室温生长ZnO薄膜晶体管的紫外响应特性

在室温下采用射频磁控溅射法制备了以ZnO薄膜为沟道层的薄膜晶体管(TFTs).研究表明ZnO薄膜在紫外区具有较高的吸收率,并且ZnO-TFTs对紫外光照射较为敏感.因此,进一步深入研究了ZnO-TFTs紫外光照下的输出和转移特性,结果表明,紫外光照将引起较为明显的光响应电流,且经过光照的器件在光源移除7天后,ZnO沟道层中仍能观察到残余电导现象,其原因可以归结为紫外光辐射在ZnO沟道层中引入了一定数量的氧空位施主态缺陷.     

A short review on: Optimization techniques of ZnO based thin film transistors

There has been a significant global interest in the thin film transistor (TFT) due to its potential use in flat panel display. A great deal of interest in zinc oxide (ZnO) based TFT has been developed owing to its promising electronic and optoelectronic properties. The performance of a TFT is mainly measured by calculating the turn-on voltage, drain current on-to-off ratio (I_on/I_off) and channel mobility that depends on many factors like crystallanity of the active layer, quality of the insulator, and the quality of the interface between the different layers (semiconductor, insulator, and metallic contacts). All these factors further depend upon the growth and processing condition of different layers. This paper presents a short review that includes the factors affecting the performance of ZnO-based TFT and the methods to optimize them. The related work of reputed research groups are summarized and discussed systematically in the paper.     

Non-vacuum, single-step conductive transparent ZnO patterning by ultra-short pulsed laser annealing of solution-deposited nanoparticles

A solution-processable, high-concentration transparent ZnO nanoparticle (NP) solution was successfully synthesized in a new process. A highly transparent ZnO thin film was fabricated by spin coating without vacuum deposition. Subsequent ultra-short-pulsed laser annealing at room temperature was performed to change the film properties without using a blanket high temperature heating process. Although the as-deposited NP thin film was not electrically conductive, laser annealing imparted a large conductivity increase and furthermore enabled selective annealing to write conductive patterns directly on the NP thin film without a photolithographic process. Conductivity enhancement could be obtained by altering the laser annealing parameters. Parametric studies including the sheet resistance and optical transmittance of the annealed ZnO NP thin film were conducted for various laser powers, scanning speeds and background gas conditions. The lowest resistivity from laser-annealed ZnO thin film was about 4.75×10⁻² Ω cm, exhibiting a factor of 10⁵ higher conductivity than the previously reported furnace-annealed ZnO NP film and is even comparable to that of vacuum-deposited, impurity-doped ZnO films within a factor of 10. The process developed in this work was applied to the fabrication of a thin film transistor (TFT) device that showed enhanced performance compared with furnace-annealed devices. A ZnO TFT performance test revealed that by just changing the laser parameters, the solution-deposited ZnO thin film can also perform as a semiconductor, demonstrating that laser annealing offers tunability of ZnO thin film properties for both transparent conductors and semiconductors.     

基于高阻ZnO薄膜的光电导型紫外探测器

本文通过射频磁控溅射法在玻璃衬底上沉积一层ZnO薄膜, 制备了Al-ZnO-Al 结构光电导型紫外探测器件, 并在室温下测试了所制备器件的暗场特性及其对紫外线的响应特性. 暗场条件下器件电流特性测试结果表明所制备的ZnO薄膜电阻率达到了3.71×10⁹ Ω · cm, 是一种高阻薄膜. 在波长365 nm, 光强303 μW/cm²的紫外线照射下, 薄膜的电阻率为7.20×10⁶ Ω · cm, 探测器明暗电流比达到了516. 40 V偏置电压条件下周期性开关紫外线照时, 探测器的上升和下降时间分别为199 ms和217 ms, 响应速度快且重复性好, 并利用ZnO半导体表面复合慢过程和体复合快过程对瞬态响应过程进行了理论拟合分析. 本文研究结果表明, 高阻ZnO薄膜紫外探测器具有良好的紫外光电响应特性.     

A p-channel SMC poly-Si thin film-transistor with a GOLDD structure

We have developed a silicide-mediated crystallization (SMC) polycrystalline silicon (poly-Si) thin film transistor (TFT) with a gate overlapped lightly doped drain (GOLDD) structure. Applying a GOLDD structure to the SMC poly-Si TFT, the off-state leakage current of coplanar TFT is reduced, while the reduction of the on-state current is relatively small. The p-channel poly-Si TFT with a GOLDD structure exhibited a field effect mobility of 50 cm²/V s and an off-state leakage current of 3.8×10⁻¹¹ A/μm at the drain voltage of −5 V and the gate voltage of 10 V.     

双有源层结构掺硅氧化锌薄膜晶体管的电特性

为降低氧化锌薄膜晶体管(ZnO-TFT)的关态电流(I_off),提高开关电流比(I_on/I_off),采用磁控溅射法制备掺硅氧化锌薄膜晶体管(SZO-TFT)和SZO/ZnO双层有源层结构的TFT器件,研究了Si含量对SZO薄膜透光性和SZO-TFT电性能的影响,比较了单层与双层有源层结构TFT器件的电特性.与ZnO-TFT相比,SZO-TFT的I_off低2个数量级,最低达1.5×10^-12 A;I_on/I_off高两个数量级,最高达7.97×10⁶.而SZO/ZnO双有源层结构的TFT器件可在不降低载流子迁移率的情况下,I_on/I_off比ZnO-TFT提高近两个数量级,有效改善了器件的整体性能.     

一维纳米氧化锌自驱动紫外探测器的构建与性能研究

本文通过化学气相沉积法制备了ZnO纳米材料, 利用扫描电镜、光致发光谱、X衍射光谱及拉曼光谱等方法对制备的材料进行了表征. 基于制备的单根ZnO线分别构建了三种不同结构的紫外探测器件: Ag-ZnO-Ag肖特基型、PEDOT:PSS/n-ZnO结型和p-Si/n-ZnO结型紫外探测器, 并对器件的性能进行了研究. 结果表明: 三种不同结构的器件都表现出良好的整流特性, 对紫外线均有明显的光响应; 在零偏压下, 都有明显的自驱动特性. 三种器件中, p-Si/n-ZnO型紫外探测器性能最为优异: 在零偏压下, 暗电流约在1.2×10^-3 nA, 光电流在5.4 nA左右, 光暗电流比为4.5×10³, 上升和下降时间分别为0.7 s和1 s. 通过三类器件性能比较, 表明无机p-Si更适合与ZnO构建pn结型自驱动紫外探测器.     

发光薄膜沉积技术中薄膜晶体管的优化设计

为了能制备高均匀性、大尺寸高清RGB-OLED显示终端,发展了一种全新的、无掩膜低成本的彩色薄膜沉积技术——薄膜晶体管导向的薄膜沉积技术,并研究了薄膜晶体管的宽长比及栅压对电聚合发光薄膜性能的影响,寻找最佳的制备条件。实验中采用像素尺寸大小为200μm×200μm的AMOLED基板,通过TFT来控制发光薄膜在ITO像素上的电化学聚合过程。首先对不同宽长比的TFT性能进行表征,再对不同宽长比的TFT在不同栅压条件下制备的电化学聚合薄膜进行表征和分析。实验结果表明,在同一宽长比的TFT控制下,施加栅压越大,制备的薄膜越厚,发光效果越好;在不同宽长比的TFT控制下,宽长比越大,聚合薄膜越厚,发光效果越好。在较大栅压下,选择宽长比为50μm/10μm的TFT最为适宜。研究结果为电化学聚合技术在AMOLED显示中的应用奠定了良好基础。     

Sol–gel derived ZnO nanoparticulate films for ultraviolet photodetector (UV) applications

Zinc oxide nanoparticles based UV detector was fabricated on thermally oxidized silicon substrate. ZnO nanoparticle films were deposited using sol–gel route. The seed solution was prepared using two different solvents (methanol and isopropyl alcohol (IPA)). The surface morphology of the prepared films was characterized by FESEM. Structural characterization along with optical measurements was carried out using XRD and UV–vis spectroscopy. For the UV photo-detector, ZnO thin film prepared in IPA is selected based on their structural and optical analysis. The changes in photo-response of ZnO thin film with respect to time was studied under the dark and variable UV intensities. It was observed that the photocurrent increased with a factor of 4.82 under 1.16 mW of UV intensity. It is believe that the synthesized ZnO thin films have potential to use in the ultraviolet photo-detector applications.     

Optoelectronic characterisation of an individual ZnO nanowire in contact with a micro-grid template

Optoelectronic characterisation of an individual ZnO nanowire in contact with a micro-grid template has been studied.The low-cost micro-grid template made by photolithography is used to fabricate the ohmic contact metal electrodes.The current increases linearly with the bias,indicating good ohmic contacts between the nanowire and the electrodes.The resistivity of the ZnO nanowire is calculated to be 3.8 ·cm.We investigate the photoresponses of an individual ZnO nanowire under different light illumination using light emitting diodes(λ = 505 nm,460 nm,375 nm) as excitation sources in atmosphere.When individual ZnO nanowire is exposured to different light irradiation,we find that it is extremely sensitive to UV illumination;the conductance is much larger upon UV illumination than that in the dark at room temperature.This phenomenon may be related to the surface oxygen molecule adsorbtion,which indicates their potential application to the optoelectronic switching device.     

Modeling of polycrystalline ZnO thin-film transistors with a consideration of the deep and tail states

We report a model of the carrier transport and the subgap density of states in a polycrystalline ZnO film for simulating a polycrystalline ZnO thin film transistor. This simple model considering the deep and the band tail states reproduces well the characteristics of polycrystalline ZnO thin film transistors. Furthermore, using the developed model, we study the effects of defect parameters on the electrical performances of the polycrystalline ZnO thin film transistors.     

A poly-Si thin film transistor fabricated by new excimer laser recrystallization employing floating active structure

We fabricated a high-performance polycrystalline silicon (poly-Si) thin film transistor (TFT) by new excimer laser annealing (ELA) method employing floating active structure. The new simple ELA method produces large lateral grains exceeding 4 μm. A novel poly-Si TFT that exhibits very high mobility (μ_FE=331 cm²/V s) and low leakage current has been successfully fabricated by single laser irradiation on selectively floating a-Si layer. Uniform lateral grains have been obtained with wide ELA process window.     

Light-emitting field-effect transistor based on a tetracene thin film

We report the first organic light-emitting field-effect transistor. The device structure comprises interdigitated gold source and drain electrodes on a Si/SiO(2) substrate. A polycrystalline tetracene thin film is vacuum sublimated on the substrate forming the active layer of the device. Both holes and electrons are injected from the gold contacts into this layer leading to electroluminescence from the tetracene. The output characteristics, transfer characteristics, and the optical emission properties of the device are reported. A possible mechanism for electron injection is suggested.     

Pulsed laser deposition of ZnO grown on glass substrates for realizing high-performance thin-film transistors

We report characterization of ZnO thin-film transistors (TFTs) on glass substrates fabricated by pulsed laser deposition (PLD). ZnO films were characterized by X-ray diffraction (XRD), atomic force microscopy and Hall effect measurements. The XRD results showed high c-axis-oriented ZnO(0002) diffraction corresponding to the wurtzite phase. Moreover, the crystallization and the electrical properties of ZnO thin films grown at room temperature are controllable by PLD growth conditions such as oxygen gas pressure. The ZnO films are very smooth, with a root-mean-square roughness of 1 nm. From the Hall effect measurements, we have succeeded in fabricating ZnO films on glass substrates with an electron mobility of 21.7 cm²/V s. By using the ZnO thin film grown by two-step PLD and a HfO₂ high-k gate insulator, a transconductance of 24.1 mS/mm, a drain current on/off ratio of 4.4×10⁶ and a subthreshold gate swing of 0.26 V/decade were obtained for the ZnO TFT.     

Ultraviolet photoconductive detector based on Al doped ZnO films prepared by sol-gel method

We report a study on the fabrication and characterization of ultraviolet photodetectors based on ZnO:Al films. Using sol-gel technique, highly c-axis oriented ZnO films with 5 mol% Al doping were deposited on Si(1 1 1) substrates. The photoconductive UV detectors based on ZnO:Al thin films, having a metal-semiconductor-metal (MSM) structure with interdigital (IDT) configuration, were fabricated by using Au as a contact metal. The characteristics of dark and photocurrent of the UV detector and the UV photoresponse of the detector were investigated. The linear current-voltage (I-V) characteristics under both forward and reverse bias exhibit ohmic metal-semiconductor contacts. Under illumination using monochromatic light with a wavelength of 350 nm, photo-generated current was measured at 58.05 μA at a bias of 6 V. The detector exhibits an evident wide-range spectral responsivity and shows a trend similar to that in transmittance and photoluminescence spectrum.     

Fabrication of a solution-processed thin-film transistor using zinc oxide nanoparticles and zinc acetate

We have fabricated a solution-processed ZnO thin-film transistor without vacuum deposition. ZnO nanoparticles were prepared by the polyol method from zinc acetate, polyvinyl pyrrolidone, and diethyleneglycol. The solution-processable semiconductor ink was prepared by dispersing the synthesized ZnO in a solvent. Inverted stagger type thin-film transistors were fabricated by spin casting the ZnO ink on the heavily doped Si wafer with 200 nm thick SiO₂, followed by evaporation of Cr/Au source and drain electrodes. After the drying and heat treatment at 600 C, a relatively dense ZnO film was obtained. The film characteristics were investigated by scanning electron microscopy (SEM) and X-ray diffraction (XRD). In order to obtain the electrical properties of the solution-derived transistor, the on–off ratio, threshold voltage, and mobility were measured.     

A thin-film transistor with a very thin a-Si:H layer and its application for an LC panel

One of the disadvantages of applying an a-Si:H thin-film transistor (TFT) to an active matrix-addressed liquid crystal (LC) panel is that a TFT with an a-Si:H has a very large photo-leakage current because of the high photo-conductivity of an a-Si:H itself.We have tried decreasing the photo-leakage current by varying the thickness of an a-Si:H layer (L) in TFTs and investigated the characteristics of TFTs, mainly drain voltage versus drain current containing photo-leakage current (I _ph).As a result, it is shown that lnI _ph is proportional to InL, and its gradient is 1.5–2.0. We assume that the thinner an a-Si:H layer is, the more effective the recombination of carriers at the interface states is forI _ph.We have applied TFT with a very thin a-Si:H layer (30nm) to a full-color active matrix-addressed LC panel for a moving picture display and realized a display of good quality under illuminated condition of 5×10⁴lx without a shading layer in it.     

Fabrication and characteristics of a surface acoustic wave UV sensor based on ZnO thin films grown on a polycrystalline 3C-SiC buffer layer

Zinc oxide (ZnO) thin films were deposited onto a polycrystalline (poly) 3C-SiC buffer layer for surface acoustic wave (SAW) ultraviolet (UV) sensing using a magnetron sputtering system. X-ray diffraction (XRD) and photoluminescence (PL) spectra showed that the ZnO film grown on 3C-SiC/Si had a dominant c-axis orientation, a lower residual stress, and higher intensity of luminescence at 380 nm of ZnO thin film. The SAW resonator UV detector were fabricated on ZnO/Si structures with a 3C-SiC buffer layer. The SAW resonator exposed under UV illumination had a linear response with sensitivity of 85 Hz/(μW/cm²) in ZnO/3C-SiC/Si structures, as compared to 25 Hz/(μW/cm²) in ZnO/Si structures with UV intensity varied until 600 μW/cm².     

铟镓锌氧薄膜晶体管的悬浮栅效应研究

为了避免光照对铟镓锌氧薄膜晶体管(InGaZnO thin film transistors,IGZO TFTs)电学特性的影响,IGZO TFT要增加遮光金属层.本文研究了遮光金属栅极悬浮时,IGZO TFT的输出特性.采用器件数值计算工具TCAD(technology computer-aided design)分析了IGZO层与栅介质层界面处电势分布,证实了悬浮栅(floating gate,FG)IGZO TFT输出曲线的不饱和现象是由悬浮栅与TFT漏端的电容耦合造成.基于等效电容的电压分配方法,提出了悬浮栅IGZO TFT电流的一阶模型.TCAD数值分析及一阶物理模型结果与测试具有较高程度的符合,较完整地解释了悬浮栅IGZO TFT的电学特性.     

室温下溅射法制备高迁移率氧化锌薄膜晶体管

为降低氧化锌薄膜晶体管(ZnO TFT)的工作电压,提高迁移率,采用磁控溅射法在氧化铟锡(ITO)导电玻璃基底上室温下依次沉积NbLaO栅介质层和ZnO半导体有源层,制备出ZnO TFT,对器件的电特性进行了表征。该ZnO TFT呈现出优异的器件性能:当栅电压为5 V、漏源电压为10 V时,器件的饱和漏电流高达2.2 m A;有效场效应饱和迁移率高达107 cm~2/(V·s),是目前所报道的室温下溅射法制备ZnO TFT的最高值,亚阈值摆幅为0.28 V/decade,开关电流比大于107。利用原子力显微镜(AFM)对NbLaO和ZnO薄膜的表面形貌进行了分析,分析了器件的低频噪声特性,对器件呈现高迁移率、低亚阈值摆幅以及迟滞现象的机理进行了讨论。