Structural and electrical properties of crystalline (1−x)Ta2O5−xTiO2 thin films fabricated by metalorganic decomposition

Polycrystalline (1−x)Ta₂O₅−xTiO₂ thin films were formed on Si by metalorganic decomposition (MOD) and annealed at various temperatures. As-deposited films were in the amorphous state and were completely transformed to crystalline after annealing above 600 °C. During crystallization, a thin interfacial SiO₂ layer was formed at the (1−x)Ta₂O₅−xTiO₂/Si interface. Thin films with 0.92Ta₂O₅–0.08TiO₂ composition exhibited superior insulating properties. The measured dielectric constant and dissipation factor at 1 MHz were 9 and 0.015, respectively, for films annealed at 900 °C. The interface trap density was 2.5×10¹¹ cm⁻² eV⁻¹, and flatband voltage was −0.38 V. A charge storage density of 22.8 fC/μm² was obtained at an applied electric field of 3 MV/cm. The leakage current density was lower than 4×10⁻⁹ A/cm² up to an applied electric field of 6 MV/cm.     

Picosecond nonlinear optical response of Ba0.5Sr0.5TiO3 thin films fabricated by pulsed laser deposition

Well-crystallized Ba_0.5Sr_0.5TiO₃ thin films with good surface morphology were prepared on MgO(1 0 0) substrates by pulsed laser deposition technique at a deposition temperature of 800 °C under the oxygen pressure of 2 × 10⁻³ Pa. X-ray diffraction and atomic force microscopy were used to characterize the films. The full width at half maximum of the (0 0 2) Ba_0.5Sr_0.5TiO₃ rocking curve and the root-mean-square surface roughness within the 5 μm × 5 μm area were 0.542° and 0.555 nm, respectively. The nonlinear optical properties of the films were determined by a single beam Z-scan method at a wavelength of 532 nm with laser duration of 55 ps. The results show that Ba_0.5Sr_0.5TiO₃ thin films exhibit a fast third-order nonlinear optical response with the nonlinear refractive index and nonlinear absorption coefficient being n₂ = 5.04 × 10⁻⁶ cm²/kW and β = 3.59 × 10⁻⁶ (m/W), respectively.     

Annealing effects on zirconium nitride films

ZrN films were deposited by dc reactive magnetron sputtering on silicon substrates under optimized nitrogen partial pressure of 6×10⁻⁵ mbar. Structural, electrical and optical properties were systematically investigated. Films deposited at room temperature exhibited Schottky structure without any silicide interfacial layer. These films have electrical resistivity of 4.23×10⁻³ Ω cm, which were crystalline in nature, with cubic (1 1 1) orientation. Refractive index and extinction coefficient were found to be 1.95 and 0.43, respectively at a wavelength of 350 nm.

Samples were annealed for 1 h in air at two temperatures, 350 and 550 °C. Scanning electron microscopy (SEM) and energy dispersive analysis of X-rays (EDAX) showed alloy penetration pits. Extent of penetration was greater in the films, which were annealed at higher temperature (550 °C). Variation in refractive index was observed in the range of 1.95–1.80 at 350 nm, for the annealed films, with increase in grain size from 7.25 to 11.10 nm. Poly-crystalline nature has been observed with (1 1 1) and (2 0 1) orientations. Resistivity is found to increase from 4.23×10⁻³ to 6.21×10⁻³ Ω cm.     

RF-sputtered CrB2 diffusion barrier for Ni/Au Ohmic contacts on p-CuCrO2

Ohmic contacts to p-type CuCrO₂ using Ni/Au/CrB₂/Ti/Au contact metallurgy are reported. The samples were annealed in the 200–700 °C range for 60 s in flowing oxygen ambient. A minimum specific contact resistance of 2 × 10⁻⁵ Ω cm² was obtained after annealing at 400 °C. Further increase in the annealing temperature (>400 °C) resulted in the degradation of contact resistance. Auger Electron Spectroscopy (AES) depth profiling showed that out-diffusion of Ti to the surface of the contact stacks was evident by 400 °C, followed by Cr at higher temperature. The CrB₂ diffusion barrier decreases the specific contact resistance by almost two orders of magnitude relative to Ni/Au alone.     

MnO thin film cathode for rechargeable microbatteries

Thin films of MnO were deposited by electron beam evaporation using a MnO or MnO₂ source. The thin films were charaterized by X-ray and electron diffraction. The Coulomb titration curve reveals a potential plateau of 2.9 V over the composition range 0.05<x<2.0. The chemical diffusion coefficient of lithium in thin films at 15°C is 2.7×10⁻¹⁴ cm²/s for 0<x<0.01 and 2.2×10⁻¹⁵ cm²/s for 0.02<x<0.06. Good reversibility for lithium insertion and extraction is demonstrated by cyclic voltammetry.     

Corrosion monitoring of stainless steel 304L in lithium bromide aqueous solution using transmittance optical detection technique

We report a method based on the power ratio of transmittance for monitoring the corrosion rate in stainless steel 304L immersed in an aqueous solution of lithium bromide at 50 wt%, at 70 °C. The optical transmittance measured in the solution contaminated with corrosion oxides at different times of exposure is related to the physical degradation of the stainless steel samples. Lasers at 532 and 632 nm were utilized for monitoring the accumulation of corrosion oxides dissolved in the lithium bromide solution of the metallic samples for 480 h. The change in the optical power of transmittance was 13 μW/480 h measured at 532 nm and 3.6 μW/480 h at 632 nm. The variation of the power ratio for 532 nm was from 0.01 to 0.24, and for 632 nm, from 0.01×10⁻³ to 15.61×10⁻³; this is proportional to an accumulated corrosion rate of [0.0142×10⁻³–0.552×10⁻³ g/cm²] for an exposure time of 432 h.     

Defect versus nanocrystal luminescence emitted from room temperature and hot-implanted SiO2 layers

Silicon nanocrystals have been synthesized in SiO₂ matrix using Si ion implantation. Si ions were implanted into 300-nm-thick SiO₂ films grown on crystalline Si at energies of 30–55 keV, and with doses of 5×10¹⁵, 3×10¹⁶, and 1×10¹⁷ cm⁻². Implanted samples were subsequently annealed in an N₂ ambient at 500–1100°C during various periods. Photoluminescence spectra for the sample implanted with 1×10¹⁷ cm⁻² at 55 keV show that red luminescence (750 nm) related to Si-nanocrystals clearly increases with annealing temperature and time in intensity, and that weak orange luminescence (600 nm) is observed after annealing at low temperatures of 500°C and 800°C. The luminescence around 600 nm becomes very intense when a thin SiO₂ sample is implanted at a substrate temperature of 400°C with an energy of 30 keV and a low dose of 5×10¹⁵ cm⁻². It vanishes after annealing at 800°C for 30 min. We conclude that this luminescence observed around 600 nm is caused by some radiative defects formed in Si-implanted SiO₂.     

Optical nonlinearities and photo-excited carrier lifetime in CdS at 532 nm

Bound-electronic and free-carrier optical nonlinearities, and relaxation of photo-excited free carriers in CdS have been investigated by the use of a single-beam Z-scan technique at 532 nm. Under pulsed radiation of 35-ps duration with the input irradiances up to 4.8 GW/cm², the two-photon absorption coefficient, the bound-electron nonlinear refractive index, the free-carrier absorption cross-section, and the change in the refractive index per unit carrier density are determined to be 5.4±0.8 cm/GW, −(5.3±0.8)×10⁻¹³ cm²/W, (3.0±0.5)×10⁻¹⁷ cm² and −(0.8±0.1)×10⁻²¹ cm³, respectively. By using these values in the open-aperture Z-scans conducted with 7-ns laser pulses, the carrier recombination time is extracted to be 3.6±0.7 ns. The measured parameters are compared to theoretical calculations.     

Davydov splitting and two-photon excitation of cadmium tungstate (CdWO4) single crystal phosphorescence

Phosphorescence characteristics of CdWO₄ excited by one-photon (λ = 308 nm) and two-photon (λ = 570–590 nm) processes were measured. A Davydov splitting of 120 ± 20 cm⁻¹ was obtained in the phosphorescence spectra, suggesting a diffusion coefficient of about 1.2 × 10⁻² cm² s⁻¹, and a diffusion length of about 3.1 × 10⁻⁴ cm for the room temperature measured lifetime of 8μs. The phosphorescence quantum efficiency was less than 2% at low temperatures (only 0.25% at room temperature), indicating that the dominant decay mechanism was radiationless. The radiative lifetime was thus estimated as 1–2 ms. The two-photon phosphorescence excitation is characterized by an absorption cross-section of the order of 10⁻⁴⁹cm⁴s.     

Chemically deposited copper oxide thin films: structural, optical and electrical characteristics

Thin films of copper oxide with thickness ranging from 0.05–0.45 μm were deposited on microscope glass slides by successively dipping them for 20 s each in a solution of 1 M NaOH and then in a solution of copper complex. Temperature of the NaOH solution was varied from 50–90°C, while that of the copper solution was maintained at room temperature. X-ray diffraction patterns showed that the films, as prepared, are of cuprite structure with composition Cu₂O. Annealing the films in air at 350°C converts these films to CuO. This conversion is accompanied by a shift in the optical band gap from 2.1 eV (direct) to 1.75 eV (direct). The films show p-type conductivity, 5×10⁻⁴ Ω⁻¹ cm⁻¹ for a film of thickness 0.15 μm. Electrical conductivity of this film increases by a factor of 3 when illuminated with 1 kW m⁻² tungsten halogen radiation. Annealing in a nitrogen atmosphere at temperatures up to 400°C does not change the composition of the films. However, the conductivity in the dark as well as the photoconductivity of the film increases by an order of magnitude. The electrical conductivity of the CuO thin films produced by air annealing at 400°C, is high, 7×10⁻³ Ω⁻¹ cm⁻¹. These films are also photoconductive.     

Electrode contact study for SiGe thin film operated at high temperature

A study on the electrode contact of the sputtered SiGe thin film is reported for application of devices working at high temperature. Surface morphological characterization with optical microscope and AFM (atomic force microscope) together with the electrical characterization by TLM measurements (transmission line method) were performed before and after aging at 500 °C for 24 h using various sputtered multilayer electrodes, Ti/Au/Ti, Ta/Pt/Ta and Ti/Pt/Ti, on 300-nm B-doped SiGe thin film deposited by magnetron sputtering and furnace crystallisation at high temperature. After aging at 500 °C for 24 h, the Ti/Au/Ti multilayer electrodes seriously degraded to be non-ohmic contact, showing rough surface morphology. The Ti/Pt/Ti metal layers showed the lowest specific contact, resistivity before and after aging, 1.46 × 10⁻³ Ω cm² and 1.68 × 10² Ω cm² respectively.     

Determination of different oxygen transport mechanisms and measurement of the oxygen ion conductivity of Y1Ba2Cu3O7−x

By undertaking AC electrochemical impedance experiments on yttria stabilised zirconia electrolytes with polished Y₁Ba₂Cu₃O_7−x electrodes, the activation energy for oxygen ion transport within the bulk of Y₁Ba₂Cu₃O_7−x, in air, over the temperature range 823 K–1043 K, was determined to be 1.50 ± 0.05 eV. At 1000 K the oxygen ionic conductivity was calculated to be around one order of magnitude lower than that in yttria stabilised zirconia. Typical calculated values were σ=5×10⁻⁵ (ω cm)⁻¹ and 6×10⁻³ (ω cm)⁻¹ at the respective temperatures 823 K and 1043 K. By employing a similar cell but with Y₁Ba₂Cu₃O_7−x paste electrodes, oxygen transfer between the Y₁Ba₂Cu₃O_7−x and the electrolyte was found to occur via a surface diffusional processes. Over the temperature range 873 K–1098 K, in air, the activation energy for in-diffusion at the surface was found to be 1.4±0.1 eV and that for out-diffusion at the surface to be 1.76±0.05 eV.     

Transparent conductive oxide thin films of CdTe-doped indium oxide prepared by pulsed-laser deposition

Transparent conducting oxide thin film CdTe-doped indium oxide (In₂O₃) has been grown by pulsed-laser deposition from a target of CdTe powder embedded in metallic indium. The electro-optical and structural properties were investigated as a function of oxygen partial pressure (PO₂) and substrate temperature (T_s). A film deposited at T_s=420 °C and PO₂=4 Pa shows the minimum resistivity 7.5×10⁻⁴ Ω cm, its optical transmission is 83% and the carrier concentration was 8.9×10²⁰ cm³. The optical band gap and the average roughness of that sample were 3.6 eV and 6.45 Å, respectively. X-ray diffraction studies indicated that the films were polycrystalline. This material is a good candidate for being used as transparent conductor in the CdTe–CdS solar cell.     

Hadronic production by ee collisions at the energy 990 MeV with the Orsay storage ring

Data were taken at the energy 2E = 990 MeV to search for multibody events, with the same large solid angle detector which has been used for the measurement of the , ω andφ production by e⁺e⁻ annilations. Assuming a π⁺π⁻π⁰π⁰ production by the quasi two-body process e⁺e⁻ → → ωπ⁰ we give the correspondi ng cross section σ(e⁺e⁻ → π⁺π⁻π⁰π⁰) = (1.1 ± 0.5) 10⁻³² cm². Since no events with 3 and 4 charged pions have been observed σ(e⁺e⁻ → π⁺π⁻π⁰π⁻) 1.5 × 10⁻³³ cm².     

Preliminary results on Cu diffusion through grain boundaries of thin ion-plated Ag---Sn films

The diffusion process of copper through grain boundaries of 500 nm thick ion-plated Ag-12at%Sn films was studied in the temperature range 100–250°C. The method is based on the determination of the time of first appearance of Cu on the Ag---Sn surface using Auger electron spectroscopy for determining trace amounts of Cu. An activation energy of E_a = 0.53 eV and a diffusivity of D′_o = 1.3 × 10⁻⁷cm²s⁻¹ was obtained. For comparison, diffusion studies of Cu through ion-plated pure Ag layers have been performed. In this case an activation energy of E_a = 0.68 eV and a diffusivity of D′_o = 2.3 × 10⁻⁵cm²s⁻¹ have been found.     

Laser ablated bismuth cuprate thin films preparation and effect of oxygen nonstoichiometry upon superconductivity

Thin films of Bi₂Sr₂CaCu₂O₈ and (Bi, Pb)₂Sr₂Ca₂Cu₃O₁₀ have been prepared on monocrystalline (100) MgO substrates, using a laser ablation method with post annealing treatment. The influence of substrate temperature and oxygen pressure during deposition were investigated. SEM observations, EDS analysis, electric and magnetic measurements have been used to characterize the films. Superconducting “2212” films, with T_c(R = 0) at 80–83 K and J_c (50 K) up to 5 × 10⁵ A/cm², have been currently achieved, while Pb-doped “2223” films exhibit T_c as high as 110 K with J_c = 5 × 10⁴ A/cm² at 77 K. The effect of annealing at low temperature (350°C) in an argon flow has been studied for the 2212 phase, it shows the influence of the oxygen non-stoichiometry, i.e. of the hole carrier density upon T_c's which can be measured up to 89 K (zero resistance).     

Surface tension and density measurements for indium and uranium using a sessile-drop apparatus with glow discharge cleaning

The sessile-drop method is used to measure the surface tension and density of liquid indium and uranium under high vacuum. Measurements are made over the temperature range 156–500°C for In and at the melting point for U. Surface oxides are efficiently removed with a glow discharge system. Drop profiles are captured by photograph and processed using nonlinear regression to yield the surface tension and density. In this regression procedure, normal distances from calculated profiles to data points are minimized. For indium, the density and surface tension measurements yield _mp = 7.05 × 10³kg/m³, d/dT = −0.776 kg/m³·°C, and γ_mp = 0.568 N/m, dγ/dT = −9.45 × 10⁻⁵ N/m·°C. The results for uranium at the melting point are _mp = 17.47 × 10³ kg/m³ and γ_mp = 1.653 N/m.     

Buffers for high temperature superconductor coatings. Low temperature growth of CeO2 films by metal–organic chemical vapor deposition and their implementation as buffers

Smooth, epitaxial cerium dioxide thin films have been grown in-situ in the 450–650°C temperature range on (001) yttria-stabilized zirconia (YSZ) substrates by metal–organic chemical vapor deposition (MOCVD) using a new fluorine-free liquid Ce precursor. As assessed by X-ray diffraction, transmission electron microscopy (TEM), and high-resolution electron microscopy (HREM), the epitaxial films exhibit a columnar microstructure with atomically abrupt film-substrate interfaces and with only minor bending of the crystal plane parallel to the substrate surface near the interface and at the column boundaries. With fixed precursor temperature and gas flow rate, the CeO₂ growth rate decreases from 10 Å/min at 450°C to 6.5 Å/min at 540°C. The root-mean-square roughness of the films also decreases from 15.5 Å at 450°C to 4.3 Å at 540°C. High-quality, epitaxial YBa₂C₃O_7−x films have been successfully deposited on these MOCVD-derived CeO₂ films grown at temperatures as low as 540°C. They exhibit T_c=86.5 K and J_c=1.08×10⁶ A/cm² at 77.4 K.     

Z-scan determination of the third-order optical nonlinearity of a triphenylmethane dye using 633 nm He–Ne laser

The third-order nonlinear optical response of a triphenylmethane dye (Acid blue 7) was studied using the Z-scan technique with a continuous-wave He–Ne laser radiation at 633 nm. The magnitude and sign of the third-order nonlinear refractive index n₂ of aqueous solution of Acid blue 7 dye were determined; the negative sign indicates a self-defocusing optical nonlinearity in the sample studied. The negative nonlinear refractive index n₂ and nonlinear absorption coefficient β were estimated to be −1.88 × 10⁻⁷ cm²/W and −3.08 × 10⁻³ cm/W, respectively, corresponding to Re(χ⁽³⁾) = −8.35 × 10⁻⁶ esu, and Im(χ⁽³⁾) = −6.88 × 10⁻⁷ esu. The experimental results show that Acid blue 7 dye have potential applications in nonlinear optics.     

Measurement of diffusion coefficients using a quick echo split NMR imaging technique

A new method for the ultrafast generation of diffusion-weighted images is reported. The technique combines a quick echo split NMR imaging sequence with the principle of Stejskal and Tanner. It allows to determine the diffusion constant with nearly the same accuracy as the conventional spin-echo technique, requiring only a fraction of the time. The determined values for water doped with 1 g Cu(NO₃)₂ per liter of H₂O and pure acetone were D_water = (1.95 ± 0.02) × 10⁻⁹ m²/s and D_acetone = (4.05 ± 0.02) × 10⁻⁹ m²/s at 18.5°C. They are in good agreement both with literature and our own reference measurements using a diffusion-weighted spin-echo sequence. In addition, the temperature dependence of D_water was measured in the range of 18.5–45.9°C and a good correspondence with reported data was found.