Direct role of hydrogen in the Staebler-Wronski effect in hydrogenated amorphous silicon

We report a hydrogen-related defect that establishes the direct role of hydrogen in stabilizing the silicon dangling bonds created in the Staebler-Wronski effect in hydrogenated amorphous silicon. A specific NMR signal due to paired hydrogen atoms occurs only after optical excitation, exists at an intensity that is consistent with the density of optically induced silicon dangling bonds, and anneals at temperatures that are consistent with the annealing of the optically induced silicon dangling bonds. At this defect the hydrogen atoms are 2.3+/-0.2 A apart.     

Metastability of amorphous silicon from silicon network rebonding

We propose a network rebonding model for light-induced metastability in amorphous silicon, involving bonding rearrangements of silicon and hydrogen atoms. Nonradiative recombination breaks weak silicon bonds and generates dangling bond-floating bond pairs, with very low activation energies. The transient floating bonds annihilate, generating local hydrogen motion. Charged defects are also found. Support for these processes is found with tight-binding molecular dynamics simulations. The model accounts for major experimental features of the Staebler-Wronski effect including electron-spin resonance data, the t(1/3) kinetics of defect formation, two types of metastable dangling bonds, and hysteretic annealing.     

用HREELS研究氢在GaAs和InP的(111),(111)表面上的吸附

氢在GaAs和InP表面上的吸附可以用高分辨率电子能量损失谱(HREELS)来探测。Ga—H,As—H,In—H和P—H键的伸缩振动各自对应于不同的能量损失。但是As—H振动极容易和Ga—H振动追加声子损失相混淆,只有从损失峰的相对强度比较上来区别。实验得到吸附的氢与表面原子的成键情况取决于表面的原子结构及电子分布。对于GaAs(111)面,低暴露量时只形成Ga—H键,而高暴露量时还可以形成As—H键。而InP(111)表面由于是经过磷气氛退火处理的,在低暴露量下In—H与P—H键均可形成。InP(Ⅲ)面上只看到P—H损失峰,说明这个表面是完全以P原子结尾的。在(Ⅲ)面上出现小面的情形,则表面Ⅲ族和Ⅴ族原子均可同氢成键。 关键词：     

Hydrogen adsorption on the silicon (001) surface and on a step on the (111) surface

Adsorption of atomic hydrogen on an ideal (001) silicon surface is investigated in the present paper. Saturation of one of the two dangling bonds of a silicon atom on this surface by hydrogen removes the interaction (hybridization) between them, resulting in the appearance of a bonding and an antibonding chemisorption state associated with the attacked dangling bond, and in the shift of the peak of the remaining unsaturated dangling bond to the energy typical of a surface state of the (111) surface. Further saturation leads to the disappearance of this peak from the energy spectrum. An analogous situation occurs for the silicon atom with two dangling bonds on a step on the (111) surface, when hydrogen is chemisorbed. Both examples testify to the local chemical nature of Shockley surface states in silicon.The authors thank A. N. Sorokin for useful discussions.     

氢化非晶硅叠层薄膜对单晶硅表面钝化研究

采用等离子体增强化学气相沉积法生长的单层本征氢化非晶硅薄膜对单晶硅片进行钝化,结果表明增加氢稀释比有利于减少薄膜中的缺陷,增强钝化效果,过量的氢稀释比会导致非晶硅在硅片表面的外延晶化生长,降低钝化效果。退火导致非晶硅晶化程度增加,降低了钝化效果,同时退火提升了薄膜的质量,改变了H键合方式,增强了钝化效果。因此,单层氢化非晶硅只有在合适的氢稀释比和退火温度才可以获得最佳钝化效果。为了提高非晶硅薄膜对硅片的钝化效果,采用具有高低氢稀释比的叠层本征非晶硅薄膜对硅片进行钝化。因此将高氢稀释比沉积的非晶硅薄膜叠层生长于低氢稀释比的薄膜之上,避免非晶硅在硅片表面的外延生长。在退火过程中,高氢稀释比薄膜中的氢扩散到低氢稀释比薄膜中,有效地钝化了非晶硅中和单晶硅表面的悬挂键,改善了非晶硅/硅片的界面质量,叠层钝化后硅片的少子寿命为7.36 ms,隐含开路电压为732 mV。     

用HREELS研究氢在GaAs和InP的（111），（III）表面上的吸附

氢在GaAs, 和InP 表面上的吸附可以用高分辨率电子能量损失谱(HREELS) 来探测.Ga-H侧, As-H , In-H 和P-H 键的伸缩振动各自对应于不同的能量损失. 但是A-H 振动极容易和Ga-H 振动追加声子损失相混淆, 只有从损失峰的相对强度比较上来区别。实验得到吸附的氢与表面原子的成键情况取决于表面的原子结构及电子分布. 对于GaAs (1 1 1)面, 低暴露量时只形成Ga-H 键, 而高暴露量时还可以形成As-H 键.而InP(1 1 1 ) 表面由于是经过磷气氛退火处理的, 在低暴露量下In 一H 与P一H 键均可形成. InP (III) 面上只看到P-H 损失峰, 说明这个表面是完全以P 原子结尾的. 在(1 1 1 ) 面上出现小面的情形, 则表面III族和V族原子均可同氢成键. 关键词：     

多孔硅量子点的受激辐射：陷阱态的作用

 经激光辐照和高温退火后能够在硅基上生成氧化多孔硅结构。用514 nm的激光泵浦,观测到该多孔硅的受激辐射。当激励强度超过阈值时,在650～750 nm区域有很强的受激发光峰。这些受激发光峰的半高宽小于0.5 nm。激光辐照和高温退火后,在样品上能形成某些特殊的氧化结构。在傅里叶红外光谱分析中,显示有硅氧双键或硅氧桥键在硅表面形成。计算结果表明：当硅氧双键或硅氧桥键形成时,电子的陷阱态出现在纳晶硅的带隙中。价带顶和陷阱态之间的粒子数反转是解释这种受激辐射的关键。     

The special features of adsorption and the kinetics of decomposition of monosilane molecules on the epitaxial surface of silicon

Analytic equations relating the rate of the incorporation of silicon atoms into a growing crystal to the characteristic frequency of the pyrolysis of silane molecules on the surface of silicon were obtained over the temperature range corresponding to the epitaxial growth of silicon films. As distinct from the earlier works, it was assumed that adsorbed silicon atoms and monosilane molecules formed double bonds with the surface. The data of technological experiments for the most extensively used pyrolysis models obtained thus far were used to determine the region of the characteristic frequencies of the decomposition of hydride molecule radicals adsorbed on the surface of a silicon plate over the temperature range 450–700°C. The temperature dependence of the frequency of monosilane molecule decomposition was shown to be to a great extent determined by the form of the temperature dependence of the $ \tilde v_{SiH_2 }^0 $ \tilde v_{SiH_2 }^0 preexponential factor. It was also found that the characteristic frequency of the decomposition of silane molecules was sensitive to the stage of pyrolysis at which hydrogen atoms released from silane molecules were captured by the surface. Decomposition occurred at the highest rate if hydrogen molecules were adsorbed at the stage of the adsorption of monosilane. The lowest rate of decomposition was observed if hydrogen molecules were adsorbed at the stage of the decomposition of radicals already captured by the surface. The temperature dependence of the coefficient of adsorption of monosilane molecules was characterized by a negative activation energy of the process for almost all the most important system models over the temperature range of growth. At elevated growth temperatures, the adsorption of monosilane molecules by the surface of silicon proceeded via an intermediate state characterized by the difference of desorption and chemisorption energies on the order of 0.28 eV.     

高温退火处理下SiNx薄膜组成及键合结构变化

采用等离子增强化学气相沉积法, 以氨气和硅烷为反应气体, p型单晶硅为衬底, 低温下(200 ℃)制备了非化学计量比氮化硅(SiN_x)薄膜. 在N₂氛围中, 于500–1100 ℃范围内对薄膜进行热退火处理. 室温下分别使用Fourier变换红外吸收(FTIR)光谱技术和X射线光电子能谱(XPS)技术测量未退火以及退火处理后SiN_x薄膜的Si–N, Si–H, N–H键键合结构和Si 2p, N 1s电子结合能以及薄膜内N和Si原子含量比值R的变化. 详细讨论了不同温度退火处理下SiN_x薄膜的FTIR和XPS光谱演化同薄膜内Si, N, H原子间键合方式变化之间的关系. 通过分析FTIR和XPS光谱发现退火温度低于800 ℃时, SiN_x薄膜内Si–H和N–H键断裂后主要形成Si–N键; 当退火温度高于800 ℃时薄膜内Si–H和N–H键断裂利于N元素逸出和Si纳米粒子的形成; 当退火温度达到1100 ℃时N₂与SiN_x薄膜产生化学反应导致薄膜内N和Si原子含量比值R增加. 这些结果有助于控制高温下SiN_x薄膜可能产生的化学反应和优化SiN_x薄膜内的Si纳米粒子制备参数. 关键词： x薄膜')" href="#">SiN_x薄膜 Fourier变换红外吸收光谱 X射线光电子能谱 键合结构     

SrO/Si(100)表面去氧过程的研究

借助高温扫描隧道显微镜和光电子能谱技术,深入研究了SrO/Si(100)表面向Sr/Si(100)再构表面的动态转化过程.Sr/Si(100)再构表面在硅基氧化物外延生长中起重要作用.在该动态转化过程中,样品在500 ℃的退火温度下,表面出现SrO晶化的现象;在550—590 ℃的退火温度下,SrO/Si(100)开始向Sr/Si(100)转化,界面和表面上的氧以气态的SiO溢出,使得表面出现大量凹槽状缺陷.并且在此动态转化过程中表面的电子态表现出金属特性,这是由于表层硅原子发生断键重排,从而在表面出现悬 关键词： SrO/Si表面 Sr/Si表面 扫描隧道显微镜 去氧过程     

Hydrogen diffusion and electronic metastability in amorphous silicon

Hydrogen diffusion and its role in the many electronic metastability phenomena in hydrogenated amorphous silicon (a-Si:H) is reviewed. A-Si:H contains about 10 at% hydrogen, most of which is bonded to silicon. The hydrogen diffuses at relatively low temperatures by releasing hydrogen from the Si-H bonds into interstitial sites. The reactions of hydrogen with the silicon dangling bonds and the weak bonds provide a hydrogen-mediated mechanism for electron-structural interactions, which are manifested as electronic metastability. The annealing of light-induced defects, the equilibration of defects and dopants, the stretched exponential relaxation kinetics, and the atomic structure formed during growth, are all attributed to hydrogen diffusion.     

多孔硅量子点中的电子局域态

经过激光辐照和高温退火加工能够生成多孔硅样品,在650—780 nm处检测到很强的光致荧光（PL）峰,并且有明显的钉扎和增强效应.实验表明,这种PL发光的强度与样品受辐照和退火的时间短密切相关.通过第一性原理模拟计算发现,样品表面用SiO 双键和Si—O—Si桥键钝化,能隙中会出现电子局域态.激光辐照和高温退火的时间长短决定了样品表面SiO双键和Si—O—Si桥键的密度,而该密度正是影响多孔硅量子点中电子局域态生成的关键. 关键词： 多孔硅量子点 硅氧钝化键 电子局域态     

A theoretical examination of the chemisorption of benzene on Si(100)−(2 × 1)

A theoretical examination of the structure of the adsorbed state of benzene on the Si(100)-(2 × 1) surface is discussed. A number of potential candidate structures are examined. The local minimum in the total energy for each structure has been calculated with respect to variations in the atomic coordinates for the adsorbed benzene structure and the first four layers of the substrate. The preferred structure is the one with the lowest value for the total energy. This structure, in agreement with the experimental observations, describes a topology for the adsorbed benzene with no Si-H bonds and all the C-H bonds remaining intact. The benzene ring is oriented at an angle of 24° from the surface plane. Four of the carbon atoms are bonded to the silicon surface. Two silicon atoms are each bonded to two carbon atoms.     

Kinetics of the decomposition of disilane molecules on a silicon growth surface in vacuum chemical epitaxy

In the framework of the kinetic approach based on data of technological experiments, the range of characteristic rates of decomposition of disilane radical molecules adsorbed on the surface during the growth of a silicon layer is determined. The relationship between the rate of incorporation of silicon atoms into a growing crystal and the characteristic rate of pyrolysis of hydride molecules on the growing surface is established. The temperature dependences of the decomposition rate of disilane molecules exhibit an unusual activationless behavior in the growth temperature range. The form of the observed dependences is determined by the pyrolysis model, conditions of transferred of hydrogen from an adsorbed molecule onto the surface of the growing layer, being a function of the gas pressure and temperature in the reactor. It is demonstrated that the basic features of the behavior of the decomposition rate of disilane molecules are controlled by the specifics of the interaction of the silicon dihydride molecular beam with the growth surface under conditions of low and high degrees of bonding of hydrogen to free surface bonds. The temperature dependences are qualitatively described by a relation composed of two activation curves with different activation energies at low and high temperatures and preexponential factors depending on the surface coverage by hydrogen atoms.     

Activation of silicon quantum dots for emission

The emission of silicon quantum dots is weak when their surface is passivated well. Oxygen or nitrogen on the surface of silicon quantum dots can break the passivation to form localized electronic states in the band gap to generate active centers where stronger emission occurs. From this point of view, we can build up radiative matter for emission. Emissions of various wavelengths can be obtained by controlling the surface bonds of silicon quantum dots. Our experimental results demonstrate that annealing is important in the treatment of the activation, and stimulated emissions at about 600 and 700 nm take place on active silicon quantum dots.     

Investigation of radiation-induced mixed interstitial configurations in a dilute nickel 1 at.% silicon alloy

Abstract

X-ray energy spectra induced by 1 MeV protons and the energy spectra of the backscattered protons have been examined in the <100> and <110> directions of Ni crystals containing 1 at.% Si. The channeling method was used to investigate interactions between the radiation-induced defects and the silicon atoms. From the measured minimum yields and from the shape of the angular scans the fraction of silicon atoms is determined, which are displaced into the <100> and <110> channels due to proton or helium irradiations and subsequent annealing treatments. In undamaged crystals about 98 % of the silicon atoms are on normal lattice sites. After irradiation a dose dependent fraction of the silicon atoms is displaced 0.05 nm away from the substitutional position indicating the formation of a mixed dumbbell consisting of one selfinterstitial atom and one silicon atom. However, the experimental data can also be interpreted by the assumption of a NiSi₂ complex, in which the silicon atoms are displaced 0.08 nm from the lattice site. Subsequent annealing from 50 K to 160 K does not change the configuration and the concentration of the silicon complexes. At room temperature the silicon atoms in the complex are positioned 0.04 nm from the lattice position. The silicon complexes were totally am ihilated at 400 K.     

表面氧钝化碳化硅纳米团簇电子结构和光学性质的第一性原理研究

基于密度泛函理论(DFT)和广义梯度近似(GGA),对氧钝化条件下4H-SiC纳米团簇的电子结构和光学性质进行了研究。计算了不同直径的4H-SiC纳米球氧钝化后的能带结构、电子态密度和光学性质。团簇的尺度在0.4~0.9 nm之间,构建表面仅存在硅氧双键和表面仅存在碳氧双键的两种模型。研究表明硅氧双键和碳氧双键所引起的缺陷态位于原4H-SiC的价带和导带之间,并且缺陷态与价带顶的能量差随纳米团簇颗粒直径的增大而减小;缺陷态主要是由Si原子外层电子和氧原子外层电子轨道杂化引起的。同时,由于氧的存在,对碳化硅的结构产生一定的影响,这也是缺陷态形成的一个原因。另外,碳氧双键和硅氧双键钝化对4H-SiC纳米团簇的光学性质有着不同的影响。在表面仅存在C=O的情况下,4H-SiC纳米团簇表现出各向同性的性质。在表面仅存在Si=O的情况下,4H-SiC纳米团簇表现出各向异性的性质。     

Structure,impurity composition,and photoluminescence of mechanically polished layers of single-crystal silicon

The introduction of optically active defects (such as atomic clusters, dislocations, precipitates) into a silicon single crystal using irradiation, plastic deformation, or heat treatment has been considered a possible approach to the design of silicon-based light-emitting structures in the near infrared region. Defects were introduced into silicon plates by traditional mechanical polishing. The changes in the defect structure and the impurity composition of damaged silicon layers during thermal annealing (TA) of a crystal were examined using transmission electronic microscopy and x-ray fluorescence. Optical properties of the defects were studied at 77 K using photoluminescence (PL) in the near infrared region. It has been shown that the defects generated by mechanical polishing transform into dislocations and dislocation loops and that SiO₂ precipitates also form as a result of annealing at temperatures of 850 to 1000°C. Depending on the annealing temperature, either oxide precipitates or dislocations decorated by copper atoms, which are gettered from the crystal bulk, make the predominant contribution to PL spectra.     

Hydrogen-induced surface metallization of beta-SiC(100)-(3x2) revisited by density functional theory calculations

Recent experiments on the silicon terminated (3 x 2)-SiC(100) surface indicated an unexpected metallic character upon hydrogen adsorption. This effect was attributed to the bonding of hydrogen to a row of Si atoms and to the stabilization of a neighboring dangling bond row. Here, on the basis of density-functional calculations, we show that multiple-layer adsorption of H at the reconstructed surface is compatible with a different geometry: in addition to saturating the topmost Si dangling bonds, H atoms are adsorbed at rather unusual sites, i.e., stable bridge positions above third-layer Si dimers. The results thus suggest an alternative interpretation for the electronic structure of the metallic surface.     

界面氢键对受限水结构和动态特性的影响

应用反应力场分子动力学方法, 模拟了水限制在全羟基化二氧化硅晶体表面间的弛豫过程, 研究了基底表面与水形成的界面氢键, 及其对受限水结构和动态特性行为的影响. 当基底表面硅醇固定时, 靠近基底表面水分子中的氧原子与基底表面的氢原子形成强氢键, 这使得靠近表面水分子中的氧原子比对应的氢原子更靠近基底表面, 从而水分子的偶极矩远离表面. 当基底表面硅醇可动时, 靠近基底表面水分子与基底表面原子形成两种强氢键, 一种是水分子中的氧原子与表面的氢原子形成的强氢键, 数量较少, 另一种是水分子中的氢原子与表面的氧原子形成的强氢键, 数量较多, 这使得靠近表面水分子中的氢原子比对应的氧原子更靠近表面, 从而水分子的偶极矩指向表面. 在相同几何间距下, 当基底表面硅醇可动时, 表面的活动性使得几何限制作用减弱, 导致了受限水分层现象没有固定表面限制下的明显. 此外, 固定表面比可动表面与水形成的界面氢键作用较强, 数量较多, 导致了可动表面限制下水的运动更为剧烈.