Structural study on the crystallization behavior of Sb3Te2 alloy for phase change memory

The atomic crystal structure of the Sb₃Te₂ binary alloy has been investigated with high‐resolution transmission electron microscopy (HR‐TEM) and fast Fourier transform patterns. As a result, there is inconsistency between the previous theoretical model and the experimental result. But, from the calculations of lattice parameters and the number of layers in the unit cell, it is found that the Sb₃Te₂ alloy can be crystallized into the Sb₂Te structure with P m1 space group and the difference between stacking sequences of the Sb₃Te₂ and the Sb₂Te structures has been discussed with the proposed atomic arrangement model of unit cells. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Dislocation Reduction Mechanisms in Gallium Nitride Films Grown by Canti-Bridge Epitaxy Method

By using the special maskless V-grooved c-plane sapphire as the substrate, we previously developed a novel GaN LEO method, or the so-called canti-bridge epitaxy （CBE）, and consequently wing-tilt-free GaN films were obtained with low dislocation densities, with which all the conventional difficulties can be overcome [J. Vacuum Sci. Technol. B 23 （2005） 2476]. Here the evolution manner of dlslocations in the CBE GaN films is investigated using transmission electron microscopy. The mechanisms of dislocation reduction are discussed. Dislocation behaviour is found to be similar to that in the conventional LEO GaN films except the enhanced dislocation-combination at the coalescence boundary that is a major dislocation-reduction mechanism for the bent horizontal-propagating dislocations in the CBE GaN films. The enhancement of this dislocation-combination probability is believed to result from the inclined shape and the undulate morphology of the sidewalls, which can be readily obtained in a wide range of applicable film-growth conditions during the GaN CBE process. Further development of the GaN CBE method and better crystal-quality of the GaN film both are expected.     

Ion-beam-assisted MBE growth of semi-spherical SiGe/Si nano-structures

Semi-spherical SiGe/Si nano-structures of a new type are presented. Epitaxial islands of 30–40 nm in base diameter and 11 nm in height and having a density of about 6×10¹⁰ cm^-2 were produced on (001) Si by molecular beam epitaxial growth of Si/Si_0.5Ge_0.5 layers with in situ implantation of 1-keV As⁺ ions. It was found by cross-section transmission electron microscopy that the islands have a complicated inner structure and consist of a micro-twin nucleus and semi-spherical nano-layers of various SiGe compositions. The nature of the surface patterning is interpreted by stress relaxation through implantation-induced defects. Received: 12 July 2001 / Accepted: 4 September 2001 / Published online: 2 October 2001     

Modified growth of Ge quantum dots using C2H4 mediation by ultra-high vacuum chemical vapor deposition

C₂H₄ mediations were used to modify the Stranski-Krastanow growth mode of Ge dots on Si(0 0 1) at 550 °C by ultra-high vacuum chemical vapor deposition. With appropriate C₂H₄-mediation to modify the Si surface, the elongated Ge hut clusters can be transformed to highly uniform Ge domes with a high Ge composition at the core. These C₂H₄-mediated Ge dots, almost bounded by {1 1 3} facets, have an average diameter and height of 55 and 9 nm, respectively. We propose two major mechanisms to depict the formation of these C₂H₄-mediated Ge dots: (i) an almost hydrogen-passivated Si surface to limit the nucleation sites for dot formation, and (ii) the incorporation of Ge atoms, repelled by the C-rich areas, into the existing Ge dots. This work provides a useful scheme to tune the topography of Ge dots in an UHV/CVD condition for possible optoelectronic applications.     

Structural and electronic properties of PbTe (rocksalt)/CdTe (zinc-blende) interfaces

We study interfaces between highly ionic crystals with different crystal structure by first-principles total-energy calculations in the repeated-slab approximation and compare the results with experimental data extracted from high-resolution transmission electron micrographs. The non-polar (1 1 0) interface between PbTe (rocksalt) and CdTe (zinc-blende) crystals gives rise to a lateral spatial offset between the two crystal halves. At the polar (1 0 0) interfaces a strong variation of the interface extent with respect to the cation or anion termination is observed. Furthermore, we calculate band offsets and projected interface band-structures for PbTe/CdTe interfaces. The results are discussed versus the interface orientation.     

Formation of mismatched layers in pentagonal nanorods

A new mechanism is presented to model the relaxation phenomena in pentagonal nanorods (PNRs) – elongated multiple twinned crystals. It is demonstrated that a shell possessing crystal mismatch with respect to the PNR core region will reduce the internal energy of the PNR associated with wedge disclinations of strength 7°20′ lying along the PNR axis. We predict the existence of an optimal magnitude for core/shell crystal lattice mismatch and an optimal shell thickness providing maximum energy release for this mechanism of mechanical stress relaxation. The considered relaxation mechanism can be realized by the diffusion of impurities in the shell region without change of the PNR radius or by growth of a thin mismatched shell layer with the corresponding thickening of PNR. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Formation mechanisms of GaN nanorods grown on Si(1 1 1) substrates

Scanning electron microscopy (SEM) images, transmission electron microscopy (TEM) images, and selected-area electron diffraction (SAED) patterns showed that vertically well aligned GaN nanorods with c-axis-oriented crystalline wurzite structures were grown on Si(1 1 1) substrates by using hydride vapor phase epitaxy. The high-resolution TEM (HRTEM) images showed that the crystallized GaN nanorods contained very few defects and that they were consisted of , {0 0 0 1}, and { } facets. The formation mechanisms for the GaN nanorods grown on Si(1 1 1) substrates are described on the basis of the SEM, TEM, SAED pattern, and HRTEM results.     

Evolution of Ge and SiGe Quantum Dots under Excimer Laser Annealing

We present different relaxation mechanisms of Ge and SiGe quantum dots under excimer laser annealing. Investigation of the coarsening and relaxation of the dots shows that the strain in Ge dots on Ge films is relaxed by dislocation since there is no interface between the Ge dots and the Ge layer, while the SiGe dots on Si0.77Ge0.23 film relax by lattice distortion to coherent dots, which results from the obvious interface between the SiGe dots and the Si0.77Ge0.23 film. The results are suggested and sustained by Vanderbilt and Wickham＇s theory, and also demonstrate that no bulk diffusion occurs during the excimer laser annealing.     

Heterojunction light emitting diodes fabricated with different n-layer oxide structures on p-GaN layers by magnetron sputtering

We grew heterojunction light emitting diode (LED) structures with various n-type semiconducting layers by magnetron sputtering on p-type GaN at high temperature. Because the undoped ZnO used as an active layer was grown under oxygen rich atmosphere, all LED devices showed the EL characteristics corresponding to orange-red wavelength due to high density of oxygen interstitial, which was coincident with the deep level photoluminescence emission of undoped ZnO. The use of the Ga doped layers as a top layer provided the sufficient electron carriers to active region and resulted in the intense EL emission. The LED sample with small quantity of Mg incorporated in MgZnO as an n-type top layer showed more intense emission than the LED with ZnO, in spite of the deteriorated electrical and structural properties of the MgZnO film. This might be due to the improvement of output extraction efficiency induced by rough surface.     

Formation and Shape Transition of Nanostructures on Si(100) surfaces after MeV Sb Implantation

We have studied the formation of nanostructures on Si(100) surfaces after 1.5 MeV Sb implantation. Scanning Probe Microscopy has been utilized to investigate the ion implanted surfaces. We observe the formation of nanostructures after a fluence of 1×10¹³ ions/cm². These surface structures are elliptical in shape with an eccentricity of 0.86 and their major and minor axes having dimensions of about 11.6 nm and 23.0 nm, respectively. The area of the nanostructure is 210 nm²at this fluence. Although the nanostructures remain of elliptical shape, their area increase with increasing fluence. However, after a fluence of 5×10¹⁴ ions/cm² a transition in shape of nanostructures is observed. Nanostructures become approximately circular with an eccentricity of 0.19 and a diameter of about 30.1 nm. At this fluence we also observe a large increase in the area of the nanostructures to 726 nm². Surface morphology and surface roughness of the ion implanted surfaces has also been discussed.     

Crystalline quality of 3C-SiC formed by high-fluence C-implanted Si

Carbon ions at 40 keV were implanted into (1 0 0) high-purity p-type silicon wafers at 400 °C to a fluence of 6.5 × 10¹⁷ ions/cm². Subsequent thermal annealing of the implanted samples was performed in a diffusion furnace at atmospheric pressure with inert nitrogen ambient at 1100 °C. Time-of-flight energy elastic recoil detection analysis (ToF-E ERDA) was used to investigate depth distributions of the implanted ions. Infrared transmittance (IR) and Raman scattering measurements were used to characterize the formation of SiC in the implanted Si substrate. X-ray diffraction analysis (XRD) was used to characterize the crystalline quality in the surface layer of the sample. The formation of 3C-SiC and its crystalline structure obtained from the above mentioned techniques was finally confirmed by transmission electron microscopy (TEM). The results show that 3C-SiC is directly formed during implantation, and that the subsequent high-temperature annealing enhances the quality of the poly-crystalline SiC.     

Carrier gas effects on the SiGe quantum dots formation

SiGe quantum dots (QDs) grown by ultra-high vacuum chemical vapor deposition using H₂ and He carrier gases are investigated and compared. SiGe QDs using He carrier gas have smaller dot size with a better uniformity in terms of dot height and dot base as compared to the H₂ carrier gas. There is a higher Ge composition and less compressive strain in the SiGe QDs grown in He than in H₂ as measured by Raman spectroscopy. The Ge content is higher for He growth than H₂ growth due to hydrogen induced Si segregation and the lower interdiffusivity caused by the more strain relaxation in the He-grown SiGe dots. The photoluminescence also confirms more compressive strain for H₂ growth than He growth. Hydrogen passivation and Ge-H cluster formation play an important role in the QDs growth.     

Atomistic simulation of the point defects in B2-type MoTa alloy

The formation and migration mechanisms of three different point defects (mono-vacancy, anti-site defect and interstitial atom) in B₂-type MoTa alloy have been investigated by combining molecular dynamics (MD) simulation with modified analytic embedded-atom method (MAEAM). From minimization of the formation energy, we find that the anti-site defects Mo_Ta and Ta_Mo are easier to form than Mo and Ta mono-vacancies, while Mo and Ta interstitial atoms are difficult to form in the alloy. In six migration mechanisms of Mo and Ta mono-vacancies, one nearest-neighbor jump (1NNJ) is the most favorable due to its lowest activation and migration energies, but it will cause a disorder in the alloy. One next-nearest-neighbor jump (1NNNJ) and one third-nearest-neighbor jump (1TNNJ) can maintain the ordered property of the alloy but require higher activation and migration energies, so the 1NNNJ and 1TNNJ should be replaced by straight [1 0 0] six nearest-neighbor cyclic jumps (S[1 0 0]6NNCJ) or bent [1 0 0] six nearest-neighbor cyclic jumps (B[1 0 0]6NNCJ) and [1 1 0] six nearest-neighbor cyclic jumps ([1 1 0]6NNCJ), respectively. Although the migrations of Mo and Ta interstitial atoms need much lower energy than Mo and Ta mono-vacancies, they are not main migration mechanisms due to difficult to form in the alloy.     

Strain-symmetrized Si/SiGe multi-quantum well structures grown by molecular beam epitaxy for intersubband engineering

Three strain-symmetrized Si/SiGe multi-quantum well structures, designed for probing the carrier lifetime of intrawell intersubband transitions between heavy hole 1 (HH1) and light hole 1 (LH1) states with transition energies below the optical phonon energy, were grown by molecular beam epitaxy at low temperature on fully relaxed SiGe virtual substrates. The grown structures were characterized by using various experimental techniques, showing a high crystalline quality and very precise growth control. The lifetime of the LH1 excited state was determined directly with pump-probe spectroscopy. The measurements indicated an increase of the lifetime by a factor of ∼2 due to the increasingly unconfined LH1 state, which agreed very well with the design. It also showed a very long lifetime of several hundred picoseconds for the holes excited out of the well to transit back to the well through a diagonal process.     

Effect of alkali leaching on the surface structure of Ni3Al catalyst

The surface structure of the alkali-leached single-phase Ni₃Al powder was investigated by X-ray diffraction, BET (Brunauer-Emmett-Teller) surface area analysis, electron microscopy, X-ray photoelectron spectroscopy, and temperature-programmed reduction. It was found that fine Ni particles of several nm in diameter were formed on the outer surface layer of the Ni₃Al powder after the alkali leaching process. The surface of the Ni particles was covered with a thin layer of Ni oxides and hydroxide, Ni₂O₃, NiO and Ni(OH)₂, and these Ni oxides and hydroxide can be easily reduced by hydrogen to the metallic nickel that is catalytically active. The inside of the Ni₃Al powder remained as the original Ni₃Al ordered structure after alkali leaching. Having heat resistant properties, the Ni₃Al phase can serve as a support of the fine Ni particles and provide the structural and thermal stabilities to the fine Ni particles.     

Effects of thermal treatment on the morphology of Alq3 thin layers on Si(1 1 1) substrate

Alq₃ thin layers were vapor deposited onto a single crystal of Si(1 1 1) and the morphology of the surface was investigated by the scanning tunneling microscope under ultrahigh vacuum conditions. The STM imaging showed considerable influence of the thermal processing onto the topography of the sample. Slowly raising the sample temperature to ∼160 °C caused a complete desorption of Alq₃ molecules and uncovering the clean surface of Si(1 1 1). A fast rise of the temperature (flashing) to ∼600 °C led to decomposition of the Alq₃ and resulted in remnants of a carbon-rich surface species. Then heating or flashing this surface to a temperature in excess of 1000 °C brought about the occurrence of regular shape object on the Si(1 1 1) surface.     

Nanointegration of ZnO with Si and SiC

The study is dedicated to some aspects of the controlled heteroepitaxial growth of nanoscaled ZnO structures and an investigation of their general and dimension mediated properties. ZnO nanostructures were synthesized by optimized MOCVD process via two growth approaches: (i) catalyst free self-organized growth of ZnO on Si substrates and (ii) ZnO heteroepitaxy on p-type hexagonal 4H-SiC substrates. The SiC substrate was prepared by sublimation epitaxy and served as a template for the ZnO epitaxial growth. The epitaxial growth of n-ZnO on p-SiC resulted in a regular matrix of well-faceted hexagonally shaped ZnO single crystals. The achievement of ZnO integration with Si encompasses controlled growth of vertically oriented nanosized ZnO pillars. The grown structures were characterized by transmission electron microscopy and microphotoluminescence. Low concentration of native defects due to a stoichiometry balance, advanced optical emission, (excitonic type near-band-edge emission and negligible defect related luminescence) and continuous interfaces (epitaxial relationship ZnO_[0 0 0 1]/SiC_[0 0 0 1]) are evidenced. The ZnO nanopillars were further probed as field emitters: the grown structures exhibits advanced field emission properties, which are explained in term of dimensionality and spatial uniformity of the nanopillars. The present results contribute to understanding and resolving growth and device related issues of ZnO as a functional nanostructured material.     

New fabrication of a strained Si/Si1−yGey dual channel on a relaxed Si1−xGex virtual substrate using a Ge-rich layer formed by oxidation

This paper presents a new method of forming a Si/SiGe dual channel on a Si_0.8Ge_0.2 virtual substrate. Generally, in a CMOS process using a Si/SiGe dual channel, due to several processes involving ion-implantation, annealing and dry-etching after the deposition of the Si/SiGe dual channel, the surface can be damaged, leading to reduced electrical properties. However, if the dual channel is formed during a specific stage of the CMOS process, the defects of the dual channel can be reduced and the thermal stability will be excellent. Therefore, in this paper, a method for minimizing the defects of the dual channel is presented. This method uses the segregation of the Ge in the oxidation process of a SiGe. A Si/SiGe dual channel formed using this method achieved results that were identical to a dual channel deposited using the chemical vapor deposition (CVD) method.     

Atomic structure of pre‐Guinier–Preston zones in Al alloys

We propose X‐ray absorption (XAS) measurements as a novel approach to determine the atomic structure of pre‐Guinier–Preston zones. These nano‐clusters are formed during very early stages of aging AlCu alloys, immediately after solution heat treatment and quenching. X‐ray absorption near‐edge structure (XANES) spectra were taken from technical aluminum alloys at the copper K edge, revealing the local atomic environment of copper. The spectra of – after solution heat treatment – freshly quenched and of artificially aged alloys differ significantly from each other. We compare the measured XANES spectra with those calculated by the FEFF‐8 code. We show the importance of employing realistic, i.e. relaxed, atomic coordinates around the scattering atom type from ab‐initio calculations with SIESTA. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

     

Structure and topography modifications of austenitic steel surfaces after friction in sliding contact

Friction experiments between two austenitic stainless steel (AISI 304L) surfaces in sliding contact were carried out under very low loads in two liquid environments, namely demineralized water and methanol, in order to study the correlation between surface damage (wear and surface topography) and structural modifications (phase formation and microstructure). The particularity of our approach was to perform the tests under Hertzian pressures, which were several orders of magnitude lower than the elastic limit of stainless steel. The structural modifications produced during friction were analysed by X-ray diffraction and transmission electron microscopy and the surface topography was studied by scanning electron microscopy and three-dimensional (3D) profiling. Whatever the experimental conditions investigated, the morphology of the damage observed on both surfaces consisted of very fine, smooth and parallel grooves typical of an abrasive wear process of a ductile material caused by the ploughing action of hard particles. From the beginning of the tests, the transformation of austenite into martensite was observed in the superficial layers and the dominant presence of martensite was identified in the wear debris. These results suggest that, under our experimental conditions, abrasion is the dominant mechanism of material removal. Received: 12 March 2002 / Accepted: 3 May 2002 / Published online: 10 September 2002 RID="*" ID="*"Corresponding author. Fax: +33-5/4949-6692, E-mail: jean.paul.riviere@univ-poitiers.fr