Effect of varying pore size of AAO films on refractive index and birefringence measured by prism coupling technique

Anodic aluminum oxide (AAO) films with different pore sizes were prepared to modulate the effective refractive index and birefringence. To investigate the relationship between the refractive index and the pore size of the AAO film, optical constants were obtained using a prism coupler with various lasers. With experimental results, the dispersion curve of alumina itself without pores was extracted using a theoretical anisotropic model. We demonstrated that AAO films could offer a wide range of refractive index and birefringence values for optical device applications. Furthermore, index profiles as a function of the thickness of the AAO films were obtained by inverse Wentzel-Kramer-Brillouin approximation to examine the optical homogeneity.     

多孔阳极氧化铝薄膜光学常数的确定

根据多孔阳极氧化铝(AAO)薄膜的实验透射谱(200—2500nm)，采用极值包络线算法确定其光学常数，并由此较精确地计算出AAO薄膜样品在该波段的光学常数.结果表明，多孔氧化铝薄膜表现出直接带隙(能隙约4．5eV)半导体的光学特性，且其光学常数与制样中的重要工艺参数阳极氧化电压有显著的相关性，即随阳极氧化电压的增加，AAO薄膜的厚度、折射率和光学能隙变大，消光系数减小．同时，计算得到的薄膜厚度与实测值相吻合，则说明计算结果和实验值是自洽的. 关键词： 薄膜光学 光学常数 多孔阳极氧化铝 阳极氧化电压     

Ag/AAO纳米有序阵列复合结构等效光学参量的确定

引入厚度偏差Δd, 修正了薄膜透射率表达式.基于Ag/AAO纳米有序阵列复合结构实验透射光谱(500—2700nm)的两条极值包络线, 定义了一个优化函数, 结合最优化数值算法尝试确定具有较强吸收的Ag/AAO纳米有序阵列复合结构的等效光学参量. 由此计算了该结构的等效折射率n、等效消光系数k、平均等效厚度d以及厚度偏差Δd. 该方法对Ag/AAO纳米复合结构平均等效厚度的相对计算误差仅为0.3%, 与实测厚度基本一致, 且Ag/AAO纳米复合结构的模拟透射谱与实验透射光谱在500—2700nm波段范围内相符. 这表明该计算方法可有效确定Ag/AAO纳米复合结构的等效光学参量, 并与实验结果是自洽的. 关键词： 薄膜光学 光学参量 纳米复合结构 最优化算法     

基于时间控厚离子束溅射技术的宽带减反膜制备

为了制备满足设计要求的宽角度、宽波段减反膜,利用离子束溅射沉积技术,在时间-功率控厚的模式下,对膜层沉积速率进行了精确修正。在实验中,利用时间-功率控厚的离子束溅射沉积技术,选择HfO2和SiO2作为高低折射率组合,在超抛ZF6玻璃基底上制备了宽角度、宽带减反膜,通过对实验后的透过率光谱曲线的数值反演计算,获得膜层厚度修正系数,初步得到了沉积速率随沉积时间变化的规律。利用修正后的沉积参数制备设计的膜系,在0°~30°入射角度下,600~1 200 nm波段的平均透过率达到99%以上。     

基于时间控厚离子束溅射技术的宽带减反膜制备

 为了制备满足设计要求的宽角度、宽波段减反膜,利用离子束溅射沉积技术,在时间-功率控厚的模式下,对膜层沉积速率进行了精确修正。在实验中,利用时间-功率控厚的离子束溅射沉积技术,选择HfO₂和SiO₂作为高低折射率组合,在超抛ZF6玻璃基底上制备了宽角度、宽带减反膜,通过对实验后的透过率光谱曲线的数值反演计算,获得膜层厚度修正系数,初步得到了沉积速率随沉积时间变化的规律。利用修正后的沉积参数制备设计的膜系,在0°~30°入射角度下,600~1 200 nm波段的平均透过率达到99%以上。     

Optical fiber refractometers based on indium tin oxide coatings fabricated by sputtering

This Letter presents the fabrication of optical fiber refractometers based on indium tin oxide (ITO) coatings deposited by sputtering with response in the visible region. ITO thin films have been sputtered by means of a rotating mechanism that enables the fabrication of smooth and homogeneous coatings onto the optical fiber core. The ITO coating acts as a resonance supporting layer. This permits us to couple light from the waveguide to the ITO-coating/external medium region at specific wavelength ranges. The device is sensitive to external medium refractive index, which allows its utilization as a refractometer. The sensitivity is dependent on the coating thickness, ranging from 523.21 to 1221 nm/refractive index unit in the explored sensors. The sensor development process is time effective compared to other techniques such as dip coating or layer-by-layer self-assembly, which is interesting in terms of mass production.     

内置调制层型光纤表面等离子体波共振传感器研究

研究了一种基于内置调制层结构的光纤表面等离子体波共振(SPR)传感器。通过在金膜与纤芯的内侧增覆具有不同厚度和属性的光学透明薄膜作为内调制层,构成了性能独特的光电复合薄膜,起到调节倏逝波矢量和金膜表面等离子体振荡波矢量的双重作用,进而控制共振效应,为调节灵敏度提供依据。采用时域有限差分方法对内置调制层结构光纤SPR共振激励模型属性进行数值仿真。在此基础上,研制了用于液体折射率测量的内置调制层型光纤SPR传感探针。实验结果表明,该传感器在1.335～1.392折射率范围内,随着待测液体折射率的增大,SPR共振光谱向长波方向偏移,且灵敏度达到2263.1nm/RIU,与基于纤芯-金膜-环境介质三层结构的常规光纤SPR传感器相比提高一倍,能够更好地满足环境折射率检测的需求。     

螺旋形塑料光纤表面等离子体共振折射率传感器

研究了基于波长调制的螺旋形塑料光纤(plastic optical fiber, POF)表面等离子体共振(surface plasmon resonance, SPR)折射率传感器。采用机械热压和扭曲法将塑料光纤制备成螺旋形,在螺旋形POF上通过磁控溅射蒸镀一定厚度(约50 nm)的金属薄膜来激励SPR效应,从而形成螺旋形POF-SPR传感器。通过对螺旋形POF-SPR传感器的结构进行修饰,研究不同结构参数对折射率传感特性的影响。实验结果表明:由厚度为500μm扁平形POF扭制、螺纹数为4的螺旋形POF-SPR传感器具有较好的线性度和折射率传感特性,在折射率为1.335～1.400范围内测得的灵敏度为1 262 nm/RIU。该传感器具有成本较低、制备简单、结构稳定等优点。     

长周期多芯手征光纤轨道角动量的调制

基于矢量模式耦合理论,在多模光纤中引入手性耦合纤芯结构,设计了一种光纤型光轨道角动量调制器.使用单根光纤,无需施加扭转或应力,可以实现任意光轨道角动量的调制.通过理论分析与数值仿真,研究了不同结构参数对轨道角动量模式纯度、传输损耗和有效折射率的影响.在中心纤芯和旁纤芯传播常数不变的前提下,旁纤芯数量对损耗影响较大,通过相位匹配条件计算得到的螺距可以在一定数值范围内浮动变化,两种纤芯的间距受限于模式损耗和光纤集成度.     

新型MOLEDs的光学性能

将负折射率介质层(NRIDL)引入到微腔有机电致发光器件(MOLEDs)中,设计了新型的微腔器件。利用传输矩阵法对此器件的反射率大小、器件厚度对发射峰的影响以及电致发光(EL)光谱性质进行了分析和讨论。结果表明:与普通微腔器件相比,新型微腔器件的谱线宽度显著窄化,峰值强度明显增强,并且受腔体长度的影响较小。这些结果为进一步提高微腔器件的发光色纯度、薄化器件厚度提供了新方法。     

空心微瓶谐振腔的封装及折射率传感特性研究北大核心CSCD

为提高传感器的稳定性和便携性,提出一种基于空心微瓶谐振腔的折射率传感器,对系统进行封装并对其折射率传感特性进行研究。仿真分析不同壁厚下空心微瓶谐振腔径向回音壁模式的光场分布,光场在微瓶内部的占比随着器件壁厚的减少而增加,有利于提高传感灵敏度。为减小空心微瓶谐振腔的壁厚,利用氢氟酸对石英毛细管进行腐蚀,使用光纤熔接机制备了薄壁空心微瓶谐振腔。采用紫外胶将耦合系统封装固定在载玻片上,器件稳定性和便携性得到提升。研究了封装器件在不同折射率匹配液下的传感特性,器件传感灵敏度为26.50 nm/RIU。该传感器具有稳定性强、灵活性高、损耗小等优点,在光微流控折射率检测方面拥有很大的应用潜力。     

Effect of the transition layer on ellipsometric measurement of nanodimensional layers

The results of numerical simulation of a nanodimensional film-transition layer-absorbing substrate structure are presented. It is found that the transition layer affects the accuracy of determining the refractive index and thickness of the nanodimensional coating. It is shown that the introduction of the effective values of the refractive index and absorption coefficient of the substrate improves the accuracy of ellipsometric measurements of the nanodimensional film parameters. Physical (full-scale) and numerical experiments demonstrate that, when the thickness and refractive index of a nanodimensional film on a substrate with an unknown transition layer comparable in thickness with the film are measured, it is appropriate to replace the substrate-transition layer structure by a substrate with effective optical parameters. It is found that a change in the thickness of the transition layer does not noticeably affect the accuracy of determining the thickness and refractive index of the film deposited when the effective values of the refractive index and absorption coefficient of the substrate are used.     

Rugate filter with multi-channel grown by glancing angle deposition

Glancing angle deposition (GLAD) is an effective technique to fabricate thin films with desired nanoscale porosity variations in three dimensions. GLAD can be used to grow rugate filters characterized by a sinusoidal refractive index profile from one single source material through control of film porosity. A multi-stopband rugate filter can be achieved either by introducing a layer of constant index into the center of sinusoidal refractive index profile or by embedding discrete layers of constant refractive index to sinusoidal index profile with the GLAD technique. Transmittance measurements of the one channel filter, formed with titanium dioxide, revealed this method is one of the most valid technologies to fabricate multi-band filters.     

Optical characterization of porous silicon films and multilayer filters

Porous silicon (PS) has a great potential in optical applications due to the tunability of its refractive index. However, the electrochemical formation parameters of porous silicon have a great influence both on porosity and pore morphology and, hence, on the optical properties of the PS layers. In the present work, the optical constants of PS layers are determined in the visible-wavelength range for different electrolyte compositions and for a wide range of formation-current densities. Thus, the interval of refractive indices that can be achieved for each electrolyte composition is studied, for the further development of interference filters. In particular, it is demonstrated that a higher ethanol concentration in the electrolyte leads to a considerably higher tunability of the refractive index of PS while reducing absorption losses. In addition, the performance of PS-based multilayer interference filters is shown to improve when formed with an electrolyte of higher ethanol concentration, especially in the blue region of the visible spectrum. PACS 78.20.Ci; 78.40.-q; 78.55.Mb     

高功率激光宽光谱减反膜的溶胶-凝胶旋转法制备工艺

 采用溶胶-凝胶法用旋转镀膜工艺在K9玻璃基片上制备出了SiO₂和有机硅单层减反膜以及有机硅-SiO₂双层减反膜。考察了旋转速度对SiO₂和有机硅单层膜的中心透射波长、膜层折射率等基本光学性质的影响，实验确定了双层膜的涂敷工艺。透射光谱测量表明，采用本文工艺条件制备的有机硅 SiO₂双层膜在430～800nm范围内透射率达99％以上。     

一些光谱方法在聚合物光学膜层研究中的应用

本文介绍了红外光谱、紫外 /可见光谱、光波导棱镜耦合等方法在有机硅氧烷耐磨透明涂层的制备、固化过程、涂层结构分析及性能测定等方面的应用。     

高功率激光宽光谱减反膜的溶胶-凝胶旋转法制备工艺

采用溶胶-凝胶法用旋转镀膜工艺在K9玻璃基片上制备出了SiO2和有机硅单层减反膜以及有机硅-SiO2双层减反膜。考察了旋转速度对SiO2和有机硅单层膜的中心透射波长、膜层折射率等基本光学性质的影响,实验确定了双层膜的涂敷工艺。透射光谱测量表明,采用本文工艺条件制备的有机硅 SiO2双层膜在430～800nm范围内透射率达99％以上。     

Accuracy design of ultra-low residual reflection coatings for laser optics

Refractive index inhomogeneity is one of the important characteristics of optical coating material, which is one of the key factors to produce loss to the ultra-low residual reflection coatings except using the refractive index inhomogeneity to obtain gradient-index coating. In the normal structure of antireflection coatings for center wavelength at 532 nm, the physical thicknesses of layer H and layer L are 22.18 nm and 118.86 nm, respectively. The residual reflectance caused by refractive index inhomogeneity(the degree of inhomogeneous is between -0.2 and 0.2) is about 200 ppm, and the minimum reflectivity wavelength is between 528.2 nm and 535.2 nm. A new numerical method adding the refractive index inhomogeneity to the spectra calculation was proposed to design the laser antireflection coatings, which can achieve the design of antireflection coatings with ppm residual reflection by adjusting physical thickness of the couple layers. When the degree of refractive index inhomogeneity of the layer H and layer L is-0.08 and 0.05 respectively, the residual reflectance increase from zero to 0.0769% at 532 nm. According to the above accuracy numerical method, if layer H physical thickness increases by 1.30 nm and layer L decrease by 4.50 nm, residual reflectance of thin film will achieve to 2.06 ppm. When the degree of refractive index inhomogeneity of the layer H and layer L is 0.08 and -0.05 respectively, the residual reflectance increase from zero to 0.0784% at 532 nm. The residual reflectance of designed thin film can be reduced to 0.8 ppm by decreasing the layer H of 1.55 nm while increasing the layer L of 4.94 nm.     

Luneburg lens for optical waveguide use

Since the apparent refractive index of an optical waveguide depends on its thickness, elements with varying index are relatively easy to fabricate. A method used to make an almost aberration free lens is presented.     

Gradient-index narrow-bandpass filter fabricated with glancing-angle deposition

Glancing-angle deposition (GLAD) is a fabrication method capable of producing thin films with engineered nanoscale porosity variations. GLAD can be used to create optical thin-film interference filters from a single source material by modification of the film refractive index through control of film porosity. We present the effects of introducing a layer of constant low density into the center of a rugate thin-film filter fabricated with the GLAD technique. A rugate filter is characterized by a sinusoidal refractive-index profile. Embedding a layer of constant refractive index, with a thickness equal to one period of the rugate index variation, causes a narrow bandpass to appear within the filter's larger stop band. Transmittance measurements of such a gradient-index narrow-bandpass filter, formed with titanium dioxide, revealed an 83% transmittance peak at a vacuum wavelength of 522 nm, near the center of the stop band, with a FWHM bandwidth of 15 nm.