Influence of thermal annealing on the composition and structural parameters of DC magnetron sputtered titanium dioxide thin films

Titanium dioxide films have been deposited using DC magnetron sputtering technique. Films were deposited onto RCA cleaned p‐silicon substrates at the ambient temperature at an oxygen partial pressure of 7 × 10^–5 mbar and sputtering pressure of 1 × 10 ^–3 mbar. The deposited films were annealed in the temperature range 673–873 K. The structure and composition of the films were confirmed using X‐ray diffraction and Auger electron spectroscopy. The structure of the films deposited at the ambient was found to be amorphous and the films annealed at 673 K and above were crystalline with anatase structure. The lattice constants, grain size, microstrain and the dislocation density of the film are calculated and correlated with annealing temperature.     

Amorphous and nanocrystalline silicon made by varying deposition pressure in PECVD process

Silicon thin films are deposited using plasma enhanced chemical vapor deposition (PECVD) of silane, argon, hydrogen mixture at various pressures in the range of 2–8 Torr. Raman scattering shows these to be amorphous in the pressure range 6–8 Torr, and nanocrystalline in the range 2–4 Torr. The volume fraction of nanocrystals is estimated by fitting the Raman data to three peaks and is found to be ～75% for the films deposited at low pressure, density of states of these films was measured. It is observed that the electrical conduction in these films depends on the crystalline volume fraction (ρ), estimated from the laser Raman Spectroscopy. Temperature dependence electrical conductivity shows that at lower temperatures thermionic emission dominates for the films with lower ρ, whereas, hopping is the main conduction mechanism for the films having high ρ. The density of states is estimated from the space charge limited currents (SCLC) observed at high fields. Photoconductivity at room temperature is also measured. The amorphous films are found to be more photosensitive than the nanocrystalline one. In the context of these findings, changes in the properties of silicon from amorphous to nanocrystalline are described.     

Hopping conduction in amorphous Nb2O5 thin films

The low field conduction mechanism in amorphous Nb₂O₅ doped with Nb is investigated by measurements of the ac conductivity as a function of frequency (3 Hz?6 × 10⁶ Hz), dc conductivity as a function of temperature (100–400 K), capacitance as a function of frequency (3 Hz?6 × 10⁶ Hz) and conductance G as a function of voltage at 10³ Hz. Loss tangent and quality factor data are also given because of their technical and scientific relevance. Evidence for hopping conduction at low applied fields is presented by the following results: (1) a monotonic increase in ac conductivity σ(ω)αωⁿ where 0.5 < n < 1.0 in the range 3 Hz?6 × 10⁶ Hz; (2) a linear dependence of current on voltage at low fields; and (3) low activation energy for dc conduction with a transition at 210 K to a still lower activation energy; and (4) a decrease in polarizability with frequency. At high fields, E > 10⁵ V/cm, dc conductivity is dominated by the field emission mechanism of the Poole-Frenkel or Poole type.     

Effect of vacuum annealing on charge transport and trapping in a-Si1 − xCx:H/c-Si heterostructures

The processes of charge transport and trapping in amorphous Si_1 ? xC_x:H films deposited on crystalline p-type Si wafers and annealed in vacuum in the temperature range 300–650 °C have been evaluated. Current–voltage (I–V), capacitance–voltage (C–V) and admittance–temperature (G–T) characteristics were measured in the temperature range 100–350 K. The spectrum of thermal effusion of hydrogen was measured from room temperature up to 1000 °C.C–V characteristics indicate a slight increase of the dielectric constant k and a large hysteresis after annealing at 450 °C. The hysteresis is believed to be associated with mobile hydrogen effusion from the a-SiC:H film, and it is not seen after a 650 °C anneal. From I–V data the maximum rectification ratio is observed after annealing at 450 °C. Variable-range hopping (VRH) conduction at the Fermi level is found to dominate the forward current of the as-deposited structure. After annealing at 450 °C the forward current can be described by space-charge limited (SCL) mechanisms with trapping at shallow levels with energy of about 0.12 eV. After annealing at 650 °C the process of VRH conduction appears again, but the density of hopping sites is much higher than in the as-grown sample. From admittance spectra, the energy position of respective traps in a-SiC:H is at (E_V + 0.45) eV for as-deposited material and it decreases slightly after vacuum annealing. On the basis of these results, an energy band diagram of the a-Si_1 ? xC_x:H/p-Si structure annealed at 450 °C is proposed.     

The effects of oxygen,hydrogen and fluorine on the conductivity of high purity evaporated amorphous silicon films

Electron bombardment evaporation was used to deposit amorphous silicon (α-Si) films in an evaporator with a base pressure of 2 × 10^?10 Torr. Rutherford backscattering analysis was used to establish the conditions necessary for deposition of pure films.The DC conductivity was measured as a function of temperature (? 150°C to + 140°C). Pure films, which were deposited between room temperature and 400°C, were found to have a room temperature conductivity (σ_RT) in the region of 10^?3μ^?1cm^?1 and a log $\text{σα}\text{T}{}^{\mathrm{<mtext>1</mtext><mtext>4</mtext>}}$ dependence. The value of σ_RT could be reduced by annealing reaching a minimum of 2 × 10^?7μ^?1 cm^?1 for an anneal temperature (T_A) of 520°C, but activated conduction was not observed.The implantation of hydrogen or fluorine (or contamination with oxygen) had the effect of reducing σ_RT, with a minimum value of less than 10^?8μ^?1cm^?1 (T_A = 400°C) for fluorine implantation to a dose of ≈ 10¹⁶ cm² (≈ 0.4 at% concentration). These films had high temperature (50°C) activation energies typical of activated conduction in extended states on the edge of the mobility gap. Implantation of fluorine to a dose of 1.5 × 10¹⁷ resulted in a rise of σ_RT (T_A = 400°C) to nearly 10⁴μ^?1 cm^?1 and log $\text{σα}\text{T}{}^{\mathrm{<mtext>?1</mtext><mtext>4</mtext>}}$ behaviour.X-ray analysis revealed that some crystallization occurred in films annealed at 600°C. This is correlated with a rise in σ_RT of the pure films and the disappearance of the effects of the introduced impurities.     

Ionic jump processes and high field conduction in glasses

A theory of multiple-ion jumps is proposed to explain the large apparent jump distances which have been calculated from high field conduction in glasses. An analysis of published data on correlation coefficients suggests that multiple ion jumps up to about four ions at a time may occur in single-alkali glasses. In mixed-alkali glasses such processes are shown to be less probable. Measurements of high field conductivity were made on both single- and mixed-alkali glasses, using blown membranes between N/10 acid solutions. The onset of departures from Ohm's law occurred at fields of about 10⁷ V m^?1 from which a jump distance of about 25–30 Å is calculated. This is too large for the proposed multiple-ion jump processes suggested, and, furthermore, the high field currents followed the Poole-Frenkel (PF) law. An alternative theory is given in which the PF law is derived for ionic migration: shallow coulombic potential basins are assumed to be distributed throughout the volume of the glass, owing to non-bridging oxygens whose charge is not balanced by cations on adjacent sites.     

Study on the device characteristics of FePc and FePcCl organic thin film Schottky diodes: Influence of oxygen and post deposition annealing

Device characteristics of Al/FePc/Au and Al/FePcCl/Au are performed and found to show rectification properties. The basic diode parameters of the device are determined. The electrical conductivity has been measured both after exposure to oxygen for 20 days and after annealing at temperature up to 473 K. Current density-voltage characteristics under forward bias are found to be due to ohmic conduction at lower voltage regions. At higher voltage regions there is space charge limited conductivity (SCLC) controlled by a discrete trapping level above the valance edge. The electrical parameters of oxygen doped and annealed samples in the ohmic and SCLC region are determined. The reverse bias curves are interpreted in terms of a transition from electrode-limited Schottky emission to the bulk-limited the Poole-Frenkel effect. The Schottky barrier parameters of oxygen doped and annealed structures of FePc and FePcCl are determined from the C²-V characteristics.     

Influence of annealing on the physical properties of filtered vacuum arc deposited tin oxide thin films

Tin oxide (SnO₂) thin films were deposited on UV fused silica (UVFS) substrates using filtered vacuum arc deposition (FVAD). During deposition, the substrates were at room temperature (RT). As-deposited films were annealed at 400 and 600 °C in Ar for 30 min. The film structure, composition, and surface morphology were determined as function of the annealing temperature using X-ray diffraction (XRD), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). The XRD patterns of the SnO₂ thin films deposited on substrates at RT indicated that the films were amorphous, however, after the annealing the film structure became polycrystalline. The grain size of the annealed films, obtained from the XRD analysis, increased with the annealing temperature, and it was in the range 8-34 nm. The AFM analysis of the surface revealed an increase in the film surface average grain size from 15 nm to 46 nm, and the surface roughness from 0.2 to 1.8 nm, as function of the annealing temperature. The average optical transmission of the films in the visible spectrum was >80%, and increased by the annealing ∼10%. The films’ optical constants in the 250-989 nm wavelength range were determined by variable angle spectroscopic ellipsometry (VASE). The refractive indexes of as-deposited and annealed films were in the range 1.83-2.23 and 1.85-2.3, respectively. The extinction coefficients, k(λ), of as-deposited and annealed films were in the range same range ∼0-0.5. The optical energy band gap (E_g), as determined by the dependence of the absorption coefficient on the photon energy at short wavelengths, increased with the annealing temperature from 3.90 to 4.35 eV. The lowest electrical resistivity of the as-deposited tin oxide films was 7.8 × 10⁻³ Ω cm, however, film annealing resulted in highly resistive films.     

DC current transport in rf sputtered SiO2 films in the temperature range 77–357 K

The dc current conduction in rf sputtered SiO₂ films has been studied in the temperature range 77–357 K with electric fields up to 9 × 10⁷V m^?1. Nonlinear current voltage characteristics have been observed. Two activation energies of about 0.3 eV and 0.03 eV appear in the high and low temperature ranges respectively. Different transport mechanisms are discussed. The Poole-Frenkel effect would not be applicable. The most probable mechanism is electron hopping between defect states but with deformation of the surroundings.     

Optical and electrical properties of as-prepared and annealed (Se80Te20)100 − xAgx (0 ≤ x ≤ 4) ultra-thin films

Optical and electrical properties of the (Se₈₀Te₂₀)_100 ? xAg_x (0 ≤ x ≤ 4) ultra-thin films have been studied. The ultra-thin films were prepared by thermal evaporation of the bulk samples. Thin films were annealed below glass transition temperature (328 K) and in between glass transition temperature and crystallization temperature (343 K). Thin films annealed at 343 K showed crystallization peaks for Se–Te–Ag phases in the XRD spectra. The transmission and reflection of as-prepared and annealed ultra-thin films were obtained in the 300–1100 nm spectral region. The optical band gap has been calculated from the transmission and reflection data. The refractive index has been calculated by the measured reflection data. It has been found that the optical band gap increases, but the refractive index, extinction coefficient, real and imaginary dielectric constant decrease with increase in Ag content. The optical band gap and refractive index show the variation in their values with increase in the annealing temperature. The extinction coefficient increases with increasing annealing temperature. The surface morphology of ultra-thin films has been determined using a scanning electron microscope (SEM). The measured dc conductivity, under a vacuum of 10^? 5 mbar, showed thermally activated conduction with single activation energy in the measured temperature range (288–358 K) and it followed Meyer–Neldel rule. The dc activation energy decreases with increase in Ag content in pristine and annealed films. The results have been analyzed on the bases of thermal annealing effects in the chalcogenide thin films.     

Heat treatment induced structural and optical properties of rf magnetron sputtered tantalum oxide films

Rf magnetron sputtering technique was employed for preparation of tantalum oxide films on quartz and crystalline silicon (111) substrates held at room temperature by sputtering of tantalum in an oxygen partial pressure of 1x10^‐4 mbar. The films were annealed in air for an hour in the temperature range 573 – 993 K. The effect of annealing on the chemical binding configuration, structure and optical absorption of tantalum oxide films was systematically studied. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

High field effects in amorphous germanium

Measurements of high field current have been made on amorphous Ge (a-Ge) films over the temperature range from 100 to 300 K. Non-ohmic conduction in a-Ge occurs at electric fields greater than 1–2 × 10⁴ V/cm. Field dependence of the conductivity has been explained in terms of the enhanced emission probability of carriers from the screened coulombic trap centers. Assuming the optical dielectric constant for a-Ge films, the screening length of the trap centers and the density of states at the Fermi level are estimated to be 12 Å and ～6.1 × 10²⁰ cm^?3 eV^?1, respectively.     

Metastable effects in silicon thin films: Atmospheric adsorption and light-induced degradation

The effects of exposure to atmosphere (ageing) and light-soaking on coplanar dark- and photo-conductivity of silicon films of varying crystallinity are examined. Dark conductivity generally increases on ageing in films with significant amorphous fraction and decreases in largely crystalline films, and may be reversed by annealing under vacuum at 130 °C consistent with adsorption and desorption of atmospheric components. Thinner films are more strongly affected by ageing. Boron doping appears to compensate charge introduced by ageing, though there are disagreements in detail. In comparison with ageing, moderate light-soaking affects dark conductivity in transitional microcrystalline silicon films only slightly. Both processes change the majority carrier mu–tau product in line with shifts in Fermi level position.     

Electrical,structural and optical properties of amorphous carbon

The planar and transverse electrical resistivity of amorphous carbon (a-C) films getter-sputtered at low temperature (77–95 K) is well-fitted by the expression $\text{? = ?}{}_0\text{exp}\text{(T}{}_0\text{/T)}{}^{\mathrm{<mtext>1</mtext><mtext>4</mtext>}}$ The exponent T₀ being approximately the same in both cases (≈ 7 × 10⁷ K) suggests that the amorphous films are isotropic. Films thinner than 600 Å display a two-dimensional hopping conductivity from which one deduces a density of states N(E_F) at the Fermi level of 10¹⁸ eV^?1 cm^?3 and a radius of the localized wave functions (a) of 12 Å. Tunneling experiments and optical absorption measurements are consistent with a pseudogap of approximately 0.8 eV. Electron diffraction experiments indicate that a-C films consist of a mixture of diamond and graphite bonds; this fact taken in the light of the other experiments would suggest that the graphite bonds act as the localized conduction states.     

Electrical properties of AsxSe1−x (x ≤ 0.05) Mott-barriers

We have experimentally measured the current-voltage and capacitance-voltage characteristics of Au/amorphous As_xSe_1 − x (x ≤ 0.05)/Zr trilayer structures at temperatures from 4 to 295 K. The observed capacitance of structures with an amorphous As_xSe_1 − x (a-As_xSe_1 − x) thickness of ~ 0.4 to ~ 2.8 μm does not significantly change over the entire range of applied bias (− 5 V to 5 V), indicating that the a-As_xSe_1 − x films are fully depleted and thus the structures are Mott barriers. The current-voltage (I-V) characteristics of the a-As_0.03Se_0.97 device at low (< 3000 V/cm) to moderate fields (3000 V/cm-10000 V/cm) follow the predictions of trap limited space charge conduction theory, as they exhibit Ohmic behavior at low fields and trap limited space charge current at moderate fields. According to the trap limited space charge current model of Lampert, the a-As_0.03Se_0.97 film has an effective hole mobility, Θμ (with Θ < 1), of ~ 5 × 10^− 7 cm²/V-sec at 295 K. This value is similar to, but consistently lower than previously reported mobilities inferred from time of flight measurements. The current at high fields (> 10⁴ V/cm) increases rapidly with applied field as a result of carrier emission from localized states and is consistent with transport by the Poole-Frenkel mechanism. A permanent transition to a high conductance state (~ 10^− 3 S) is observed after exposure to very high electric fields (~ 4 × 10⁵V/cm).     

Improving the performance of amorphous and crystalline silicon heterojunction solar cells by monitoring surface passivation

The influence of thermal annealing on the crystalline silicon surface passivating properties of selected amorphous silicon containing layer stacks (including intrinsic and doped films), as well as the correlation with silicon heterojunction solar cell performance has been investigated. All samples have been isochronally annealed for 1 h in an N₂ ambient at temperatures between 150 °C and 300 °C in incremental steps of 15 °C. For intrinsic films and intrinsic/n-type stacks, an improvement in passivation quality is observed up to 255 °C and 270 °C, respectively, and a deterioration at higher temperatures. For intrinsic/n-type a-Si:H layer stacks, a maximum minority carrier lifetime of 13.3 ms at an injection level of 10¹⁵ cm^? 3 has been measured. In contrast, for intrinsic/p-type a-Si:H layer stacks, a deterioration in passivation is observed upon annealing over the whole temperature range. Comparing the lifetime values and trends for the different layer stacks to the performance of the corresponding cells, it is inferred that the intrinsic/p-layer stack is limiting device performance. Furthermore, thermal annealing of p-type layers should be avoided entirely. We therefore propose an adapted processing sequence, leading to a substantial improvement in efficiency to 16.7%, well above the efficiency of 15.8% obtained with the ‘standard’ processing sequence.     

Surface morphology of spin-coated As–S–Se chalcogenide thin films

Surface morphology and roughness of amorphous spin-coated As–S–Se chalcogenide thin films were determined using atomic force microscopy. Prepared films were coated from butylamine solutions with thicknesses d ∼ 100 nm and then annealed in a vacuum furnace at 45 °C and 90 °C for 1 h for their stabilization. The root mean square surface roughness analysis of surfaces of as-deposited spin-coated As–S–Se films indicated a very smooth film surface (with R_q values 0.42–0.45 ± 0.2 nm depending on composition). The nanoscale images of as-deposited films confirmed that surface of the films is created by domains with dimensions 20–40 nm, which corresponds to diameters of clusters found in solutions. The domain character of film surfaces gradually disappeared with increasing annealing temperature while the solvent was removed from the films. Middle-infrared transmission spectra recorded a decrease of intensities of vibration bands connected to N–H (at 3367 and 3292 cm⁻¹) and C–H (at 2965, 2935 and 2880 cm⁻¹) stretching vibrations. Temperature regions of solvent evaporation T = 60–90 °C and glass transformation temperatures T_g = 135–150 °C of spin-coated As–S–Se thin films were determined using a modulated differential scanning calorimetry.     

Effects of post-annealing on electrical properties of amorphous Ga-doped Zn–Sn–O semiconductor films

We investigated the effect of post-annealing on the electrical properties of amorphous gallium-zinc-tin oxide (a-GZTO) films with different Ga contents. The films were deposited at room temperature by sputtering and annealed in air for 1 h. It was found that the doping with Ga, which acts as the carrier suppressor, contributes to the thermal stability of characteristic properties of a-GZTO thin films. The film with a small amount of Ga showed significant variations in carrier concentration according to the annealing temperature. Increases in carrier concentration and mobility can be ascribed to the reduction of subgap density of states by annealing. After annealing at 400 °C, however, the enrichment of Zn cations in surface region resulted in considerable changes in chemical bonding states and consequently, the carrier concentration decreased by two orders of magnitude for the low Ga-doped ZTO film.     

Effect of substrate temperature on the properties of vacuum evaporated indium selenide thin films

Thin films of InSe were obtained by thermal evaporation techniques on glass substrates maintained at various temperatures (T_sb = 30°, 400°C). X‐ray diffraction analysis showed the occurrence of amorphous to polycrystalline transformation in the films deposited at higher substrate temperature (400°C). The polycrystalline films were found to have a hexagonal lattice. Compositions of these films have been characterized by EDAX and the surface analysis by scanning electron microscopy. Optical properties of the films, investigated by using spectrophotometer transmittance spectra in the wavelength range (300 – 1100 nm), were explained in terms of substrate temperatures. Films formed at room temperature showed an optical band gap (E_g^opt) 1.56 eV; where as the films formed at 400°C were found to have a E_g^opt of 1.92 eV. The increase in the value of E_g^opt with T_sb treatment is interpreted in terms of the density of states model as proposed by Mott and Davis. The analysis of current ‐Voltage characteristics, based on space charge limited currents (SCLC) measurements, confirms the exponential decrease of density of states from the conduction band edge towards the Fermi level for both the amorphous and polycrystalline films. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)