2D compound formation during copper dissolution: An electrochemical STM study

The reversible formation of a 2D-CuI film on Cu(1 0 0) is studied by means of cyclic voltammetry in combination with electrochemical scanning tunneling microscopy.Exposing the Cu(1 0 0) electrode surface to an acidic and iodide containing electrolyte (5 mM H₂SO₄/1 mM KI) leads to the formation of a well ordered c(p × 2)-I adsorbate layer at potentials close to the onset of the anodic copper dissolution reaction. Copper dissolution starts at slightly more positive potentials preferentially at step edges in the presence of the iodide adlayer via the removal of copper material from kink sites at step edges. This increase of mobile Cu⁺ ions causes the local exceeding of the CuI solubility product (pKL = 11.3), thereby giving rise to the nucleation and growth of a laterally well ordered 2D-CuI film. Key structural motifs of the growing CuI film are closely related to the (1 1 1) plane of bulk CuI. Quite intriguing, the 2D-CuI film does not act as a passive layer. Copper dissolution proceeds even in the presence of this binary compound via an inverse step flow mechanism.     

Soft magnetic properties of FeCo films with Co underlayer

Bilayered Fe₆₅Co₃₅ (=FeCo)/Co films were prepared by facing targets sputtering with 4πM_s∼24 kg. The soft magnetic properties of FeCo films were induced by a Co underlayer. H_c decreased rapidly when the Co underlayer was 2 nm or more. The films showed well-defined in-plane uniaxial anisotropy with the typical values of H_ce=10 Oe and H_ch=3 Oe, respectively. High frequency characteristics of the films show the films can work at 0.8 GHz with real permeability as high as 250.     

Valence control of cobalt oxide thin films by annealing atmosphere

The cobalt oxide (CoO and Co₃O₄) thin films were successfully prepared using a spin-coating technique by a chemical solution method with CH₃OCH₂CH₂OH and Co(NO₃)₂·6H₂O as starting materials. The grayish cobalt oxide films had uniform crystalline grains with less than 50 nm in diameter. The phase structure is able to tailor by controlling the annealing atmosphere and temperature, in which Co₃O₄ thin film was obtained by annealing in air at 300-600, and N₂ at 300, and transferred to CoO thin film by raising annealing temperature in N₂. The fitted X-ray photoelectron spectroscopy (XPS) spectra of the Co2p electrons are distinguishable from different valence states of cobalt oxide especially for their satellite structure. The valence control of cobalt oxide thin films by annealing atmosphere contributes to the tailored optical absorption property.     

Effect of Co underlayer on soft magnetic properties and microstructure of FeCo thin films

High saturation magnetization soft magnetic FeCo (=Fe₆₅Co₃₅) films were prepared using a thin Co underlayer. The FeCo/Co films exhibited a well-defined in-plane uniaxial anisotropy with easy axis coercivity (H_ce) of 10 Oe and hard axis coercivity (H_ch) of 3 Oe, and a half reduction of H_c with H_ce=4.8 Oe and H_ch=1.0 Oe was obtained when the composition was adjusted to 25 at% Co. The effective permeability of the films remains flat around 250 to 800 MHz. The saturation magnetostriction was 5.2×10⁻⁵ and the intrinsic stress was 0.8 GPa in FeCo single layer, both were slightly reduced by Co underlayer. The Co underlayer changed the preferred orientation of the FeCo films from (2 0 0) to (1 1 0) but more significantly, reduced the average grain size from ∼74 to ∼8.2 nm. It also reduced the surface roughness from 2.351 to 0.751 nm. The initial stage and interface diffusion properties were examined by TEM and XPS.     

Synthesis of a composite consisting of carbon nanotubes and graphite shell-encapsulated cobalt nanoparticles using plasma-enhanced chemical vapor deposition

We report a simple and effective one-step synthesis route for synthesizing a composite consisted of carbon nanotubes (CNTs) and graphite shell-encapsulated cobalt nanoparticles using plasma-enhanced chemical vapor deposition on Si (1 0 0) substrate covered with catalyst Co particles, discharging a mixture of H₂ and CH₄ gas, and characterize the obtained composite by X-ray diffraction, scanning electron microscopy, transmission electron microscopy, high resolution transmission electron microscope, and X-ray photoelectron spectroscopy. The results show that CNTs align perpendicularly to the substrate and graphite shell-encapsulated Co nanoparticles clung to the external surfaces of aligned CNTs. The diameter of the graphite shell-encapsulated Co nanoparticles increases with increasing the H₂ content in H₂ and CH₄ carbonaceous gas. A possible growth mechanism of the CNTs and graphite shell-encapsulated cobalt nanoparticles composite has been explored.     

The electrodeposition behaviors and magnetic properties of Ni-Co films

Ni-Co films with different compositions and microstructures were produced on ITO glasses by electrodeposition from sulphate bath at 25 °C. Cyclic voltammograms give a result that the increase in the Co²⁺ concentration displaces Ni-Co alloy oxidation peaks to negative potential with high Co current distributions. It is observed that the content of cobalt in the films increases from 22.42% to 56.09% as the molar ratio of CoSO₄/NiSO₄ varying from 0.015/0.085 to 0.045/0.055 in electrolyte. XRD patterns reveal that the structure of the films strongly depends on the Co content in the deposited films. The saturation magnetization (M_s) moves up from 144.84 kA m⁻¹ to 342.35 kA m⁻¹ and coercivity (H_c) falls from 15.27 kA m⁻¹ to 7.27 kA m⁻¹ with the heat treatment temperature increasing from 25 °C to 450 °C. The saturation magnetization (M_s) and coercivity (H_c) move up from 340.97 kA m⁻¹ and 7.98 kA m⁻¹ to 971.58 kA m⁻¹ and 18.62 kA m⁻¹ with the Co content increasing from 22.42% to 56.09% after annealing at 450.     

Magnetic and magneto-optical properties of Co-P films prepared by chemical deposition

Features in the formation of chemically deposited polycrystalline Co-P films with thicknesses of a few nanometers are established by analyzing film surface morphology and variation in the film magnetization. It is shown that in the thickness range below 30 nm the polar Kerr effect value θ_K changes nonmonotonically and depends on a wavelength of the incident light. For the films thicker than 30 nm, this value depends weakly on both the thickness and the wavelength. These features in the θ_K behavior are attributed to the Faraday effect, which is revealed at small thicknesses upon light reflection from the lower surface of a magnetic layer. It is found that the Faraday effect in the Co-P films exceeds that in the Co films by a factor of more than two. This effect is assumed to be caused by the presence of a Pd underlayer in the samples under study.     

CuO-PAA hybrid films: Chemical synthesis and supercapacitor behavior

We report the synthesis of CuO-Poly (acrylic) acid (PAA) hybrid thin films by a cost-effective spin coating technique for supercapacitor application. Coated films were annealed at 300, 400 and 500 °C, to study the annealing effect on the supercapacitor behavior. Further films were characterized by X-ray diffractometer (XRD), X-ray photoelectron spectroscopy (XPS), Fourier transform-Raman spectroscopy (FT-Raman) and Fourier transform-Infrared spectroscopy (FT-IR) techniques. Energy dispersive spectroscopy (EDS) shows the formation of amorphous blend of CuO and Cu₂O phases at 300 °C. Further, films annealed at 400 and 500 °C exhibit polycrystalline phase pure CuO with monoclinic structure. The scanning electron microscopy (SEM) micrographs show the transition of island-like structure to CuO crystals surrounded by PAA grafted composite ring with increase in annealing temperature. The possible growth mechanism of PAA and CuO bonding is discussed. Cyclic voltammetry (CV) is employed to calculate the specific capacitance (C_sp) in 1 M H₂SO₄ electrolyte. It is observed that the C_sp increases from 41 to136 F g⁻¹ with increase in annealing temperature.     

Out-of-plane low field anisotropic magnetoresistance in Nd0.51Sr0.49MnO3 thin films

A comparative study of the out-of-plane anisotropic magnetoresistance (AMR) in single crystalline and polycrystalline thin films of phase separated manganite Nd_0.51Sr_0.49MnO₃ has been carried out. On-axis DC magnetron sputtering was used to deposit the single crystalline films (30 and 100 nm in thickness) on single crystal (0 0 1) LaAlO₃ (LAO) and polycrystalline films (100 nm) on (1 0 0) Yttrium-stabilized ZrO₂ (YSZ) substrates. The in-plane and out-of-plane magnetotransport properties of these films differ significantly. A large low field AMR is observed in all the films. AMR shows a peak below the insulator-metal transition temperature in the single crystalline films, while the same increases monotonically in the polycrystalline film. Relatively larger low field AMR (∼20% at T=78 K and H=1.7 kOe) in the polycrystalline films suggests the dominance of the shape anisotropy.     

Oxygen adsorption on ultrathin Co/Ir(1 1 1) films: Compositional anomaly

Adsorption of oxygen on ultrathin Co/Ir(1 1 1) films thinner than 4 monolayers in an ultrahigh vacuum environment was studied. For oxygen adsorption on cobalt films, the complex adsorption kinetics emerges partly due to the incorporation of oxygen. The amount of oxygen adsorbed at the surfaces is higher than that incorporated into the film as revealed from sputter profiling measurements. At room temperature the CoO layer exhibits paramagnetism and could not contribute to the remanent Kerr intensity. As oxygen exposure increases, the reduction of the Kerr intensity is due to the reduction of the effective layer for the magnetic measurements. Compared with oxygen saturated cobalt films, the concentration of adsorbed oxygen per Co atom shows an oscillatory behavior. A compositional anomaly of a great amount of adsorbed oxygen in submonolayer Co coverage occurs because of the maximized number of adsorption and incorporation sites for oxygen on the surface. A larger charge transfer between Co and oxygen was observed for thinner Co overlayers as revealed from the larger chemical shifts of Auger lines.     

Sulfidation of a Cu submonolayer at the Au(1 1 1)/electrolyte interface - An in situ STM study

We describe the electrochemical preparation of an ultrathin copper sulfide film on Au(1 1 1) and its structural characterization by in situ STM. The first step, underpotential deposition of a Cu submonolayer from CuSO₄/H₂SO₄ solution, is followed by two electrolyte exchanges for (i) Cu-free (blank) H₂SO₄ solution and (ii) NaOH/Na₂S solution. The well-known (√3 × √3)R30° structure of the upd Cu layer is stable in the blank electrolyte for at least 2 h. After exposure to bisulfide, the Cu layer contracts and forms two-dimensional islands of two distinct ordered surface phases, i.e. a rectangular and, at higher potentials, a hexagonal phase, with Cu-free Au(1 1 1) regions between them, the latter exhibiting the characteristic (√3 × √3)R30°-S adlayer structure. Potential changes lead to a complex phase behaviour including HS⁻ ? S_x oxidation/reduction and, at strongly anodic potentials, dissolution of the Cu adlayer.     

Magneto-optical spectroscopy of diluted magnetic oxides TiO2−δ: Co

We report an experimental study on transversal Kerr effect (TKE) in magnetic oxide semiconductors TiO_2−δ:Co. The TiO_2−δ: Co thin films were deposited on LaAlO₃ (0 0 1) substrates by magnetron sputtering in the argon-oxygen atmosphere at oxygen partial pressure of 2×10⁻⁶-2×10⁻⁴ Torr. It was obtained that TKE spectra in ferromagnetic samples are extremely sensitive to the Co-volume fraction, the crystalline structure, and technology parameters. The observed well-pronounced peaks in TKE spectra for anatase Co-doped TiO_2−δ films at low Co (<1%) volume fraction are not representative for bulk Co or Co clusters in TiO_2−δ matrix that indicates on intrinsic ferromagnetism in these samples. With increase of Co-volume fraction up to 5-8% the fine structure of TKE spectra disappears and magneto-optical response in reflection mode becomes larger than that for thick Co films     

The influence of H2/(H2 + Ar) ratio on microstructure and optoelectronic properties of microcrystalline silicon films deposited by plasma-enhanced CVD

Hydrogenated microcrystalline silicon films were deposited by glow discharge decomposition of SiH₄ diluted in mixed gas of Ar and H₂. By investigating the dependence of the film crystallinity on the flow rates of Ar and H₂, we showed that the addition of Ar in diluted gas markedly improves the crystallinity due to an enhanced dissociation of SiH₄. The infrared-absorption spectrum reveals that the fraction of SiH bonding increases with increasing the rate ratio of H₂/(H₂ + Ar). The surface roughness of the films increases with increasing the flow rate ratio of H₂/(H₂ + Ar), which is attributed to the decrease of massive bombardment of Ar ions in the plasma. Refractive index and absorption coefficient of the films were obtained by simulating the optical transmission spectra using a modified envelope method. Electrical measurements of the films show that the dark conductivity increases and the activation energy decreases with the ratio of H₂/(H₂ + Ar). A reasonable explanation is presented for the dependence of the microstructure and optoelectronic properties on the flow rate ratio of H₂/(H₂ + Ar).     

Effects of the Hf content on the microstructure and magnetic properties of Co-Hf-Ta thin films

Effects of the Hf content in Co-Hf-Ta thin films on the microstructure and magnetic properties were investigated in this study. It was found that appropriate Hf addition can effectively refine the Co grain size. Co grain sizes sharply decreased from 50 nm down to 2.3 nm with increasing the Hf content from 1.02 at.% to 2.81 at.%, leading to the reduced magneto-crystalline anisotropy. The Co-Hf-Ta thin films with small Co grains reveal low anisotropy field, low coercivity, and high resistivity. By optimizing the Hf content, the film with Hf concentration of 2.81 at.% exhibits excellent soft magnetic properties: high saturation magnetization (4πM_S ∼ 13.6 kG), and low coercivity (H_C ∼ 0.6 Oe). The effective permeability of the film reaches 800 and remains constant up to 1 GHz.     

Growth temperature dependence of the hysteretic behavior of Ni0.5Zn0.5Fe2O4 thin films

Herein, a discussion of the effect of deposition temperature on the magnetic behavior of Ni_0.5Zn_0.5Fe₂O₄ thin films. The thin films were grown by r.f. sputtering technique on (1 0 0) MgO single-crystal substrates at deposition temperatures ranging between 400 and 800 °C. The grain boundary microstructure was analyzed via atomic force microscopy (AFM). AFM images show that grain size (φ∼70-112 nm) increases with increasing deposition temperature, according to a diffusion growth model. From magneto-optical Kerr effect (MOKE) measurements at room temperature, coercive fields, H_c, between 37and 131 Oe were measured. The coercive field, H_c, as a function of grain size, reaches a maximum value of 131 Oe for φ ∼93 nm, while the relative saturation magnetization exhibits a minimum value at this grain size. The behaviors observed were interpreted as the existence of a critical size for the transition from single- to multi-domain regime. The saturation magnetization (21 emu/g<M_s<60 emu/g) was employed to quantify the critical magnetic intergranular correlation length (L_c≈166 nm), where a single-grain to coupled-grain behavior transition occurs. Experimental hysteresis loops were fitted by the Jiles-Atherton model (JAM). The value of the k-parameter of the JAM fitted by means of this model (k/μ_o∼50 A m²) was correlated to the domain size from the behavior of k, we observed a maximum in the density of defects for the sample with φ∼93 nm.     

High pressure behaviour of KHSO4 studied by electrical impedance spectroscopy

Measurements of the electrical conductivity were performed in KHSO₄ at pressures between 0.5 and 2.5 GPa and in the temperature range 120-350 °C by the use of the impedance spectroscopy. The temperatures of the α-β phase transition (T_Tr) and of the melting (T_m), determined from the Arrhenius plots ln(σT) vs. 1/T, increase with pressure up to 1.5 GPa having dT/dP∼+45 K/GPa. Above the pressure 1.5 GPa, the pressure dependencies of T_Tr and T_m are negative dT/dP∼−45 K/GPa. At pressures above 0.5 GPa, the reversible decomposition of KHSO₄ into K₃H(SO₄)₂+H₂SO₄ (and probably into K₅H₃(SO₄)₄+H₂SO₄) affects the electrical conductivity of KHSO₄, with the typical values of the protonic electrical conductivity, c. 10⁻¹ S/cm at 2.5 GPa.     

Compressed exponential form for disordered domain wall motion in ultra-thin Au/Co/Au ferromagnetic films

Magnetization reversal in ultra-thin Au/Co/Au films deposited on single crystal silicon (1 0 0) was investigated using Kerr microscopy. In the considered ultra-thin Co films, with a thickness between 0.7 and 1 nm, the coercivity and magnetic anisotropy decrease with decrease in cobalt layer thickness and the magnetization reversal dynamics is dominated by disordered domain wall motion. An analysis of the observed magnetization reversal dynamics is proposed, starting from the Fatuzzo-Labrune model. We show that the relaxation curves of these samples are well described by a function obtained by a technical transformation of Fatuzzo-Labrune model in the regime dominated by domain wall motion.     

Characteristics of Ti0.97Co0.03O2:Sb0.01 dilute magnetic semiconducting thin films deposited at 500 °C by pulsed laser deposition

Epitaxial Ti_0.97Co_0.03O₂:Sb_0.01(TCO:Sb) films were deposited on R-Al₂O₃ (1 1 0 2) substrates at 500 °C in various deposition pressures by pulsed laser deposition. The solubility of cobalt within the films increases with decreasing deposition pressure at a deposition temperature of 500 °C. The TCO:Sb films deposited at 5×10⁻⁶ Torr exhibit a p-type anomalous Hall effect having a hole concentration of 6.1×10²²/cm³ at 300 K. On the other hand, films deposited at 4×10⁻⁴ Torr exhibits an n-type anomalous Hall effect having an electron concentration of about 1.1×10²¹/cm³. p- or n-type DMS characteristics depends on the change of the structure of TCO:Sb films and the solubility of Co is possible by controlling the deposition pressure.     

Structural and magnetic properties of sol-gel Co2xNi0.5−x Zn0.5−xFe2O4 thin films

Nanocrystalline Co_2xNi_0.5−xZn_0.5−xFe₂O₄ (x=0−0.5) thin films have been synthesized with various grain sizes by a sol-gel method on polycrystalline silicon substrates. The morphology as well as magnetic and microwave absorption properties of the films calcined at 1073 K were studied using X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy, and vibrating sample magnetometry. All films were uniform without microcracks. The Co content in the Co-Ni-Zn films resulted in a grain size ranging from 15 to 32 nm while it ranged from 33 to 49 nm in the corresponding powders. Saturation and remnant magnetization increased with increase in grain size, while coercivity demonstrated a drop due to multidomain behavior of crystallites for a given value of x. Saturation magnetization increased and remnant magnetization had a maximum as a function of grain size independent of x. In turn, coercivity increased with x independent of grain size. Complex permittivity of the Co-Ni-Zn ferrite films was measured in the frequency range 2-15 GHz. The highest hysteretic heating rate in the temperature range 315-355 K was observed in CoFe₂O₄. The maximum absorption band shifted from 13 to 11 GHz as cobalt content increased from x=0.1 to 0.2.     

Laser sintering of Cu paste film printed on polyimide substrate

We here show that highly conductive copper films are obtainable from Cu paste by laser sintering. The Cu paste synthesized using an organo-metallic compound was screen-printed onto polyimide substrate and the printed films were scanned by an ultraviolet laser beam at 355 nm under nitrogen atmosphere. Very compact microstructure was observed throughout the whole thickness and the sintered films were mechanically robust. Although Cu is known susceptible to oxidation, no Cu oxides were incorporated into the film during laser sintering. An electrical resistivity of 1.86 × 10⁻⁵ Ω cm was obtained. This resistivity is several orders of magnitude lower than those reported for the copper nanoparticle paste thermally sintered under N₂ or H₂ atmosphere.