Magnetoresistance of Fe3O4/Au/Fe3O4 and Fe3O4/Au/Fe spin-valve structures

A detailed study of the in-plane magnetotransport properties of spin valves with one and two Fe₃O₄ electrodes is presented. Fe₃O₄/Au/Fe₃O₄ spin valves exhibit a clear anisotropic magnetoresistance in small magnetic fields but no giant magnetoresistance (GMR). The absence of GMR in these structures is due to simultaneous magnetization reversal in the two Fe₃O₄ layers. By contrast, a negative GMR effect is measured on Fe₃O₄/Au/Fe spin valves. The negative GMR is attributed to an electron spin scattering asymmetry at the Fe₃O₄/Au interface or an induced spin scattering asymmetry in the Au interfacial layers.     

Aspects of “low field” magnetotransport in epitaxial thin films of the ferromagnetic metallic oxide SrRuO3

Epitaxial thin films of the conductive ferromagnetic oxide SrRuO₃ were grown on an (0 0 1) SrTiO₃ (STO) substrate by using DC sputtering technique. The magnetic and magnetoresistive properties of the films were measured by applying the magnetic field both perpendicular (out-of-plane) and parallel (in-plane) to the film plane and ever maintaining the direction of the applied field perpendicular to that of the transport current. The films grown on an (0 0 1) STO substrate showed identical magnetization properties in two orthogonal crystallographic directions of the substrate, [1 0 0]_S and [0 0 1]_S (in-plane and out-of-plane geometry), which suggests the presence of a multi domain structure within the plane of the film. For such samples, no anisotropic field (hard axis) along de [0 0 1]s direction, i.e., perpendicular to the film-plane could be detected. Nevertheless, a distinguishable temperature dependent out-of-plane anisotropic magnetoresistance (MR) along with strong temperature dependent low field hysteretic MR(H) behavior was detected for the studied films. A negative MR ratio MR(T)=[ρ(μ₀H=9 T; T)−ρ( μ₀H=0 T; T)]/ρ( μ₀H=0 T; T) on the order of a few percent, with maximums of 6% and 4% (right at the Curie temperature, T_C 160 K) was calculated for an in-plane and out-of plane measuring geometry, respectively. In addition there is an equally strong MR effect at low temperatures, which might be related to the temperature dependence of the magnetocrystalline anisotropy together with a magnetization rotation. Both the MR(T) behavior and the achieved values (except for T<30 K) are similar to those obtained on SrRuO₃ films grown on 2° miscut (0 0 1) STO substrates with the current parallel to the field and parallel to the direction, which was identified as the easier axis for magnetization.     

Fe_3O_4单晶薄膜磁性电场调控的微磁学仿真研究

磁性薄膜磁学特性电场调控的相关研究对开发新型低功耗磁信息器件具有突出意义.本文基于电场调控磁性的基本理论,以OOMMF(Object Oriented Micro-Magnetic Frame)微磁学仿真软件为工具,研究了电场对生长于PZN-PT单晶衬底上Fe_3O_4单晶薄膜磁学特性的调控.研究结果显示:无外加电场时,薄膜表现出典型的软磁特性;沿衬底[001]方向施加的外加电场可以使得薄膜矫顽力、矩形比等磁学特性发生显著改变:当外加磁场沿[100]([010])时,施加正值(负值)电场强度可以显著增大薄膜的矫顽力与矩形比,当电场强度不小于0.6 MV/m时薄膜矩形比达到1.这是因为外加电场导致薄膜产生单轴应力各向异性,使得薄膜的等效磁各向异性发生了从无外电场下的面内四重磁晶各向异性向高电场下的近似单轴磁各向异性的过渡.外加1 MV/m与-1 MV/m的电场时等效易磁化轴分别沿[100]与[010]方向.另外,外加1 MV/m(-1 MV/m)的电场强度可以使得铁磁共振的频率增大(减小)接近1 GHz.     

Anisotropy of the magnetoresistance in Gd5Si2Ge2

The observed magnetoresistance of single crystalline Gd5Si2Ge2 is negative and strongly anisotropic. The absolute values measured along the [100] and [010] directions exceed those parallel to the [001] direction by more than 60%. First principles calculations demonstrate that a structural modification is responsible for the anisotropy of the magnetoresistance, and that the latter is due to a significant reduction of electronic velocity in the [100] direction and the anisotropy of electrical conductivity.     

基于HfO2的阻变存储器中Ag导电细丝方向和浓度的第一性原理研究

采用基于密度泛函理论的第一性原理方法, 研究了基于HfO₂的阻变存储器中Ag 导电细丝浓度以及方向性. 通过计算Ag杂质5种方向模型的分波电荷态密度等势面图、形成能、 迁移势垒和分波电荷态密度最高等势面值, 发现[-111]方向最有利于Ag导电细丝的形成, 这对器件的开启电压、形成电压和开关比有很大影响. 本文基于最佳的[-111]导电细丝方向, 设计了4 种Ag 浓度结构. 计算4种Ag浓度结构的分波电荷态密度等势面图, 得出Ag浓度低于4.00 at.% 时晶胞结构中无导电细丝形成且无阻变现象. 当Ag浓度从4.00 at.%增加到4.95 at.% 时, 晶胞结构中发现有导电细丝形成, 表明Ag浓度高于4.00 at.%时, 晶胞中可以发生阻变现象. 然而, 通过进一步对比计算这两种晶胞结构中Ag的形成能、分波电荷态密度最高等势面值、总态密度与Ag的投影态密度发现, Ag浓度越大, 导电细丝却不稳定, 并且不利于提高阻变存储器的开关比. 本文的研究结果可为改善基于HfO₂的阻变存储器的性能提供一定理论指导.     

金红石TiO_2中本征缺陷扩散性质的第一性原理计算

基于密度泛函理论的爬坡弹性带方法,对金红石相二氧化钛晶体中钛间隙、钛空位、氧间隙、氧空位4种本征缺陷的扩散特征进行了研究.对比4种本征缺陷在晶格内部沿不同扩散路径的过渡态势垒后发现,缺陷扩散过程呈现出明显的各向异性.其中,钛间隙和氧间隙沿[001]方向具有最小的扩散势垒路径,激活能分别为0.505 eV和0.859 eV;氧空位和钛空位的势垒最小的扩散路径分别沿[110]方向和[111]方向,激活能分别为0.735 eV和2.375 eV.     

阻变存储器复合材料界面及电极性质研究

采用基于密度泛函理论的第一性原理对比研究了Cu（111）/HfO₂（001）,Cu（111）/HfO₂（010）,Cu（111）/HfO₂（100）三种复合材料界面模型的失配率、界面束缚能、电荷密度、电子局域函数以及差分电荷密度. 计算结果表明：Cu（111）/HfO₂（010）失配率最小,界面束缚能最大,界面体系相对最稳定;对比电荷密度及电子局域函数图显示,只有HfO₂（010）方向形成的复合材料体系出现了垂直Cu电极方向完整连通的电子通道,表明电子在此方向上具有局域性、连通性,与阻变存储器（RRAM）器件导通方向一致;差分电荷密度图显示,Cu（111）/HfO₂（010）复合材料体系界面处存在电荷密度分布重叠的现象,界面处有电子的相互转移、成键的存在;进一步计算了Cu（111）/HfO₂（010）体系距离界面不同位置的间隙Cu原子形成能,表明越靠近界面Cu原子越容易进入HfO₂ 体内,在外加电压下易发生电化学反应,从而导致Cu导电细丝的形成与断裂. 研究结果可为RRAM存储器的制备及性能的提高提供理论指导和设计工具. 关键词： 阻变存储器 复合材料 界面 电子通道     

Sign reversal of anisotropic magnetoresistance and anomalous thickness-dependent resistivity in Sr2CrWO6/SrTiO3 films

High-quality Sr₂CrWO₆ (SCWO) films have been grown on SrTiO₃ (STO) substrate by pulsed laser deposition under low oxygen pressure. With decrease of the film thickness, a drastic conductivity increase is observed. The Hall measurements show that the thicker the film, the lower the carrier density. An extrinsic mechanism of charge doping due to the dominance of oxygen vacancies at SCWO/STO interfaces is proposed. The distribution and gradient of carrier concentration in SCWO films are considered to be related to this phenomenon. Resistivity behavior observed in these films is found to follow the variable range hopping model. It is revealed that with increase of the film thickness, the extent of disorder in the lattice increases, which gives a clear evidence of disorder-induced localization charge carriers in these films. Magnetoresistance measurements show that there is a negative magnetoresistance in SCWO films, which is considered to be caused by the magnetic scattering of magnetic elements Cr³⁺ and W⁵⁺. In addition, a sign reversal of anisotropic magnetoresistance (AMR) in SCWO film is observed for the first time, when the temperature varies across a characteristic value, T_M. Magnetization—temperature measurements demonstrate that this AMR sign reversal is caused by the direction transition of easy axis of magnetization from the in-plane ferromagnetic order at T > T_M to the out-of-plane at T < T_M.     

量子顺电EuTiO_3材料基态磁性的第一性原理研究

EuTiO_3是钙钛矿结构的量子顺电体,实验发现其基态具有平面各向异性G类反铁磁结构,本文运用基于密度泛函理论的第一性原理计算研究了EuTiO_3处于量子顺电相和应力作用下处于铁电四方相时可能的自旋取向和自旋交换耦合作用,分析了自旋耦合作用的路径,探讨了应力对磁性交换路径的作用,结果发现:当体系自由时,EuTiO_3具有自旋沿[110]方向平面内单轴各向异性的G类反铁磁结构,该结构下Eu离子4f电子自旋通过处于面心位置的O 2p实现自旋反铁磁性的超交换耦合,而在外加应力诱导的铁电四方结构下,由于自旋交换路径中Eu—O—Eu键角改变,Eu 4f电子自旋实现了[110]方向的铁磁交换耦合。     

垂直各向异性Ho3Fe5O12薄膜的外延生长与其异质结构的自旋输运

垂直磁各向异性稀土-铁-石榴石纳米薄膜在自旋电子学中具有重要应用前景.本文使用溅射方法在(111)取向掺杂钇钪的钆镓石榴石(Gd_0.63Y_2.37Sc₂Ga₃O₁₂,GYSGG)单晶衬底上外延生长了2—100 nm厚的钬铁石榴石(Ho₃Fe₅O₁₂,HoIG)薄膜,并进一步在HoIG上沉积了3 nm Pt薄膜.测量了室温下HoIG的磁各向异性和HoIG/Pt异质结构的自旋相关输运性质.结果显示,厚度薄至2 nm的HoIG薄膜(小于2个单胞层)在室温仍具有铁磁性,且由于外延应变,2—60 nm厚HoIG薄膜都具有很强的垂直磁各向异性,有效垂直各向异性场最大达350 mT;异质结构样品表现出非常可观的反常霍尔效应和“自旋霍尔/各向异性”磁电阻效应,前者在HoIG厚度小于4 nm时开始缓慢下降,而后者当HoIG厚度小于7 nm时急剧减小,说明相较于反常霍尔效应,磁电阻效应对HoIG的体磁性相对更加敏感;此外,自旋相关热电压随HoIG厚度减薄在整个厚度范围以指数方式下降,说明遵从热激化磁振子运动规律的自旋塞贝克效应是其主要贡献者.本文结果表明HoIG纳米薄膜具有可调控的垂直磁各向异性,厚度大于4 nm的HoIG/Pt异质结构具有高效的自旋界面交换作用,是自旋电子学应用发展的一个重要候选材料.     

Anisotropic photoresponse of layered rhenium disulfide synaptic transistors

Layered ReS₂ with direct bandgap and strong in-plane anisotropy shows great potential to develop high-performance angle-resolved photodetectors and optoelectronic devices. However, systematic characterizations of the angle-dependent photoresponse of ReS₂ are still very limited. Here, we studied the anisotropic photoresponse of layered ReS₂ phototransistors in depth. Angel-resolved Raman spectrum and field-effect mobility are tested to confirm the inconsistency between its electrical and optical anisotropies, which are along 120° and 90°, respectively. We further measured the angle-resolved photoresponse of a ReS₂ transistor with 6 diagonally paired electrodes. The maximum photoresponsivity exceeds 0.515 A·W^-1 along b-axis, which is around 3.8 times larger than that along the direction perpendicular to b axis, which is consistent with the optical anisotropic directions. The incident wavelength- and power-dependent photoresponse measurement along two anisotropic axes further demonstrates that b axis has stronger light-ReS₂ interaction, which explains the anisotropic photoresponse. We also observed angle-dependent photoresistive switching behavior of the ReS₂ transistor, which leads to the formation of angle-resolved phototransistor memory. It has simplified structure to create dynamic optoelectronic resistive random access memory controlled spatially through polarized light. This capability has great potential for real-time pattern recognition and photoconfiguration of artificial neural networks (ANN) in a wide spectral range of sensitivity provided by polarized light.     

Surface morphology of InGaAs on GaAs(100) by chemical beam epitaxy using unprecracked monoethylarsine, triethylgallium and trimethylindium

Temperature-dependent evolution of surface corrugation and the interface dislocation in In_0.15Ga_0.85As epilayer on GaAs(100) substrate grown by chemical beam epitaxy using unprecracked monoethylarsine have been investigated by atomic force microscope (AFM) and transmission electron microscopy (TEM). AFM images showed that the line direction of surface ridge changes from [011] to [0 1] with increasing temperature. However, TEM micrographs showed that dislocation networks are formed along both [011] and [0 1] directions at the interface. These results indicate that growth kinetics on the terrace and at surface steps generated by the dislocations play an important role in determining the direction of surface corrugation. We suggest that the temperature-dependent change of surface corrugation is caused by an anisotropic surface diffusion on the terrace and different sticking probability of adsorbates on the surface steps which were produced by interface misfit dislocation along the two orthogonal surface directions.     

(100)Si基应变p型金属氧化物半导体[110]晶向电导率有效质量双椭球模型

利用应变技术和沟道晶向工程技术,均可有效增强Si基金属氧化物半导体器件的性能.本文提出了(100)Si p型金属氧化物半导体(PMOS)[110]晶向电导率有效质量双椭球模型,从理论上解释了Si PMOS[100]晶向沟道空穴迁移率为[110]晶向沟道空穴迁移率1.15倍的原因.基于(100)Si基应变PMOS反型层E-k关系,拓展应用该模型,首先获得了(100)Si基应变PMOS反型层价带第一子带等能图,然后给出了(100)Si基应变PMOS器件反型层[110]晶向空穴电导率有效质量模型.本文的模型方案合理可行,可为Si基应变PMOS器件的研究与设计提供有价值的参考.     

First-principles hybrid functional study of the electronic structure and charge carrier mobility in perovskite CH_3NH_3SnI_3

We calculate the electronic properties and carrier mobility of perovskite CH_3NH_3SnI_3 as a solar cell absorber by using the hybrid functional method. The calculated result shows that the electron and hole mobilities have anisotropies with a large magnitude of 1.4 × 10~4cm~2·V~(-1)·s~(-1) along the y direction. In view of the huge difference between hole and electron mobilities, the perovskite CH3NH3 Sn I3can be considered as a p-type semiconductor. We also discover a relationship between the effective mass anisotropy and electronic occupation anisotropy. The above results can provide reliable guidance for its experimental applications in electronics and optoelectronics.     

Manipulating magnetic anisotropies of Co/MgO(001) ultrathin films via oblique deposition

We present a systematic investigation of magnetic anisotropy induced by oblique deposition of Co thin films on MgO(001) substrates by molecular beam epitaxy at different deposition angles,i.e.,0?,30?,45?,60?,and 75?with respect to the surface normal.Low energy electron diffraction(LEED),surface magneto–optical Kerr effect(SMOKE),and anisotropic magnetoresistance(AMR) setups were employed to investigate the magnetic properties of cobalt films.The values of in-plane uniaxial magnetic anisotropy(UMA) constant Ku and four-fold magnetocrystalline anisotropy constant K1 were derived from magnetic torque curves on the base of AMR results.It was found that the value of Ku increases with increasing deposition angle with respect to the surface normal,while the value of K_1 remains almost constant for all the samples.Furthermore,by using MOKE results,the Ku values of the films deposited obliquely were also derived from the magnetization curves along hard axis.The results of AMR method were then compared with that of hard axis fitting method(coherent rotation) and found that both methods have almost identical values of UMA constant for each sample.     

Effects of Ⅴ/Ⅲ ratio on species diffusion anisotropy inthe MOCVD growth of non-polar a-plane GaN films

Non-polar a-plane (110) GaN films have been grown on r-plane (102) sapphire substrates by metal organic chemical vapour deposition. The influences of Ⅴ/Ⅲ ratio on the species diffusion anisotropy of a-plane GaN films were investigated by scanning electron microscopy, cathodoluminescence and high-resolution x-ray diffraction measurements. The anisotropy of a-plane GaN films may result from the different migration length of adatoms along two in-plane directions. Ⅴ/Ⅲ ratio has an effect on the growth rates of different facets and crystal quality. The stripe feature morphology was obviously observed in the film with a high V/III ratio because of the slow growth rate along the [100] direction. When the Ⅴ/Ⅲ ratio increased from 1000 to 6000, the in-plane crystal quality anisotropy was decreased due to the weakened predominance in migration length of gallium adatoms.     

磁感应强度和冷却速率对Tb_(0.27)Dy_(0.73)Fe_(1.95)合金凝固过程中取向行为的影响

实验研究了磁感应强度和冷却速率对Tb_(0.27)Dy_(0.73)Fe_(1.95)合金凝固过程中(Tb,Dy)Fe_2相取向行为及合金磁性能的影响.结果表明,将强磁场作用于Tb_(0.27)Dy_(0.73)Fe_(1.95)合金的凝固过程可以制备出(Tb,Dy)Fe_2相沿111取向的组织,同时显著提高了合金的磁致伸缩性能;通过提高磁感应强度可以在更快的冷却速率下得到111取向的组织;在4-10 T范围内,随着冷却速率的增加,(Tb,Dy)Fe_2相沿111取向所需的磁感应强度增加,而发生(110)取向的磁感应强度减小.随着冷却速率的增加,合金的饱和磁化强度增加,而强磁场的施加对合金饱和磁化强度的变化没有明显影响.(Tb,Dy)Fe_2相的取向行为受*Tb,Dy)Fe_3相取向行为的影响,且由磁晶各向异性能与磁场作用时间共同控制.     

Structural, magnetic and transport properties of NiFeχAg(1−χ) heterogeneous alloys

We carried out a comprehensive study of structural, magnetic and electrotransport properties of as-deposited and annealed (Ni₈₀Fe₂₀)_χAg(_1−χ) heterogenous alloys prepared by sputtering. The NiFe atomic concentration was varied between 15% and 40%. These alloys consist of small magnetic particles (Ni₈₀Fe₂₀) embedded in a nonmagnetic matrix (Ag). The structures of these alloys were investigated by X-ray diffraction, scanning electron microscopy and high-resolution cross-section transmission electron microscopy. The magnetic measurements were made using SQUID magnetometry and ferromagnetic resonance. Magnetoresistance was measured with a conventional four-point probe between 1.5 K and room temperature in field range 0–6T. Three contributions to the magnetoresistance of these granular alloys have been clearly identified: the spin-valve (or giant) magnetoresistance as in multilayers, scattering on magnetic fluctuations (as in any ferromagnetic metal around its magnetic ordering temperature), and anisotropic magnetoresistance. These three contributions have their own dependences on the size of the magnetic particles, on the degree of intermixing between Ni₈₀Fe₂₀ and Ag, and on temperature. We discuss the different shapes and amplitudes of magnetoresistance versus Ni₈₀Fe₂₀ concentration or temperature and their evolution upon annealing in terms of the relative roles of these three contributions. The magnetoresistance in multilayers (current in-plane or perpendicular to the plane) and granular alloys are also compared.     

Microstructure and transport properties of various 90° grain boundaries in YBa2Cu3O7 thin films

The microstructure and transport properties of various 90° grain boundaries in (103) oriented YBa₂Cu₃O₇(YBCO) thin films grown epitaxially in situ by 90° off-axis sputtering are compared. The (103) films grown on (101) LaAlO₃ and (101) SrTiO₃ substrates have specific sets of 90° grain boundaries in both principal in-plane directions: 90° [010] twist boundaries along the [101] direction, and 90° [010] symmetrical tilt boundaries and 90° [010] basal-plane-faced tilt boundaries along the (301) direction. No weak-link behavior is observed across some of these boundaries by transport critical current density and normalized magnetic field dependence of J _c measurements along both those in-plane directions. High-resolution transmission electron microscopy reveals variations in the structure and microfaceting of the 90° boundaries, which may contribute to the absence of weak-link behavior. These results have important implications for understanding the behavior of step-edge Josephson junctions.     

Anisotropy of Two-Dimensional Electron and Hole Mobilities in (0 0 1) GaAs/Al x Ga 1− x As Heterostructures Under Uniaxial Stress

Transport properties of two-dimensional electron and hole gas at (0 0 1) GaAs/Al x Ga 1 m x As heterointerface in [1 1 0] and [1 m 1 0] directions have been investigated for the first time under in plane uniaxial compression up to 5 kbar. Resistivity, Shubnikov-de Haas oscillations and Hall effect were measured and carrier densities and mobilities were determined. The in-plane uniaxial compression significantly modifies the energy spectrum of p-GaAs/Al x Ga 1 m x As that leads to strong anisotropy of hole mobility under compression. In the case of the n-type heterostructure uniaxial compression causes only change of the carrier concentration and the corresponding small change of the initial mobility anisotropy, determined by anisotropic surface roughness scattering.