Improving the uniformity of RF-plasma density by a humped variable-gap spiral antenna

This paper develops a humped spiral antenna of top inductively coupled plasma with variable gap. Comparing with planar spiral antennae, it investigates the performance of humped spiral antennae in the calculated electromagnetic configurations and experimental results. It finds that the humped antenna has the improved uniformity of plasma density in the radial direction and the decreased electron temperature in the top inductively coupled plasma. By experimental and theoretical analyses, the plasma performance in the case of humped antennae is considered to be the combined results of the uniform electromagnetic configurations and the depressed capacitively coupling effect.     

Characteristics of a dual‐radio‐frequency cylindrical inductively coupled plasma

The plasma parameters such as electron density, effective electron temperature, plasma potential, and uniformity are investigated in a new dual‐frequency cylindrical inductively coupled plasma (ICP) source operating at two frequencies (2 and 13.56 MHz) and two antennas (a two‐turn high‐frequency antenna and a six‐turn low‐frequency (LF) antenna). It is found that the electron density increases with 2 MHz power, whereas the electron temperature and plasma potential decrease with 2 MHz power at a fixed 13.56 MHz power. Moreover, the plasma uniformity can be improved by adjusting the LF power. These results indicate that a dual‐frequency synergistic discharge in a cylindrical ICP can produce a high‐density, low‐potential, low‐effective‐electron‐temperature, and uniform plasma.     

Axial ratio improvement of an Archimedean spiral antenna over a radial AMC reflector

This paper presents a method to improve the circular polarization of an Archimedean spiral antenna placed over a radial Artificial Magnetic Conductor (AMC). Results have been compared with the same radiating element over a more classical AMC reflector. A prototype of an Archimedean two-wire spiral antenna has been built to operate from 0.5?GHz to 6?GHz. Measurement results with this radial AMC give a relative bandwidth of 79?%, in which the broadside RHCP gain is improved. In this bandwidth the axial ratio of Archimedean spiral antenna placed over a radial AMC is less than 2?dB whereas it is higher than 3?dB with a classical cartesian shape of AMC reflector.     

Discharge impedance of solenoidal inductively coupled plasma discharge

The discharge impedance is calculated for a solenoidal inductively coupled plasma (ICP) discharge, which is one of the important sources for plasma processing. To calculate this impedance, the electromagnetic field quantities are obtained by solving the two-dimensional Maxwell equations in a realistic geometry. Also considered in the calculation is the anomalous skin effect which is regarded as a collisionless heating mechanism of ICP discharge. The results show that the discharge impedance is a function of various discharge parameters, such as plasma density, electron temperature, antenna position, collision frequency, excitation frequency, and chamber geometry.     

闭式电感耦合等离子体特性对比实验研究和光谱分析

ICP反应室或ICP质谱仪不同,ICP在用于衰减微波时,其腔体采用全密封石英结构,同时缺少静电屏蔽、金属衬底和磁场约束等条件,研究其内部电子密度等参数的分布对于等离子体局部隐身技术具有重要意义。利用光谱分析法,对两种典型ICP源(螺旋型和盘香型)在密闭石英立方体腔内H模式下稳定放电的电子密度分布展开了对比试验研究。使用Ar离子谱中476.45 nm谱线相对光谱强度变化研究了不同型ICP源的E—H模式跳变和功率耦合效率,通过非H谱线(Ar)的Stark展宽法,诊断了两种源的天线垂直平面上的二维电子密度分布。实验发现ICP在H模下的电子密度分布受交变磁场产生的趋肤电流影响较大,趋肤深度随着放电功率的增大而减小,同时主等离子体区域体积缩小、电子密度增加,在天线的垂直面上,螺旋型源ICP电子密度呈中心轴对称型分布,盘香型源ICP呈双峰型分布。功率耦合效率受源天线形状及其容性耦合效应影响较大,光谱相对强度显示螺旋型源的功率耦合效率低于盘香型源。通过该实验方法,可以在石英立方腔体内得到最高电子密度范围为1.4×1017～2.5×1017 m-3的螺旋型ICP源和范围1.8×1017～3.0×1017 m-3的盘香型ICP源。     

Numerical Simulation of Plasma Antenna with FDTD Method

We adopt cylindrical-coordinate FDTD algorithm to simulate and analyse a 0.4-m-long column configuration plasma antenna. FDTD method is useful for solving electromagnetic problems, especially when wave characteristics and plasma properties are self-consistently related to each other. Focus on the frequency from 75 MHz to 400 MHz, the input impedance and radiation efficiency of plasma antennas are computed. Numerical results show that, different from copper antenna, the chaxacteristics of plasma antenna vary simultaneously with plasma frequency and collision frequency. The property can be used to construct dynamically reconfigurable antenna. The investigation is meaningful and instructional for the optimization of plasma antenna design.     

感应耦合等离子体刻蚀在聚合物光波导制作中的应用

提出了利用感应耦合等离子体(ICP)刻蚀技术提高聚合物光波导器件性能的方法,介绍了ICP刻蚀技术的原理和优点。选取聚甲基丙烯酸甲酯-甲基丙烯酸环氧丙酯(P(MMA-GMA))作为波导材料,采用氧气作为刻蚀气体,研究了ICP参数变化对刻蚀效果的影响。介绍了倒脊形光波导的制备过程,采用改变单一工艺参数的方法,分析了刻蚀效果随时间、功率、压强、气体流量等参数的变化,对参数优化后刻蚀得到的凹槽和平板结构进行了表征。实验结果表明:在天线射频功率为300 W,偏置射频功率为30 W,气体压强为0.5 Pa,氧气流速为50 cm³/min的条件下,可获得侧壁陡直、底面平整的P(MMA-GMA)凹槽结构。     

Circularly polarized unidirectional emission via a coupled plasmonic spiral antenna

In this Letter, we study the emission properties of an electric dipole emitter coupled to a plasmonic spiral structure. The plasmonic spiral structure functions as an optical antenna, coupling the electric dipole emission into circularly polarized unidirectional emission in the far field. Increasing number of turns of the spiral leads to narrower angular width of the emission pattern in the far field. For a spiral antenna with six turns, antenna directivity of 23.5 dB with a directional emission into a narrow angular cone of 4.3° can be achieved. The emitted photons carry spin that is essentially determined by the handedness of the spiral antenna. By reversing the spiral, one can switch the polarization of the emission field between left-hand and right-hand circular polarizations. The spiral antenna may be used as a nanoscale circular polarization source in single molecule sensing, single-photo sources, and integrated photonic circuits.     

低压氩气电感耦合等离子体特性分析及光谱诊断

电感耦合等离子体具有电子密度高、放电面积大、工作气压宽、结构简单等特点,在等离子体隐身领域具有突出的潜在优势。相对于开放式等离子体,闭式等离子体更适应于飞行器表面空气流速高、气压变化大的特殊环境。研究着眼于飞行器关键部件的局部隐身应用,设计了一种镶嵌于不锈钢壁中的圆柱形石英腔体结构,利用电感耦合放电的方式在腔体中产生均匀的平板状等离子体。由于增加了接地金属,降低了腔体内的钳制电位,同之前的纯石英腔体相比,该结构显著改善了等离子体的均匀性。研究了该闭式腔体内氩气电感耦合等离子体（ICP）的放电特性和发射光谱,实验中放电功率达到150 W时,可以明显观察到ICP的E-H模式转换,此时发射光谱和电子密度都呈现阶跃式增长。氩气发射光谱强度随放电功率升高显著增加,但是不同谱线强度增加幅度并不一致,分析认为是受不同的跃迁概率和激发能的影响。根据等离子体的发射光谱,利用玻尔兹曼斜率法对电子激发温度进行诊断,得到电子激发温度在2 000 K以上,并且随功率升高而降低,因为功率增大使电子热运动增强,粒子间的碰撞加剧,碰撞导致的能量消耗也更大。电子激发温度沿腔体径向呈近似均匀分布,分布趋势受功率影响不大。针对利用发射光谱诊断电子密度误差较大、计算繁琐的问题,引入Voigt卷积函数,经过拟合滤除多余展宽项的影响,得到准确的Stark展宽半高宽。最终利用发射光谱Stark展宽法计算了电子密度,腔体中心处的峰值密度可以达到7.5×1017 m-3。随着放电功率增大,线圈中容性分量降低,耦合效率增大,电子密度随之增大,但空间分布趋势基本不受功率影响。     

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采用等离子体分层模型,利用WKB近似研究了离子回旋共振加热(ICRH)天线发射谱n||对离子回旋波在托卡马克等离子体的表面功率反射系数、吸收衰减的影响,数值模拟了不同天线发射谱n||条件下快波少数离子加热的效果.模拟结果表明,当其它实验参数一定时,ICRH天线发射合适的n||能提高天线与等离子体的耦合效率,增强少数离子加热的效果.     

ICP-AES测定水中铜结果的不确定度评定

介绍了ICP－AES法测定水中铜的不确定度的评定方法。由于等离子质谱仪（ICP－MS）、紫外分光光度计（UVS）、原子吸收分光光度计（AAS）及原子荧光光度计（AFS）等仪器在定量分析中，校准曲线的绘制，标准样品的使用，测定结果的输出等方面与ICP－AES极为相似，因此本方法不仅可以用于水中其他元素和其他材料的测量结果的评定，而且还可以在评定ICP－MS、UVS、AAS、AFS等仪器的测定结果不的确定度时作参考。     

A Microfabricated Inductively Coupled Plasma Excitation Source

A novel miniaturization of inductively coupled plasma （ICP） source based on printed circuit produced using micro-fabrication techniques is presented. The basic parameters of the novel ICP, including its radio frequency, power loss, size, and argon consumption are less than 1% of that for the case of atmospheric pressure ICP source. For example, at 100 Pa of argon gas pressure, the present ICP source can be ignited by using the rf power less than 3.5 W. Potential applications of the ICP is discussed.     

加载电磁带隙结构的平切圆锥等角螺旋天线

加载电磁带隙的平切圆锥等角螺旋（EAS-EBG)天线可以在很宽的频带范围内提高辐射增益。建立了平切等角螺旋锥体（EAS）天线的基本模型,并用HFSS对其进行了仿真。研究了一种加载电磁带隙结构的平切圆锥等角螺旋锥体天线。该天线是在保持原平切等角螺旋锥体天线外形不变的情况下,加载了小型化的电磁带隙结构,以提高增益并保持共形化。仿真结果表明:加载电磁带隙结构的模型增益在5～12 GHz带宽下可以提高1～3 dB,并且轴比特性基本不变。     

光电导天线辐射阻抗特性模拟分析(英文)

针对连续太赫兹光电导天线辐射功率较低的缺点,利用有限积分方法对三种常用的光电导天线,包括偶极天线、蝶形天线和螺旋天线,进行数值模拟并分析比较其辐射阻抗特性.仿真结果表明,偶极天线的辐射阻抗与偶极长度、宽度、电极间隙以及传输线宽度有关,且在其谐振频率存在峰值阻抗,适用于特定频率的太赫兹波辐射.蝶形天线和螺旋天线在所研究的太赫兹波段具有近似稳定的辐射阻抗,广泛应用于宽带领域.对带有交叉电极的电极间隙进行计算,结果表明由交叉电极引入的附加电容降低了天线的高频阻抗.     

Optimization of Operating Parameters of Plasma Antenna

In this work, the operating parameters of the plasma antenna are optimized using a kinetic model based on Particle in Cell‐Monte Carlo Collisions (PIC‐MCC) method. This optimization study is performed via the investigation of variations in the operating parameters of the plasma antenna, i. e., its dimensions, background gas pressure, and the applied voltage frequency and their consequent effects on the plasma frequency, kinetic energy of electrons and plasma current density of plasma antenna. While the antenna performance is improved at higher tube lengths and applied frequencies, it is optimized at a particular tube radius. Moreover, higher background pressures have increasing effects on the plasma antenna operation. Based on this parametric study, the optimum operating parameters of the plasma antenna are established. (© 2015 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

一种高功率折线栅极化转换天线罩的设计

设计了一种用于高功率径向线螺旋阵列天线的极化转换天线罩。利用三层介质层包夹双层金属折线,形成密封的埋入式折线栅结构。在实现圆极化与线极化相互转换的同时,又避免金属与空气接触,可以提高功率容量。分析了埋入式折线栅单元各参数的影响,并优化单元参数,以此构建埋入式折线栅极化转换天线罩并加载至X波段高功率径向线螺旋阵列天线,分析了天线的基本性能以及功率容量。仿真结果显示：天线匹配良好,增益和波束宽度变化很小,中心频率轴比由1.16 dB变为40 dB,圆极化波转换为线极化波效果良好;经初步分析,极化转换天线罩的功率容量为121 MW,实现了极化转换天线罩的高功率应用。     

KT—5B托卡马克上阿尔芬波加热实验中天线阻抗的测量

一、引 言 托卡马克等离子体中的阿尔芬波加热实验研究自80年代初以来取得了许多有价值的实验结果。在阿尔芬波加热实验中,天线辐射阻抗的测量是十分重要的。天线辐射阻抗的变化不仅直接反映了阿尔芬波与等离子体之间的能量耦合情况,而且也反映了波在等离子体中传播过程的某些物理特性。例如,出现离散阿尔芬波(DAW模)或表面静电波(SEW模)便会使阻抗出现较大的峰值。因此,探索一种简便易行又能反映阻抗随放电时间变化的细微     

基于等离子体的定向天线阵理论与实验研究

当前国内学者对等离子体天线的研究主要集中于柱状天线和反射面天线, 而在国外已有学者以等离子体阵列结构设计了功能多样的智能天线系统. 为了较系统地了解这一新的设计思路, 基于等离子体散射理论对中心单元激励的圆形定向天线阵进行了理论和实验研究. 设计了一个16元等离子体无源振子的圆形天线阵, 实现了天线电磁波单波束和多波束的定向辐射. 通过理论计算和分析, 阐述了天线电磁波单波束和多波束辐射的原理. 通过建立实验系统, 测试了圆形天线阵的定向辐射特性. 实验结果和理论值接近, 说明该等离子体圆形天线阵可以实现天线电磁波的定向辐射和多波束辐射. 另外, 该天线阵还具有快速切换辐射方向、参数快速重构、雷达隐身性良好的优点. 关键词： 等离子体 定向天线阵 单波束 多波束     

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为优化表面波放电的狭缝天线阵设计,给表面波放电装置的设计提供理论依据,对狭缝天线布局进行了理论和仿真计算分析。结果表明,宽缝辐射的电磁场比纵缝强,同相激励天线辐射的电磁场比异相激励强,更容易击穿空气产生等离子体。基于磁场强度同相分布规律对已经采用的纵缝天线阵进行改进,纵缝按照两侧交互并间隔半个波导波长布置,各个纵缝均为同相,产生等离子体效果更好。     

Radiation properties of microstrip patch antenna covered with an anisotropic dielectric layer and a plasma sheath

By using SO-FDTD method, radiation properties of microstrip patch antenna covered with an anisotropic dielectric layer and a plasma layer are investigated. Simulation results show that the resonant frequency of antenna covered with a plasma layer varies with different plasma parameters. It has been indicated that the frequency offset of antenna is as high as 120 MHz when plasma frequency changes from 1 GHz to 8 GHz. The effect on antenna covered with an anisotropic dielectric layer is analyzed, while altering the dielectric constant or thickness of dielectric layer. Finally, the peak gain of antenna in complex plasma environment is presented in detail.