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1.
We report on characterization of a set of AlGaN/GaN multiple-quantum-well (MQW) photodetectors. The model structure used in the calculation is the p-i-n heterojunction with 20 AlGaN/GaN MQW structures in i-region. The MQW structures have 2 nm GaN quantum well width and 15 nm AlxGa1−xN barrier width. The cutoff wavelength of the MQW photodetectors can be tuned by adjusting the well width and barrier height. Including the polarization field effects, on increasing Al mole fraction, the transition energy decreases, the total noise increases, and the responsivity has a red shift, and so the detectivity decreases and has a red shift.  相似文献   

2.
This paper gives the composition dependence of the bandgap energy for highly doped n-type AlxGa1−xN. We report results of the bowing parameter obtained using a random simulation. Three groups of AlxGa1−xN semiconductors were considered and which are distinguishable by their non degenerate or degenerate character in the doping density (1017?ND?1020 cm−3). A striking feature is the large discrepancy of the bandgap bowing (−2.02?b?2.94 eV), as was demonstrated from our calculations. This suggests that high doping may be a possible cause able to induce the large range of bowing parameters reported for AlxGa1−xN alloys.  相似文献   

3.
The growth of InxGa1−xN Wurtzite structure is a well established fact. It permits to design optoelectronic devices such as laser diodes or LEDs, from the near ultraviolet to the infrared light spectrum. This sweeps indeed, the whole of the visible spectrum and, hence, appears to be very useful to the recent development of liquid crystal display screens, or designing photodiodes and perhaps solar cells (after studying their energetical efficiencies). Nevertheless, refractive indices of InxGa1−xN structure have not been studied.The refractive index of such structures is increasing from the GaN refractive index to the InN one, with therefore, a bowing of the curve due to the lattice mismatch between these two constituting binary alloys.The index is, in a certain range of the “n(x)” characteristic, less than the GaN one. This seems to be particularly interesting in the integrated optics domain or optical waveguides realization, because the growth of GaN is easier than the growth of InxGa1−xN.  相似文献   

4.
Transport properties of the two dimensional electron gas (2DEG) formed at the interface of AlGaN/GaN heterostructure ranging from 20 K to 300 K has been investigated theoretically considering the various scattering mechanisms like the acoustic, the piezo, the surface roughness, the alloy, the polar optical phonon and the dislocation scattering. The dc mobility is found to remain constant up to 150 K and then it decrease sharply with further increase in temperature. The ac mobility is also found to decrease with increase in the temperature. The real part of ac mobility, i.e. μr decreases with the increase in the frequency very fast initially and then gradually attains a steady value. The imaginary part of the ac mobility μim initially increases with the increase in the frequency and then decreases after reaching the maximum value. The value of the ac mobility reduces quite reasonably as the 2D carrier concentration increases at lower range of the frequency. At the carrier concentration of 5 × 1017 m−2, the ac mobility remains constant through a wide range of frequencies. With the increase in the dislocation densities, the values of the ac mobility are found to decrease at the lower range of frequencies. The thermo electric power is positive at the 2D carrier concentration of 5 × 1016 m−2, the value of which increases with the increase in the temperature and gradually attains a steady value. But the thermoelectric power at n2D of 1017 m−2 is found to be negative in the value. The value of ZT is found to increase with the temperature and attains the maximum value of 0.007 at 150 K and the value of ZT then decreases with increase in the temperature.  相似文献   

5.
Zinc-blende BxGa1−xAs alloys have been successfully grown on exactly oriented (0 0 1)GaAs substrates using triethylboron, trimethylgallium and arsine sources. The growth has been accomplished in a vertical low-pressure metalorganic chemical vapor deposition (LP-MOCVD) reactor. Boron incorporation behaviors have been extensively studied as a function of growth temperature and gas-phase boron mole fraction. The evolution of surface morphology was also observed.The maximum boron composition of 5.8% is obtained at the optimum growth temperature of 580 °C. RMS roughness over the surface area of 1×1 μm2 is only 0.17 nm at such growth conditions. Based on the experimental results, it has been clearly shown that boron incorporation will decrease significantly at higher temperature (>610 °C) or at much lower temperature (?550 °C).  相似文献   

6.
Pentacene organic thin-film transistors (OTFTs) using LaxTa(1−x)Oy as gate dielectric with different La contents (x = 0.227, 0.562, 0.764, 0.883) have been fabricated and compared with those using Ta oxide or La oxide. The OTFT with La0.764Ta0.236Oy can achieve a carrier mobility of 1.21 cm2 V−1s−1s, which is about 40 times and two times higher than those of the devices using Ta oxide and La oxide, respectively. As supported by XPS, AFM and noise measurement, the reasons lie in that La incorporation can suppress the formation of oxygen vacancies in Ta oxide, and Ta content can alleviate the hygroscopicity of La oxide, resulting in more passivated and smoother dielectric surface and thus larger pentacene grains, which lead to higher carrier mobility.  相似文献   

7.
Perovskite ferroelectric BaxSr1−xTiO3 (x = 0.5, 0.6, 0.7 and 0.8) thin films have been fabricated as metal-ferroelectric-insulator-semiconductor (MFIS) configurations using a sol-gel technique. The C-V characteristics for different Ba-Sr ratios and different film thicknesses have been measured in order to investigate the ferroelectric memory window effect. The results show that the memory window width increases with the increase both of Ba content and film thickness. This behavior is attributed to the grain size and dipole dynamics effect. It is found also that the memory window increases as the applied voltage increases. In addition, the leakage current density for the films is measured and it is found to be of the order of 10−8 A/cm2 for all tested samples, indicating that the films have good insulating characteristics.  相似文献   

8.
In this work, we report on the successfully growing Hg1−xMnxSe bulk crystals using a mixed, travelling heater method and Bridgman method, two-step procedure. Firstly, and with the aim of reducing Hg high pressure related to the high temperature synthesis reaction between the components in elemental form, HgSe crystals were synthesized and grown by the cold travelling heater method. Secondly, previously sublimated Mn and Se were incorporated to complete the desired composition. Then, the Bridgman growth was carried out by heating the alloy at a temperature of about 880 °C and lowering it at rate of 1 mm/h through a gradient of 25 °C/cm. The Hg1−xMnxSe crystals were characterized by scanning electron microscopy, energy dispersive X-ray analysis, X-ray diffractometry, Fourier transform infrared spectroscopy and magnetic susceptibility measurements. The summary of the experimental results allows us to be optimistic with the potential of Hg1−xMnxSe as regards using Hg1−xMnxTe and Hg1−xCdxTe for infrared photodetection.  相似文献   

9.
Polycrystalline thin films of Zn1−xCoxO with different cobalt (Co) content were grown on indium tin oxide (ITO) substrates by cathodic electrodeposition technique and subsequently annealed in air at 400 °C. The effect of annealing in their structural, optical and chemical properties has been characterized by X-ray diffraction (XRD), energy-dispersive spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS), Raman scattering and optical spectroscopy. Our measurements indicate that moderate annealing increases the crystal quality of the films. The films are highly transparent in the visible range and evidence an increase of the band gap and of the intensity of three typical Co absorption bands in the visible with the amount of Co. Thermal annealing produces an increase of the intensity of the Co2+-related absorption bands revealing that higher amount of Co atoms are occupying Zn sites.  相似文献   

10.
In this study the metal-semiconductor-metal (MSM) structure ultraviolet (UV) photodetectors (PDs) based on MgxZn1−xO thin films were fabricated. The MgxZn1−xO thin films were grown on glass substrates by sol-gel method. The results show that the optical absorption has a blue shift and higher transmittance with increasing Mg dopant. The optical band gap were modified by 3.28-3.52 eV, which corresponded to x = 0 and x = 0.16. For a 10 V applied bias, the dark currents of the MgxZn1−xO MSM-PDs were 637 nA (x = 0) to 0.185 nA (x = 0.16) and showed good Schottky contacts. This UV-visible rejection ratio of the MgxZn1−xO UV PDs at x = 0, 0.16, 0.21 and 0.33 were 18.82, 35.36, 40.91 and 42.92, respectively.  相似文献   

11.
In this study, we used nanoscratch techniques under a ramping load to evaluate the abrasive wear of Zn1−xMnxO epilayers (0 ? x ? 0.16) grown through molecular beam epitaxy (MBE) on sapphire substrates. We analyzed the surface roughness and damage using atomic force microscopy (AFM) and nanoindenter techniques. The scratched surfaces of the Zn1−xMnxO epilayers were significantly different for the various Mn compositions. AFM imaging of the Zn1−xMnxO films revealed that pileup phenomena were important on both sides of each scratch. During the scratching process, we found that cracking dominated in the case of Zn1−xMnxO films while ploughing; also we observed lower values of the coefficient of friction and shallower penetration depths for the films upon increasing the Mn content (x) from 0 to 0.16, suggesting that higher Mn contents provided the Zn1−xMnxO epilayers with higher shear resistances, enhanced by the presence of MnO bonds.  相似文献   

12.
We investigated the phase formation and texture of nickel silicides formed during the reaction of 10 nm sputter deposited nickel with Si1−xCx epitaxial layers on Si(1 0 0) substrates, having a carbon content between 0 and 2.5 atomic percent. It was found that both the formation temperature as well as the texture of the metal-rich phases is influenced by the amount of carbon in the Si1−xCx layer. To determine the influence of the location of the carbon during the silicidation process we also investigated the reaction of 10 nm nickel on Si(1 0 0) substrates, where carbon was either alloyed in the nickel layer or deposited as an interlayer at the interface between the nickel and the substrate. Depending on the location of the carbon, a different thermal stability of the layer was found.  相似文献   

13.
In this paper we report on electrical demonstration of thermally stable Ni silicides. It has been shown that when a sacrificial Si1−xCx epilayer is grown in the source-drain areas of NMOS transistors prior to silicidation, Ni silicides can withstand a 30 min anneal at 750 °C and demonstrate excellent electrical performance. We have observed carbon segregation at the NiSiC/Si1−xCx interface which can explain the increased NiSiC thermal stability. We have experimentally demonstrated feasibility of CMOS device implementation of thermally stable Ni silicides.  相似文献   

14.
It was studied that FePt-Ta thin films prepared on MgO (1 0 0) buffer-layer by DC/RF magnetron co-sputtering have shown better magnetic properties and micro structural improvement. The Ta-doped FePt-Ta films indicate somewhat differences in micro structural ordering and the aspect of grain growth after annealing. With respect to magnetic property, the sample having 30% increased coercivity was obtained after a heat treatment at 700 °C. In particular the addition of Ta (5.5%) enhances the L10 ordering of FePt at relatively high temperature (above 500 °C).  相似文献   

15.
The Pb(Zr0.20Ti0.80)O3/(Pb1−xLax)Ti1−x/4O3 (x = 0, 0.10, 0.15, 0.20) (PZT/PLTx) multilayered thin films were in situ deposited on the Pt(1 1 1)/Ti/SiO2/Si(1 0 0) substrates by RF magnetron sputtering technique with a PbOx buffer layer. With this method, all PZT/PLTx multilayered thin films possess highly (1 0 0) orientation. The PbOx buffer layer leads to the (1 0 0) orientation of the multilayered thin films. The effect of the La content in PLTx layers on the dielectric and ferroelectric properties of the PZT multilayered thin films was systematically investigated. The enhanced dielectric and ferroelectric properties are observed in the PZT/PLTx (x = 0.15) multilayered thin films. The dielectric constant reaches maximum value of 365 at 1 KHz for x = 0.15 with a low loss tangent of 0.0301. Along with enhanced dielectric properties, the multilayered thin films also exhibit large remnant polarization value of 2Pr = 76.5 μC/cm2, and low coercive field of 2Ec = 238 KV/cm.  相似文献   

16.
Si1−xGex/Si heterostructures play a primary role in the Si-based fast electronics developments of today. In this work, we will present the experimental results of infrared spectroscopic ellipsometry (IRSE) for structural determination of the boron heavily doped SiGe/Si sample grown by ultra-high vacuum chemical vapor deposition (UHVCVD) (the Ge atomic percent, the thickness of SiGe film and boron concentration). Especially, the principle of boron concentration in p-type SiGe film layer determined by IRSE was elucidated in detail. In addition, in order to corroborate the validity of IRSE for determining dopant concentration, secondary ion mass spectroscopy (SIMS) experiment has also been carried out. The close experimental agreement between IRSE and SIMS demonstrate that IRSE as a contactless, and non-destructive technology can be used in-line tools in production used for measuring the Ge content, the thickness of SiGe layer and boron concentration in p-type dopant SiGe/Si heterostructure, which often used the base layer of SiGe hetero-junction bipolar transistor (HBT) devices.  相似文献   

17.
InXGa1−XSb has the highest hole mobility amongst all III-V semiconductors which can be enhanced further with the use of strain. The use of confinement and strain in InXGa1−XSb quantum wells lifts the degeneracy between the light and heavy hole bands which leads to reduction in the hole effective mass in the lowest occupied band and an increase in the mobility. We present magnetotransport measurements on compressively strained InXGa1−XSb and GaSb quantum wells. Hall-bar and Van de Pauw structures were fabricated and Shubnikov-de Haas oscillations in the temperature range of T = 2-10 K for magnetic fields of B = 0-9 T were measured. The reduction of effective hole mass with strain was quantified. These results are in excellent agreement with modeling results from band structure calculations of the effective hole mass in the presence of strain and confinement.  相似文献   

18.
This study investigates the temperature dependence of the current-voltage (I-V) characteristics of n-MgxZn1−xO/p-GaN junction diodes. The n-MgxZn1−xO films were deposited on p-GaN using a radio-frequency (rf) magnetron sputtering system followed by annealing at 500, 600, 700, and 800 °C in nitrogen ambient for 60 s, respectively. The n-MgxZn1−xO/p-GaN diode at a substrate temperature of 25 °C had the lowest leakage current in reverse bias. However, the leakage current of the diodes increased with an increase in annealing temperatures. The temperature sensitivity coefficients of the I-V characterizations were obtained at different substrate temperatures (25, 50, 75 100, and 125 °C) providing extracted values of 26.4, 27.2, 17.9, and 0.0 mV/°C in forward bias and 168.8, 143.4, 84.6, and 6.4 mV/°C in reverse bias, respectively. The n-MgxZn1−xO/p-GaN junction diode fabricated with MgxZn1−xO annealed at 800 °C demonstrated the lowest temperature dependence. Based on these findings, the n-MgxZn1−xO/p-GaN junction diode is feasible for GaN-based heterojunction bipolar transistors (HBTs).  相似文献   

19.
The thick film NixZn(1−x)Fe2O4 on alumina substrate was prepared by screen printing of the ferrite powder synthesized by chemical co-precipitation method using nitrate precursors. These NixZn(1−x)Fe2O4 thick films of varying x were characterized by X-ray diffraction, FTIR spectroscopy and SEM (scanning electron microscopy). The permittivity and permeability were measured by overlay technique. Voltage standing wave ratio method was also used to measure the dielectric constant. The permittivity was found to increase with Ni content varying between 13 and 18. The permeability was ∼3.01. The overlay technique provides an easy method for measurement of permittivity and permeability of ferrite thick film.  相似文献   

20.
Hafnium oxide (HfO2) films were deposited on Si substrates with a pre-grown oxide layer using hafnium chloride (HfCl4) source by surface sol-gel process, then ultrathin (HfO2)x(SiO2)1−x films were fabricated due to the reaction of SiO2 layer with HfO2 under the appropriate reaction-anneal treatment. The observation of high-resolution transmission electron microscopy indicates that the ultrathin films show amorphous nature. X-ray photoelectron spectroscopy analyses reveal that surface sol-gel derived ultrathin films are Hf-Si-O alloy instead of HfO2 and pre-grown SiO2 layer, and the composition was Hf0.52Si0.48O2 under 500 °C reaction-anneal. The lowest equivalent oxide thickness (EOT) value of 0.9 nm of film annealed at 500 °C has been obtained with small flatband voltage of −0.31 V. The experimental results indicate that a simple and feasible solution route to fabricate (HfO2)x(SiO2)1−x composite films has been developed by means of combination of surface sol-gel and reaction-anneal treatment.  相似文献   

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