Coverage dependent adsorption site for sulfur on Ni(111)

Angular-resolved photoemission spectra have been observed from two ordered sulfur overlayers, p(2×2) and (√3 ×√3)R30°, representing different coverages on the Ni(111) surface. Utilization of selection rules applicable to photoemission along the sample normal permits an assignment of placement and composition of the adsorbate induced bands. The spectra show dramatic changes in peak positions between these two overlayers similar in magnitude to those observed on Ni(100). The shifts in peak positions are attributed to symmetry prescribed changes in the surface unit cell relating to the character of the bond. Arguments that these changes provide evidence that the bonding site of the adsorbate atom may change with coverage are presented.     

Nickel carbonyl adsorption on the Ni(111) surface

Overlayers formed by the adsorption of Ni(CO)₄ in CO on the Ni(111) surface at 100 K were characterized using high resolution electron energy loss spectroscopy and thermal desorption spectroscopy. At temperatures below 135 K, molecular nickel carbonyl adsorbs on the CO saturated Ni(111) surface as suggested by several observations. Vibrational transitions characteristic of molecular Ni(CO)₄ are dominant. The energy dependence of both the elastic and inelastic electron scattering cross sections are dramatically altered by Ni(CO)₄ adsorption. All of the mass spectrometer ionization fragments typical of molecular Ni(CO)₄ are observed in the narrow thermal desorption peak at 150 K. The inelastic scattering cross sections for both adsorbed nickel carbonyl and adsorbed CO on the Ni(111) surface suggest that a nonresonant dipole scattering mechanism is dominant.     

Ethylene-oxide adsorption on Ni(111): Hreels and Arups investigations

The adsorption of ethylene-oxide (Et-O) on Ni(111) was studied with high resolution electron energy loss spectroscopy and angular resolved UV-light induced photoelectron spectroscopy (ARUPS) at 140K; these measurements were complemented by thermal desorption spectroscopy (TDS) and workfunction change measurements ( δφ ).For fractional Et-O monolayer coverages five loss peaks were observed with HREELS at 835, 1155, 1270, 1495 and 3150 cm⁻¹ which are attributed to the C₂O ring deformation, CH₂ wagging and twisting modes, to the C₂O ring breathing, to the CH₂ scissor modes and C-H stretching modes of molecular adsorbed Et-O. At low coverage, the HREELS is dominated by the 835 and 3150 cm⁻¹ losses, whereas the 1155, 1270 and 1495 cm⁻¹show only weak intensities. The latter loss peaks increase significantly in intensity for Et-O coverage near the saturation of the first adsorption layer, θ (Et-O)~0.3.UPS measurements confirm the molecular adsorption of Et-O on Ni(111) at 140 K. Compared to the Et-O gas phase UPS, a considerable shift to lower binding energy is observed for the 6a₁ oxygen lone pair orbital and also for the 2b₁ (n, σ_CO, σ_CC) which has some lone pair character. These chemical shifts suggest a bonding of Et-O to Ni(111) through the oxygen atom.     

The kinetics of dehydrogenated adsorption of ethylene on Ni(111)

The adsorption of ethylene on Ni(111) has been studied with Thermal Desorption and Auger Electron Spectroscopy. With these methods the coexistence of an acetylenic complex and hydrogen for low coverages, and the displacement of the hydrogen by the acetylenic complex for increasing coverage can be quantitatively described.     

First principles investigations of hydrazine adsorption conformations on Ni(111) surface

Theoretical investigation on hydrazine (N₂H₄) adsorption on Ni(111) was done by using density functional theory. Stability and mechanism of hydrazine adsorption in anti, gauche and cis conformation on nickel surface were studied. Charge transfer between lone-pair orbital and d-band was found to stabilize the anti-conformation as the most stable conformation, in contrast with hydrazine in the gas-phase where gauche conformation is more favored. However, the derived anti-bonding state between adsorbate and substrate is partially occupied due to the spin-polarization in the local states near the Fermi level and thus contributes in weakening the bonding. The stable adsorption structure was further verified by comparing the calculated vibrational frequencies with HREELS measurement results. The results were found to be in agreement with experimental results. It was also found that the adsorption in cis-conformation is a transition state as evident from the existence of imaginary frequency on its lowest vibrational mode which belongs to NH₂ torsional movement around N–N axis.     

Carbon segregation and dissolution induced by tellurium adsorption on Ni(111)

Carbon has been observed to segregate to the surface during deposition of Te to form the 2(√3 × √3)R30° structure on a Ni(111) surface. The carbon redissolves into the bulk when the Te coverage is increased to form a (√3 × √3)R30° + 2(√3 × √3)R30° mixed phase.     

An electron spectroscopic investigation of the adsorption of NO on Ni(111)

The adsorption, decomposition, and desorption of NO on the close packed Ni(111) surface have been investigated by XPS, XPS satellites, XAES, UPS, and LEED between 125 and 1000 K. At adsorption temperatures below 300 K a single molecular species (v) is formed with about unit sticking coefficient, which is interpreted as bridge-bonded; its saturation coverage is about 85% of that of CO, i.e. 0.5 relative to surface Ni atoms. Adsorption at 300 to 400 K yields dissociative adsorption (β) followed by molecular adsorption; above 400 K only dissociated species are formed. Upon heating, a full molecular layer dissociates only after some NO desorption (at 380–400 K), while dilute layers (below half coverage) dissociate already above 300 K without NO desorption. Together with quantitative findings this shows that for dissociation of one v-NO, the space of two is required. N₂ desorption from the β-layer occurs above 740 K; the oxygen staying behind diffuses into the crystal above 800 K. Readsorption of NO onto a β-layer or onto an oxygen precoverage at 125 K leads, besides to an α₁-state similar to v-NO, to another molecular state (α₂) which is interpreted as linearly bound. The resulting total coverage is considerably higher than in a virgin layer. This shows that the blocking of dissociation in a full v-layer is probably not due to β requiring the same sites, but to kinetic hindrance; an influence of β-induced surface reconstruction cannot be excluded, however. The LEED results agree with a previous report and are well compatible with the other results.     

Ni(111)表面C原子吸附的密度泛函研究

基于密度泛函理论的第一性原理计算,对过渡金属Ni晶体与Ni (111)表面的结构和电子性质进行了研究, 并探讨了单个C原子在过渡金属Ni (111)表面的吸附以及两个C原子在Ni(111)表面的共吸附. 能带和态密度计算表明, Ni晶体及Ni (111)表面在费米面处均存在显著的电子自旋极化. 通过比较Ni (111)表面各位点的吸附能,发现单个C原子在该表面最稳定的吸附位置为第二层Ni原子上方所在的六角密排洞位, 吸附的第二个C原子与它形成碳二聚物时最稳定吸附位为第三层Ni原子上方所在的面心立方洞位. 电荷分析表明,共吸附时从每个C原子上各有1.566e电荷转移至相邻的Ni原子, 与单个C原子吸附时C与Ni原子间的电荷转移量(1.68e)相当. 计算发现两个C原子共吸附时在六角密排洞位和面心立方洞位的磁矩分别为0.059μ_B和 0.060μ_B,其值略大于单个C原子吸附时所具有的磁矩(0.017μ_B).     

第一性原理研究氧在Ni(111)表面上的吸附能及功函数

采用基于密度泛函理论（DFT）广义梯度近似（GGA）下的第一性原理方法系统地研究了不同覆盖度下O在Ni（111）表面的吸附特性.计算结果表明,O在Ni（111）表面的稳定吸附位为三重面心立方（fcc）洞位,吸附能随着覆盖度的增加而减小,O诱导Ni（111）表面功函数的变化量与覆盖度成近线性关系,并随着覆盖度的增加而增大.同时,通过对电子密度和分波态密度的分析发现：O在Ni（111）表面的吸附使得Ni表面电子向O原子转移,形成表面偶极矩,导致功函数增加;表面Ni原子的3d轨道和O的2p轨道通过耦合、杂化作用形成成键态和反键态,而反键态几乎不被占据,因而O—Ni键相互作用比较强,吸附能较大. 关键词： 表面吸附 密度泛函理论 吸附能 功函数     

Bromine adsorption on Cu(111)

The dissociative chemisorption of molecular bromine on Cu(111) at 300 K has been studied using ultraviolet photoelectron spectroscopy (UPS), Auger electron spectroscopy (AES), low energy electron diffraction (LEED) and work function change measurements. A (√3 × √3)R30° structure is formed initially at a bromine coverage of 0.33 ML. This then converts to a (9√3 × 9√3)R30° compression structure with a coverage of 0.41 ML. The coincidence distance of the compression structure is determined entirely by the van der Waals diameter of adsorbed bromine. The applicability of using the van der Waals diameters of the three halogens, Cl, Br and I, to predict the saturation compression structures on Cu(111), is discussed.     

Low temperature adsorption and site-conversion process of CO on the Ni(111) surface

Low-temperature (25 K) adsorption states and the site conversion of adsorbed CO between the ontop and the hollow sites on Ni(111) were studied by means of temperature programmed desorption and infrared reflection absorption spectroscopy. The activation energy and pre-exponential factor of desorption were estimated to be 1.2 eV and 2.6 × 10¹³ s^? 1, respectively, in the limit of zero coverage. At low coverage, CO molecules preferentially adsorbed at the hollow sites below 100 K. With increasing temperature, the ontop sites were also occupied. Using a van't Hoff plot, the enthalpy and the entropy differences between the hollow and ontop CO were estimated to be 36 meV and 0.043 meV K^? 1, respectively, and the vibrational entropy difference was estimated to be 0.085 meV K^? 1. The positive entropy difference was the result of the low-energy frustrated translational mode of the ontop CO, which was estimated to be 4.6 ± 0.3 meV. With the harmonic approximation, the upper limit of the activation energy of site hopping from ontop sites to hollow sites was estimated to be 61 meV. In addition, it was suggested that the activation energy of hollow-to-hollow site hopping via a bridge site was less than 37 meV.     

The adsorption of N2: Chemisorbed on Ni(110) and physisorbed on Pd(111)

The bonding of molecular N₂ has been investigated with angle resolved photoelectron spectroscopy and inelastic electron scattering. The spectra obtained from N₂ chemisorbed onto a Ni(110) surface are compared to CO chemisorbed onto Ni(110) and to N₂ physisorbed onto Pd(111). The N₂ molecular axis was found to be normal to the crystal surface for the chemisorbed state on Ni(110) and random for the physisorbed state on Pd(111). The NN and NiN₂ stretching frequecies indicate that the N₂ molecule is terminally bonded to a single Ni atom on Ni(110). The binding energies of the two outer σ states and one π state of chemisorbed N₂ were measured, indicating that the bonding of N₂ to a metal surface is different than CO. Both σ states drop in energy compared to the π level due to the fact that both of them are involved in the N₂ substrate bond. The symmetry of the gas phase N₂ molecule is reduced upon adsorption. The consequences of this are seen in the dipole active NN vibrational mode, the large intensity of the Ni-N₂ vibrational mode and the coupling of the adsorbate 4σ(2σ_u) level to the final state resonance which is forbidden by symmetry in the gas phase. Many electron excitation satellite lines are observed in the valence spectra of both the chemisorbed and physisorbed N₂. The physisorbed satellite lines are nearly identical to those seen in gas phase N₂, while the chemisorbed N₂ spectra has new satellite structure, due to the interaction with the substrate.     

The adsorption site and orientation of CH3S on Ni(111)

The angle-resolved X-ray photoelectron spectra for 0.15 monolayers (ML) of sulfur, and 0.25 ML methyl thiolate formed at 100 K and annealed to 150 and 250 K, on Ni(111) are analyzed to determine the structures of these species. It is found that sulfur adsorbs on the face-centered cubic hollow site on Ni(111) with a S---Ni bond length of 2.20±0.02 Å. The thiolate species formed at 150 K has the C---S bond tilted at 35° to the surface normal with a C---S bond length of 1.85±0.02 Å and a S---Ni bond length similar to that for adsorbed sulfur (2.2 Å). The methyl group is tilted toward the bridge site and the thiolate appears to be adsorbed on the face-centered cubic site although there may also be adsorption in the hexagonal close packed site. The species formed at 250 K adsorbs on a reconstructed surface where the chemical shift of the S 2p core level indicates that it adsorbs at a four-fold site and the angle-resolved XPS data indicate that the C---S bond is oriented normal to the surface. The calculated angular variations in intensity are consistent with this interpretation but cannot distinguish between the various models proposed for the reconstructed surface.     

The adsorption sites of CO on Ni(111) as determined by infrared reflection-absorption spectroscopy

The adsorption of CO on Ni(111) has been studied using infrared reflection-absorption spectroscopy combined with LEED, Auger electron spectroscopy, thermal desorption spectroscopy and work function measurements. At low CO coverage (θ = 0.05) CO adsorbs on threefold sites with a strecthing frequency given by ω_CO = 1817 cm^?1. At θ = 0.30 all molecules have shifted to two-fold sites, and θ = 0.50, where a c(4 × 2) structure is observed, ω_CO = 1910 cm^?1. At θ = 0.57, with a (√7/2) × √7/2)R19.1° structure, one quarter of the molecules are adsorbed on top of the nickel atoms with the others in two-fold sites. Molecules bonded on the top sites give rise to a band at 2045 cm^?1. The frequency shift due to dipole-dipole interactions is small compared with the shift resulting from bonding to different crystallographic sites.