不同成分等离子体鞘层的玻姆判据

在一维平板鞘层中采用流体模型分别研究了不同成分无碰撞等离子体鞘层的玻姆判据.通过拟牛顿法数值模拟了含有电子、离子、负离子以及二次电子的等离子体鞘层玻姆判据.结果表明二次电子发射增加了鞘层离子马赫数的临界值,且器壁发射二次电子温度越高,离子马赫数临界值越小.负离子使离子马赫数临界值减小.而在含有二次电子和负离子的等离子体鞘层中,当负离子较少时,二次电子发射对离子马赫数临界值影响较大;当负离子增加时,离子马赫数的临界值则主要受负离子的影响. 关键词： 鞘层 等离子体 玻姆判据     

二次电子发射和负离子存在时的鞘层结构特性

 建立了包括电子、离子、器壁发射二次电子以及负离子多种成分的等离子体无碰撞鞘层的基本模型,讨论了二次电子发射和负离子对1维稳态等离子体鞘层结构的影响,并且分析了多种成分等离子体鞘层内的二次电子和负离子的相互作用。结果表明：二次电子发射系数的增加和负离子含量的增加,都将导致鞘层的厚度有所减小;二次电子发射系数超过临界发射系数之后,鞘层不再是离子鞘。随着器壁材料二次电子发射系数的增加,鞘层中的负离子密度分布也逐渐增加;负离子的增加,导致二次电子临界发射系数有所增加。另外,在等离子体鞘层中二次电子发射和负离子的存在,也影响着鞘层中电子的放电特性与器壁材料的腐蚀。     

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建立了包含两种正离子的碰撞等离子体鞘层的流体模型,通过四阶龙格-库塔法模拟了碰撞对含有两种正离子的等离子体鞘层中的离子密度和速度分布产生的影响。结果表明,对于两种正离子的等离子体来说,鞘层中无论哪种离子与中性粒子碰撞频率的增加,该种离子的密度和速度分布都将呈现波动变化,密度是先增加后降低,速度是先降低后增加;而另一种离子的密度和速度呈单调变化。鞘边正离子的含量越少,受自身与中性粒子的碰撞频率增加,鞘层中该种离子密度先增加后降低的变化位置就越远离等离子体的鞘层边界。同时发现该种离子密度分布受自身碰撞频率增加,降低的幅度变化非常小。另外发现电子碰撞器壁产生的二次电子发射系数对质量较轻的离子影响要大一些。     

One-dimensional solution to the stable, space-charge-limited emission of secondary electrons from plasma-wall interactions

Numerical solutions to the stable, space-charge-limited emission of secondary electrons from plasma-wall interaction are found based on one-dimensional plasma moment equations that assume cold ions, Maxwellian electrons and cold secondary electrons. The numerical method finds a range of plasma parameters that permit stable emission of secondary electrons in the absence of normal electric fields to the wall. These solutions were not obtained with previous method that solves only for the marginally stable plasma sheath. Range of the ion Mach number at the sheath edge, the floating wall potential relative to the plasmas, and secondary electron emission coefficients corresponding to the vanishing normal electric fields are found for hydrogen, argon and xenon plasmas. The results show that a relatively small range of secondary electron emission coefficient exists to allow stable sheaths structures along with larger ranges of ion injection speed at the sheath edge and floating potential of the emitting wall.     

等离子体浸没离子注入非导电聚合物的适应性及栅网诱导效应的研究

本文建立了绝缘材料等离子体浸没离子注入过程的动力学Particle-in-cell(PIC)模型, 将二次电子发射系数直接与离子注入即时能量建立关联, 研究了非导电聚合物厚度、介电常数和二次电子发射系数对表面偏压电位的影响规律以及栅网诱导效应. 研究结果表明: 非导电聚合物较厚时, 表面自偏压难以实现全方位离子注入, 栅网诱导可以间接为非导电聚合物提供偏压, 并抑制二次电子发射, 为厚大非导电聚合物表面等离子体浸没离子注入提供了有效途径.     

Fluid-like transport variables in a kinetic collisionless plasmanear a surface with ion and electron reflection

Transport variables of the positive ions and electrons in the presheath and sheath of a plasma near a wall that partially reflects ions and electrons are determined from a kinetic analysis. Because velocity distributions of the ions and electrons near the wall are highly non-Maxwell-Boltzmann distributions, accurate predictions of transport variables, such as density, fluid velocity, mean pressure, fluid-like viscous stress, and conduction, require kinetic analysis. The results find that dimensionless transport variables of ions and electrons in the presheath and sheath can be exactly expressed in terms of transcendental functions determined by dimensionless independent parameters of ion and electron reflectivities of the wall, ion-to-electron mass ratio, charge number, and electron-to-ion temperature ratio at the presheath edge. The effects of the parameters on transport variables at the wall are also obtained. The computed transport variables in the presheath and sheath show agreement with available theoretical data for a completely absorbing wall     

聚合物物理属性对离子注入效应的影响

聚合物导电性能差, 表面电荷积聚所产生的电容效应致使其表面电位衰减, 采用等离子体浸没离子注入对其表面改性是非常困难的. 建立了绝缘材料等离子体浸没离子注入过程的粒子模拟(PIC)模型, 实时跟踪离子在等离子体鞘层中的运动形态及特性并进行统计分析. 并基于PIC模型, 将聚合物表面的二次电子发射系数直接与离子注入即时能量建立关联, 研究了聚合物厚度、介电常数和二次电子发射系数等物理量对鞘层演化、离子注入能量和剂量的影响规律. 研究结果表明: 当聚合物厚度小于200 μ m, 相对介电常数大于7, 二次电子发射系数小于0.5时, 离子注入剂量和高能离子所占的份额与导体离子注入情况相当. 通过对聚合物表面离子注入剂量和高能离子所占份额的研究, 为绝缘材料和半导体材料表面等离子体浸没离子注入的实现提供了理论和实验依据.     

Distribution functions of positive ions and electrons in a plasmanear a surface

In this study, the velocity distribution functions of the ions and electrons in a collisional presheath and collisionless sheath of a plasma near a wall emitting and reflecting ions and electrons are systematically determined. The collisions in the presheath are modeled by a relaxation time approximation (namely, Bhatnagar-Gross-Krook model, or simply BGK model). To find the variation in electrostatic potential with position, the model and analysis from Emmert et al. (1980), are used. Distribution functions of the ions and electrons in a collisionless presheath and sheath on a wall partially reflecting ions and electrons, therefore, can be exactly obtained. The reflections of the ions and electrons by a wall play important roles in studying heat transfer from a plasma sheath to a workpiece surface, and sputter etching and deposition, ion implantation, and ion scattering spectroscopy. Irrespective of ion and electron reflectivities, velocities of the ions in the presheath and sheath are of highly non-Maxwell-Boltzmann distributions. The electrons in the presheath are close to Maxwell-Boltzmann distributions, whereas those in the sheath are non-Maxwell-Boltzmann distributions. Even though the wall partially reflects ions and electrons, the Bohm's criterion is marginally satisfied at the sheath edge. The computed distribution functions for a completely absorbing surface agree with theoretical results provided in the literature. Good comparison of the resulted transport variables with available analytical work is presented in the companion paper     

电子和负离子的反射运动对碰撞电负性磁鞘的影响

研究了鞘层中电子和负离子的反射运动对碰撞电负性磁鞘玻姆判据和鞘层结构的影响.通过理论推导得到了考虑鞘层中电子和负离子的反射运动时鞘层玻姆判据表达式,并通过数值模拟得到了电子和负离子采用玻尔兹曼模型和反射运动模型时离子马赫数的下限随参数的变化曲线以及鞘层中带电粒子密度的分布曲线.结果表明,电子和负离子的反射运动模型和玻尔兹曼模型离子马赫数的上限完全相同,下限表达式不同,反射运动模型中下限还与基板电势有关,且随着基板电势值的增加而增大,达到与玻尔兹曼分布中相同值后保持不变,随着鞘边负离子浓度和温度的不同达到最大值的速度不同;离子马赫数的下限在玻尔兹曼和反射运动模型中都随鞘边负离子浓度的增加和温度的降低而减小,只是在反射运动模型中的最大值要小;两种模型中离子马赫数的下限都随鞘边电场的增加而增加,但在玻尔兹曼模型中增加得更快最终值更大;两种模型离子马赫数的下限都随碰撞参数或磁场角度的增加而降低,但在玻尔兹曼模型中降低更快,随着碰撞参数或者磁场角度的增加两种模型中离子马赫数的下限趋于一致;当基板电势值较小时,电子和负离子的反射运动对鞘层结构影响较大,当基板电势值较大时电子和负离子反射运动对鞘层中带电粒子密度分布的影响很小.     

Heat flow through a plasma sheath in the presence of secondary electron emission from plasma‐wall interaction

The formation of a plasma sheath in front of a negative wall emitting secondary electron is studied by a one‐dimensional fluid model. The model takes into account the effect of the ion temperature. With the secondary electron emission (SEE ) coefficient obtained by integrating over the Maxwellian electron velocity distribution for various materials such as Be, C, Mo, and W, it is found that the wall potential depends strongly on the ion temperature and the wall material. Before the occurrence of the space‐charge‐limited (SCL ) emission, the wall potential decreases with increasing ion temperature. The variation of the sheath potential caused by SEE affects the sheath energy transmission and impurity sputtering yield. If SEE is below SCL emission , the energy transmission coefficient always varies with the wall materials as a result of the effect of SEE , and it increases as the ion temperature is increased. By comparison of with and without SEE , it is found that sputtering yields have pronounced differences for low ion temperatures but are almost the same for high ion temperatures.     

Sheath in Front of a Negatively Biased Collector that Emits Electrons and is Immersed in a Two Electron Temperature Plasma

An extension of a recently published [Gyergyek T., ?er?ek M. Contrib. Plasma Phys., 45 , (2005), 89] one dimensional fluid model of the sheath formation in front of a floating electrode (collector) that emits secondary electrons and is immersed in a two‐electron temperature nonmagnetized, collisionless plasma is presented. The electron velocity distribution function is assumed to be a two‐temperature maxwellian, while the singly charged positive ions and the emitted electrons are assumed to be monoenergetic. It is assumed that the electrons in the pre‐sheath potential drop obey the Boltzmann relation, so that a larger fraction of the hot than of the cool electrons can penetrate to the sheath edge. Our model predicts that the collector can in some cases have 3 and in some cases, when the emission of electrons from the collector is critical, even 5 different floating potentials at the same hot to cool electron temperature and density ratios very far away from the collector. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

碰撞对两种正离子的电负性磁鞘影响的数值研究

建立包括两种正离子的电负性磁鞘的流体模型,利用四阶龙格库塔法数值求解描述一维稳态等离子体鞘层的方程组,考察离子与中性粒子碰撞对一维稳态等离子体鞘层的影响.结果表明:鞘边Ar⁺与He⁺的含量比值与碰撞参数对离子马赫数的取值范围都有影响.鞘边负离子含量越少,碰撞对鞘层中带电粒子密度的影响越明显.并且随碰撞参数的加大,鞘层中电子、负离子的密度下降越快,两种正离子的密度则呈现不同的波动变化.鞘边负离子含量越多,碰撞对鞘层中两种正离子的速度影响就越明显.此外,碰撞参数越大对鞘边δ越大的鞘层中的带电粒子密度影响越大.     

Negative Ion Kinetics in RF Glow Discharges

Using temporally and spatially resolved laser spectroscopy, we have determined the identities, approximate concentrations, effects on the local field, and kinetics of formation and loss of negative ions in RF discharges. Cl- and BCl3- are the dominant negative ions found in low-frequency discharges through Cl2 and BCl3, respectively. The electron affinity for Cl is measured to be 3.6118 ± 0.0005 eV. Negative ion kinetics are strongly affected by application of the RF field. Formation of negative ions by attachment of slow electrons in RF discharges is governed by the extent and duration of electron energy relaxation. Similarly, destruction of negative ions by collisional detachment and field extraction is dependent upon ion energy modulation. Thus, at low frequency, the anion density peaks at the beginning of the anodic and cathodic half-cycles after electrons have attached but before detachment and extraction have had time to occur. At higher frequencies, electrons have insufficient time to attach before they are reheated and the instantaneous anion density in the sheath is greatly reduced. When the negative ion density is comparable to the positive ion density, the plasma potential is observed to lie below the anode potential, double layers form between sheath and plasma, and anions and electrons are accelerated by large sheath fields to electrode surfaces.     

两种温度电子对稳态等离子体鞘层的影响

建立包含冷热电子的无碰撞等离子体鞘层的流体模型,利用数值模拟研究含有两种温度电子时等离子体鞘层的产生.结果表明:对于含有两种不同温度电子的稳态等离子体,冷电子的温度越低或者冷电子的含量越多,鞘边离子的马赫数临界值就越小,鞘层的宽度就变得越窄,沉积器壁的离子动能流也就越少.此外,研究不同种类的等离子体(Ar、Ke、Xe),鞘层厚度和离子沉积器壁动能流受冷电子的影响.     

ECR微波等离子体离子输运的数值模拟

建立了ECR微波等离子体源离子输运的平板和圆柱模型,对离子历经的空间区域的输运过程进行了数值研究。采用Monte Carlo(M-C)方法模拟了存在外磁场情况下,离子离开开放电室后历经中性区、鞘层区、最后被加负偏压的工作表面吸收的全过程,考虑了离子与中性粒子的电荷交换碰撞玫弱性散性,统一处理了中性区和鞘层区电势的衔接,采用曲线拟合,电势自洽迭代方法把中性区和鞘层区衔接起来,得到了光滑自治的电势分布曲线和鞘层区不同位置处的速度分布、能量分布及角分布。     

负离子对等离子体鞘层特性影响的数值研究

构造强电负性等离子体中平板电极处鞘层形成的模型,使用流体动力学方程组研究等离子体鞘层.得到空间电势、空间静电荷分布和鞘层宽度作为距离函数的数值结果.结果表明,强电负性鞘层中,在等离子体区和鞘层区之间几乎没有过渡的预鞘区,在靠近极板附近鞘层里的电子、负离子和正离子的分布形成一个纯正离子鞘区.在靠近鞘边附近,空间静电荷密度分布有一个很尖的峰.发现同电正性情形相比,强电负性鞘层的宽度要窄很多,空间电势下降得快得多.     

Fluid Model of a Sheath Formed in Front of an Electron Emitting Electrode Immersed in a Plasma with Two Electron Temperatures

The formation of a sheath in front of a negatively biased electrode (collector) that emits electrons is studied by a one‐dimensional fluid model. Electron and ion emission coefficients are introduced in the model. It is assumed that the electrode is immersed in a plasma that contains energetic electrons. The electron velocity distribution function is assumed to be a sum of two Maxwellian distributions with two different temperatures, while the ions and the emitted electrons are assumed to be monoenergetic. The condition for zero electric field at the collector is derived. Using this equation the dependence of electron and ion critical emission coefficients on various parameters ‐ like the ratio between the hot and cool electron density, the ratio between hot and cool electron temperature and the initial velocity of secondary electrons ‐ is calculated for a floating collector. A modification of the Bohm criterion due to the presence of hot and emitted electrons is also given. The transition between space charge limited and temperature limited electron emission for a current‐carrying collector is also analyzed. The critical potential, where this transition occurs, is calculated as a function of several parameters like the Richardson emission current, the ratio between the hot and cool electron density, the ratio between hot and cool electron temperature and the initial velocity of secondary electrons. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

二次电子分布函数对绝缘壁面稳态鞘层特性的影响

由于缺乏详细的理论计算和实验结果,在研究绝缘壁面稳态流体鞘层特性时,通常假设壁面出射的总二次电子服从单能分布(0)、半Maxwellian分布等.在单能电子轰击壁面的详细二次电子发射模型基础上,采用Monte Carlo方法统计发现:当入射电子服从Maxwellian分布时,绝缘壁面发射的总二次电子服从三温Maxwellian分布.进而,采用一维稳态流体鞘层模型进行对比研究,结果表明:二次电子分布函数对鞘边离子能量、壁面电势、电势及电子/离子密度分布等均具有明显影响;总二次电子服从三温Maxwellian分布时,临界空间电荷饱和鞘层无解,表明随着壁面总二次电子发射系数的增加,鞘层直接从经典鞘层结构过渡到反鞘层结构.     

Plasma-wall interactions in DC discharges and sheath of Langmuir probes

The plasma-wall interactions in various DC discharges and sheath of Langmuir probe are analyzed and discussed. The methods of their investigations are discussed including fluid and PIC MC. Various assumptions used in fluid models e.g. plasma neutrality, Bohm criterion, Boltzmann electrons approximation, etc. are analyzed. Ion heating and electron cooling effect at the DC plasma wall is discussed and explained. Langmuir probes measurements in high-temperature and ion thruster plasma are analyzed. The secondary electron emission influences the IV characteristic of Langmuir probe especially at positive voltages. However, only elastic reflection processes really contribute significantly to the probe current. The elastic SEE processes reflect electrons from probe with the same relatively high speed. It was observed that the axial magnetic field influences probe characteristics and floating potential more significantly than radial field. The axial field deflects all electrons approaching probe.     

Influence of the temperature of positive ions on the sheath formation and parameter space region in magnetized electronegative plasmas

The parameter space regions and the sheath formation in an electronegative discharge in the presence of thermal positive ions and oblique magnetic field are investigated. It is assumed that the negative species are in thermal equilibrium and the positive ions have a finite temperature. Three regimes of uniform, multilayer stratified and pure stratified are found as functions of positive and negative ion temperature, electronegativity and the magnetic field. The influence of positive ion temperature in the presence of magnetic field on the profiles of the positive ion density, positive ion velocity and electric potential are investigated. The positive ion flux at the sheath edge as a function of magnetic field is obtained for different collisionality and positive and negative ion temperatures. Finally, the influence of the magnetic field, collision frequency and the positive ion temperature on the parameter space regions are discussed.