离子注入对InAs/GaAs量子点光学效质的影响

研究了低能质子注入诱导的界面混合和快速热退火对量子点发光效率的影响，对其光致发光 峰强进行了拟合计算.研究发现量子点的发光峰强度主要由载流子俘获时间和非辐射复合寿 命决定.由于后退火处理能够部分的消除因质子注入造成的缺陷，量子点中非辐射复合中心 浓度与注入剂量成亚线性关系；退火温度越高，非辐射复合中心被消除越多，亚线性程度越 高.界面混合导致的俘获效率的增加和注入损伤引起的非辐射复合是相互竞争过程，存在一 个临界的注入剂量N_C，当注入剂量N小于N_C，界面混合作 用较为明显，量子点 发光峰强随注入剂量增加而增强；当N大于N_C时，质子注入引起了大量的非 辐射复合 中心，主要表现为注入损伤，量子点的发光峰强随注入剂量增加而迅速减弱.退火温度越高 ，N_C越大. 关键词： 量子点 离子注入 峰强     

Observation of monolayer-splitting for InAs/GaAs quantum dots

A pronounced modulation is observed in the photoluminescence (PL) spectrum of self-organized InAs/GaAs quantum dots (QDs), recorded at low excitation densities. The clearly distinguishable peaks are identified as a multimodal distribution of the ground state transition energy, originating from a discrete, stepwise variation of the structural properties of the QDs, which is associated with an increase of the QD height in monolayer (ML) steps. The observation of a ML splitting implies a flat QD shape with well-defined upper and lower interfaces as well as negligible indium segregation. The electronic properties of the InAs/GaAs QDs were investigated by PL and PL-excitation spectroscopy and are discussed based on realistic calculations for flat InAs/GaAs QDs with a truncated pyramidal shape based on an extended 8-band k·p model. The calculations predict a red shift of the ground state transition with each additional ML, which saturates for heights above 9 ML, is in good agreement with experiment.     

尺寸分布对量子点激发态发光性质的影响

采用有效质量近似方法研究了量子点的激发态光致发光峰的展宽问题. 对尺寸不均匀分布下量子点各能级发光峰与平均尺寸量子点发光峰的能量偏差进行了计算，定性地描述了尺寸分布对量子点基态和激发态发光峰展宽的影响. 研究表明，量子点的高度、直径以及体积等不均匀分布使量子点具有不同的垂直、平面方向的量子束缚. 这两种量子限制的相互作用决定了量子点激发态发光峰的宽度相对于基态发光峰的大小. 在各种不同性质的尺寸分布下，量子点激发态发光峰的展宽有可能大于、等于或小于基态发光峰的展宽. 关键词： 量子点 尺寸分布 激发态     

Control of structural and excitonic properties of self-organized InAs/GaAs quantum dots

A systematic dependence of excitonic properties on the size of self-organized InAs/GaAs quantum dots is presented. The bright exciton fine-structure splitting changes from negative values to more than 0.5 meV, and the biexciton binding energy varies from antibinding to binding, as the height of truncated pyramidal dots increases from 2 to above 9 InAs monolayers. A novel mode of metalorganic vapor phase epitaxy was developed for growing such quantum dots with precise shape control. The dots consist of pure InAs and feature heights varying in steps of complete InAs monolayers. Such dot ensembles evolve from a strained, rough two-dimensional layer with a thickness close to the critical value for the onset of the 2D–3D transition. Dots with a common height represent subensembles with small inhomogeneous broadening. Tuning of subensemble emission energy is achieved by varying the mean lateral extension of the respective QDs. Detailed knowledge of the structural properties of individual dots enable realistic k·p calculations to analyze the origin of the observed excitonic properties. The binding energies of charged and neutral excitons increase due to correlation by the gradually increasing number of bound states for increasing dot size. The monotonously increasing magnitude of the fine-structure splitting with dot size is shown to be caused by piezoelectricity. The identification of key parameters allows to tailor exciton properties, providing a major step towards the development of novel applications.     

InAs/GaAs量子点的静压光谱压力系数研究

采用有效质量模型和非线性弹性理论计算了不同尺寸InAs/GaAs量子点的静压光谱发光峰的 压力系数(PC).量子点峰位随压力的变化主要来自禁带宽度和电子束缚能随压力变化两方面 的贡献.由于InAs/GaAs量子点是一个应变体系，体系的晶格常数，失配应变和弹性系数均随 外加压力变化，使得加压后量子点的禁带宽度相对于非应变体系略有减小，同时势垒高度增 加，电子束缚程度增加.两者共同作用引起的InAs应变层的禁带宽度压力系数减小是导致量 子点的压力系数小于InAs体材料的主要原因.同时计算结果表明，电子束缚能随压力变化对 不同尺寸量子点的压力系数的影响不同，量子点尺寸越小，受其影响越大，压力系数也越大 . 关键词： 量子点 压力系数 应变     

Lateral electron transport through single InAs quantum dots grown by molecular beam epitaxy

The transport properties of single InAs quantum dots (QDs) grown by molecular beam epitaxy have been investigated by metallic leads with nanogaps. It was found that the uncapped InAs QDs grown on the GaAs surfaces show metallic conductivities, indicating that even the exposed QDs are not depleted. On the contrary, it was found that no current flows through the exposed wetting layers. For the case of the QDs covered with GaAs capping layers, clear Coulomb gaps and Coulomb staircases have been observed at 4.2 K.     

Size dependence of biexciton binding energy in single InAs/GaAs quantum dots

This paper studies the size dependence of biexciton binding energy in single quantum dots (QDs) by using atomic force microscopy and micro-photoluminescence measurements. It finds that the biexciton binding energies in the QDs show ``binding' and ``antibinding' properties which correspond to the large and small sizes of QDs, respectively. The experimental results can be well interpreted by the biexciton potential curve, calculated from the exciton molecular model and the Heitler--London method.     

InAs/GaAs量子点1.3 μm单光子发射特性

采用双层耦合量子点的分子束外延生长技术生长了InAs/GaAs量子点样品,把量子点的发光波长成功地拓展到1.3 μm.采用光刻的工艺制备了直径为3 μm的柱状微腔,提高了量子点荧光的提取效率.在低温5 K下,测量得到量子点激子的荧光寿命约为1 ns;单量子点荧光二阶关联函数为0.015,显示单量子点荧光具有非常好的单光子特性;利用迈克耳孙干涉装置测量得到单光子的相干时间为22 ps,对应的谱线半高全宽度为30 μeV,且荧光谱线的线型为非均匀展宽的高斯线型.     

Photoluminescence and lasing properties of InAs/GaAs quantum dots grown by metal-organic chemical vapour deposition

Photoluminescence （PL） and lasing properties of InAs/GaAs quantum dots （QDs） with different growth procedures prepared by metalorganic chemical vapour deposition are studied. PL measurements show that the low growth rate QD sample has a larger PL intensity and a narrower PL line width than the high growth rate sample. During rapid thermal annealing, however, the low growth rate sample shows a greater blueshift of PL peak wavelength. This is caused by the larger InAs layer thickness which results from the larger 2-3 dimensional transition critical layer thickness for the QDs in the low-growth-rate sample. A growth technique including growth interruption and in-situ annealing, named indium flush method, is used during the growth of GaAs cap layer, which can flatten the GaAs surface effectively. Though the method results in a blueshift of PL peak wavelength and a broadening of PL line width, it is essential for the fabrication of room temperature working QD lasers.     

Extremely low density self-assembled InAs/GaAs quantum dots

The self-assembled InAs/GaAs quantum dots (QDs) with extremely low density of 8×106 cm-2 are achieved using higher growth temperature and lower InAs coverage by low-pressure metal-organic chemical vapour deposition (MOVCD). As a result of micro-photoluminescence (micro-PL), for extremely low density of 8×106 cm-2 InAs QDs in the micro-PL measurements at 10 K, only one emission peak has been achieved. It is believed that the InAs QDs have a good potential to realize single photon sources.     

Optical orientation and spin relaxation of resident electrons in n-doped InAs/GaAs self-assembled quantum dots

We report on optical orientation of electrons in n-doped InAs/GaAs quantum dots. Under non-resonant cw optical pumping, we measure a negative circular polarization of the luminescence of charged excitons (or trions) at low temperature (T=10 K). The dynamics of the recombination and of the circular polarization is studied by time-resolved spectroscopy. We discuss a simple theoretical model for the trion relaxation, that accounts for this remarkable polarization reversal. The interpretation relies on the bypass of Pauli blocking allowed by the anisotropic electron–hole exchange. Eventually, the spin relaxation time of doping electrons trapped in quantum dots is measured by a non-resonant pump–probe experiment.     

Analysis of room temperature PL spectra of InAs/GaAs/InP and InAs/InP self-assembled QDs: A five-band study

In this paper, room temperature PL spectra of InAs self-assembled dots grown on GaAs/InP and InP substrate are presented. For analyzing different positions of the PL peaks, we examine the strain tensor in these quantum dots (QDs) using a valence force field model, and use a five-band k·p formalism to find the electronic spectra. We find that the GaAs tensile-stained layer affects the position of room temperature PL peak. The redshift of PL peak of InAs/GaAs/InP QDs compared to that of InAs/InP QDs is explained theoretically.     

含有AlGaAs插入层的InAs/GaAs三色量子点红外探测器

本文报道了采用分子束外延技术制备的三色InAs/GaAs量子点红外探测器. 器件采用nin型结构, 吸收区结构是在InGaAs量子阱中生长含有AlGaAs插入层的InAs量子点, 器件在77 K下的红外光电流谱有三个峰值: 6.3, 10.2和11 μm. 文中分析了它们的跃迁机制, 并且分别进行了指认. 因为有源区采用了不对称结构, 所以器件在外加偏压正负方向不同时, 光电流谱峰值的强度存在一些差异. 不论在正偏压或者负偏压下, 当偏压达到较高值, 再进一步增大偏压时, 都出现了对应于连续态的跃迁峰强度明显下降的现象, 这是由量子点基态与阱外连续态的波函数交叠随着偏压进一步增大而迅速减小导致的.     

电场调谐InAs量子点荷电激子光学跃迁

在低温5 K下, 采用光致发光光谱及外加偏压调谐量子点电荷组态研究了InAs单量子点的精细结构和对应发光光谱的偏振性、不同带电荷激子的圆偏振特性. 得出如下结果: 1) 指认InAs单量子点中不同荷电激子的发光光谱和对应的激子本征态的偏振特性; 2) 外加偏压可以调谐量子点的荷电激子的发光光谱; 3) 伴随着电子、空穴的能量弛豫, 电子的自旋弛豫时间远大于空穴的自旋弛豫时间. 关键词： InAs量子点 激子 荧光光谱 电场调谐     

The strain relaxation of InAs/GaAs self-organized quantum dot

This paper presents a detailed analysis of the dependence of degree of strain relaxation of the self-organized InAs/GaAs quantum dot on the geometrical parameters. Differently shaped quantum dots arranged with different transverse periods are simulated in this analysis. It investigates the total residual strain energy that stored in the quantum dot and the substrate for all kinds of quantum dots with the same volume, as well as the dependence on both the aspect ratio and transverse period. The calculated results show that when the transverse period is larger than two times the base of the quantum dots, the influence of transverse periods can be ignored. The larger aspect ratio will lead more efficient strain relaxation. The larger angle between the faces and the substrate will lead more efficient strain relaxation. The obtained results can help to understand the shape transition mechanism during the epitaxial growth from the viewpoint of energy, because the strain relaxation is the main driving force of the quantum dot's self-organization.     

Self-assembly of InAs quantum dots on GaAs(001)by molecular beam epitaxy

Currently, the nature of self-assembly of three-dimensional epitaxial islands or quantum dots (QDs) in a lattice-mismatched heteroepitaxial growth system, such as InAs/GaAs(001) and Ge/Si(001) as fabricated by molecular beam epitaxy (MBE), is still puzzling. The purpose of this article is to discuss how the self-assembly of InAs QDs in MBE InAs/GaAs(001) should be properly understood in atomic scale. First, the conventional kinetic theories that have traditionally been used to interpret QD self-assembly in heteroepitaxial growth with a significant lattice mismatch are reviewed briefly by examining the literature of the past two decades. Second, based on their own experimental data, the authors point out that InAs QD self-assembly can proceed in distinctly different kinetic ways depending on the growth conditions and so cannot be framed within a universal kinetic theory, and, furthermore, that the process may be transient, or the time required for a QD to grow to maturity may be significantly short, which is obviously inconsistent with conventional kinetic theories. Third, the authors point out that, in all of these conventional theories, two well-established experimental observations have been overlooked: i) A large number of “floating” indium atoms are present on the growing surface in MBE InAs/GaAs(001); ii) an elastically strained InAs film on the GaAs(001) substrate should be mechanically unstable. These two well-established experimental facts may be highly relevant and should be taken into account in interpreting InAs QD formation. Finally, the authors speculate that the formation of an InAs QD is more likely to be a collective event involving a large number of both indium and arsenic atoms simultaneously or, alternatively, a morphological/structural transformation in which a single atomic InAs sheet is transformed into a three-dimensional InAs island, accompanied by the rehybridization from the sp²-bonded to sp³- bonded atomic configuration of both indium and arsenic elements in the heteroepitaxial growth system.     

Anomalous temperature dependence of photoluminescence spectra from InAs/GaAs quantum dots grown by formation–dissolution–regrowth method

Two kinds of InAs/GaAs quantum dot(QD) structures are grown by molecular beam epitaxy in formation–dissolution–regrowth method with different in-situ annealing and regrowth processes. The densities and sizes of quantum dots are different for the two samples. The variation tendencies of PL peak energy, integrated intensity, and full width at half maximum versus temperature for the two samples are analyzed, respectively. We find the anomalous temperature dependence of the InAs/GaAs quantum dots and compare it with other previous reports. We propose a new energy band model to explain the phenomenon. We obtain the activation energy of the carrier through the linear fitting of the Arrhenius curve in a high temperature range. It is found that the Ga As barrier layer is the major quenching channel if there is no defect in the material. Otherwise, the defects become the major quenching channel when some defects exist around the QDs.     

电场调谐InAs单量子点的发光光谱

采用稳态和时间分辨发光光谱,研究了生长在p-i-n二极管结构内的InAs单量子点发光光谱的电场调谐特性.随着电场强度的增加,观察到量子点中激子发光的Stark 效应.通过选择不同波长的激光线激发量子点样品,发现随着电场强度的增加导致量子点发光强度的减弱,这是由于量子点俘获载流子概率的减小所致,而激子寿命的增加源于电场导致激子的Stark效应. 关键词： InAs单量子点 Stark效应 电子-空穴分离     

Mn离子注入InAs/GaAs量子点结构材料的光电性质研究

用高能离子注入(160keV)的方法对InAs/GaAs量子点结构进行掺杂，研究了不同退火工艺处理后量子点的光致发光和电学性能.相对于长时间退火，快速退火处理后的量子点发光通常较强.在相同的退火条件下，量子点发光峰位随着Mn注入剂量的增加，先是往高能量端快速移动，而后发光峰又往低能方向移动.后者可能是由于Mn原子进入InAs量子点，释放了InAs量子点中的应变所致.对于高注入剂量样品和长时间退火样品，变温电阻曲线在40 K附近会出现反常行为. 关键词： 离子注入 InAs/GaAs量子点 光致发光 团簇     

InAs/GaAs透镜形量子点超晶格材料的纵向和横向周期对应变场分布的影响

对量子点超晶格材料中量子点纵向周期和同层量子点的横向周期间距对量子点及其周围应变场分布的影响进行了系统的研究.结果表明，横向和纵向周期通过衬底材料之间的长程相互作用对量子点沿中心轴路径应变分布的影响效果正好相反，在适当条件下，两者对量子点应变场分布的影响可以部分抵消.同时也论证了在单层量子点和超晶格量子点材料中，计算量子点的电子结构时，应综合考虑量子点空间周期分布对载流子限制势的影响，不能简单的利用孤立量子点模型来代替. 关键词： 应变 半导体量子点 自组织