Crystallization on surfaces of well-defined topography

Single crystals of calcite with regular patterned surfaces comprising close-packed arrays of hemispherical cavities or domes were produced by crystallization on colloidal monolayers or PDMS replicas of these monolayers, respectively. Perfect replication of the substrate topography was achieved for all colloidal particles, irrespective of their size and surface chemistry when the substrate geometry permitted unrestricted ion flow to the growing crystal. This work demonstrates that crystallization within a mould provides a very general route to producing single crystals with curved surfaces and unusual morphologies and that such patterning can be applied from the micro- to the nanoscale.     

Azo polymer microspherical cap array: soft-lithographic fabrication and photoinduced shape deformation behavior

In this work, azo polymer microspherical cap arrays possessing unique photoprocessible properties have been fabricated through a soft-lithographic contact printing approach. In the process, hexagonal polystyrene (PS) colloidal arrays, obtained by the vertical deposition method, were used as masters. Poly(dimethylsiloxane) (PDMS) stamps with aligned hemisphere air voids on the surfaces were obtained by casting the precursor against the colloidal arrays. By using the stamps and a solution of an epoxy-based azo polymer (BP-AZ-CA) as "ink", the microspherical cap arrays were fabricated by pressing the "inked" surfaces against substrates. Uniform 2D arrays of the submicrometer spherical caps could be obtained on the substrates after peeling off the stamps and drying. The characteristic sizes of the arrays depended on some adjustable features, such as the diameters of PS spheres and concentrations of the "inks" used in the process. After exposure to a linearly polarized Ar+ laser single beam, the spherical caps could be stretched along the polarization direction, and the arrays were consequently transformed into ellipsoidal cap arrays. Upon irradiation of interfering p-polarized Ar+ laser beams, only the spherical caps in the bright fringes were deformed by the light irradiation, which resulted in more complicated surface relief patterns. The observation gives another well-defined example of the photoinduced mass migration in the submicrometer scale. The approach can potentially be applied to fabrication of microlens arrays with different converging rate in two directions.     

Micro fabrication of microlens arrays by micro dispensing

In this study, master of the microlens arrays is fabricated using micro dispensing technology, and then electroforming technology is employed to replicate the Ni mold insert of the microlens arrays. Finally, micro hot embossing is performed to replicate the molded microlens arrays from the Ni mold insert. The resin material is used as the dispensing material, which is dropped on a glass substrate. The resin is exposed to a 380 W halogen light. It becomes convex under surface tension on the glass substrate. A master for the microlens arrays is then obtained. A 150‐nm‐thick copper layer is sputtered on the master as an electrically conducting layer. The electroforming method replicates the Ni mold insert from the master of the microlens arrays. Finally, micro hot embossing is adopted to replicate the molded microlens arrays. The micro hot embossing experiment employs optical films of polymethylmethacrylate (PMMA) and polycarbonate (PC). The processing parameters of micro hot embossing are processing temperature, embossing pressure, embossing time, and de‐molding temperature. Taguchi's method is applied to optimize the processing parameters of micro hot embossing for molded microlens arrays. An optical microscope and a surface profiler are utilized to measure the surface profile of the master, the Ni mold insert and the molded microlens arrays. AFM is employed to measure the surface roughness of the master, the Ni mold insert and the molded microlens arrays. The sag height and focal length are determined to elucidate the optical characteristics of the molded microlens arrays. Copyright © 2009 John & Sons, Ltd.     

Applying magnetic soft mold imprint technology with ultraviolet light‐emitting‐diode array on the fabrication of microlens arrays

This study proposed a novel technology, which uses exposed technology with ultraviolet light‐emitting‐diode (UV‐LED) arrays and the polydimethylsiloxane (PDMS) magnetic flexible soft mold imprint technology, to develop exposed equipments with UV‐LED arrays. This study used magnetic soft mold imprint technology to replicate the structure of microlens, providing a more effective alternative for imprint technology and application. The measurement results showed that PDMS with magnetic iron powder can precisely cast mold to replicate the structures of microlens. Electromagnetic plates were used to control even imprinting with magnetic force, in order to fill the mold of micro‐structure of the photo‐resist. Magnetic iron powder was added to PDMS to produce composite material, which can effectively avoid the transformation of pure PDMS during soft mold imprinting, and increase mechanical strength. Magnetic PDMS soft mold is easy to make, and the casting time is short, so that costs can be effectively reduced. Also with advantages of less free energy on its surface, and unlikely to adhere to the photo‐resist during imprinting, it can be combined with electromagnetic plates evenly to control the magnetic soft mold. This imprinting technology is a big advantage to the production process of micro‐structures during imprinting. Copyright © 2009 John Wiley & Sons, Ltd.     

Fabrication of large-scale zinc oxide ordered pore arrays with controllable morphology

The fabrication of large-scale ZnO ordered pore arrays by the potentiostatic electrochemical deposition method based on a two-dimensional ordered colloidal monolayer template is reported. The pore morphology evolves from hemispherical to a well-like structure by controlling the deposition potential.     

Photopatterning in poly-L-lysine thin films using UV-enhanced hydrophilicity

Deep UV lithography on poly-L-lysine thin films was used to generate microarrays with enhanced hydrophilicity. This was manifested as adsorption of ambient humidity from air by areas exposed to UV fluence around 5 J/cm2 and was made visible by phase-contrast microscopy. Kinetics of adsorption was investigated by a novel technique involving fabrication of submicrometer hydrophilicity grating by two-beam UV interferometry. In an aqueous colloidal medium, gold and polystyrene microspheres preferentially attach to areas that are relatively less hydrophilic, i.e., those areas not exposed to UV light. This observation provides a method for fabricating micro- and nanoporous arrays with controlled porosity. The technique is demonstrated with microspheres of sizes between 250 nm and 10 microm.     

胶体刻蚀——纳米结构化表面的构筑与应用

综述了近年来胶体刻蚀领域的研究进展, 分别讨论了基于胶体微粒和胶体晶体为模板的可控沉积与可控刻蚀及在固体平面基质、曲面基质和气液界面等不同基质上构筑结构化表面的方法. 同时还探讨了利用胶体刻蚀方法形成的微纳结构在光、电、磁以及表面润湿和生物学等方面的应用.     

Monodispersed ZnSe colloidal microspheres: preparation, characterization, and their 2D arrays

Uniform and monodispersed ZnSe colloidal microspheres were prepared via a hot injection route by using trioctylamine as solvent and with a relatively higher concentration of the monomer precursors. The size of the colloidal ZnSe spheres was tuned from 138 to 629 nm by varying the concentration of the precursors, and the size increased linearly with the concentration of Zinc oleate in the range from 0.05 to 0.10 kg/L with the molar ratio of Zn to Se of 0.5. The colloidal microspheres were well characterized by SEM, TEM, HRTEM, EDS, UV-vis, and PL techniques. Detailed examination confirmed that the colloidal microspheres were formed by the in-situ aggregation of ZnSe nanoparticles. Furthermore, the 2D ordered assembly of the ZnSe microspheres was realized via a simple vertical precipitation technique. Due to the high refractive index and absence of absorption in the visible region, the monodispersed ZnSe colloidal microspheres could be potential building blocks to construct photonic band gap crystals and other functional devices.     

TiO2掺杂调控聚苯乙烯微球折射率及胶体光子晶体结构色

胶体光子晶体由于其可调变的结构色在绿色印刷、印染等领域备受关注,而其光子带隙的宽度和位置由光子晶体的晶格参数(晶面间距,通常受胶体微球尺寸影响)和介质的折射率决定。现有人工胶体光子晶体主要基于SiO_2和高分子(如聚苯乙烯(PS)等)微球的组装制备,由于胶体微球材质种类有限,折射率调控受限,因而目前调控胶体光子晶体结构色主要靠改变胶体微球的尺寸来实现。本文首先制备高折射率(2.6)的TiO_2纳米晶,在乳液聚合制备单分散的PS(折射率1.6)微球过程中,将所制备的TiO_2纳米晶掺杂于PS微球中,通过TiO_2的掺杂量有效调控胶体微球的折射率,进而实现胶体光子晶体的结构色调控。以多色胶体光子晶体微球的水溶液为墨水,采用彩色喷墨打印技术打印了电脑设计的光子晶体彩画。本文发展的光子晶体结构色调控新技术拓展了胶体光子晶体的应用。     

Generation of submicrometer structures by photolithography using arrays of spherical microlenses

This paper describes the fabrication of arrays of spherical microlenses by self-assembly of microspheres and the use of these arrays for nearfield photolithography to generate repetitive microstructures in photoresist. We used these arrays of microspheres to fabricate two types of elastomeric membranes: (i) membranes that have microspheres embedded in their surface and (ii) membranes that have hemispherical wells in their surface. Both types of membranes act as amplitude masks that pattern the intensity of illumination in the near field incident on the photoresist. Microspheres in the first type of membrane act as convergent lenses that generate recessed microstructures in positive photoresist. Hemispherical wells in the second type of membrane act as divergent lenses that produce protrusive microstructures in positive photoresist. This method can generate dense, regular arrays of microstructures with a variety of profiles--circular or hexagonal holes, circular posts, hollow posts, and cones--depending on the sizes and refractive indices of the spherical lenses and the distance between the lenses and the photoresist. This technique provides a simple route to large areas (>4 cm2) of repetitive, simple microstructures.     

Metal patterning on silicon surface by site-selective electroless deposition through colloidal crystal templating

Site-selective Cu deposition on a Si substrate was achieved by a combination of colloidal crystal templating, hydrophobic treatment, and electroless plating. Uniformly sized nano/microstructures were produced on the substrate using a monolayer coating of colloidal spheres instead of a conventional resist. The Cu patterns obtained were of two different types: networklike honeycomb and isolated-island patterns with a minimum period of 200 nm. Each ordered pattern with the desired intervals was composed of clusters of Cu nanoparticles with a size range of 50-100 nm. By the present method, it is possible to control the periodicity of metal arrays by changing the diameter of the colloidal spheres used as an initial mask and to adjust the shape of the metal patterns by changing the mask structure for electroless plating.     

分子印迹胶体阵列检测对硝基苯酚

以对硝基苯酚(p-NP)为印迹模板,丙烯酰胺为功能单体,制备单分散的对硝基苯酚分子印迹胶体微球。通过垂直沉降法将分子印迹胶体微球自组装为分子印迹胶体阵列,采用胶带将分子印迹胶体阵列粘贴固定。固定于胶带上的分子印迹胶体阵列膜显示出良好的稳定性,而且对目标分子p-NP具有明显的光学响应。分子印迹微球吸附目标分子发生溶胀,引起胶体阵列溶涨,分子印迹胶体阵列(MICA)反射峰位置发生移动。实验结果显示,MICA随着p-NP浓度增加,反射峰红移近60 nm,MICA表面颜色由红色逐渐变为蓝紫色;而非印迹胶体阵列红移量只约40 nm。MICA简化了光子晶体凝胶传感材料的制备步骤,为开发新型高性能生化传感器材料提供了新思路。     

Chemical modification of colloidal masks for nanolithography

A method is presented to tune the holes in colloidal masks used for nanolithography. Using a simple wet-chemical method, a thin layer of silica is grown on masks of silica particles. The size of the holes is controlled by the amount of tetraethoxysilane (TEOS) added. More accurate tuning of the hole size is possible in the presence of a calibrated seed dispersion of silica colloids. We demonstrate modified masks that were used to create arrays of metal nanoparticles with a size ranging from 400 nm, for unmodified masks, down to tens of nanometers. The method is easy-to-use, fast, and inexpensive.     

分子印迹纳米胶体阵列检测爆炸物的研究

以三硝基甲苯(TNT)为模板,丙烯酰胺为功能单体,采用乳液聚合法制备具有单分散性的TNT分子印迹胶体小球.通过垂直沉降法自组装,并用胶带将得到的具有蛋白石结构的分子印迹胶体阵列(MICA)固化.研究其在不同比例的甲醇/水溶液中的光学响应,并在最优检测环境下进行特异性吸附实验.实验表明,当甲醇/水的体积比为7∶3,TNT浓度为20 mmol/L时,反射峰红移近24 nm,为非印迹胶体阵列红移量的1.4倍,为TNT结构类似物的23倍.MICA在实现对光子晶体传感器制备简化的同时,提供了对TNT进行快速裸眼检测的可能性.     

Continuous modification of upconversion luminescence of fluorescent dye in the crystalline colloidal arrays

The crystalline colloidal arrays with controllable photonic bandgaps were prepared by the change of volume fraction of the polystyrene microspheres. Upconversion emission property of fluorescent dye has investigated in crystalline colloidal array, and continuous modification of the upconversion emission of fluorescent dye was observed. A significant suppression of upconversion emission of dye in the range of the photonic bandgap as well as enhancement at the bandgap edge was obtained in the crystalline colloidal arrays. In addition, upconversion emission of dye was also enhanced when the excited light overlapped with the long or short bandgap edge of the crystalline colloidal arrays, which is due to slow photons effect near the edges of a photonic bandgap. The continuous modification and enhancement of upconversion emission may be important for the development of low-threshold upconversion lasers and displays.     

Many-particle tracking with nanometer resolution in three dimensions by reflection interference contrast microscopy

We have developed and characterized a method, based on reflection interference contrast microscopy, to simultaneously determine the three-dimensional positions of multiple particles in a colloidal monolayer. To evaluate this method, the interaction of 6.8 microm (+/-5%) diameter lipid-derivatized silica microspheres with an underlying planar borosilicate substrate is studied. Measured colloidal height distributions are consistent with expectations for an electrostatically levitated colloidal monolayer. The precision of the method is analyzed using experimental techniques in addition to computational bootstrapping algorithms. In its present implementation, this technique achieves 16 nm lateral and 1 nm vertical precision.     

Nanoscopic Pd line arrays using nanocontact printed dendrimers

High-density Pd line arrays with 55 nm line-width were obtained using nanocontact-printed dendrimer monolayers. Elastomeric PDMS stamps for nanocontact printing were replicated from silicon master molds which were fabricated by UV nanoimprinting in combination with reactive ion etching. The fabrication method effectively controlled the aspect ratios of high-density lines for resolving the problems encountered in both replicating silicon masters to PDMS stamps and printing with the replicated PDMS stamps. Using the PDMS nanostamp with an optimized aspect ratio, a self-assembled monolayer of dendrimer was patterned on a Pd film via nanocontact printing, which was facilitated by the strong interaction between Pd and amine groups of the dendrimer. The patterned self-assembled monolayer was used as an etch-resist mask against the wet etchant of Pd, leaving behind a high-density Pd line array over large areas. The resulting functional Pd nanopattern is of practical significance in microelectronics and bio- or gas-sensing devices.     

Fabrication of hybrid nanostructured arrays using a PDMS/PDMS replication process

In the study, a novel and low cost nanofabrication process is proposed for producing hybrid polydimethylsiloxane (PDMS) nanostructured arrays. The proposed process involves monolayer self-assembly of polystyrene (PS) spheres, PDMS nanoreplication, thin film coating, and PDMS to PDMS (PDMS/PDMS) replication. A self-assembled monolayer of PS spheres is used as the first template. Second, a PDMS template is achieved by replica moulding. Third, the PDMS template is coated with a platinum or gold layer. Finally, a PDMS nanostructured array is developed by casting PDMS slurry on top of the coated PDMS. The cured PDMS is peeled off and used as a replica surface. In this study, the influences of the coating on the PDMS topography, contact angle of the PDMS slurry and the peeling off ability are discussed in detail. From experimental evaluation, a thickness of at least 20 nm gold layer or 40 nm platinum layer on the surface of the PDMS template improves the contact angle and eases peeling off. The coated PDMS surface is successfully used as a template to achieve the replica with a uniform array via PDMS/PDMS replication process. Both the PDMS template and the replica are free of defects and also undistorted after demoulding with a highly ordered hexagonal arrangement. In addition, the geometry of the nanostructured PDMS can be controlled by changing the thickness of the deposited layer. The simplicity and the controllability of the process show great promise as a robust nanoreplication method for functional applications.     

Control of TiO2 structures from robust hollow microspheres to highly dispersible nanoparticles in a tetrabutylammonium hydroxide solution

A new process for controlling the structure of TiO2 from hollow microspheres to highly dispersible nanoparticles has been developed by altering the concentration of tetrabutylammonium hydroxide (TBAH) in the solvothermal reaction of titanium isopropoxide. Robust and size-controllable hollow TiO2 microspheres, constructed by the assembly of 18 nm TiO2 nanoparticles, were synthesized at relatively high TBAH concentration. The diameters of hollow spheres, with a shell thickness of approximately 250 nm, were controlled to 1.5-4 microm by varying the concentration of TBAH in the range of 0.1-0.5 M. After calcination at 450 degrees C, the hollow microspheres were not appreciably deformed and were still floating on the surface of the water. However, highly dispersible TiO2 nanoparticles with an average diameter of 13 nm were obtained at a low TBAH concentration such as 9.2 mM. The colloidal particle size of TiO2 in an aqueous suspension at pH 2 was 12.5-13.5 nm, which indicates that the each nanoparticle is completely separated. The overall procedure is simple and highly reproducible, and large-scale synthesis is available at low cost.