durations in the picosecond time regime in BK7 glass generates free electrons with relaxation by emission of radiation or by formation of defects. The temporal and spatial emission characteristics are observed by high-speed photography in the streak mode. The beam waist moves within the pulse duration towards the incoming laser radiation by self-focusing and with the laser radiation absorbed by multi-photon processes. The dynamics of the long lasting stress formation is visualized by time-resolved Nomarski-Photography. The modification of the glass is investigated during and after irradiation with ultra-short pulsed laser radiation (100 fs<t_p<3 ps) at the wavelength =810 nm. The formation of a sound wave in fused silica and BK7 glass is observed and the mechanical stress, depending on the excitation pulse duration, is measured. PACS 06.60.Jn; 42.50.Md; 78.47.-p; 81.16.-c; 82.53.-k     

Fabrication of hollow optical waveguides in fused silica by three-dimensional femtosecond laser micromachining

We report on the fabrication of hollow optical waveguides in fused silica using femtosecond laser micromachining. We show that in such hollow waveguides, high-intensity femtosecond laser beams can be guided with low optical loss. Our technique, which was established earlier for fabrication of optofluidic structures in glass, can ensure a high smoothness at the inner surfaces of the hollow waveguides and provide the unique capability of fabrication of hollow waveguides with complex geometries and configurations. A transmission of ∼90% at 633 nm wavelength is obtained for a 62-mm-long hollow waveguide with an inner diameter of ∼250 μm. In addition, nonlinear propagation of femtosecond laser pulses in the hollow waveguide is demonstrated, showing that the spectral bandwidth of the femtosecond pulses can be broadened from ∼27.2 to ∼55.7 nm.     

杂质诱导熔石英激光的损伤机理

发展了355 nm纳秒激光下亚波长杂质粒子引起熔石英损伤的基本模型。通过Mie散射理论和热传导方程,计算了粒子与熔石英边界处的温度随粒子尺寸的变化关系,并分析了达到临界温度时,不同粒子诱导损伤所需的关键能量密度,讨论了各粒子最易引起熔石英损伤的尺寸。实验采用355 nm纳秒激光脉冲作用熔石英及其HF刻蚀样品,测得两者的损伤概率。研究表明:粒子吸收激光能量,随着粒子半径的增加,其边缘温度先增大后减小,一定尺寸范围内的粒子才会引起熔石英的损伤;关键能量密度所对应的粒子半径为最易引起熔石英损伤的关键粒子半径;经刻蚀后,熔石英样品表面杂质数密度降低,损伤概率降低,损伤阈值提高。     

Multiple foci and a long filament observed with focused femtosecond pulse propagation in fused silica

Multiple foci and a long filament are observed when we focus a femtosecond laser pulse into a fused-silica sample. The dependences of the intensity distribution of the plasma luminescence on the pulse energy and the numerical aperture (NA) of the focusing objective are investigated. Multiple foci are observed when NA of 相似文献   

The polarization-dependence of femtosecond laser damage threshold inside fused silica

The laser damage threshold inside fused silica is dependent not only on the numerical aperture (NA) of the focusing objective, but also on the polarization of the incident femtosecond laser pulses. The damage threshold for circularly polarized beams is higher than that for linearly polarized beams when NA>0.4, but the former was lower than the latter when NA<0.4. The reverse might be due to different damage processes: laser induced damage at high NA and the self-focusing induced breakdown at low NA.     

Subwavelength ripple formation induced by tightly focused femtosecond laser radiation

Subwavelength ripples (<λ/4) are obtained by scanning a tightly focused beam (∼1 μm) of femtosecond laser radiation (λ = 800 nm, t_p = 100 fs) over the surface of either bulk fused silica and silicon and Er:BaTiO₃. The ripple pattern extends coherently over many overlapping laser pulses parallel and perpendicular to the polarisation. Investigated are the dependence of the ripple spacing on the spacing of successive pulses, the direction of polarisation and the material. The evolution of the ripples is investigated by applying pulse bursts with N = 1 to 20 pulses. The conditions under which these phenomena occur are specified, and some possible mechanisms of ripple growth are discussed. Potential applications are presented.     

Spatio-temporal evolution scenarios of femtosecond laser pulse filamentation in fused silica

We investigated the evolution of femtosecond laser pulses at different wavelengths corresponding to normal, zero, and anomalous regimes of group velocity dispersion (GVD) in fused silica. The laser pulse filamentation in different GVD regimes under the same similarity parameters was first considered. It was established numerically that the scenario of the pulse filamentation depends both on temporal factors, which are determined by pulse GVD and self-phase modulation, and spatial factors associated with Kerr self-focusing and plasma defocusing. In presence of strong normal GVD the dispersive stretching causes, a pulse power decrease followed by lowering of the intensity in filament, electron density reduction in plasma channel, and suppressing of the refocusing. For zero GVD the multipeak regime of radiation propagation is realized in the filament as a result of recurring self-focusings of powerful pulse tail, which was defocused in laser plasma. When GVD is anomalous a sequence of ??light bullets?? with duration about 10 fs forms in the filament. And the peak intensity in ??light bullet?? stays the same ?? 5 × 10¹³ W/cm². In the regime of anomalous GVD power is transferred from the pulse edges to its center, where the repeated self-focusings occur and form a ??light bullet?? sequence.     

Optical and ultrasonic monitoring of femtosecond laser filamentation in fused silica

Millimeter-long filaments and accompanying luminous plasma and defect channels created in fused silica (FS) by single focused femtosecond laser pulses with supercritical powers were probed in situ using optical imaging and contact ultrasonic techniques. Above the threshold pulse energy E_opt = 5 μJ corresponding to a few megawatt power levels pulses collapse due to self-focusing, producing channels filled by electron-hole plasma and luminescent defects, and exhibits predominantly compressive pressure transients. Analysis of the optical and ultrasonic response versus the laser pulse energy suggests that filamentary pulse propagation in the channels occurs with considerable dissipation of about ∼10 cm⁻¹. The predominant ionization mechanism is most likely associated with avalanche ionization, while the main mechanism of optical absorption is free-carrier absorption via inverse Bremsstrahlung interaction with the polar lattice.     

In situ observation of dynamics of plasma self-channeling and bulk modification in silica glasses induced by a high-intensity femtosecond laser

The time-resolved dynamics of plasma self-channeling and refractive index bulk modification in silica glasses were first observed in situ using a high-intensity femtosecond (110 fs) Ti:sapphire laser (λ_p=790 nm). Plasma channeling is induced in silica glass at an irradiation higher than an input intensity of 1.5×10¹² W/cm² and photoinduces either the refractive-index modification or optical crack modification. In the domain of refractive-index modification, the lifetime of induced plasma self-channeling was 20 ps and the structural transition time for forming the refractive-index change was 10 ps. In the domain of optical cracks, however, the lifetime of induced plasma formation was 30 ps and the structural transition time for forming the optical cracks was 40 ps. According to electron spin resonance spectroscopic (ESP) measurement, it was found that the defect concentration of the SiE^′ center increased significantly in the refractive index modification region. A maximum value of the refractive-index change Δn was measured to be 1.6×10^-2. The intensity profile of the output beam transmitted through the refractive-index modification showed that the bulk modification produced a permanent optical waveguide. Received: 8 April 2002 / Accepted: 12 April 2002 / Published online: 22 November 2002 RID="*" ID="*"Corresponding author. Fax: +81-48/462-4682, E-mail: shcho@riken.go.jp     

Infrared photosensitivity in silica glasses exposed to femtosecond laser pulses

We investigate the use of infrared femtosecond laser pulses to induce highly localized refractive-index changes in fused-silica glasses. We characterize the magnitude of the change as a function of exposure and measure index changes as large as 3x10(-3) and 5x10(-3) in pure fused silica and boron-doped silica, respectively. The potential of this technique for writing three-dimensional photonic structures in bulk glasses is demonstrated by the fabrication of a Y coupler within a sample of pure fused silica.