大相对孔径紫外成像仪光学系统设计

为解决目前大多数紫外成像仪存在的定位和指向精度差、色差较大、分辨率及光能利用率不足等问题,设计了一款高分辨率的大孔径消色差紫外光学系统。首先,根据电晕放电检测的应用需求,提出了紫外光学系统的总体设计。然后利用熔石英及氟化钙两种材料的不同色散特性,根据改进的双胶合透镜结构设计了一款大孔径的消色差紫外光学系统,并对该系统进行了公差分析。设计的紫外光学系统在全视场全探测范围内点列图均方根直径0.08 mm,分辨率为20 lp/mm,满足电力行业中对电晕探测的需求。     

真空紫外到深紫外波段基底材料的光学特性

研究了真空紫外到深紫外波段常用的基底材料,给出了常用基底材料的光学特性和在真空紫外波段的截止波长,测量了这些材料在120~500 nm的透过率,给出了通过透过率计算弱吸收基底光学常数的计算方法,并用该方法得到了熔石英、氟化镁晶体、氟化钙晶体、氟化锂晶体在120~500 nm的折射率和消光系数,对这些常用基底的使用范围和特点进行了一定的比较和分析,并将所得基底的光学常数与公开发表的文献进行了比较,证明了所得结果的可靠性。     

球面镜真空紫外光谱反射率的高精度测量

为了实现对球面镜真空紫外光谱反射率的直接测量,构建了一套真空紫外光谱反射率测试系统。该系统以氟化镁窗口氘灯与Seya-Namioka凹面光栅单色仪产生单色光源,反射式调制器与参考探测器做光学补偿,内径80mm的荧光积分球与精密转台作为接收系统。光学补偿消除单色光源不稳定性,荧光积分球消除了两次测量光斑不同对探测器响应的影响,且减少了系统的能量损失。利用该系统测量了115～180nm球面镜的反射率,测试结果表明测量重复性优于±0.3%;按国际通用不确定度评估规范,对系统进行不确定度分析,相关不确定度小于1.3%。实现了球面镜反射率的高精度测量。     

Evolution of vacuum ultraviolet emission in dual-frequency capacitively coupled plasmas

In plasma material processing, vacuum ultraviolet (VUV) emission is released from gas discharges, leading to undesirable results. Energetic VUV photons enable the creation of an electron-hole pair current when their energy is larger than the bandgap energy of the plasma-facing top layer during plasma material processing. For example, the high energy of VUV photons from helium (21.2 eV), argon (11.6 eV), and oxygen (13.6 eV) is sufficient to generate induced currents in SiO₂ thin films. These feedstock gases are widely used in many procedures utilizing low-temperature industrial plasmas. Thus, the VUV emission evolution with both the power ratio between high (60 MHz) and low (2 MHz) frequencies and pulse duty ratio of the low-frequency radio frequency (rf) power in a dual-frequency capacitively coupled plasma, which is indispensable in modern plasma etching processes, was investigated. Both the power ratio between high and low frequencies and the pulse duty ratio changed the electron temperature, leading to evolution of the VUV emission intensity.     

真空紫外到深紫外波段基底材料的光学特性

 研究了真空紫外到深紫外波段常用的基底材料,给出了常用基底材料的光学特性和在真空紫外波段的截止波长,测量了这些材料在120~500 nm的透过率,给出了通过透过率计算弱吸收基底光学常数的计算方法,并用该方法得到了熔石英、氟化镁晶体、氟化钙晶体、氟化锂晶体在120~500 nm的折射率和消光系数,对这些常用基底的使用范围和特点进行了一定的比较和分析,并将所得基底的光学常数与公开发表的文献进行了比较,证明了所得结果的可靠性。     

First observation of natural circular dichroism spectra in the extreme ultraviolet region using a polarizing undulator‐based optical system and its polarization characteristics

Natural circular dichroism (CD) spectra in the extreme ultraviolet (EUV) region down to a wavelength of 80 nm have been observed for the first time, using an alanine thin film deposited on sodium salicylate coated glass as a sample. Calibrated EUV‐CD spectra of l ‐alanine exhibited a large negative peak at around 120 nm and a positive CD signal below 90 nm, which were roughly predicted by theoretical calculations. A CD measurement system with an Onuki‐type polarizing undulator was used to obtain the EUV‐CD spectra. This CD system, the development of which took five years, can be used to observe even weak natural CD spectra. The polarization characteristics of this system were also evaluated in order to calibrate the recorded CD spectra.     

Size-dependent photoluminescence properties under vacuum ultraviolet excitation of Zn2SiO4:Mn nanophosphors

The Zn₂SiO₄:Mn²⁺ nanophosphors with different particle sizes were synthesized via the hydrothermal method by adjusting the concentrations of surfactant and the hydrothermal temperature. The behavior of the photoluminescence as a function of phosphor particle sizes under vacuum ultraviolet excitation was investigated. Higher critical quenching concentration with decreasing particle size of the Zn₂SiO₄:Mn²⁺ nanophosphors was observed. This is ascribed to the hindrance of energy transfer between luminescence centers under vacuum ultraviolet excitation. The prolonged decay time in smaller samples provides further evidence that the energy transfer confinement has an effect on the photoluminescence properties.     

高分辨率星载真空紫外成像光谱仪设计与研究

为了实现对大气层中辐射波长分布在真空紫外和近紫外波段(115～300 nm)的粒子探测,完善大气遥感,设计了一种高分辨率成像光谱仪,并开展了原理样机的研制.根据国外已有载荷进行分析,选用了以离轴抛物镜为望远系统、Czerny-Tumer结构为成像光谱系统的光学方案;针对真空紫外波段辐射弱的特点选取了带有MCP的二维光子...     

真空紫外辐射对碳/环氧复合材料性能的影响

 介绍了真空紫外线的模拟和射流式真空紫外辐射模拟设备的工作原理、技术参数及特点,并利用该设备及其它分析手段对环氧树脂浇铸体(EP648)和碳/环氧复合材料(C/E648)在真空紫外线辐照作用下的出气、质量损失率、层间剪切强度和表面状态的变化进行了研究。试验结果表明：真空紫外线辐照导致材料产生明显的出气效应,质量损失率呈现先递增后趋于平缓的趋势;17 280esh辐照剂量下,EP648的质量损失是C/E648的3.4倍,C/E648的层间剪切强度与辐照前相比下降了13.3%;环氧树脂破损较重,而碳纤维表面状态基本完好,并对内部的环氧树脂起到一定的保护作用。     

A novel Raman optical activity instrument operating in the deep ultraviolet spectral region

Raman optical activity (ROA) has been exclusively observed in the visible (VIS) and near‐infrared (NIR) spectral regions to date. During the last few years, we have designed, constructed and tested the first ROA instrument, operating in the deep‐ultraviolet (DUV) spectral region employing 244‐nm excitation. This novel DUV ROA instrument is based on a backscattering geometry and incident circular polarization modulation (ICP); it makes use of a fast DUV imaging lens‐based spectrograph and specially designed DUV grade polarization optics. The performance of this instrument has been evaluated by analysing measured non‐resonant DUV ROA spectra of non‐absorbing enantiomeric liquid samples and by comparing these with corresponding ROA spectra recorded in the visible spectral region. Copyright © 2015 John Wiley & Sons, Ltd.     

A high power radiation source in the vacuum ultraviolet

A sliding spark over solid xenon has been developed with the object to serve as a vacuum-ultraviolet light source for the photoionization of gases, especially hydrogen and inert gases. An intensity of 1·10¹² Watt/cm³ sr at 800 Å has been observed, lasting about 5 μsec. The emitting area was approximately 1.6 cm². This light source has been used to irradiate a test gas of xenon at 0.4 m Torr. An electron density of 2·10¹² cm^?3 was detected at a distance of 80 cm with an 8 mm microwave interferometer.     

Photoreflectance system based on vacuum ultraviolet laser at 177.3 nm

Photoreflectance (PR) spectroscopy is a powerful and non-destructive experimental technique to explore interband transitions of semiconductors. In most PR systems, the photon energy of the pumping beam is usually chosen to be higher than the bandgap energy of the sample. To the best of our knowledge, the highest energy of pumping laser in reported PR systems is 5.08 eV (244 nm), not yet in the vacuum ultraviolet (VUV) region. In this work, we report the design and construction of a PR system pumped by VUV laser of 7.0 eV (177.3 nm). At the same time, dual-modulated technique is applied and a dual channel lock-in-amplifier is integrated into the system for efficient PR measurement. The system's performance is verified by the PR spectroscopy measurement of well-studied semiconductors, which testifies its ability to probe critical-point energies of the electronic band in semiconductors from ultraviolet to near-infrared spectral region.     

真空紫外波段光栅二级衍射效率测量装置

利用光栅二级衍射会影响反射样品光谱反射率结果的原理,通过计算不同光谱反射率获得了光栅二级衍射效率。介绍了测量二级衍射效率的实验装置,该装置采用双光路单色仪结构,使用已知光谱辐亮度氘灯作为光源,探测器为光电倍增管,通过水杨酸钠膜将紫外光转为可见光。以波长161nm为例,测量了5块反射镜样片,计算得到光栅二级衍射效率为0.00611×(1±0.0777)。分析表明,该方法采用的测试装置简单,系统不确定度为14.08%,可以实现真空紫外波段光栅二级光谱衍射效率的连续测量。     

真空紫外分波前傅里叶变换光谱技术进展

本文分析了真空紫外分波前傅里叶变换光谱技术原理、特点及其必要性,介绍了几种采用真空紫外分波前傅里叶变换光谱技术的光谱仪的代表性结构、性能和应用,探讨了国内真空紫外分波前傅里叶变换光谱技术的未来发展,为获得高分辨率真空紫外光谱提供了另一途径。     

Predictive estimation of vacuum ultraviolet emission intensity in a low-pressure inductively coupled hydrogen plasma based on the branching ratio technique

Vacuum ultraviolet (VUV) emission has recently attracted attention in low pressure processing plasmas because of the possibility of high-energy photon damages on the substrates. To quantify the VUV induced damages during the plasma processes, it is need to use of a VUV spectrometer equipped with vacuum systems not readily available in industries. In this work, therefore, we report a simple method to estimate the VUV emission intensity of hydrogen plasmas utilizing a conventional visible spectrometer widely used in plasma processes. From the measurement of hydrogen emission spectra in the visible wavelength region, the VUV emission line (Lyman-β) was calculated using the branching ratio technique and enabled the estimation of Lyman-α emission intensity based on the Boltzmann relation with given plasma parameters. In addition, it was found that the method could also predict the VUV emission intensity for high density hydrogen plasma cases by considering the self-absorption effect by hydrogen atoms.     

真空紫外辐照对MQ增强硅橡胶热性能及光学性能的影响

 采用空间综合辐照模拟设备研究了真空紫外辐照对MQ增强加成型硅橡胶的表面形貌、质量损失、热性能及光学性能的影响。试验结果表明：真空紫外辐照后,硅橡胶表面出现损伤裂纹,随辐照剂量的增加,裂纹的数量增多;真空紫外辐照后,硅橡胶的质量有所损失,其质损率随辐照剂量的增加而增加;真空紫外辐照后硅橡胶的耐热性随辐照剂量的增加先增加而后下降;真空紫外辐照对硅橡胶材料的体膨胀/收缩变形影响不大,但对材料的光学性能有较大影响,随着辐照剂量的增加,材料的光学透过率下降。     

Design of an optical filter using photonic band gap material

The article presents a design of an optical filter using Photonic Band Gap (PBG) materials in the visible and infrared region of the electromagnetic spectrum. This idea is based on the famous Kronig-Penny model in the band theory of solids. The suggested filter may work at any range of the wavelength that can be achieved by choosing the appropriate values of the controlling parameters. This structure is also able to pass the light emitted by the Ruby laser and this acts as a monochromator. Also, we have studied the anomalous behavior of refractive index for the structure having alternate layers of air and GaAs.     

真空冷却控制系统优化设计

在真空预冷装置中制冷压缩机和真空泵是主要耗能部件。根据试验中的温度或压力来控制压缩机的负荷和真空泵的开启,可以找出提高能量利用率的方法。文中硬件采用台达DVP系列PLC,软件采用台达公司的WP1208编程软件编程控制压缩机和真空泵。测试结果表明设计的控制系统运行稳定可靠,能够达到节能的目的。