飞秒电子衍射系统的设计

研发的超快电子衍射系统由超快电子枪、样品室、超快读出系统、电源系统,以及真空系统等组成,该超快电子衍射系统具有较高的时间分辩能力和较强的探测能力.光电阴极是蒸镀于MgFB2窗上的35 nm的银膜,该阴极对266 nm的紫外光比较敏感,有较高的量子效率,又具有很好的化学稳定性.用短磁聚焦系统来实现对光电子的聚焦,有两对偏转板,其中的一对在测量时间脉宽时用作扫描板.用双MCP探测器来增强电子图像的强度,其增益在104以上,具有单电子探测能力.系统的总时间脉宽设计为358 fs.     

新型跑道腔式束流位置监测器

系统提出了一种新的腔式束流位置监测器(BPM),即跑道型腔式BPM,并使用微波工作室软件进行了理论研究和模拟计算,提出了通用设计方法。跑道型腔式BPM的金属腔部分具有跑道形横截面,引出束流位置偏移激励起的一对偶极模式作为束流位置信号。该方案的偶极模式极化方向固定,频率分离,可以解决随机误差产生的横向串扰问题,其理论位置分辨力可以达到15 nm。     

集装箱检测系统用加速器电子枪的特性研究

 研究了固定式海关集装箱检测系统用9MeV电子行波直线加速器电子枪的结构特点和束流特性。该电子枪采用钪酸盐阴极,在灯丝电流为2.4A,阳极引出电压为-40kV的工作条件下,由电子枪发射到加速器入口处的脉冲电流强度为300mA,在加速器出口处,束斑截面小于φ2mm;打靶后,产生的X射线剂量率大于30cGy/(min× m)。电子枪的良好特性及束流强度保证了集装箱检测图像所需的高分辨率的要求。为保证满足更换电子枪时的安装要求,利用EGUN程序模拟计算了电子枪的结构及束流特性,为实际装配和使用提供了参考尺寸和调试参数。     

0.23 eV energy resolution obtained using a cold field-emission gun and a streak imaging technique

We demonstrate that a high energy resolution of 0.23 eV is possible by using a cold field-emission electron gun (CFEG) without a monochromator. We have used a 300 kV transmission electron microscope (Hitachi, HF-3000) equipped with a CFEG and an energy filter (Gatan, GIF2002). Since energy instability is critical for high energy resolution in electron energy-loss spectroscopy, we have applied a high-speed 'streak imaging' acquisition technique, in which a series of time-resolved spectra are acquired as a two-dimensional spectrum. With this technique, we can easily record 1000-20,000 spectra with an exposure time of 0.353 ms per spectrum. Instability of less than 1.4 kHz has been corrected in the time-resolved spectra, allowing the inherent performance of the CFEG to be realized.     

超快电子枪发射系统的优化设计

改进了超快电子衍射系统发射部分的数值计算模型和处理方法,使得计算结果更加接近于实际发射情形.研究了阴极表面面型对超快电子衍射系统时间分辨率的影响,提出了改进超快电子衍射系统时间分辨率的一个思路,该思路对于超快电子枪的设计及提高系统时间分辨率具有一定的作用.     

On the excitation temperature of pulsed plasma produced from washer plasma gun in a compact plasma system

The washer plasma gun is widely used to produce pulsed plasma and has various applications in plasma physics. A washer plasma gun and a Guillemin-E type pulse forming network are designed and fabricated in the laboratory to produce pulsed argon plasma in the Compact Plasma System. The spectroscopic signals of pulsed plasma are taken through toughened float glass at a distance of about 0.3 m from the plasma gun by a USB4000 digital spectrometer. Assuming the gun plasma is in Local Thermodynamic Equilibrium, Boltzmann plot method and the line ratio method are used to measure the excitation/electron temperature of pulsed plasma with different base pressure varying from 0.2 mbar to 1 mbar. The excitation/electron temperature of the plasma increases slightly with increasing base pressure within the range of 0.2 mbar to 0.8 mbar and then decreases slightly at a pressure of 1 mbar. Both methods produce almost similar results in temperature measurement, but the Boltzmann Plot method is most accurate than line ratio method and widely used method to obtain the excitation/electron temperature of plasma in Local Thermodynamic equilibrium condition.     

磁控注入电子枪的研究

介绍了毫米波回旋速调管磁控注入电子枪的结构与特点.依据回旋管对电子枪的要求,考虑相对论效应和空间电荷效应,编制了一套计算程序.利用电子枪模拟程序对电子轨迹进行模拟计算,研究了电极形状、磁场分布以及电子轨迹与电子注参量的影响,为磁控注入电子枪的设计提供了理论依据. The Structure and characteristics of the magnetron injection gun (MIG) for mm wave gyro-klytron are introduced. According to the requirements for the gyro-klytron, the relativistic effect and the space charge effect is taken into account . A program is developed for CAD. An electron gun code is used to simulate the electron trajectory, the influence of electrode shape, magnet field, electron trajectory on the electron beam have been studied. The theory for design of the electron gun is presented.     

毫米波回旋速调管磁控注入电子枪模拟计算

介绍了毫米波回旋速调管磁控注入电子枪的结构与特点。电子枪提供的电子束流性能直接影响到回旋速调管的总体参数,为保证整管的效率和输出功率,利用电子枪模拟程序对电子轨迹进行模拟计算,研究了电极形状、磁场分布以及电子轨迹与电子注参量的影响,并为磁控注入电子枪的设计提供了理论依据。     

双注磁控注入电子枪

为了增加回旋管的功率,采用双注磁控注入电子枪产生相对论电子注。与双阳极磁控注入电子枪相比,双注磁控注入电子枪产生双束电子注,在不影响电子注质量的基础上,增加电子枪的电流;电子枪产生相同电流时,双注磁控注入电子枪电子注电流小,电子注电子之间的空间电荷效应小,能够降低电子注的速度零散,提高电子注的质量。采用MAGIC软件数值模拟双注磁控注入电子枪,设计出一支大束流、低速度零散的双注磁控注入电子枪。     

BEPCII电子枪系统设计

 BEPCII改进工程需要更高流强的电子枪。新电子枪系统的物理设计、机械设计、控制系统设计等均进行了描述。电子枪的设计发射电流在脉宽为1 ns时大于10 A，重复频率50 Hz。将会采用脉冲电源来为电子枪提供最高200 kV的脉冲高压。在设计阶段，电子枪的几何结构和束流传输过程利用计算机模拟进行了优化。EGUN和DGUN的计算结果表明导流系数为0.22 mA·V^-3/2，电子枪出口的发射度为16 p·mm·mrad。PARMELA的模拟结果表明束流能顺利地传输至第一根加速管末端，捕获效率为67%，出口的均方根发射度为25 mm·mrad。基于EPICS平台的电子枪控制系统设计也已完成，提供了全新的双脉冲运行模式和2.5 μs长脉冲运行模式。     

红色显示用单晶荧光体

Ｃｅ掺杂单晶石榴石Ｃｅ：Ｖ：（Ｇｄ,Ｙ）３Ａｌ５Ｏ１２是一种实现高亮度、高分辨率约色显示的理想荧光新材料。它具有宽带发光谱,主峰位于５８０ｎｍ,采用这种材料作荧光屏的Φ５４ｍｍ极极射线管投影管可以达到７３００ｍｃｄ／ｍ＾２的高度亮,效率为１．５ｌｍ／Ｗ,通过优化电子枪设计,整管分辨率可达到８０ｌｉｎｅ／ｍｍ以上。本文对这种新材料的发光机理、制备工艺进行了详细介绍,并对一些实验中得到的有意义的结论进     

Operation of the EGA electron gun at high gas pressures

Summary This paper presents experimental results on the effects of increasing gas pressure on electron gun operations. The electron gun used is the gun EGA which has been developed for the TSS-1 mission. Various gases have been used with pressures in the range from 10⁻⁶ to a few times 10⁻³ mbar. The measurements, taken in a vacuum chamber, show a steady increase in the slope of theI–V characteristics of the gun when the pressure is increased, as a consequence of ionization phenomena induced by the electron beam. Further measurements have been taken of the overall current on a target at some distance from the gun itself. An attempt is also made at a theoretical calculation of the effects observed, based on simplified models.     

An Iron-Free Magnetron-Injection-Gun for a 28GHz, 200kW Gyroklystron Amplifier

A design study of a double-anode magnetron-injection-gun is performed to incorporate the electron gun into a high power 28GHz gyroklystron amplifier operating at 70kV and 8.2A. The electron gun is designed to be used in a tapered magnetic field in the cathode region produced from an iron-free superconducting magnet. An electron trajectory code predicts a beam axial velocity spread of 5.9% at = 1.5, 70kV, 8.2A and 10.4kG, which is a high quality electron beam suitable for the high gain, high efficiency, five-cavity gyroklystron amplifier. The successful design of the high quality electron gun is attributed to a longer gap between the modulating anode and the grounded anode compared with the case of the first 28GHz electron gun built with an iron enclosed electromagnet.     

325MHz微波栅控高压型热阴极电子枪的设计研究

高重复频率、高平均流强的电子枪具有十分广泛的应用。设计了一台束团重复频率为325 MHz在CW模式工作的微波栅控高压型热阴极电子枪,并详细论述了该类型微波栅控电子枪的实验原理。在该类型电子枪的设计中,首先需要利用仿真模拟软件EGUN、POISSON（PoissonSuperfish）、GPT（General Particle Tracer）完成300 kV直流高压电子枪的结构设计,并进行束流动力学验证计算。为将微波馈入该直流电子枪的阴栅极之间,进行了该微波栅控电子枪的供电系统设计,完成了从射频功率源到同轴热阴极的阻抗匹配方案,设计了一种325 MHz双模式同轴供电器件,并进行了验证与分析。     

On the electron gun operation in the Koehler illumination mode

The properties of the equivalent-cylinder electron-optical model are presented to describe the behavior of a three-electrode gun in dependence on the bias and cathode depth. The electron-optical modes of the electron gun operation in the Koehler illumination mode are considered. The results obtained can be used to design electron-beam lithography systems and electron microscopes.     

低反轰多腔热阴极微波电子枪物理设计

 为了开展基于自由电子激光的紧凑型太赫兹源技术研究,获得高品质（强流、低能散、低发射度）电子束,提出了一个低反轰双路微波馈入多腔热阴极微波电子枪的设计方案。用两路独立微波馈入激励微波电子枪,一路由首腔馈入激励首腔和实现阴极表面建场引出电子,另一路由后续腔馈入并通过腔间耦合激励各腔。两路微波互不耦合,通过移相器实现首腔和第2腔之间的相移连续可调。理论模拟结果表明:在一个射频周期内,热阴极微波电子枪的电子反轰功率约8 kW,平均反轰功率仅为1.2 W（重复频率25 Hz和脉宽6 μs）。     

回旋管单阳极电子枪计算机辅助设计

 根据回旋管对电子枪的要求，采用综合法和分析法设计了该单阳极磁控注入电子枪。编制了一套大型的计算程序，利用计算机辅助设计，给出了电极形状、电子轨迹与电子注参量。计算表明，这种电子枪具有速度零散小、层流性较好、体积小等特点。该枪已用于制管实验中。由热测实验表明，它具有明显的优点，并获得了127kW的峰值功率和超过10%的效率。     

超紧凑型飞秒电子衍射仪的设计

由于空间电荷效应的限制,产生百飞秒的极短电子脉冲是超快电子衍射技术的一大难点.同时,电子的穿透深度随着电子能量的增加而增加,而电子的散射几率却具有相反的规律.因而,除了时间分辨的提升,还需要可宽范围调节的电子能量以优化不同厚度样品对其的需求.基于此,提出并设计了一种新型超紧凑电子枪,结合均匀场阴极和可移动阳极的配置,可在10-125 kV加速电压范围内实现100 fs量级时间分辨率.通过优化设计高压电极轮廓,使得其轴上和整个阴极面的场增强因子在不同阴阳极间距下均小于约4%,从而保证了不同加速电压下最大轴上场强均可达10 MV/m量级,有效地抑制了电子脉冲的展宽效应;进一步将阳极小孔设计成可放置致密电镜载网的阶梯孔,一方面可将载网支撑的样品紧贴小孔后方放置,最大程度上缩短了电子从阴极到样品的时间弥散,同时也可以有效地减弱阳极孔对电子束的散焦效应,提升电子束的横向聚焦性能.     

多腔微波电子枪聚束腔作用分析

 分析了聚束腔中电场分布及电子的运动过程,使用RUNGE KUTTA法求出不同腔长时电子的俘获相位及不同初始相位电子的运动轨迹,讨论了加聚束段对减小电子反轰的作用。研制的4+1/2腔RF-gun使用首腔和第二加速腔作为聚束段,取得了高占空因子,较高束流功率的实验结果。     

A combined SNMS and EFTEM/EELS study on focused ion beam prepared vanadium nitride thin films

We investigated the diffusion profiles and core-loss fine-structures (ELNES) of thin vanadium nitride films by electron energy-loss spectroscopy (EELS) and energy filtering transmission electron microscopy (EFTEM). The nitride layers have been produced by rapid thermal processing in a NH₃ or N₂ atmosphere and have then been cross-sectioned with a focused ion beam instrument (FIB) under mild milling conditions to maintain crystallography. For the high-resolution electron energy-loss spectroscopy studies (HREELS), a recently developed TEM gun monochromator, implemented into a 200 kV field emission gun column was used in combination with a new post-column spectrometer. It was found that, dependent on substrate and atmosphere, layers with different vanadium and nitrogen content were formed, showing distinct differences in their ELNES. With an energy resolution at the 0.2 eV level and a TEM beam spot size of approximately 2 nm these layers could be unambiguously identified when compared to theoretical ELNES simulations from the literature.