GaAs/AlAs super-flat interfaces in GaAs/AlAs and GaAs/(GaAs) (AlAs) quantum wells grown on (4 1 1)A GaAs substrates by MBE

Effectively atomically flat GaAs/AlAs interfaces over a macroscopic area (“super-flat interfaces”) have been realized in GaAs/AlAs and GaAs/(GaAs) (AlAs) quantum wells (QWs) grown on (4 1 1)A GaAs substrates by molecular beam epitaxy (MBE). A single and very sharp photoluminescence (PL) peak was observed at 4.2 K from each GaAs/AlAs or GaAs/(GaAs) (AlAs) QW grown on (4 1 1)A GaAs substrate. The full-width at half-maximum (FWHM) of a PL peak for GaAs/AlAs QW with a well width ( ) of 4.2 nm was 4.7 meV and that for GaAs/(GaAs) (AlAs) QW with a smaller well width of 2.8 nm (3.9 nm) was 7.6 meV (4.6 meV), which are as narrow as that for an individual splitted peak for conventional GaAs/AlAs QWs grown on (1 0 0) GaAs substrates with growth interruption. Furthermore, only one sharp peak was observed for each GaAs/(GaAs) (AlAs) QW on the (4 1 1)A GaAs substrate over the whole area of the wafer (7 7 mm ), in contrast with two- or three-splitted peaks reported for each GaAs/AlAs QW grown on the (1 0 0) GaAs substrate with growth interruption. These results indicate that GaAs/AlAs super-flat interfaces have been realized in GaAs/AlAs and GaAs/(GaAs) (AlAs) QWs grown on the (4 1 1)A GaAs substrates.     

Room temperature polarized photoreflectance and photoluminescence characterization of AlGaAs/InGaAs/GaAs high electron mobility transistor structures

We have characterized the properties of three AlGaAs/InGaAs/GaAs pseudomorphic high electron mobility transistor structures with two different well widths fabricated by molecular beam epitaxy on (0 0 1) GaAs substrates with different threading dislocation densities using room temperature photoreflectance (PR) and photoluminescence (PL). The samples were denoted as A, B and C with well widths of 140, 160 and 160 Å, respectively. Samples A and B were grown on substrates with lower threading dislocation densities. For samples B and C, the well width exceeds the pseudomorphic limit so that there is some strain relaxation and related misfit dislocations, as determined from X-ray measurements. In order to detect the anisotropic strain of the misfit dislocations related to strain relaxation, the PR measurements were performed for incident light polarized along [1 1 0] and directions. Evidence for the influence of the strain relaxation upon the relaxed channel was provided by the observed anisotropy of the polarized PR features and reduction of the intensity of PL signals in the InGaAs channel layer. The lowest lying intersubband transition has been confirmed by a comparison of the PR and PL spectra. Signals have been observed from every region of the sample making it possible to evaluate the In and Al compositions, channel width and two-dimensional electron gas density as well as the properties of the GaAs/AlGaAs multiple quantum well buffer layer.     

Pressure effect on the electron mobility in AlAs/GaAs quantum wells

By taking the influence of optical phonon modes into account, this paper adopts the dielectric continuum phonon model and force balance equation to investigate the electronic mobility parallel to the interfaces for AlAs/GaAs semiconductor quantum wells (QWs) under hydrostatic pressure. The scattering from confined phonon modes, interface phonon modes and half-space phonon modes are analysed and the dominant scattering mechanisms in wide and narrow QWs are presented. The temperature dependence of the electronic mobility is also studied in the temperature range of optical phonon scattering being available. It is shown that the electronic mobility reduces obviously as pressure increases from 0 to 4GPa, the confined longitudinal optical (LO) phonon modes play an important role in wide QWs, whereas the interface optical phonon modes are dominant in narrow QWs, the half-space LO phonon modes hardly influence the electronic mobility expect for very narrow QWs.     

快速热处理对应变InGaAs/GaAs单量子阱激光二极管电子发射和DX中心的影响

研究分子束外延(MBE)生长的应变In0.2Ga0.8AsGaAs折射率梯度变化异质结单量子阱激光二极管的快速热处理(RTA)效应.结果表明,RTA移除了InGaAsGaAs界面非辐射中心,提高77K光致发光效率和有源层电子发射.同时Al和Ga原子互扩散,也增加了AlGaAs波导层DX中心浓度.RTA处理后样品电流冲击老化实验证明DX中心浓度呈现出相应的增加.这表明DX中心可能是激光二极管性能退化的原因之一. 关键词： 量子阱 快速热处理 电子发射 DX中心     

Bandgap tuning of semiconductor quantum well structures using ion implantation

Ion induced QW intermixing using broad area and focused ion beam (FIB) implantation was investigated at low energy (32 and 100 keV respectively) in three different material systems (GaAs/AlGaAs, InGaAs/GaAs, and lattice matched InGaAs/InP). Repeated sequential ion implants and rapid thermal anneals (RTAs) were successful in delivering several times the maximum QW bandgap shift achievable by a single implant/RTA cycle. The effectiveness of broad area high energy implantation (8 MeV As⁴⁺) on QW intermixing was also established for GRINSCH (graded-index separate confinement heterostructure) QW laser structures grown in InGaAs/GaAs. Lastly, preliminary work illustrating the effects of implant temperature and ion current density was carried out for InGaAs/GaAsQWs.     

Modelling of high-temperature dark current in multi-quantum well structures from MWIR to VLWIR

In this paper, a model to calculate the dark current of quantum well infrared photodetectors at high-temperature regime is presented. The model is derived from a positive-definite quantum probability-flux and considers thermionic emission and thermally-assisted tunnelling as mechanisms of dark current generation. Its main input data are the wave functions obtained by time-independent Schrodinger equation and it does not require empirical parameters related to the transport of carriers. By means of this model, the dark current of quantum well infrared photodetectors at high-temperature regime is investigated with respect to the temperature, the barrier width, the applied electric field and the position of the first excited state. The theoretical results are compared with experimental data obtained from lattice-matched InAlAs/InGaAs, InGaAsP/InP on InP substrate and AlGaAs/GaAs structures with rectangular wells and symmetric barriers, whose absorption peak wavelengths range from MWIR to VLWIR. The corresponding results are in a good agreement with experimental data at different temperatures and at a wide range of applied electric field.     

界面生长中断对GaAs (111)衬底上 AlGaAs/GaAs量子阱电子自旋寿命的影响

用固源分子束外延技术(SSMBE)在GaAs(111)衬底上,采用不同的界面中断时间生长了多组AlGaAs/GaAs多量子阱样品(MQWs),通过室温发光光谱和时间分辨克尔旋转谱(TRKR)研究了界面生长中断对发光光谱半峰全宽(FWHM)和量子阱中电子自旋弛豫时间(自旋寿命)的影响,发现了自旋寿命随着界面生长中断时间的增加呈现先减小后增加的趋势,此变化趋势与荧光光谱半峰全宽表征的材料质量随中断时间的变化一致,适当的界面生长中断时间能有效的增加GaAs (111)衬底上AlGaAs/GaAs 多量子阱中电子自旋寿命。     

1 060 nm高功率垂直腔面发射激光器的有源区设计

对1 060 nm高功率垂直腔面发射激光器的有源区进行了理论计算和设计。对比了GaAsP、GaAs和AlGaAs三种不同材料的垒层所组成的高应变InGaAs量子阱的性能。为了确定有源区阱层和垒层的参数,考虑了自热效应对功率的影响,使得模型更加精确可靠。发现所设计的In_0.28Ga_0.72As量子阱的阱宽和阱数的最佳值分别为9 nm和3个,输出功率可以达到瓦级。另外,对比了三种不同垒层的温度特性,结果显示,使用GaAsP垒层的器件在高温下具有更高的功率和更好的温度稳定性。最后,利用MOCVD生长了InGaAs/GaAsP量子阱并测试了其PL谱,实验数据与理论结果符合得很好。     

Effect of Quantum Well Width Reduction for GaInNAs/GaAs Lasers

We investigated the function of the quantum well (QW) width for laser characteristics especially for reduction of the well width. We pointed out that such reduction has almost no influence on the optical gain or the carrier overflow for a large conduction band offset system, such as GaInNAs QWs. A thin QW is advantageous for suppression of the carrier overflow to the higher quantized energy levels which results in good temperature and gain characteristics. Thin GaInNAs QWs is a good candidate for an active layer structure of the lasers utilized in the next optical communication systems.     

Oscillatory behavior of magneto-optical interband emissions in asymmetric quantum well structures

We report on the oscillatory behavior of the photoluminescence intensity from asymmetric AlGaAs/InGaAs/GaAs quantum well structures in the presence of a perpendicular magnetic field. Two distinct photoluminescence peaks originating from transitions from the ground (e₁) and the first excited (e₂) electronic states to the heavy hole state (hh₁) are observed. The opposite phase of the oscillations shows clearly the competitive process between the transitions from the ground and first excited states. Electron transfer mechanisms cannot explain the origin of these oscillations. The optical oscillations emerge from changes in the effective electron–hole interaction.     

InGaAs(P)/InP MQW mixing by Zn diffusion,Ge and S implantation for optoelectronic applications

There is a growing interest in impurity-induced layer disordering for the technologically important InGaAs(P)/InP system. More complicated than in the AlGaAs/GaAs ternary system, which concerns only interdiffusion of group III atoms, interdiffusion in this quaternary system can occur for both group III (Ga,In) and group V (P,As) atoms, which may or may not result in a strain-free alloy lattice-matched to InP, a major concern for device applications. After a brief review on the thermal stability of InP/ InGaAs quantum well structures, we show that Zn diffusion at moderate temperature leads to intermixing on the group III sublattice, only, with subsequent lattice mismatch. On the other hand, either Ge or S implantation of InGaAs/InP quantum wells results in intermixing involving both the group III and the group V sublattice and approximating the lattice-matched condition.     

An explicit FDM calculation of nonparabolicity effects in energy states of quantum wells

An explicit finite difference method (FDM) to solve the nonparabolic effective mass approximation of Schrodinger wave equation (SWE) for arbitrary quantum wells (QWs) is presented. The explicit nature of the presented method and its sparse matrices allow fast computation for energy states in QWs. The nonparabolicity effects are considered explicitly without iteration. This in turn results in faster and more stable calculations. The method is used to study the nonparabolicity effects in energy states and states overlapping in asymmetric AlGaAs/GaAs QWs.     

Crystallinity and interdiffusion in InP/InGaAs quantum wells grown by Hydride VPE

This paper reports the results of a study on interfacial quality and thermal interdiffusion for InP/InGaAs Quantum Wells (QW) grown by hydride VPE. By controlling well layer as thin as 25 Å, it was estimated that island and valley, whose height was one monolayer and whose lateral size was one third of exciton radius, existed at the interface. For the first time, interdiffusion coefficients for InP/InGaAs QW were obtained from 77K PL peak energy shift. Typical values were 2.5×10⁻¹⁹ cm²/sec and 1.5×10⁻¹⁸ cm²/sec for the annealing temperature of 700°C and 750°C, respectively. These values are over 10² times larger than that in AlGaAs/GaAs QW, and less 10⁻² times smaller than that in InAlAs/InGaAs QW.     

Small-signal modulation characteristics for 1.5 μm lattice-matched InGaNAs/GaAs and InGaAs/InP quantum well lasers

The small-signal modulation characteristics of 1.5 m lattice-matched InGaNAs/GaAs and InGaAs/InP quantum well lasers and their temperature dependence have been calculated. It is found that the maximum bandwidth of the InGaNAs/GaAs quantum well lasers is about 2.3 times larger than that of the InGaAs/InP quantum well lasers due to the high differential gain which results from the large electron effective mass in the dilute nitride system. The slope efficiency for the 3 dB bandwidth as a function of optical density is twice as large for InGaNAs/GaAs as for InGaAs/InP quantum well lasers.     

941nm2%占空比大功率半导体激光器线阵列

计算了半导体激光器的激射波长与量子阱宽度以及有源层中In组分的关系,确定了941nm波长的量子阱宽度和In组分.并利用金属有机化合物气相淀积(MOCVD)技术生长了InGaAs/GaAs/AlGaAs分别限制应变单量子阱激光器材料.利用该材料制成半导体激光器线阵列的峰值波长为940.5 nm,光谱的FWHM为2.6 nm,在400 μs,50 Hz的输入电流下,输出峰值功率达到114.7 W(165 A),斜率效率高达0.81 W/A,阈值电流密度为103.7 A/cm2;串联电阻5 mΩ,最高转换效率可达36.9%.     

InGaAs/GaAs应变量子阱激光器线宽展宽因子的理论研究

详细地介绍了计算线宽展宽因子(α因子)的理论基础及推导过程, 建立了α因子的简便模型. 该模型分别考虑了带间跃迁、带隙收缩和自由载流子效应对α因子的影响, 利用不同载流子浓度下的增益曲线得到光子能量随载流子浓度的变化速率以及微分增益, 进而对α因子进行近似计算. 模拟计算了InGaAs/GaAs量子阱激光器的增益曲线及α 因子的大小, 计算结果与文献报道的实验值相符. 进一步讨论了InGaAs/GaAs量子阱阱宽及In组分对α 因子的影响. 结果表明, α 因子随In组分和阱宽的增加而增加.