插指型SiO_2电流阻挡层对大功率LED外量子效率的影响

为了改善蓝光大功率LED芯片p电极处的电流拥挤现象,提高大功率LED芯片的外量子效率,在ITO透明导电层与p-GaN间沉积插指型SiO_2电流阻挡层。采用等离子体增强化学气相沉积的方法沉积SiO_2薄膜,再经过光刻和BOE湿法刻蚀技术制备插指型SiO_2电流阻挡层。采用SimuLED仿真软件分析插指型SiO_2电流阻挡层对大功率LED芯片电流扩展性能的影响,研究插指型SiO_2电流阻挡层对大功率LED芯片外量子效率的影响。结果发现,插指型SiO_2电流阻挡层结构可以有效改善p电极附近的电流拥挤现象。与没有沉积插指型SiO_2电流阻挡层的大功率LED芯片相比,光输出功率得到显著的提高。在350 mA的输入电流下,沉积插指型SiO_2电流阻挡层后的大功率LED芯片的外量子效率提高了18.7%。     

Improved light extraction of GaN-based light-emitting diodes with surface-patterned ITO

The surface patterning of the indium tin oxide (ITO) transparent current layer has been investigated to improve the light extraction efficiency of GaN-based light-emitting diodes (LEDs). LEDs with periodic micro-hexagon patterned ITO have been fabricated utilizing standard lithography techniques and inductively coupled plasma (ICP) technology. The luminance intensity of the LED chips with patterned ITO following 160 s ICP etching was enhanced by about 50% compared to the LED chips with unpatterned ITO. Detailed processing parameters are provided. scanning electron microscopy (SEM) and atomic force microscopy (AFM) are used to examine the micro-structures. The results indicate that the surface-patterned ITO technique could have potential applications in high-power GaN-based LEDs.     

Enhancement of LED light extraction via diffraction of hexagonal lattice fabricated in ITO layer with holographic lithography and wet etching

A novel method for enhancing light extraction efficiency of LEDs via diffraction of the lattice fabricated in ITO layers of LEDs is proposed. The lattice fabrication process includes holographic lithography and wet etching. 3-beam interference holographic approach was used to fabricate large-area hexagonal lattice mask which can cover 2-inch semiconductor wafer, and acid etching was used to transfer the lattice structure into p-contact ITO layer. 1.4 fold enhancement of light output at 20 mA injection current was obtained from GaN-based LEDs in the primary experiment. The lattice fabrication process is rapid and cost-effective thus enabling industrial mass production of high brightness LEDs.     

Improved light extraction of GaN-based light-emitting diodes with surface-textured indium tin oxide electrodes by nickel nanoparticle mask dry-etching

GaN-based light-emitting diodes (LEDs) with surface-textured indium tin oxide (ITO) as a transparent current spreading layer were fabricated.The ITO surface was textured by inductively coupled plasma (ICP) etching technology using a monolayer of nickel (Ni) nanoparticles as the etching mask.The luminance intensity of ITO surface-textured GaN-based LEDs was enhanced by about 34% compared to that of conventional LED without textured ITO layer.In addition,the fabricated ITO surface-textured GaN-based LEDs would present a quite good performance in electrical characteristics.The results indicate that the scattering of photons emitted in the active layer was greatly enhanced via the textured ITO surface,and the ITO surface-textured technique could have a potential application in improving photoelectric characteristics for manufacturing GaN-based LEDs of higher brightness.     

Improved light extraction efficiency of GaN-based LEDs with patterned sapphire substrate and patterned ITO

To improve the light extraction efficiency of GaN-based light-emitting diodes (LEDs), periodic semisphere patterns with 3.5 μm width, 1.2 μm height, and 0.8 μm spacing were formed on sapphire substrate by dry etching using BCl₃/Cl₂ gas chemistry. The indium tin oxide (ITO) transparent conductive layer was patterned by wet etching to reduce the total internal reflection existing along between p-GaN, ITO, and air. At 350 mA injection current, the high power LED by integrating patterned sapphire substrate with patterned ITO technology exhibited a 36.9% higher light output power than the conventional LEDs.     

全息技术制作二维光子晶体蓝宝石衬底提高发光二极管外量子效率

为了提高GaN基发光二极管(LED)的外量子效率,在蓝宝石衬底制作了二维光子晶体.衬底上的二维光子晶体结构采用激光全息技术和感应耦合等离子体(ICP)干法刻蚀技术制作,然后采用金属氧化物化学气相沉积(MOCVD)技术在图形蓝宝石衬底(PSS)上生长2μm厚的n型GaN层,4层量子阱和200nm厚的p型GaN层,形成LED结构.衬底上制作的二维光子晶体为六角晶格结构,晶格常数为3.8μm,刻蚀深度为800nm.LED器件光强输出测试结果显示,在PSS上制作的LED(PSS-LED)的发光强度普遍高于蓝宝石平 关键词： 全息 发光二极管 图形蓝宝石衬底 外量子效率     

Forming the graded-refractive-index antireflection layers on light-emitting diodes to enhance the light extraction

Distributed antireflection (AR) layers with different composition ratios of ITO and SiO(2) formed on an ITO electrode of GaN-based LEDs provide substantial enhancement in light-extraction efficiency. By using the coradio frequency magnetron sputtering deposition, four 50 nm thick AR layers with graduated refractive indices were fabricated. The effect of the AR layers on enhancing the efficiency of the LED device was analyzed by electroluminescence (EL) and I-V measurements. As a result, the EL intensity of the LED device grown on the patterned sapphire substrate with AR layers was increased by up to 13% compared to the conventional patterned sapphire substrate-applied LED device without AR layers at a drive current of 20 mA. The AR layers on top of the LED device gradually changed the refractive indices between ITO (n=2.1) and air (n=1.0), which minimized the total internal reflection of generated light. And no degradation in the electrical characteristic of the LEDs was observed according to the I-V measurements.     

Improvement of GaN light-emitting diodes with surface-treated Al-doped ZnO transparent Ohmic contacts by holographic photonic crystal

This letter presents a holographic photonic crystal (H-PhC) Al-doped ZnO (AZO) transparent Ohmic contact layer on p-GaN to increase the light output of GaN-based LEDs without destroying the p-GaN. The operating voltage of the PhC LEDs at 20 mA was almost the same as that of the typical planar AZO LEDs. While the resultant PhC LED devices exhibited significant improvements in light extraction, up to 1.22 times that of planar AZO LEDs without PhC integration. Temperature dependence of the integrated photoluminescence intensity indicates that this improvement can be attributed to the increased extraction efficiency due to the surface modification. These results demonstrate that the surface-treated AZO layer by H-PhCs is suitable for fabricating high-brightness GaN-based LEDs.     

纳米压印制备的光子晶体结构对AlGaN基材料深紫外出光效率的提高

通过利用阳极氧化铝的方法制备高度有序的光子晶体结构作为纳米压印模板,将大面积光子晶体图案转移到了样品表面,解决了国际上小尺寸光子晶体制备困难的问题。采用纳米压印的方法在AlGaN基样品表面上制备了290 nm的周期光子晶体结构,并将表面具有光子晶体结构的AlGaN基样品正面出光强度提高121%。偏振特性的实验结果表明六角排列的孔状光子晶体将原来朝向样品侧面传播的TE偏振光偏折转向正面,从而增加光抽取效率,改变出光偏振度。指出远场角分辨图案的变化归因于光子晶体对出光的衍射和Bragg散射效果。实验中采用的创新性工艺可以用来制备具有高出光效率的深紫外发光二极管。     

Optical characteristics of light-emitting diodes with high transparent conductive film at low temperatures

In this paper, we report the synthesis and transmittance of a titanium–indium–tin oxide (TITO) film, fabricated through a low-temperature process. The TITO film was fabricated by incorporating a 2-nm-thick titanium barrier at the bottom of an ITO film. The transmittance characteristics of the TITO film were examined for light-emitting diodes (LEDs) of various wavelengths at different post-annealing temperatures. A saturated high transmittance was observed at a temperature of 550 °C, which is relatively low when compared to that in the case of a conventional ITO film. Photoluminescence studies demonstrated that a 450-nm-thick TITO film, fabricated at 550 °C, was highly effective in improving the performance of the LED, when compared to conventional ITO films. The X-ray diffraction peaks, scanning electron microscopy images, and transmittance electron microscopy images confirmed that titanium atoms could improve the crystallization of ITO. It was found that non-crystallization in ITO was effectively activated by the titanium barrier. Furthermore, the optical bandgap (3.77 eV for the conventional ITO film) was improved to 3.92 eV in the TITO film. An infrared LED fabricated with a TITO film displayed 70% higher light output power than that with a conventional ITO film. These results suggest that using a titanium barrier is essential to effectively improve inactive nucleation sites in ITO films grown at low temperatures.     

Photonic crystal LEDs – designing light extraction

Photonic crystals (PhCs) have attracted much attention during the last decade as a solution to overcome the low extraction efficiency of as‐grown light‐emitting diodes (LEDs). In this review we describe the underlying physics and summarize recent results obtained with PhC LEDs. Here, the main focus is on diffracting PhC. In order to quantify the benefit from the incorporation of PhCs for diffracting light a comparison by simulations between a PhC LED and a standard state‐of‐the‐art LED is carried out. Finally, the impact of the PhC on the LEDs emission characteristics will be discussed with respect to étendue‐limited applications.     

Enhanced light extraction of GaN-based light-emitting diodes with periodic textured SiO_2 on Al-doped ZnO transparent conductive layer

We report an effective enhancement in light extraction of Ga N-based light-emitting diodes(LEDs) with an Al-doped Zn O(AZO) transparent conductive layer by incorporating a top regular textured SiO_2 layer. The 2 inch transparent throughpore anodic aluminum oxide(AAO) membrane was fabricated and used as the etching mask. The periodic pore with a pitch of about 410 nm was successfully transferred to the surface of the SiO_2 layer without any etching damages to the AZO layer and the electrodes. The light output power was enhanced by 19% at 20 m A and 56% at 100 m A compared to that of the planar LEDs without a patterned surface. This approach offers a technique to fabricate a low-cost and large-area regular pattern on the LED chip for achieving enhanced light extraction without an obvious increase of the forward voltage.     

利用单层密排的纳米球提高发光二极管的出光效率

在发光二极管(LED)的透明电极层上制作单层六角密排的聚苯乙烯(polystyrene, PS) 纳米球, 研究提高GaN基蓝光LED的出光效率. 采用自组装的方法在透明电极铟锡氧化物层上制备了直径分别约为250, 300, 450, 600和950 nm的PS纳米球, 并且开展了电致发光的研究. 结果表明, 在LED的透明电极层上附有PS纳米球能有效地提高LED的出光效率; 当PS纳米球的直径与出射光的波长比较接近时, LED的出光效率最优. 与参考样品相比, 在20 mA和150 mA工作电流下, 附有PS纳米球的样品的发光效率分别增加1.34倍和1.25倍. 三维时域有限差分方法计算表明, 该出光增强主要归因于附有PS纳米球的LED结构可以增大LED结构的光输出临界角, 从而提高LED的出光效率. 因此, 这是一种低成本的实现高效率LED的方法.     

Improved Light Extraction of GaN-based LEDs with Nano-roughened p-GaN Surfaces

p-GaN surfaces axe nano-roughened by plasma etching to improve the optical performance of GaN-based light emitting diodes （LEDs）. The nano-roughened GaN present a relaxation of stress. The light extraction of the LEDs with nano-roughened surfaces is greatly improved when compared with that of the conventional LEDs without nano-roughening. PL-mapping intensities of the nano-roughened LED epi-wafers for different roughening times present two to ten orders of enhancement. The light output powers are also higher for the nano-roughened LED devices, This improvement is attributed to that nano-roughened surfaces can provide photons multiple chances to escape from the LED surfaces,     

基于金属掺杂ITO透明导电层的紫外LED制备

为降低ITO薄膜对紫外波段的光吸收,制备低电压高功率的紫外LED,研究了一种基于金属掺杂ITO透明导电层的365 nm紫外LED的制备工艺。利用1 cm厚的石英片生长了不同厚度ITO薄膜以及在ITO上掺杂不同金属的新型薄膜,并研究了在不同的退火条件下这种薄膜的电阻和透过率,分析了掺杂金属ITO薄膜的带隙变化。将这种掺杂的ITO薄膜生长在365 nm外延片上并完成电极生长,制备成14 mil×28 mil的正装LED芯片。利用电致发光（EL）设备对LED光电性能进行测试并对比。实验结果表明:掺Al金属的ITO薄膜能够相对ITO薄膜的带隙提高0.15 eV。在600℃退火后,方块电阻降低6.2 Ω/□,透过率在356 nm处达到90.8%。在120 mA注入电流下,365 nm LED的电压降低0.3 V,功率提高14.7%。ITO薄膜掺金属能够影响薄膜带隙,改变紫光LED光电性能。     

Enhancement of the light output of light-emitting diode with double photonic crystals

A light-emitting diode (LED) with double photonic crystals (PhCs) is designed to enhance the light output. Based on the configuration of the PhC assisted LED with a single PhC (SPC-LED), a second PhC is added on the bottom surface of the active layer to improve the light output. The optical properties of this double PhCs assisted LED are simulated using the three-dimensional (3D) finite-difference time-domain (FDTD) method. The calculation results show that its light output can be 3.2 times higher than that of LED without PhC, and 1.39 times higher than that of SPC-LED.     

Improvement of the light output and contact resistance of InGaN-based light-emitting diodes based on tantalum-doped indium tin oxide as p-type electrodes

This paper reports that highly transparent and low resistance tantalum-doped indium tin oxide (Ta-doped ITO) films contacted to p-type GaN have been prepared by the electron-beam evaporation technique. The Ta-doped ITO contacts become Ohmic with a specific contact resistance of $\sim 5.65\times 10^{ - 5}$~$\Omega \cdot$cm$^{2}$ and show the transmittance of $\sim $98% at a wavelength of 440~nm when annealed at 500~\du. Blue light emitting diodes (LEDs) fabricated with Ta-doped ITO p-type Ohmic contact layers give a forward-bias voltage of 3.21~V at an injection current of 20~mA. It further shows that the output power of LEDs with Ta-doped ITO contacts is enhanced 62% at 20~mA in comparison with that of LEDs with conventional Ni/Au contacts.     

Cascaded deep ultraviolet light-emitting diode via tunnel junction

The Al Ga N-based deep ultraviolet(DUV) light-emitting diode(LED) is an alternative DUV light source to replace traditional mercury-based lamps. However, the state-of-the-art DUV LEDs currently exhibit poor wall-plug efficiency and low light output power, which seriously hinder their commercialization. In this work, we design and report a tunnel-junctioncascaded(TJC) DUV LED, which enables multiple radiative recombinations within the active regions. Therefore, the light output power of the TJC-DUV LEDs is more than doubled compared to the conventional DUV LED. Correspondingly, the wall-plug efficiency of the TJC-DUV LED is also significantly boosted by 25% at 60 m A.     

结温与热阻制约大功率LED发展

LED结温高低直接影响到LED出光效率、器件寿命、可靠性、发射波长等。保持LED结温往允许的范围内,是大功率LED芯片制备、器件封装和器件应用等每个环节都必须重点研究的关键因素,尤其是LED器件封装和器件应用设计必须着重解决的核心问题。首先介绍pn结结温对LED器什性能的影响,接着分析大功率LED结温与器件热阻的关系．基于对器件热阻的分析,得出了结温与热阻已经制约大功率LED进一步向更大功率发展的结论,并提出了如下两个观点：1．要在保持低成本和自然散热方式下提高LED器件的功率,根本的出路是提高光转换效率;2．在日前没有提高光转换效率的情况下,发展超过5W的大功率器件对工程应肘没有实质意义。     

Fabrication and Optical Characterization of GaN-Based Nanopillar Light Emitting Diodes

InGaN/GaN-multiple-quantum-well-based light emitting diode (LED) nanopillar arrays with a diameter of approximately 200nm and a height of 700nm are fabricated by inductively coupled plasma etching using Ni self-assembled nanodots as etching mask. In comparison to the as-grown LED sample an enhancement by a factor of four of photoluminescence (PL) intensity is achieved after the fabrication of nanopillars, and a blue shift and a decrease of full width at half maximum of the PL peak are observed. The method of additional wet etching with different chemical solutions is used to remove the etch-induced damage. The result shows that the dilute HCl (HCl:H₂O=1:1) treatment is the most effective. The PL intensity of nanopillar LEDs after such a treatment is about 3.5 times stronger than that before treatment.