用于真空电子太赫兹器件的微型热阴极电子束源研究

太赫兹波辐射源是太赫兹(THz)波技术的关键.真空电子太赫兹器件在高频、大功率太赫兹源发展中较其他技术有明显的优势,微米尺度高电流密度微型电子束源则是研制真空电子太赫兹器件的核心之一.本文在研制低温、大电流纳米粒子氧化钪掺杂含钪扩散阴极(nanosized-scandia doped dispenser cathode)的基础上,采用发射抑制膜沉积与聚焦离子束(FIB)刻蚀技术,研制无需压缩直接提供高电流密度的微型电子束的电子源.所研究的电子束源直径400μm,在工作温度950fiC,提供空间电荷限制电流密度50 A/cm2时,已稳定工作1000 h以上,并且层流性良好.本文阐述了阴极制备工艺、电子发射特性、微米尺度电子束源的获得和特性,介绍了发射抑制膜的结构和抑制特性的评估.并探讨了镀膜和刻蚀对发射的影响机理.这一电子束源在常规毫米尺度电子源的基础上产生微米尺度的微区高电流密度的电子束,为真空电子太赫兹辐射源的研制提供了新的途径.     

Experimental studies of long-lifetime cold cathodes for high-powermicrowave oscillators

Operation of explosive-emission cold cathodes made from various materials was studied at a large number of pulses at current densities of ~1.0⁴ A/cm². The cathode voltage and the beam current were ~500 kV and 5 kA, respectively, with a pulsewidth of ~20 ns. At a small number of pulses (⩽10³), cathodes of like geometry (even made from different materials) demonstrated similar emission properties. For most of the materials tested, with a large number of pulses (⩾10³), the current risetime increased to the fullwidth of the voltage pulse and the maximum current of the vacuum diode decreased. When using a graphite cathode, the maximum current remained invariant until 10⁸ pulses. Mass losses were measured for a series of cathode materials. The results obtained offered the possibility to realize long-lived operation of an X-band relativistic backward-wave oscillator with an almost invariant output power of 350-400 MW during 10⁸ pulses at a pulse repetition rate of 100-150 p.p.s     

单晶CeB_6发射性能及磁电阻各向异性研究

采用X射线劳厄定向法对单晶CeB_6的(110),(111),(210)和(310)晶面进行了定向.系统研究了不同晶面热发射性能及磁场对电阻率的影响规律.结果表明,当阴极温度为1873 K时(110),(111),(210)和(310)晶面最大发射电流密度分别为38.4,11.54,50.4和20.8 A/cm~2,表现出了发射性能的"各向异性".RichardsonDushman公式计算逸出功结果表明,上述晶面中(210)晶面具有最低的逸出功,为2.4 eV.从实际应用来看,该晶面有望替代商业化的钨灯丝成为新一代的场发射阴极材料.磁电阻率测量结果显示,当晶体从[001]方向旋转至[011]方向时电阻率从73μ?·cm变化至69μ?·cm,表明电阻率在磁场中沿不同方向同样具有"各向异性"的特点.     

532nm皮秒脉冲激光对单晶硅的损伤特性研究

随着光电对抗和超短脉冲激光技术的发展,研究超短脉冲激光与单晶硅相互作用具有非常重要的理论和实际意义.为了进一步明确532 nm皮秒脉冲激光对单晶硅的损伤机理,本文开展了532 nm皮秒脉冲激光辐照单晶硅的损伤效应实验研究,测定了损伤阈值,明确了损伤机理,探讨了低通量下的脉冲累积效应.首先,利用波长为532 nm、脉冲宽...     

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The electron densities in the atmospheric pressure helium plasma were calculated by means of electron drift velocity and the jet velocity respectively. The electron velocity and jet velocity can be calculated by means of helium plasma jet current measured by a dielectric probe and plasma discharge current signal measured by voltage probes. The results show that the estimated electron densities of the helium plasma jet calculated from electron drift velocity and the jet velocity are in the order of 10 ¹¹ cm ^-3 and they increase with applied voltage. There is a little fluctuation in the value of the electron density along the jet axis of the plasma. This result is the same as the measured electron density in atmospheric pressure helium non-thermal plasma jet by using a Rogowski coil and a Langmuir probe. This is in one order lower than the electron density measured by microwave antenna.     

利用介质阻挡探针法测量大气压氦等离子体射流电子密度

分别利用电子的漂移速度和等离子体的传播速度计算了大气压下氦等离子体射流的电子密度。     

Study of field-induced explosive electron emission mechanisms ofpseudospark superemission cathodes

Various mechanisms of electron emission, including the field, field-enhanced thermionic, and explosive electron emissions from pseudospark cathodes, are discussed and compared. The mechanism of the field-induced explosive electron emission due to microstructure on the cathode surface is considered to be more likely the pseudospark superemissive mechanism. A high-mean electric field up to 3-5 MV/cm on the cathode surface in the end of hollow cathode phase is enough to initiate the mechanism. The cathode spot initiation delay time (<10 ns) and explosive emission threshold current (~10⁸ A/cm² ) prior to the high current conducting phase are given by solving the initial value problem of the one-dimensional heat conduction equation, thus explaining the existing experimental data of the pseudospark cathode superemission. In the case of multigap discharge, the above mechanism occurs on nearly all cathode and interelectrode surfaces. Experimental evidence in single- and multigap pseudospark discharges supports the suggested explanation     

A multiple-cathode arc-discharge plasma source

A plasma source for obtaining a 1-cm length of high-fractional ionized plasmas with electron densities in the range of 10¹⁵-10¹⁷ cm^-3 is described. The source consists of a capacitive discharge between a metal anode and an array of small metal cathodes embedded in epoxy, each with a current-limiting resistor. The effect is to have an array of sources which merge into each other, producing the plasma as a whole. The design and performance of the plasma source are presented. The entire system consists of the main electrode and shielding structures, the preionization circuit, and the main discharge circuit. Each of these components is described and the operating parameters and results are given     

A two-component model for the electron distribution function in ahigh-current pseudospark or back-lighted thyratron

Temperature, energy, and densities of two electron distribution function components, including an isotropic bulk part and an anisotropic beam, are analyzed for a hydrogen pseudospark and/or back-lighted thyratron switch plasma with a peak electron density of 1-3×10¹⁵ cm^-3 and peak current density of ≈10⁴ A/cm². Estimates of a very small cathode-fall width during the conduction phase and high electric field strengths lead to the injection of an electron beam with energies ⩾100 eV and density of 10¹³-10¹⁴ cm^-3 into a Maxwellian bulk plasma. Collisional and radiative processes of monoenergetic beam electrons, bulk plasma electrons and ions, and atomic hydrogen are modeled by a set of rate equations, and line intensity ratios are compared with measurements. Under these high-current conditions, for an initial density n_H2=10¹⁶ cm^-3 and electron temperature of 0.8-1 eV, the estimated beam density is ≈10¹³ -10¹⁴ cm^-3. These results suggest the possibility of producing in a simple way a very high-density electron beam     

Current filamentation of strongly preionized high pressure glowdischarges in Ne/Xe/HCl mixtures

The formation of intense current filaments, destroying the homogeneity of the active laser volume, limits the energy extraction from XeCl-lasers. Using time-resolved spectrally integrated pictures, the morphology and temporal development of such filaments are studied. The time scale of this process is found to be controlled by HCl depletion. With strong preionization (n_e>10⁹/cm ³) and a fast (10 ns) rising discharge voltage applied at the end of the preionizing X-ray pulse, the filaments originate from hotspots formed in the cathode layer. The shot by shot statistics of spot formation on freshly prepared cathodes reveal that hotspots are not caused by streamers developing in the high field region of strongly reduced electron density built up by electron diffusion during formation of the cathode sheath. Unexpectedly, a large number of weak diffuse filaments are found in spotless discharges (current density 300 A/cm²; duration 200 ns), in spite of the strong preionization     

基于窄带隙聚合物的高性能可见-近红外光伏探测器

聚合物光伏探测器是一种极具应用前景的新型光电探测器件.研究了基于窄带隙聚合物的高性能可见-近红外光伏探测器,结果表明,所制备的光伏探测器在可见至近红外光谱范围内具有宽的光谱响应(380—960 nm)、出色的响应度(840 nm时达到380 mA/W)和归一化探测度;同时,器件在暗态反偏条件下的能级示意图揭示了器件内平均电场较低是较厚光敏层器件具有低噪声电流的主要原因.电容-电压与时间周期性响应曲线研究表明聚合物光伏探测器具有快速的响应能力和良好的周期重复性.     

High current density results from a LaB6 thermioniccathode electron gun

A Pierce-type electron gun using a planar 1.9-cm-diameter lanthanum hexaboride cathode is being studied as a robust thermionic emitter at high cathode-current densities. The gun has been operated up to voltages of 115 kV, achieving beam current densities of 30 A/cm² . The electron gun operated dependably up to 90 kV, achieving temperature-limited currents of 50 A. Due to the high fields at the tip of the Pierce-focusing electrode, the gun would usually arc at voltages >90 kV. Ten shots were obtained at a gun voltage of 115 kV, achieving transmitted currents up to 89 A, transmitted beam power up to 10.2 MW, and transmitted power densities up to 3.4 MW/cm²     

薄膜硅/晶体硅异质结电池中本征硅薄膜钝化层的性质及光发射谱研究

本文采用甚高频等离子体化学气相沉积技术 (VHF-PECVD) 制备薄膜硅/晶体硅异质结电池中的本征硅薄膜钝化层, 光发射谱 (OES) 测量技术研究了硅薄膜沉积过程中等离子体发光谱随时间的变化. 结果表明: 在实验优化条件下等离子体发光谱很快达到稳定 (大约25 s), 并且SiH^*/H_α^* 的比值随时间变化较小, 避免了生长过程中硅薄膜结构的不均匀性, 这主要是SiH₄没有完全耗尽避免了SiH₄的反向扩散. 进一步研究了沉积参数对稳态发光谱和硅薄膜性质的影响, 结果表明: 随着硅烷浓度增加, H_α^*峰强度减小, SiH^*峰强度增加, 薄膜从微晶转变成非晶, 非晶硅薄膜钝化效果好; 随着沉积气压增大, H_α^*和 SiH^*峰强度先增加后减小, 高气压下H_α^*和 SiH^*峰强度下降主要是反应前驱物的聚合形成高聚合物, 不利于形成高质量的硅薄膜, 因此钝化效果下降; 随着反应功率密度增加, H_α^*和 SiH^*峰强度增大, 当功率密度为150 mW/cm² 趋于饱和, 硅薄膜的致密度和钝化效果也开始下降, 50 mW/cm²的低功率密度下硅薄膜钝化效果差可能是由于原子H 浓度低, 不能完全钝化单晶硅表面的悬挂键. 关键词： 薄膜硅 异质结 光发射谱 钝化     

PECVD分层结构对提高氢化非晶硅TFT迁移率的影响

为了进一步提高氢化非晶硅薄膜晶体管 (a-Si:H TFT) 的场效应电子迁移率, 研究了批量生产条件下对欧姆接触层和栅极绝缘层进行多层 制备, 不同的工艺参数对a-Si:H TFT场效应电子迁移率的影响. 研究表明随着对欧姆接触层 (n⁺层) 分层数的增加, 以及低速生长的栅极绝缘层 (GL层) 和高速生长的栅极绝缘层 (GH 层) 厚度比值提高, a-Si:H TFT的场效应迁移率得到提升. 当n⁺层分层数达到 3层, GL层和GH层厚度比值为4:11 时, 器件的场效应电子迁移率达到0.66 cm²/V·s, 比传统工艺提高了约一倍, 显著改善了a-Si:H TFT 的电学特性, 并在量产线上得到了验证. 关键词： 非晶硅薄膜晶体管 电子迁移率 欧姆接触层 栅极绝缘层     

Importance of high local cathode spot pressure on the attachment ofthermal arcs on cold cathodes

The importance of having high local cathode spot pressures for the self-sustaining operation of a thermal arc plasma on a cold cathode is theoretically investigated. Applying a cathode sheath model to a Cu cathode, it is shown that cathode spot plasma pressures ranging 7.4-9.2 atm and 34.2-50 atm for electron temperatures of ~1 eV are needed to account for current densities of 10⁹ and 10¹⁰ A·m^-2, respectively. The study of the different contributions from the ions, the emission electrons, and the back-diffusing plasma electrons to the total current and heat transfer to the cathode spot has allowed us to show the following. 1) Due to the high metallic plasma densities, a strong heating of the cathode occurs and an important surface electric field is established at the cathode surface causing strong thermo-field emission of electrons. 2) Due to the presence of a high density of ions in the cathode vicinity, an important fraction of the total current is carried by the ions and the electron emission is enhanced. 3) The total current is only slightly reduced by the presence of back-diffusing plasma electrons in the cathode sheath. For a current density j_tot=10⁹ A·m^-2 , the current to the cathode surface is mainly transported by the ions (76-91% of j_tot while for a current density j_tot = 10¹⁰ A·m^-2, the thermo-field electrons become the main current carriers (61-72% of j_tot). It is shown that the cathode spot plasma parameters are those of a high pressure metallic gas where deviations from the ideal gas law and important lowering of the ionization potentials are observed     

Dielectrics for passivation of planar InP/InGaAs diodes

We have investigated dielectrics for passivating planar InP or InGaAs photodiodes: thermally evaporated Al₂O₃ and SiO, sputtered Si₃N₄ and SiO₂ and also SiO₂ using chemical vapour deposition. The measured bulk and field-effect properties of all dielectrics excluding sputtered SiO₂ were suitable for this application. In planar InGaAs diodes with Cd diffused or Mg implanted p⁺-region a disordered dielectric/semiconductor surface led to high reverse current densities above 1 mA/cm². In InP diodes with p⁺-diffusion and dielectrics exhibiting positive flatband voltages, e.g. Si₃N₄ and Al₂O₃, reverse current densities of 10 μA/cm² were measured probably caused by a slight inversion of the semiconductor surface. With a SiO or CVD-SiO₂ passivating layer on n-InP lowest leakage current densities (10 nA/cm²) were achieved. Very low dark-current planar photodiodes InP/InGaAsP/InGaAs have been fabricated using SiO passivation (30 nA/cm²).     

Electron beam generation using a ferroelectric cathode

Data is presented on the production of electron beams from a ferroelectric cathode at voltages of order 0.5 MV and current densities of order 100 A/cm². In comparison with data at lower voltages, the beam current scales as the three-halves-power of the voltage. An interpretation of the voltage dependent scaling, based on the coupling of electrostatic energy from the ferroelectric to the gun, is presented     

Development of an intense pulsed metallic ion beam source

Intense pulse metallic ion beams (Al⁺, Cu⁺, and Pb⁺) were produced by a magnetically insulated ion diode having a metal anode. Metal ion plasmas on the anode could be generated through enhanced electron bombardment by using a radial cathode. The energy, current density, and duration time of the lead ion beam were 30~140 keV, ~7.5 A/cm² (total ion current ⩾0.5 kA), and 800 ns, respectively. The ion current density exceeded the space-charge-limited current by a factor of 50. The lead ions in the first-to-sixth states of ionization were detected by a Thomson-parabola ion-spectrometer together with light loss, such as C⁺ and O ⁺. The ratio of the ion current of heavy metals to the total ion current was measured using a magnetic mass analyzer with a charge collector. The ratio was about 90% for a lead ion beam and 20~50% for Al and Cu ion beams     

Space and time resolved electron density and current measurementsin a dense plasma focus Z-pinch

Plasma density and current profiles in a Z-pinch are important parameters to understand the implosion and radiation physics. This paper describes measurements of electron density and current at radii of ⩾200 μm from the axis of a dense plasma focus (DPF) pinch plasma that is imploded by a ≈0.3 MA current pulse. These measurements use laser interferometry and polarimetry. The electromagnetic wave propagating through a current carrying plasma will change its phase, polarization state, and propagation direction. Refraction by electrons bends the wave fronts and changes the propagation direction; Faraday rotation due to the magnetic field and electron density rotates the laser polarization vector. By measuring these quantities simultaneously, the magnetic field and electron density can be separately determined. Although the DPF used here is a low current device, the measured densities (⩽10²⁰ cm^-3) and magnetic fields (~100 T) are similar to values expected just outside higher current but larger radius Z-pinches, so this technique should be applicable there as well. The techniques described here do not require access to the core of the pinch to work; just outside these pinches the coronal density and self-magnetic field are high enough to give reliable data but not so high as to make the measurements difficult     

Filippov type plasma focus as intense source of hard X-rays(Ex≃50 keV)

This paper evaluates the use of a plasma focus machine (Filippov type) as a pulsed intense source of hard X-rays. It is shown experimentally that discharging a capacitor bank of W=50 kJ in the new arrangement of the discharge parameters, one can deliver into the test cavity (volume of 6*10³ cm³) an average of Φ _x=8*10^-4 J/cm². The delivered energy fluence varies in the range of 2*10^-4 J/cm²⩽Φ_x⩽2.9*10^-3 J/cm², depending on the probe position. The X-ray energy spectra were established by the differential absorption method using thermo-luminescent detectors (time-integrated spectra) or plastic scintillators (time-resolved spectra). The average energy of X-ray photons is 40 keVx^av<50 keV (20 keV⩽E _x⩽170 keV) and remains quasi-constant during the main part of the pulse (~40 ns). The electron energy that can produce such bremsstrahlung radiation is in the range of 95 keV⩽E_e⩽170 keV. However, time-resolved experiments reveal that at each instant of time only one energy of electron beam occurs. The aforementioned radiation characteristics reveal new potentials for the plasma-focus machine for a variety of applications. Some insight into the physics behind production mechanism of quasi-monoenergetic relativistic-electron beams will be concurrently reviewed